Patents by Inventor Alfred Viehbeck
Alfred Viehbeck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5397863Abstract: Disclosed are structures comprising a composite of fluorinated particulate carbon dispersed in a polymer, the fluorinated carbon being present in an amount sufficient to reduce the dielectric constant of the composition, the structure also including electrical conductor patterns. The composite can be made conductive by irradiating it with an UV excimer laser.Type: GrantFiled: August 13, 1992Date of Patent: March 14, 1995Assignee: International Business Machines CorporationInventors: Ali Afzali-Ardakani, Juan Ayala-Esquilin, Bodil E. Braren, Shahrokh Daijavad, Elizabeth Foster, James L. Hedrick, Jr., Jeffrey C. Hedrick, Rodney T. Hodgson, Ashit A. Mehta, Steven E. Molis, Jane M. Shaw, Stephen L. Tisdale, Alfred Viehbeck
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Patent number: 5374454Abstract: A halogenated polymeric material is exposed to a reducing agent and/or an electrolyte and applied voltage to render exposed portions capable of being metallized and of being etched. The exposed portions can also be doped to thereby induce electrical conductivity therein. Also, new structures containing a free standing halogenated polymeric-containing layer and electrical conductive pattern thereon are provided.Type: GrantFiled: February 4, 1993Date of Patent: December 20, 1994Assignee: International Business Machines IncorporatedInventors: Harry R. Bickford, Peter J. Duke, Elizabeth Foster, Martin J. Goldberg, Voya R. Markovich, Linda C. Matthew, Donald G. McBride, Terrence R. O'Toole, Stephen L. Tisdale, Alfred Viehbeck
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Patent number: 5326643Abstract: The disclosure describes a multilayer article of manufacture comprising a substrate having adhered to it a terminally unsaturated adhesive polyimide, where the surface of the adhesive opposite the substrate is adhered to a polyimide, the article further characterized in having one set or a plurality of alternating layers of the terminally unsaturated adhesive polyimide and the polyimide. In another embodiment, the article has at least one adhesive polyimide layer adhered to a metal substrate or an electrical circuit component such as an integrated circuit, or means for forming electrical connections in an electrical circuit such as metal conduits on the circuit or a wiring network embedded within a ceramic and/or polymer substrate.In manufacturing the article of manufacture, a surface treatment technique such as wet process or a plasma/optional silane coupling agent may be applied to either the substrate, adhesive polyimide film or polyimide film prior to the bonding operation.Type: GrantFiled: October 7, 1991Date of Patent: July 5, 1994Assignee: International Business Machines CorporationInventors: Eleftherios Adamopoulos, Jungihl Kim, Kang-Wook Lee, Tae S. Oh, Terrence R. O'Toole, Sampath Purushothaman, John J. Ritsko, Jane M. Shaw, Alfred Viehbeck, George F. Walker
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Patent number: 5324813Abstract: Low dielectric constant polyimides formed from an optionally fluorinated dianhydride and a fluorinated diamine are described. The fluorine containing constituents are sterically disposed so that the dipole moment of the constituents tend to cancel out. Since fluorine containing diamines are generally nonreactive, to achieve a polyimide of high enough molecular weight to be practically useful, a method of fabrication of a high molecular weight polymer from monomers of low reactivity is provided. The monomers, such as a diamine and dianhydride are provided in a solution within which a low molecular weight polyamic acid is formed. The solution is dried. The polyamic acid used is cured to a low molecular weight polyimide. The polyimide is redisolved, redryed and recured enough times to build up the molecular weight to a useful level. The method is applicable to fabricating other polymers of high molecular weight, such as polyamides, polyesters and polyurethanes.Type: GrantFiled: July 22, 1992Date of Patent: June 28, 1994Assignee: International Business Machines CorporationInventors: Gareth G. Hougham, Jane M. Shaw, Alfred Viehbeck
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Patent number: 5318803Abstract: A dielectric substrate is conditioned for subsequent electroless plating thereon by contacting with a catalytic metal salt and then with a reducing agent and with an electroless metal plating bath followed by contacting with a second catalytic metal salt. In addition, a dielectric substrate is conditioned for electroless plating thereon by obtaining a substrate of a dielectric material that contains metal particles therein and contacting with a catalytic metal salt.Type: GrantFiled: November 13, 1990Date of Patent: June 7, 1994Assignee: International Business Machines CorporationInventors: Harry R. Bickford, Dennis A. Canfield, Arthur E. Graham, Stephen L. Tisdale, Alfred Viehbeck
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Patent number: 5281447Abstract: The invention is directed to a method for forming a metal coating on a substrate by applying an oxalate of a Group VIII element from the Periodic Table of the Elements to the substrate. The oxalate is selected so that it will decompose to a complex of a zero valent Group VIII element or a Group VIII element on exposure to an energy source. Microelectronic circuits, etch masks or metal contacts on superconductors can be formed by the method when the oxalate coating is exposed to an energy source through a mask or the energy source beamed at the oxalate to trace a pattern on it.The metal thus obtained can be subsequently coated by electroless compositions especially where the Group VIII element is a catalyst for electroless coatings such as palladium. Additionally, the metal coating may be coated by an electrolytic composition.Type: GrantFiled: October 25, 1991Date of Patent: January 25, 1994Assignee: International Business Machines CorporationInventors: Michael J. Brady, Stephen L. Buchwalter, Richard J. Gambino, Martin J. Goldberg, Kam L. Lee, Alfred Viehbeck
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Patent number: 5242551Abstract: A method of isomerizing an isoimide to an n-imide is described wherein an electron is supplied to the isoimide which induces the isomerization and wherein the isomerization is catalytic to the electron which remains available to initiate further isomerization. A polyimide is deposited onto a conductive substrate by providing a composition containing a polyisoimide and an electrolyte providing the substrate and a counter electrode in the composition, and providing a bias between the substrate and counter electrode to thereby supply an electron to the polyisoimide which isomerizes to deposit the insoluble polyimide on the substrate.Type: GrantFiled: October 3, 1991Date of Patent: September 7, 1993Assignee: International Business Machines CorporationInventors: Ernest R. Frank, Terrence R. O'Toole, Alfred Viehbeck
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Patent number: 5242713Abstract: Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons.Type: GrantFiled: December 23, 1988Date of Patent: September 7, 1993Assignee: International Business Machines CorporationInventors: Alfred Viehbeck, Stephen L. Buchwalter, William A. Donson, John J. Glenning, Martin J. Goldberg, Kurt R. Grebe, Caroline A. Kovac, Linda C. Matthew, Walter P. Pawlowski, Mark J. Schadt, Michael R. Scheuermann, Stephen L. Tisdale
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Patent number: 5187241Abstract: The invention relates to the formation of isoimides from amic acids, especially polyisoimides by a novel process in which polyimides are first converted to polyamic acids and then contacted with an isoimidizing agent. An acyl halide of a heterocyclic nitrogen compound or an acyl halide of a heterocyclic sulphur compound can be used as the isoimidizing agent. The isoimidization may also be carried out in the presence of a compound containing a heterocyclic nitrogen especially a solvent containing a heterocyclic nitrogen.The invention is especially applicable to conducting nucleophilic addition reactions on the surface of polyimides where the surface has been converted to a polyamic acid or on the surface of polyamic acid materials followed by isoimidization and reaction of the isoimide with a nucleophile such as an amine or organic hydroxy compound.Photosensitive metal compounds or electroless metal coating catalysts can be coordinated with the compositions obtained.Type: GrantFiled: October 3, 1991Date of Patent: February 16, 1993Assignee: International Business Machines CorporationInventors: Stephen L. Buchwalter, Ernest R. Frank, Terrence R. O'Toole, Richard R. Thomas, Alfred Viehbeck
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Patent number: 5179467Abstract: An electrochemical color change cell incorporating as a color changing agent intramolecular charge transfer salt or an intermolecular charge transfer salt. The intermolecular charge transfer salts and the intramolecular charge transfer salts have a plurality of oxidation states and a wide variation in color change. The intermolecular and intramolecular charge transfer salts preferably contain a violene moiety and a moiety having a carbonyl group conjugated to an aromatic moiety. The intramolecular charge transfer salts have a stable covalent radical-anion/radical-cation configuration. The intermolecular charge transfer salts have a stable ionic radical-anion/radical-cation configuration.Type: GrantFiled: September 17, 1990Date of Patent: January 12, 1993Assignee: International Business Machines CorporationInventors: Stephen L. Buchwalter, Martin J. Goldberg, Revathi Iyengar, Terrence R. O'Toole, Alfred Viehbeck
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Patent number: 5152880Abstract: A polyimide is deposited onto a conductive substrate by providing a composition containing the polyimide and an electrolyte and/or reducing agent, providing the substrate and a counter electrode in the composition, and providing a bias between the substrate and counter electrode to thereby deposit the polyimide on the substrate.Type: GrantFiled: March 28, 1991Date of Patent: October 6, 1992Assignee: International Business Machines CorporationInventors: Terrence R. O'Toole, Alfred Viehbeck
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Patent number: 5135779Abstract: Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material. The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons.Type: GrantFiled: May 24, 1991Date of Patent: August 4, 1992Assignee: International Business Machines CorporationInventors: Alfred Viehbeck, Stephen L. Buchwalter, Martin J. Goldberg, Caroline A. Kovac, Stephen L. Tisdale
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Patent number: 5133840Abstract: The surface modification of polyimide materials by a chemical process is disclosed to provide a variety of functional groups on the surface. The surface is treated to produce polyamic acid carboxyl groups which are subsequently reacted with epoxies, hydrazines, or alcohols. The carboxyl groups can be also be subjected to other organic reactions, such as reduction with metal hydrides and the like. The versatility and controllability of this process lends itself to promoting adhesion of the polyimide to similarly treated polyimides, other polymers and other substrates as well as combining with metals such as metal catalysts used for depositing conductors on non-conductive surfaces such as circuit boards.Type: GrantFiled: May 15, 1990Date of Patent: July 28, 1992Assignee: International Business Machines CorporationInventors: Leena P. Buchwalter, Stephen L. Buchwalter, Terrence R. O'Toole, Richard R. Thomas, Alfred Viehbeck
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Patent number: 5104944Abstract: A process for the synthesis of derivatives of materials containing an imide group conjugated to an aromatic moiety to form an ester, a thioester, an amide, a ketone, and silylesters. Electrons are supplied to redox sites to form a reduced imide material. The reduced imide material is contacted with a nucleophile which opens the imide ring of the reduced imide and chemically combines with a carbonyl carbon atom of the open imide ring to form an imide derivative.Type: GrantFiled: July 18, 1989Date of Patent: April 14, 1992Assignee: International Business Machines CorporationInventors: Martin J. Goldberg, Daniel P. Morris, Alfred Viehbeck
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Patent number: 5045159Abstract: Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and methods of fabrication thereof consisting of a thioether, an ester, an ether, a phosphate and a silylether. Electrons are supplied to the carbonyl group conjugated to an aromatic moiety to form a reduced material. The reduced material is contacted with an electrophile which attacks and chemically combines with the carbonyl group conjugated to an aromatic moiety. The parent material can be regenerated by hydrolysis of the derivative. A silyl derivative can be selectively formed on a polyimide material surface which can act as a barrier to an RIE etch of the polyimide material. After etch the polyimide material is regenerated from the silyl derivative.Type: GrantFiled: July 18, 1989Date of Patent: September 3, 1991Assignee: International Business Machines CorporationInventors: Martin J. Goldberg, Daniel P. Morris, Alfred Viehbeck
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Patent number: 5021129Abstract: Structures and methods of fabrication thereof wherein the method selectively supplies electrons to a first electroactive material in the presence of a second electroactive material wherein the first and second electroactive materials have different redox potentials. The electrons are selectively supplied either by electrochemical means or by appropriately chosen reducing agents. A structure fabricated by these methods has a first electroactive body disposed on a second electroactive body wherein the first body has a pattern therein exposing at the base thereof the surface of the second electroactive material body. Electrons can be selectively supplied to the surface of the second electroactive material body which is exposed at the base of the pattern in the first electroactive material body. Upon exposing the structure to a seeding solution seed is selectively supplied to those regions to which electrons have been selectively supplied.Type: GrantFiled: September 25, 1989Date of Patent: June 4, 1991Assignee: International Business Machines CorporationInventors: Gary V. Arbach, Terrence R. O'Toole, Alfred Viehbeck
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Patent number: 4599614Abstract: A solid electrochromic film is used on a semiconductor electrode in a display device permitting the user to write on the display using a light pen. Additional elements, including arrangement of the semiconductor electrodes transversely with respect to counter-electrodes, or providing an electrochromic film on the counter-electrodes, further enhance the versatility of the display device.Type: GrantFiled: September 13, 1983Date of Patent: July 8, 1986Assignee: SumX CorporationInventors: David W. DeBerry, Alfred Viehbeck