Abstract: A driver for a lighting device includes: a lighting driver configured to drive LED(s) of the lighting device in a first mode of operation when a primary power source is available and provided to the lighting driver and to control power output and/or final output current utilizing a backup or other secondary power source during an emergency mode of operation. In example embodiments and implementations, the lighting driver includes a single instance of a LED driver (e.g., only one LED driver circuit) configured to drive LED(s) of the lighting device during both modes of operation.

Abstract: LED driver apparatus and methods may include a sensing circuit for adjusting an output based on either a pulse width modulation dimming control or an analog dimming control. An LED driver apparatus and methods may also include a sensor for a parameter such as temperature and for recording such parameter, for example as a function of time. A setting unit for an LED driver apparatus can be used to sense and/or adjust settings in the LED apparatus even when the LED apparatus is not independently powered.

Abstract: A supplemental lighting system includes a charging circuit having a reference voltage for the charging circuit set through changes to reference resistances, and/or having an output voltage, current or power set through a connector configuration. In one example, a battery storage connector can be used to select a particular resistance for setting the reference voltage. Additionally, a supplemental lighting system may have a rechargeable battery coupled to a low-voltage part of the circuit, for example protected by an isolation circuit. Furthermore, a lithium ion or similar rechargeable battery supply can include a circuit for allowing it to be used with a circuit designed for a NiCad powered system or with a circuit designed for a lithium ion powered system.

Abstract: Methods and apparatus for plasma-enhanced substrate processing are provided herein. In some embodiments, a method is provided for processing a substrate in a process chamber having a plurality of electromagnets disposed about the process chamber to form a magnetic field within the process chamber at least at a substrate level. In some embodiments, the method includes determining a first direction of an external magnetic field present within the process chamber while providing no current to the plurality of electromagnets; providing a range of currents to the plurality of electromagnets to create a magnetic field within the process chamber having a second direction opposing the first direction; determining a desired magnitude in the second direction of the magnetic field over the range of currents; and processing a substrate in the process chamber using a plasma while statically providing the magnetic field at the desired magnitude.

Abstract: A ballast adapter includes a bracket plate formed as a flat sheet having a bracket plate outside surface and a bracket plate inside surface. The ballast adapter also has a pair of bracket plate arms having a sliding mount to the bracket plate. The pair of bracket plate arms are mounted to slide adjust toward and away from each other. The pair of bracket plate arms includes a first bracket plate arm and a second bracket plate arm. A pair of bracket sidewalls extend in a direction at a generally normal plane from the pair of bracket plate arms. The pair of bracket sidewalls includes a first bracket sidewall and a second bracket sidewall. The first bracket sidewall extends from the first bracket plate arm and the second bracket sidewall extends from the second bracket plate arm.

Abstract: Embodiments of the present invention generally relate to an apparatus for processing substrates having improved magnetic shielding. One embodiment of the present invention provides a plasma processing chamber having an RF match, a plasma source and a plasma region defined between a chamber ceiling and a substrate support. At least one of the RF match, plasma source and plasma region is shielded from any external magnetic field with a shielding material that has a relative magnetic permeability ranging from about 20,000 to about 200,000. As a result, the inherent process non-uniformities of the hardware may be reduced effectively without the overlaid non-uniformities from external factors such as earth's geomagnetic field.

Abstract: Methods and apparatus for plasma-enhanced substrate processing are provided herein. In some embodiments, a method is provided for processing a substrate in a process chamber having a plurality of electromagnets disposed about the process chamber to form a magnetic field within the process chamber at least at a substrate level. In some embodiments, the method includes determining a first direction of an external magnetic field present within the process chamber while providing no current to the plurality of electromagnets; providing a range of currents to the plurality of electromagnets to create a magnetic field within the process chamber having a second direction opposing the first direction; determining a desired magnitude in the second direction of the magnetic field over the range of currents; and processing a substrate in the process chamber using a plasma while statically providing the magnetic field at the desired magnitude.

Abstract: A supplemental lighting system includes a charging circuit having a reference voltage for the charging circuit set through changes to reference resistances, and/or having an output voltage, current or power set through a connector configuration. In one example, a battery storage connector can be used to select a particular resistance for setting the reference voltage. Additionally, a supplemental lighting system may have a rechargeable battery coupled to a low-voltage part of the circuit, for example protected by an isolation circuit. Furthermore, a lithium ion or similar rechargeable battery supply can include a circuit for allowing it to be used with a circuit designed for a NiCad powered system or with a circuit designed for a lithium ion powered system.

Abstract: Methods and apparatus for plasma-enhanced substrate processing are provided herein. In some embodiments, an apparatus for processing a substrate includes: a process chamber having an internal processing volume disposed beneath a dielectric lid of the process chamber; a substrate support disposed in the process chamber; one or more inductive coils disposed above the dielectric lid to inductively couple RF energy into the processing volume above the substrate support; and one or more first electromagnets to form a first static magnetic field that is substantially vertical in direction and axisymmetric about a central processing axis of the process chamber, and having a magnitude of about 2 to about 10 gauss within the processing volume proximate the lid.

Abstract: A folding ballast has a ballast housing having an elongated shape. A first socket arm is mounted to the ballast housing at a first socket arm joint, and the first socket arm has a first closed position parallel to the ballast. The first socket arm has a first open position perpendicular to the ballast. A second socket arm is mounted to the ballast housing at a second socket arm joint, and the second socket arm has a second closed position parallel to the ballast. The second socket arm has a second open position perpendicular to the ballast. A first socket is mounted to the first socket arm, and the first socket is electrically connected to the ballast housing. A second socket is mounted to the second socket arm, and the second socket is electrically connected to the ballast housing.

Abstract: Described are a method and apparatus for evaluating a least one characteristic of a plasma. The described method uses photons to raise the excitation state to or past the point of ionization of atoms which will traverse the plasma to be evaluated. The ionization of the atoms, followed by the measurement of the energy of any resulting secondary ions, facilitates the determining of one or more characteristics of the plasma. In one example, the photons are provided by a laser which directs a beam to intersect, and in some examples to be collinear with, a beam of atoms directed through the plasma.

Abstract: An absorbent article including a cover layer, a barrier layer and an absorbent system arranged between the cover layer and the barrier layer, the absorbent article being drapeable and possessing the absorbency attributes required of a sanitary napkin.

Abstract: Described are a method and apparatus for evaluating a least one characteristic of a plasma. The described method uses photons to raise the excitation state to or past the point of ionization of atoms which will traverse the plasma to be evaluated. The ionization of the atoms, followed by the measurement of the energy of any resulting secondary ions, facilitates the determining of one or more characteristics of the plasma. In one example, the photons are provided by a laser which directs a beam to intersect, and in some examples to be collinear with, a beam of atoms directed through the plasma.