Abstract: Atmospheric inductively coupled plasma torch comprising a vessel within which the plasma is generated and a coil wound around the periphery of the vessel. The coil has at least two spaced-apart winding layers. The coil is constructed such that all winding layers of a given multi-turn is wound before an adjacent multi-turn is wound. A first end of the coil is coupled to ground, and a second end of the coil is coupled to receive a RF driver signal that is configured to ignite the plasma to facilitate processing.

Abstract: The invention relates to a process for preparing biaryls by anodic cross-dehydrodimerization of substituted phenols with arenes in the presence of partially fluorinated and/or perfluorinated mediators and a supporting electrolyte.

Abstract: A rotary atomizer applies particulate paints with good color matching by reducing paint droplet size deviation and then optimizing the other paint spraying parameters. Paint droplet size parameters are reduced by using a bell cup having reduced flow deviations, including an overflow surface having a generally constant angle between a deflector and an atomizing edge.

Abstract: The invention relates to a process for preparing unsymmetrical biaryl by anodic dehydrodimerization of substituted ortho-alkoxyaryl alcohols in the presence of partially fluorinated and/or perfluorinated mediators and a supporting electrolyte.

Abstract: Showerhead electrodes for a semiconductor material processing apparatus are disclosed. An embodiment of the showerhead electrodes includes top and bottom electrodes bonded to each other. The top electrode includes one or more plenums. The bottom electrode includes a plasma-exposed bottom surface and a plurality of gas holes in fluid communication with the plenum. Showerhead electrode assemblies including a showerhead electrode flexibly suspended from a top plate are also disclosed. The showerhead electrode assemblies can be in fluid communication with temperature-control elements spatially separated from the showerhead electrode to control the showerhead electrode temperature. Methods of processing substrates in plasma processing chambers including the showerhead electrode assemblies are also disclosed.

Abstract: The invention relates to a method of storing, transporting and supplying electrochemical energy, with storage and supply being physically separated.

Abstract: A circuit is disclosed for a power supply unit for generating a DC voltage, the power supply unit having a current transformer, a rectifier, a series circuit including a first blocking diode and a charging capacitor, an electronic switch which is in parallel with the current transformer, a comparator, a voltage reference circuit for the comparator. In at least one embodiment, the circuit includes a circuit for monitoring the voltage across the charging capacitor. The comparator is used to control the electronic switch on the basis of the voltage across the charging capacitor in relation to the voltage which is generated by the voltage reference circuit and is applied to the comparator. In at least one embodiment, provision is made of a tap which is located between the rectifier and the first blocking diode and at which the circuit for monitoring the voltage across the charging capacitor is located. The circuit is in the form of an RC combination having a second blocking diode connected in series.

Abstract: The invention relates to a process for preparing reactive zinc by electrochemical reduction, wherein iron or steel is used as cathode material.

Abstract: The present invention relates to 3-tert-butylbenzaldehyde dimethyl acetal and to 3-tert-butylbenzyl methyl ether and to an electrochemical method for producing 3-tert-butyl-benzaldehyde dimethyl acetal and intermediates passed through in said method.

Abstract: The invention relates to an operating method for an atomiser (1) for the coating of structural components, particularly of vehicle body parts, with the following steps: Application of a spray jet of a coating agent through the atomiser (1); discharge of a first guide air flow (11) for the formation of a spray jet; determination of at least one application parameter (?, ?, T, BC/CC, Qvarnish, n, U,) which reproduces a property (?, ?, T, BC/CC) of the applied coating agent or an operating variable (Qvarnish, n, U) of the atomiser (1) as well as influencing of the first guide air flow (11) as a factor of the application parameter (?, ?, T, BC/CC, Qvarnish, n, U,). Within the framework of the invention, there is the alternative option that fluctuations of the application parameters and, based thereon, variations of the spray jet width are taken into account by means of an adaptation of the path spacing (d) between the adjacent coating agent paths for the purpose of keeping the path overlapping constant.

Abstract: Various exemplary illustrations of an electrode assembly for an electrostatic atomizer, for example for a rotation atomizer, and exemplary methods of making and/or using the same, are disclosed. An exemplary electrode assembly may include an electrode holder arrangement for holding at least one electrode creating an electrostatic field about a symmetrical axis, wherein there is a dielectric material for influencing a discharge current component extending in the direction of the symmetrical axis.

Abstract: The invention relates to an improved industrial apparatus for the large-scale storage of energy and a process for storing and transporting electric energy by means of this apparatus.

Abstract: This invention relates to solid crystalline forms of (1RS,3RS,6RS)-6-Dimethylaminomethyl-1-(3-methoxy-phenyl)cyclohexane-1,3-diol hydrochloride (1), methods of producing 1, methods of use of 1, use of 1 as analgesics and pharmaceutical compositions comprising 1.

Abstract: Showerhead electrodes for a semiconductor material processing apparatus are disclosed. An embodiment of the showerhead electrodes includes top and bottom electrodes bonded to each other. The top electrode includes one or more plenums. The bottom electrode includes a plasma-exposed bottom surface and a plurality of gas holes in fluid communication with the plenum. Showerhead electrode assemblies including a showerhead electrode flexibly suspended from a top plate are also disclosed. The showerhead electrode assemblies can be in fluid communication with temperature-control elements spatially separated from the showerhead electrode to control the showerhead electrode temperature. Methods of processing substrates in plasma processing chambers including the showerhead electrode assemblies are also disclosed.

Abstract: A hitherto unknown crystalline form of (?)-(1R,2R)-3-(3-dimethylamino-1-ethyl-2-methylpropyl)-phenol hydrochloride, pharmaceutical compositions containing the new crystalline form, methods of producing the new crystalline form, and a related method of use including treatment of, e.g., pain and/or urinary incontinence.

Abstract: A crystalline salt of 3-[2-(dimethylamino)methyl(cyclohex-1-yl)]phenol and hydrogen chloride, preferably in a 1:1 composition, including various crystalline forms of this salt, processes for preparing the various crystalline forms of this salt, pharmaceutical compositions containing the various crystalline forms of this salt, and the use of this salt as a pharmacologically active agent in a pharmaceutical composition to treat or inhibit pain or other disorders or disease states.

Abstract: A method of bevel edge processing a semiconductor in a bevel plasma processing chamber in which the semiconductor substrate is supported on a semiconductor substrate support is provided. The method comprises evacuating the bevel etcher to a pressure of 3 to 100 Torr and maintaining RF voltage under a threshold value; flowing a process gas into the bevel plasma processing chamber; energizing the process gas into a plasma at a periphery of the semiconductor substrate; and bevel processing the semiconductor substrate with the plasma.

Abstract: An apparatus for improving bevel etch repeatability among substrates is provided. The apparatus includes an optical arrangement disposed to ascertain at least one bevel edge characteristic of a bevel edge of a substrate. The apparatus also includes a logic module for deriving at least one compensation factor from the at least one bevel edge characteristic. At least one compensation factor pertains to an adjustment in a bevel etch process parameter. The apparatus further includes a plasma processing chamber for performing bevel etching utilizing the at least one compensation factor.

Abstract: A method for etching a layer over a substrate in a process chamber, wherein the process chamber including a first electrode and a second electrode and the first electrode is disposed opposite of the second electrode is provided. The method includes placing the substrate on the second electrode and providing an etching gas into the process chamber. The method also includes providing a first radio frequency (RF) signal into the process chamber and modulating the first RF signal. The method further includes providing a second RF signal into the process chamber and modulating the second RF signal.

Abstract: Described is an electrode material which is suitable for a lithium ion accumulator and comprises a porous metal-organic framework, wherein the framework comprises lithium ions and optionally at least one further metal ion and at least one bidentate organic compound and the at least one bidentate organic compound is based on a dihydroxydicarboxylic acid which can be reversibly oxidized to a quinoid structure. Also described is a porous metalorganic framework, the use thereof and also lithium ion accumulators comprising such electrode materials.