Abstract: A distributed multi-terminal and multi-network supporting system for an Android online game App includes an online game server, an Android online game App distributed video and remote control server, and an Android online game video and remote control mode client. The online game server is configured to store Android online game account information and game information of a user. The Android online game App distributed video and remote control server establishes network communication with the online game server, and the Android online game video and remote control mode client, respectively. The Android online game App distributed video and remote control server includes an enhanced ARM CPU version Android OS, an enhanced multi-instance ARM Linux Docker container, a host server, and an enhanced ARM CPU version Linux. A distributed multi-terminal and multi-network supporting method for an Android online game App based on the distributed multi-terminal and multi-network supporting system is provided.

Abstract: A high-power resistor and a fabrication method thereof are provided. The method includes: providing a resistance substrate including resistance alloy material and a copper metal layer; forming a cuprous oxide layer on the resistance substrate by using the copper metal layer; sticking the resistance substrate to a ceramic substrate, in which the cuprous oxide layer is located between the resistance substrate and the ceramic substrate; performing a sintering process on the resistance substrate and the ceramic substrate to form a composite substrate; forming a plurality of terminal electrodes on the composite substrate to form the high-power resistor. Therefore, the high-power resistor includes the composite substrate and the terminal electrodes. The composite substrate includes a bonding layer disposed between the ceramic substrate and the resistance substrate to bond the resistance alloy material on the ceramic substrate, in which the bonding layer includes sintered cuprous oxide.

Abstract: A package structure and a manufacturing method for the same are provided. The package structure includes a circuit, a mold sealing layer, a conductive metal board, and a conductive layer. The circuit board includes a substrate and a first electronic element disposed on the substrate. The mold sealing layer is disposed on the substrate and covers the first electronic element. The mold sealing layer has a top surface, a bottom surface corresponding to the top surface, and a side surface connected between the top surface and the bottom surface. The conductive metal board is disposed on the top surface and adjacent to the first electronic element. The conductive layer is disposed on the side surface and electrically connected to the conductive metal board. The conductive metal board and the conductive layer are each an independent component.

Abstract: A vapor chamber structure includes a main body. The main body has multiple independent heat dissipation blocks. Each of the heat dissipation blocks has an internal independent airtight chamber. A capillary structure is disposed on an inner wall face of the airtight chamber. A working fluid is filled in the airtight chamber. Multiple connection bodies are disposed between the independent heat dissipation blocks to connect the independent heat dissipation blocks with each other. At least one heat insulation penetrating slot is formed between each two adjacent connection bodies to separate the heat dissipation blocks from each other so as to achieve heat insulation effect. By means of the heat insulation penetrating slots formed on the connection bodies, the respectively airtight chambers can independently conduct heat without transferring heat to each other.

Abstract: A semiconductor structure and method of manufacture is provided. In some embodiments, a semiconductor structure includes a semiconductor layer comprising a first uppermost surface, a lowermost surface, and a first sidewall surface extending between the uppermost surface and the lowermost surface. A gate dielectric layer is over the semiconductor layer. A first gate electrode is over a portion of the gate dielectric layer over the uppermost surface of the semiconductor layer. A first source/drain region is in the semiconductor layer under the first uppermost surface and adjacent the first gate electrode. A second source/drain region is in the semiconductor layer under the lowermost surface of the semiconductor layer.

Abstract: High-voltage semiconductor devices are disclosed, each having gate, source and drain electrodes. A deep well layer is formed on a substrate and has a surface, where the substrate and the deep well layer are of first-type and second-type conductivities, respectively. A field isolation layer on the surface isolates a drain active region from a source active region. The source electrode contacts the source active region on the surface to form an ohmic contact. The drain electrode contacts the drain active region on the surface. A first well layer of the first-type conductivity is formed on the surface and between the ohmic contact and the drain active region, and at least a portion of the first well layer is under the field isolation layer. A bottom layer of the first-type conductivity is formed at a bottom of the deep well layer. The gate electrode is on the field isolation layer.

Abstract: Various embodiments of the present disclosure are directed towards a trench capacitor with a trench pattern for yield improvement. The trench capacitor is on a substrate and comprises a plurality of capacitor segments. The capacitor segments extend into the substrate according to the trench pattern and are spaced with a pitch on an axis. The plurality of capacitor segments comprises an edge capacitor segment at an edge of the trench capacitor and a center capacitor segment at a center of the trench capacitor. The edge capacitor segment has a greater width than the center capacitor segment and/or the pitch is greater at the edge capacitor segment than at the center capacitor segment. The greater width may facilitate stress absorption and the greater pitch may increase substrate rigidity at the edge of the trench capacitor where thermal expansion stress is greatest, thereby reducing substrate bending and trench burnout for yield improvements.

Abstract: A semiconductor structure includes a substrate including a first region and a second region, a first channel layer disposed in the first region and a second channel layer disposed in the second region, a first dielectric layer disposed on the first channel layer and a second dielectric layer disposed on the second channel layer, and a first gate electrode disposed on the first dielectric layer and a second gate electrode disposed on the second dielectric layer. The first channel layer in the first region includes Ge compound of a first Ge concentration, the second channel layer in the second region includes Ge compound of a second Ge concentration. The first Ge concentration in the first channel layer is greater than the second Ge concentration in the second channel layer.

Abstract: Cable designs and methods are provided herein to enable remote end access to active cable controllers for monitoring and upgrade operations. One illustrative network cable design includes: a first end connector configured to couple with a first host port and a second end connector configured to couple with a second host port, each of the first and second end connectors configured to convey a data stream in each direction via optical or electrical conductors connected between the first and second end connectors; a controller and a powered transceiver circuit included in the first end connector, the controller operable to configure operation of the powered transceiver circuit; and electrical contacts in the second end connector for a management bus to convey information from the second host port to the controller in the first end connector.

Abstract: Embodiments of the present disclosure provide a method of forming N-type and P-type source/drain features using one patterned mask and one self-aligned mask to increase windows of error tolerance and provide flexibilities for source/drain features of various shapes and/or volumes. In some embodiments, after forming a first type of source/drain features, a self-aligned mask layer is formed over the first type of source/drain features without using photolithography process, thus, avoid damaging the first type of source/drain features in the patterning process.

Abstract: Various embodiments of the present disclosure are directed towards a method for forming an integrated chip. The method includes forming a memory cell stack over a substrate. The memory cell stack includes a top electrode. A sidewall spacer structure is formed around the memory cell stack. The sidewall spacer structure includes a first sidewall spacer layer, a second sidewall spacer layer, and a protective sidewall spacer layer sandwiched between the first and second sidewall spacer layers. A dielectric structure is formed over the sidewall spacer structure. A first etch process is performed on the dielectric structure and the second sidewall spacer layer to define an opening above the top electrode. The second sidewall spacer layer and the dielectric structure are etched at a higher rate than the protective sidewall spacer layer during the first etch process. A top electrode via is formed within the opening.

Abstract: The present disclosure relates to a magneto-resistive random access memory (MRAM) cell having an extended upper electrode, and a method of formation the same. In some embodiments, the MRAM cell has a magnetic tunnel junction (MTJ) arranged over a conductive lower electrode. Two protection layers sequentially surround a sidewall of the MTJ. The two protection layers have etch selectivity over one another.

Abstract: A memory device includes a bottom electrode, a magnetic tunnel junction (MTJ) stack, a top electrode, and a sidewall spacer. The MTJ stack is over the bottom electrode. The top electrode is over the MTJ stack. The sidewall spacer laterally surrounds the MTJ stack and the top electrode. The sidewall spacer has an outermost sidewall laterally set back from an outermost sidewall of the bottom electrode.

Abstract: A semiconductor device includes a plurality of nanostructures, a gate dielectric layer disposed on each nanostructure of the plurality of nanostructures, a gate electrode disposed on the gate dielectric layer and on the plurality of nanostructures, and a source/drain region adjacent to the nanostructures. The source/drain region includes an epitaxial structure including a polygonal-shaped upper portion and a column-like lower portion, wherein the polygonal-shaped upper portion has multiple facets, and each of the facets characterized by a (111) crystallographic orientation. The polygonal-shaped upper portion includes corner regions adjacent an intersection of two facets with a (111) crystallographic orientation and an epitaxial body region in contact with the corner regions. The corner regions are characterized by a first dopant concentration and the epitaxial body region is characterized by a second dopant concentration, and the first dopant concentration is higher than the second dopant concentration.

Abstract: The present disclosure relates to an integrated circuit. The integrated circuit includes a an inter-layer dielectric (ILD) structure laterally surrounding a conductive interconnect. A dielectric protection layer is disposed over the ILD structure and a passivation layer is disposed over the dielectric protection layer. The passivation layer includes a protrusion extending outward from an upper surface of the passivation layer. A bottom electrode continuously extends from over the passivation layer to between sidewalls of the passivation layer. A data storage element is over the bottom electrode and a top electrode is over the data storage element.

Abstract: Depositing a side slab structure on a cladding layer before etching a supporting dielectric prevents tapering of a silicon waveguide during etching of the supporting dielectric and a substrate. For example, the side slab structure may be deposited over the silicon waveguide and the cladding layer after etching the cladding layer. As a result, when an electronic device is integrated ex situ on the substrate, wave intensity and/or total internal reflection is improved, which improves an efficiency of the electronic device.

Abstract: The present disclosure relates to an integrated chip. The integrated chip includes a bottom electrode disposed over a substrate. The bottom electrode has a first thickness along an outermost edge and a second thickness between the outermost edge and a lateral center of the bottom electrode. The first thickness is larger than the second thickness. A data storage structure is over the bottom electrode and a top electrode is over the data storage structure.

Abstract: A semiconductor structure includes a first device and a second device. The first device includes a plurality of first fins, a first work function layer over the plurality of first fins, and a first contact layer over the first work function layer. The second device includes a plurality of second fins, a second work function layer and the first work function layer over the plurality of the second fins, and a second contact layer over the first work function layer and the second work function layer. A distance between a bottom surface of the first work function layer and a bottom surface of the first contact layer is greater than a distance between a side surface of the first work function layer of the first device and a side surface of the first contact layer.

Abstract: Control logic in a memory device executes a programming operation to program the set of memory blocks of the set of memory planes to a set of a programming levels. In response to determining at least a portion of a first memory block passed a program verify operation associated with a last programming level of the set of programming levels, the control logic executes a first program sub-operation to terminate the programming operation with respect to a first subset of one or more memory planes of the set of memory planes that passed the program verify operation associated with the last programming level and identify a second subset of one or more memory planes that failed the program verify operation associated with the last programming level. The control logic executes a second program sub-operation to apply a trim set to the second subset of one or more memory planes that failed the program verify operation of the last programming level.

Abstract: A semiconductor device according to the present disclosure includes a first conductive feature and a second conductive feature in a first dielectric layer, a buffer layer over the first dielectric layer, a second dielectric layer over the buffer layer, a first bottom via extending through the buffer layer and the second dielectric layer, a second bottom via extending through the buffer layer and the second dielectric layer, a first bottom electrode disposed on the first bottom via, a second bottom electrode disposed on the second bottom via, a first magnetic tunnel junction (MTJ) stack over the first bottom electrode, and a second MTJ stack over the second bottom electrode. The first MTJ stack and the second MTJ stack have a same thickness. The first MTJ stack has a first width and the second MTJ stack has a second width greater than the first width.