Abstract: An acoustic wave filter having thermal sensing acoustic wave resonator comprises a substrate, a plurality of series acoustic wave resonators formed on the substrate, at least one shunt acoustic wave resonator formed on the substrate and a thermal sensing acoustic wave resonator. The thermal sensing acoustic wave resonator is one of a series acoustic wave resonator and a shunt acoustic wave resonator. Thereby the thermal sensing acoustic wave resonator plays dual roles of thermal sensing and acoustic wave filtering.

Abstract: A method of forming patterns includes the steps of providing a substrate on which a target layer and a hard mask layer are formed; forming a plurality of first resist patterns on the hard mask layer; performing a tilt-angle ion implant process to form a first doped area and a second doped area in the hard mask layer between adjacent first resist patterns; removing the first resist patterns; coating a directed self-assembly (DSA) material layer onto the hard mask layer; performing a self-assembling process of the DSA material layer to form repeatedly arranged block copolymer patterns in the DSA material layer; removing undesired portions from the DSA material layer to form second patterns on the hard mask layer; transferring the second patterns to the hard mask layer to form third patterns; and etching the target layer through the third patterns.

Abstract: A method and systems for dynamically planning a well site are provided herein. The method includes generating, via a computing system, a three-dimensional model of a hydrocarbon field including a reservoir. The method also includes determining a location for a well site based on the three-dimensional model and determining reservoir targets for the determined location and a well trajectory for each reservoir target. The method also includes adjusting the location for the well site within the three-dimensional model and dynamically adjusting the reservoir targets and the well trajectories based on the dynamic adjustment of the location for the well site. The determination and the dynamic adjustment of the location, the reservoir targets, and the well trajectories for the well site are based on specified constraints. The method further includes determining a design for the well site based on the dynamic adjustment of the location, the reservoir targets, and the well trajectories for the well site.

Abstract: An antenna apparatus and an electronic apparatus are provided. The electronic apparatus includes the antenna apparatus. The antenna apparatus includes a radiator, a first and a second impedance control circuit. The radiator receives and transmits a radio frequency (RF) signal. The first impedance control circuit is electrically connected to the radiator and transmits the RF signal. The second impedance control circuit includes an impedance matching circuit and an inductor. The first end of the impedance matching circuit is electrically connected to the radiator. The impedance matching circuit adjusts the impedance matching of the radiator and transmits a sensing signal. The inductor is electrically connected to the second end of the impedance matching circuit. The inductor transmits a sensing signal, and blocks the RF signal. Accordingly, the structures of the antenna and the circuit can be simplified, and the influence between the RF signal and the sensing signal can be reduced.

Abstract: A method for processing a substrate is provided. The method comprises forming a patterned photoresist over a first material, the patterned photoresist comprising island portions and shaped spaces surrounding the island portions. An area of each of the island portions is reduced to enlarge the shaped spaces, which are filled with a second material. The island portions are removed to form first openings in the second material. Portions of the first material exposed through the first openings are removed to form second openings in the first material. Portions of a substrate exposed through the second openings are removed to form holes in the substrate. Methods of patterning a substrate and methods of forming a hole pattern in a substrate are also disclosed.

Abstract: There is provided a system and method for automatically identifying potential compartments of a reservoir based on the reservoirs geological structure. A method of identifying compartments of a reservoir structure includes obtaining structural data corresponding to a geological structure of a reservoir. The method also includes generating a topological net based on the structural data, the topological net comprising critical points and poly segments connecting the critical points. The method also includes identifying potential compartments of the reservoir structure based on the topological net. The method also includes identifying spill or break-over relationships among the potential compartments based on the topological net.

Abstract: A method for processing a substrate is provided. The method comprises forming a patterned photoresist over a first material, the patterned photoresist comprising island portions and shaped spaces surrounding the island portions. An area of each of the island portions is reduced to enlarge the shaped spaces, which are filled with a second material. The island portions are removed to form first openings in the second material. Portions of the first material exposed through the first openings are removed to form second openings in the first material. Portions of a substrate exposed through the second openings are removed to form holes in the substrate. Methods of patterning a substrate and methods of forming a hole pattern in a substrate are also disclosed.

Abstract: A method of forming patterns includes the steps of providing a substrate on which a target layer and a hard mask layer are formed; forming a plurality of first resist patterns on the hard mask layer; performing a tilt-angle ion implant process to form a first doped area and a second doped area in the hard mask layer between adjacent first resist patterns; removing the first resist patterns; coating a directed self-assembly (DSA) material layer onto the hard mask layer; performing a self-assembling process of the DSA material layer to form repeatedly arranged block copolymer patterns in the DSA material layer; removing undesired portions from the DSA material layer to form second patterns on the hard mask layer; transferring the second patterns to the hard mask layer to form third patterns; and etching the target layer through the third patterns.

Abstract: A substrate having a target material layer is provided. A first hard mask layer, a second hard mask layer, and a photoresist layer are formed on the target material layer. The photoresist layer is transferred into first patterns on the second hard mask layer. Regions of the second hard mask layer not protected by the first patterns are etched away, thereby forming second patterns. The first patterns are trimmed to form trimmed features. A conformal spacer material layer is deposited on the trimmed features, the second patterns, and the first hard mask. The spacer material layer is etched to form first spacers on sidewalls of the trimmed features, and second spacers on sidewalls of the second patterns. The trimmed features are removed. Regions of the second patterns not protected by the first spacers are removed, thereby forming patterns with a reduced, fine pitch.

Abstract: A method of forming patterns includes the steps of providing a substrate on which a target layer and a hard mask layer are formed; forming a plurality of first resist patterns on the hard mask layer; performing a tilt-angle ion implant process to form a first doped area and a second doped area in the hard mask layer between adjacent first resist patterns; removing the first resist patterns; coating a directed self-assembly (DSA) material layer onto the hard mask layer; performing a self-assembling process of the DSA material layer to form repeatedly arranged block copolymer patterns in the DSA material layer; removing undesired portions from the DSA material layer to form second patterns on the hard mask layer; transferring the second patterns to the hard mask layer to form third patterns; and etching the target layer through the third patterns.

Abstract: A thermal sensor circuit comprises a conversion circuit which is one of a buck DC-DC converter circuit and a boost DC-DC converter circuit, wherein the conversion circuit comprises an inductor and an output terminal. A thermal sensor senses a thermal variation correlated to a capacitance variation of the thermal sensor. The capacitance variation induces an internal parasitic capacitance variation of the inductor which is connected in parallel to the thermal sensor and results a variation of an energy stored in the inductor. Hence a variation of a converted circuit signal outputting by the output terminal is caused, wherein the variation of the converted circuit signal is correlated to the thermal variation.

Abstract: A substrate having a target material layer is provided. A first hard mask layer, a second hard mask layer, and a photoresist layer are formed on the target material layer. The photoresist layer is transferred into first patterns on the second hard mask layer. Regions of the second hard mask layer not protected by the first patterns are etched away, thereby forming second patterns. The first patterns are trimmed to form trimmed features. A conformal spacer material layer is deposited on the trimmed features, the second patterns, and the first hard mask. The spacer material layer is etched to form first spacers on sidewalls of the trimmed features, and second spacers on sidewalls of the second patterns. The trimmed features are removed. Regions of the second patterns not protected by the first spacers are removed, thereby forming patterns with a reduced, fine pitch.

Abstract: Method for determining visualization rendering parameters for seismic data to heighten subtle differences. The full data volume and at least one sub-volume are processed in the inventive method (12). Statistics are extracted for the data or attributes of the data (13). Rendering parameters are derived based on comparing and computing the statistical information for the volume and sub-volumes (14).

Abstract: A method of forming patterns includes the steps of providing a substrate on which a target layer and a hard mask layer are formed; forming a plurality of first resist patterns on the hard mask layer; performing a tilt-angle ion implant process to form a first doped area and a second doped area in the hard mask layer between adjacent first resist patterns; removing the first resist patterns; coating a directed self-assembly (DSA) material layer onto the hard mask layer; performing a self-assembling process of the DSA material layer to form repeatedly arranged block copolymer patterns in the DSA material layer; removing undesired portions from the DSA material layer to form second patterns on the hard mask layer; transferring the second patterns to the hard mask layer to form third patterns; and etching the target layer through the third patterns.

Abstract: A patterns forming method begins with performing a lithography process on a photoresist film with a photomask having first apertures in a first mask region and second apertures in a second mask region to respectively form first main features and dummy features, on which the second mask region is located between the border of the photomask and the first mask region, and a size of each of the first apertures is greater than a size of each of the second apertures. Subsequently, a material is filled into the first main features to respectively form second main features and into the dummy features to seal the dummy features. Then, a substrate is etched to form patterned features by using the photoresist film having the second main features.

Abstract: A method of forming patterns includes the steps of providing a substrate on which a target layer and a hard mask layer are formed; forming a plurality of first resist patterns on the hard mask layer; performing a tilt-angle ion implant process to form a first doped area and a second doped area in the hard mask layer between adjacent first resist patterns; removing the first resist patterns; coating a directed self-assembly (DSA) material layer onto the hard mask layer; performing a self-assembling process of the DSA material layer to form repeatedly arranged block copolymer patterns in the DSA material layer; removing undesired portions from the DSA material layer to form second patterns on the hard mask layer; transferring the second patterns to the hard mask layer to form third patterns; and etching the target layer through the third patterns.

Abstract: A method for processing a substrate is provided. The method comprises forming a patterned photoresist over a first material, the patterned photoresist comprising island portions and shaped spaces surrounding the island portions. An area of each of the island portions is reduced to enlarge the shaped spaces, which are filled with a second material. The island portions are removed to form first openings in the second material. Portions of the first material exposed through the first openings are removed to form second openings in the first material. Portions of a substrate exposed through the second openings are removed to form holes in the substrate. Methods of patterning a substrate and methods of forming a hole pattern in a substrate are also disclosed.

Abstract: There is provided a system and method for reservoir connectivity analysis in a 3D earth model. A subsurface region is identified and a baseline reservoir connectivity model is obtained from the subsurface region. Compartments and connections are determined from the baseline reservoir connectivity model using reservoir connectivity analysis, and a set of 3D objects representing the compartments and/or connections is created from the 3D earth model. A mathematical graph structure is created from the 3D objects and reservoir connectivity scenarios are evaluated based on analysis of the mathematical graph structure and 3D objects.

Abstract: A method, including: identifying a well target or reservoir segment; defining a dynamic surface grid, the dynamic surface grid being a representation of a ground surface, sea-level, or subsea surface above a reservoir upon which a drill center is locatable, and the dynamic surface grid including a plurality of cells that define potential locations for the drill center; assigning, to each of the plurality of cells of the dynamic surface grid, a value of a drilling or geologic attribute that defines a quality of a drill center position relative to the well target or reservoir segment; and selecting, based on a value of the drilling or geologic attribute, a location for the drill center corresponding to a location represented on the dynamic surface grid.

Abstract: A thermal sensor circuit comprises a conversion circuit which is one of a buck DC-DC converter circuit and a boost DC-DC converter circuit, wherein the conversion circuit comprises an inductor and an output terminal. A thermal sensor senses a thermal variation correlated to a capacitance variation of the thermal sensor. The capacitance variation induces an internal parasitic capacitance variation of the inductor which is connected in parallel to the thermal sensor and results a variation of an energy stored in the inductor. Hence a variation of a converted circuit signal outputting by the output terminal is caused, wherein the variation of the converted circuit signal is correlated to the thermal variation.