Abstract: In a method of manufacturing a semiconductor device including a Fin FET, a fin structure extending in a first direction is formed over a substrate. An isolation insulating layer is formed over the substrate so that an upper portion of the fin structure is exposed from the isolation insulating layer. A gate structure extending in a second direction crossing the first direction is formed over a part of the fin structure. A fin mask layer is formed on sidewalls of a source/drain region of the fin structure. The source/drain region of the fin structure is recessed by a plasma etching process. An epitaxial source/drain structure is formed over the recessed fin structure. In the recessing the source/drain region of the fin structure, the plasma etching process comprises applying pulsed bias voltage and RF voltage with pulsed power.

Abstract: This specification discloses a composition of vegan cheese and method of preparing the same. The mentioned composition of vegan cheese and method of preparing the same can provide vegan cheese having the characteristics of real cheese by the design of the food structure and the condition control in the preparation process of the vegan cheese. Moreover, according to this specification, the mentioned composition of vegan cheese and method of preparing the same can provide vegan cheese product more in line with health requirements by not adding any emulsifier.

Abstract: Disclosed are gaming systems, methods and machines for a gaming cabinet configuration. In particular, the gaming systems, methods and machines may incorporate gaming cabinets that include one or more curved or arcuate screens, one or more candles integrated into the gaming cabinet, and/or one or more diffuse lighting elements to provide lighting features or effects.

Abstract: The present disclosure describes a method to form alignment marks on or in the top layer of an extreme ultraviolet (EUV) mask blank without the use of photolithographic methods. For example, the method can include forming a metal structure on the top layer of the EUV mask blank by dispensing a hexacarbonylchromium vapor on the top layer of the EUV mask and exposing the hexacarbonylchromium vapor to an electron-beam. The hexacarbonylchromium vapor is decomposed to form the metal structure at an area which is proximate to where the hexacarbonylchromium vapors interact with the electron-beam. In another example, the method can include forming a patterned structure in the top layer of an EUV mask blank with the use of an etcher aperture and an etching process.

Abstract: A pneumatic reciprocating saw comprises a housing, a saw extending into the housing, a pneumatic motor assembled with the housing and a transmission assembly. The pneumatic motor comprises an output shaft, the transmission assembly comprises a driving bevel gear arranged on the output shaft, a transmission bevel gear engaged with the driving bevel gear, a driven rod being arranged on the transmission bevel gear, a pushing block being eccentrically arranged on the driven rod, a transmission rod assembled with the saw, and a thermal insulator sleeved on the transmission rod without being shifting along with the transmission rod. The transmission rod comprises a groove for placing the pushing block to slide therein, when the transmission rod is driven to reciprocate in a linear track, a tail end of the transmission rod not connected with the saw being limited by the thermal insulator to only move in the linear track.

Abstract: An automatically brightness adjusting electronic device and a brightness adjusting method are provided. The method comprises: sensing an environmental light intensity; generating a brightness adjustment signal according to the environmental light intensity via a second control unit; and adjusting a display brightness of a display unit according to the brightness adjustment signal via a first control unit or the second control unit.

Abstract: A pneumatic scissor tool comprises a tool housing, a movable blade and a power assembly, the tool housing comprises an assembly space, a mounting opening and a fixed blade, wherein the fixed blade is arranged at the mounting opening, the movable blade is arranged at the mounting opening corresponding to the fixed blade. Further, the power assembly comprises a pneumatic motor, a transmission shaft and an eccentric driving wheel. The eccentric driving wheel is connected with the transmission shaft and comprises an outer ring member, a bearing block, a column mounting space and a plurality of supporting columns, the outer ring member is used for pushing the movable blade, the bearing block is arranged in the outer ring member and installed in an eccentric manner with the transmission shaft, and the supporting columns is arranged in the column mounting space and are tightly connected with each other.

Abstract: The present disclosure describes a method to form alignment marks on or in the top layer of an extreme ultraviolet (EUV) mask blank without the use of photolithographic methods. For example, the method can include forming a metal structure on the top layer of the EUV mask blank by dispensing a hexacarbonylchromium vapor on the top layer of the EUV mask and exposing the hexacarbonylchromium vapor to an electron-beam. The hexacarbonylchromium vapor is decomposed to form the metal structure at an area which is proximate to where the hexacarbonylchromium vapors interact with the electron-beam. In another example, the method can include forming a patterned structure in the top layer of an EUV mask blank with the use of an etcher aperture and an etching process.

Abstract: The present disclosure describes a method to form alignment marks on or in the top layer of an extreme ultraviolet (EUV) mask blank without the use of photolithographic methods. For example, the method can include forming a metal structure on the top layer of the EUV mask blank by dispensing a hexacarbonylchromium vapor on the top layer of the EUV mask and exposing the hexacarbonylchromium vapor to an electron-beam. The hexacarbonylchromium vapor is decomposed to form the metal structure at an area which is proximate to where the hexacarbonylchromium vapors interact with the electron-beam. In another example, the method can include forming a patterned structure in the top layer of an EUV mask blank with the use of an etcher aperture and an etching process.

Abstract: A new approach is proposed to support grouping and storing a data stream based on the types of data items in the stream for efficient data batch processing and analysis. First, the data stream is uploaded to a cloud storage, wherein the stream of data includes a plurality of data items of different types generated by and collected from different users and/or devices. The data items are then retrieved, grouped and saved by a preprocessing unit into a plurality of batch data queues, wherein data items in each batch data queue are of the same type. One or more batch processing units are then configured to fetch and batch process data items from the batch data queues and store these data items of the same data type to one or more cloud storage files for further processing and analysis on the cloud storage one batch data queue at a time.

Abstract: A 3D positioning system and method, adapted for object tracking and positioning of virtual reality is provided. The method comprises: tracking a characteristic of at least a light-emitting component at a controller; calculating relative displacement information between each of the controller and a headset display device according to the characteristic; detecting first displacement information of the headset display device and second displacement information of each of the controller; transmitting the relative displacement information, the first displacement information, and the second displacement information to the host; and adjusting a corresponding virtual image of the virtual reality according to the relative displacement information, the first displacement information, and the second displacement information and transmitting the adjusted virtual image to the headset display device to display via the host.

Abstract: An automatically brightness adjusting electronic device and a brightness adjusting method are provided. The method comprises: sensing an environmental light intensity; generating a brightness adjustment signal according to the environmental light intensity via a second control unit; and adjusting a display brightness of a display unit according to the brightness adjustment signal via a first control unit or the second control unit.

Abstract: The present disclosure describes a method to form alignment marks on or in the top layer of an extreme ultraviolet (EUV) mask blank without the use of photolithographic methods. For example, the method can include forming a metal structure on the top layer of the EUV mask blank by dispensing a hexacarbonylchromium vapor on the top layer of the EUV mask and exposing the hexacarbonylchromium vapor to an electron-beam. The hexacarbonylchromium vapor is decomposed to form the metal structure at an area which is proximate to where the hexacarbonylchromium vapors interact with the electron-beam. In another example, the method can include forming a patterned structure in the top layer of an EUV mask blank with the use of an etcher aperture and an etching process.

Abstract: A light-emitting diode (LED) device is capable of regulation of an operating current, and includes an LED unit configured to receive a direct current (DC) voltage for generating the operating current flowing therethrough, a regulating unit electrically connected to the LED unit, and a control unit electrically connected to the regulating unit. The regulating unit is configured to regulate the operating current so as to generate a limiting current flowing therethrough. The control unit is configured to control the regulating unit, according to one of the DC voltage and the limiting current, to generate the limiting current having a magnitude within a fixed range for regulating the operating current.

Abstract: A rise assisting structure includes a main body, a seat unit, two operation bars, and two support units. The seat unit is pivotally connected, at one side thereof, to the main body. The operation bars are pivotally mounted to the main body. The operation bars are provided at one end thereof with a step board arranged therebetween. The support units are each of an elastic extendable/retractable arrangement. When the step board is treaded down, the operation bars provide a torque in a way similar to a seesaw and the support units provide an elastically-support upward-pushing effect to raise up the seat unit so as to allow a user, with or without the assistance of an attendant person, to rise and stand up easily.

Abstract: A current vector controlled synchronous reluctance motor and control method thereof, wherein the motor has a coil on each of the teeth. The coils form a U-phase winding, a V-phase winding and a W-phase winding. The phase windings receive a balanced three-phase current vector to induce closed magnetic field lines, such that the coils induce same magnetic poles adjacent to the rotor unit. Two short magnetic routes are formed along three adjacent teeth and the rotor unit. The efficiency of the reluctance motor is high.