Patents by Inventor Andreas Fischer

Andreas Fischer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HCI POLYMORPHS OF 3-((2-(DIMETHYLAMINO)METHYL (CYCLOHEX-1-YL))PHENOL
    Publication number: 20110251287
    Abstract: A crystalline salt of 3-[2-(dimethylamino)methyl(cyclohex-1-yl)]phenol and hydrogen chloride, preferably in a 1:1 composition, including various crystalline forms of this salt, processes for preparing the various crystalline forms of this salt, pharmaceutical compositions containing the various crystalline forms of this salt, and the use of this salt as a pharmacologically active agent in a pharmaceutical composition to treat or inhibit pain or other disorders or disease states.
    Type: Application
    Filed: June 21, 2011
    Publication date: October 13, 2011
    Applicant: Gruenenthal GmbH
    Inventors: Michael GRUSS, Andreas Fischer, Markus Kegel, Wolfgang Hell, Markus Von Raumer, Joerg Berghausen, Susan Margaret Paul
  • Sample Carrier and Method for Achieving Comparable Analytical Results By Aligning Test Substances on a Uniform Plane
    Publication number: 20110245106
    Abstract: A sample carrier such as a multi-well platform with one or more recesses, in each of which a substance to be analyzed is disposed, and an analysis method in which one or more substances, each of which is located in a recess of the sample carrier, are aligned on a uniform plane relative to the surface of the sample carrier before being analyzed.
    Type: Application
    Filed: May 3, 2011
    Publication date: October 6, 2011
    Applicant: Gruenenthal GmbH
    Inventors: Andreas FISCHER, Dagmar Lischke, Dagmar Peters-Groth
  • ELECTROCHEMICAL TEXTILE-WASHING PROCESS
    Publication number: 20110237484
    Abstract: The present invention relates to a washing machine comprising an electrochemical cell, to a process for electrochemical cleaning of fibers, to laundry detergents for electrochemical cleaning of fibers and to the fibers thus cleaned.
    Type: Application
    Filed: March 24, 2011
    Publication date: September 29, 2011
    Applicant: BASF SE
    Inventors: Ulrich GRIESBACH, Steffen Maas, Florian Stecker, Andreas Fischer
  • Crystalline forms of (?)-(1R,2R)-3-(3-dimethylamino-1-ethyl-2-methylpropyl)-phenol hydrochloride
    Patent number: 7994364
    Abstract: A hitherto unknown crystalline form of (?)-(1R,2R)-3-(3-dimethylamino-1-ethyl-2-methylpropyl)-phenol hydrochloride, pharmaceutical compositions containing the new crystalline form, methods of producing the new crystalline form, and a related method of use including treatment of, e.g., pain and/or urinary incontinence.
    Type: Grant
    Filed: December 10, 2009
    Date of Patent: August 9, 2011
    Assignee: Gruenenthal GmbH
    Inventors: Andreas Fischer, Helmut Buschmann, Michael Gruss, Dagmar Lischke
  • Arrangements and methods for improving bevel etch repeatability among substrates
    Patent number: 7977123
    Abstract: A method, performed in connection with bevel etching of a substrate, for improving bevel-etch repeatability among substrates, is disclosed. The method includes providing an optical arrangement and ascertaining at least one bevel edge characteristic of a bevel edge of said substrate. The method also includes deriving at least one compensation factor from said at least one bevel edge characteristic, said at least one compensation factor pertaining to an adjustment in a bevel etch process parameter. The method further includes performing said bevel etching utilizing said at least one compensation factor.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: July 12, 2011
    Assignee: Lam Research Corporation
    Inventors: Andreas Fischer, Neungho Shin, Fransisco Camargo
  • Apparatus for the deionization of cooling media for fuel cells
    Patent number: 7976998
    Abstract: The present invention relates to a process for the deionization of a cooling medium in a fuel cell (11) circulating in a cooling circuit (20), in which the cooling medium is subjected to at least intermittent, but preferably continuous, electrochemical deionization. To this end, at least one electrode deionization cell (23) , through which a diluate stream (27) serving as cooling medium and a concentrate stream (28) flow, is arranged in the cooling circuit. The concentrate stream (28) may be part of a secondary cooling circuit.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: July 12, 2011
    Assignee: BASF Aktiengesellschaft
    Inventors: Claudius Kormann, Andreas Fischer
  • RF pulsing of a narrow gap capacitively coupled reactor
    Patent number: 7976673
    Abstract: An apparatus for providing a plasma etch of a layer over a wafer is provided. A capacitively coupled process chamber is provided. A gas source is provided. A first and a second electrode are provided within the process chamber. A first radio frequency power source is electrically connected to at least one of the first and second electrodes, where the first radio frequency power source provides radio frequency power. A second radio frequency power source is electrically connected to at least one of the first and second electrodes. A first modulation control is connected to the first radio frequency power source, to provide a controlled modulation of the first radio frequency power source.
    Type: Grant
    Filed: May 6, 2003
    Date of Patent: July 12, 2011
    Assignee: Lam Research Corporation
    Inventors: Peter Loewenhardt, Mukund Srinivasan, Andreas Fischer
  • Atomizer
    Patent number: 7971805
    Abstract: The invention relates to an atomizer and method of operation for an atomizer having an application element for applying a spray of coating medium on a component to be coated and at least one integrated shroud air nozzle for delivering conditioned shroud air which at least partially surrounds the spray of the coating medium.
    Type: Grant
    Filed: April 26, 2007
    Date of Patent: July 5, 2011
    Assignee: Durr Systems Inc.
    Inventors: Hans-Jürgen Nolte, Frank Herre, Andreas Fischer, Peter Marquardt
  • PROCESS FOR THE ANODIC DEHYDRODIMERIZATION OF SUBSTITUTED PHENOLS
    Publication number: 20110147228
    Abstract: The invention relates to a process for preparing biaryl alcohols, in which anodic dehydrodimerization of substituted phenols is carried out in the presence of partially fluorinated and/or periluorinated mediators and a supporting electrolyte at a graphite electrode.
    Type: Application
    Filed: August 28, 2009
    Publication date: June 23, 2011
    Applicant: BASF SE
    Inventors: Andreas Fischer, Itamar Michael Malkowsky, Florian Stecker, Siegfried Waldvogel, Axel Kirste
  • METHOD FOR THE ELECTROCHEMICAL DIRECT AMINATION OF HYDROCARBONS
    Publication number: 20110108432
    Abstract: The invention relates to a process for the electrochemical direct amination of hydrocarbons by means of a diamond electrode and also a process for preparing aniline.
    Type: Application
    Filed: June 15, 2009
    Publication date: May 12, 2011
    Applicant: BASF SE
    Inventors: Itamar Malkowsky, Alexander Panchenko, Ulrich Griesbach, Andreas Fischer
  • PROCESS FOR THE ELECTROCHEMICAL CLEAVAGE OF LIGNIN AT A DIAMOND ELECTRODE
    Publication number: 20110089046
    Abstract: The invention relates to a process for the electrochemical cleavage of lignin by means of a diamond electrode and also to a process for producing vanillin and derivatives thereof by electrochemical cleavage of lignin in a solution having a pH?11.
    Type: Application
    Filed: May 11, 2009
    Publication date: April 21, 2011
    Applicant: BASF SE
    Inventors: Ulrich Griesbach, Andreas Fischer, Florian Stecker, Joerg Botzem, Ralf Pelzer, Mario Emmeluth, Siegfried R. Waldvogel
  • Apparatuses, Systems and Methods for Rapid Cleaning of Plasma Confinement Rings with Minimal Erosion of Other Chamber Parts
    Publication number: 20110083697
    Abstract: An apparatus used for rapid removal of polymer films from plasma confinement rings while minimizing erosion of other plasma etch chamber components is disclosed. The apparatus includes a center assembly, an electrode plate, a confinement ring stack, a first plasma source, and a second plasma source. The electrode plate is affixed to a surface of the center assembly with a channel defined along the external circumference therein. A first plasma source is disposed within the channel and along the external circumference of the center assembly, wherein the first plasma source is configured to direct a plasma to the inner circumferential surface of the confinement ring stack. A second plasma source located away from the first plasma source is configured to perform processing operations on a substrate within the etch chamber.
    Type: Application
    Filed: December 16, 2010
    Publication date: April 14, 2011
    Inventors: Eric Hudson, Andreas Fischer
  • UNIVERSAL ATOMIZER
    Publication number: 20110086166
    Abstract: The exemplary illustrations relate to an atomization system for a rotary atomizer for applying a coating agent, comprising a rotatably supported bell plate for atomizing the coating agent and for dispensing a spray jet of the coating agent, and comprising a guiding air ring for dispensing a first guiding air flow and a second guiding air flow for producing the spray jet dispensed by the bell plate. The two guiding air flows may comprise separate guiding air flow feeds and may further be set independently from each other. An exemplary bell plate and the guiding air ring may be designed such that the atomization system is suitable for coating the inside of chassis parts of motor vehicles and for coating the outside of chassis parts of motor vehicles.
    Type: Application
    Filed: June 12, 2009
    Publication date: April 14, 2011
    Inventors: Andreas Fischer, Peter Marquardt, Hans-Jürgen Nolte, Jürgen Berkowitsch
  • MULTI-PART ELECTRODE FOR A SEMICONDUCTOR PROCESSING PLASMA REACTOR AND METHOD OF REPLACING A PORTION OF A MULTI-PART ELECTRODE
    Publication number: 20110067814
    Abstract: An improved upper electrode system has a multi-part electrode in which a central portion of the electrode having high wear is replaceable independent of an outer peripheral portion of the electrode. The upper electrode can be used in plasma processing systems for processing semiconductor substrates, such as by etching or CVD. The multi-part upper electrode system is particularly useful for large size wafer processing chambers, such as 300 mm wafer processing chambers for which monolithic electrodes are unavailable or costly.
    Type: Application
    Filed: November 24, 2010
    Publication date: March 24, 2011
    Applicant: Lam Research Corporation
    Inventors: Andreas Fischer, William S. Kennedy, Peter Loewenhardt, David Trussell
  • HYBRID RF CAPACITIVELY AND INDUCTIVELY COUPLED PLASMA SOURCE USING MULTIFREQUENCY RF POWERS AND METHODS OF USE THEREOF
    Publication number: 20110059615
    Abstract: A device for inductively confining capacitively coupled RF plasma formed in a plasma processing apparatus. The apparatus includes an upper electrode and a lower electrode that is adapted to support a substrate and to generate the plasma between the substrate and the upper electrode. The device includes a dielectric support ring that concentrically surrounds the upper electrode and a plurality of coil units mounted on the dielectric support ring. Each coil unit includes a ferromagnetic core positioned along a radial direction of the dielectric support ring and at least one coil wound around each ferromagnetic core. The coil units generate, upon receiving RF power from an RF power source, electric and magnetic fields that reduce the number of charged particles of the plasma diffusing away from the plasma.
    Type: Application
    Filed: November 12, 2010
    Publication date: March 10, 2011
    Applicant: Lam Research Corporation
    Inventors: Alexei Marakhtanov, Rajinder Dhindsa, Eric Hudson, Andreas Fischer
  • Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber parts
    Patent number: 7879184
    Abstract: An apparatus used for rapid removal of polymer films from plasma confinement rings while minimizing erosion of other plasma etch chamber components is disclosed. The apparatus includes a center assembly, an electrode plate, a confinement ring stack, a first plasma source, and a second plasma source. The electrode plate is affixed to a surface of the center assembly with a channel defined along the external circumference therein. A first plasma source is disposed within the channel and along the external circumference of the center assembly, wherein the first plasma source is configured to direct a plasma to the inner circumferential surface of the confinement ring stack. A second plasma source located away from the first plasma source is configured to perform processing operations on a substrate within the etch chamber.
    Type: Grant
    Filed: June 20, 2006
    Date of Patent: February 1, 2011
    Assignee: Lam Research Corporation
    Inventors: Eric Hudson, Andreas Fischer
  • APPARATUS TO DETECT FAULT CONDITIONS OF A PLASMA PROCESSING REACTOR
    Publication number: 20110022215
    Abstract: A method of fault detection for use in a plasma processing chamber is provided. The method comprises monitoring plasma parameters within a plasma chamber and analyzing the resulting information. Such analysis enables detection of failures and the diagnosis of failure modes in a plasma processing reactor during the course of wafer processing. The method comprises measuring the plasma parameters as a function of time and analyzing the resulting data. The data can be observed, characterized, compared with reference data, digitized, processed, or analyzed in any way to reveal a specific fault. Monitoring can be done with a detector such as a probe, which is preferably maintained within the plasma chamber substantively coplanar with a surface within the chamber, and directly measures net ion flux and other plasma parameters.
    Type: Application
    Filed: October 5, 2010
    Publication date: January 27, 2011
    Applicant: Lam Research Corporation
    Inventors: Douglas Keil, Eric Hudson, Chris Kimball, Andreas Fischer
  • Rotary atomizer
    Patent number: D636842
    Type: Grant
    Filed: May 13, 2010
    Date of Patent: April 26, 2011
    Assignee: Duerr Systems GmbH
    Inventors: Hans-Jürgen Nolte, Andreas Fischer, Peter Marquardt, Jurgen Berkowitsch, Joachim Schneider
  • Rotary atomizer
    Patent number: D636843
    Type: Grant
    Filed: May 13, 2010
    Date of Patent: April 26, 2011
    Assignee: Duerr Systems GmbH
    Inventors: Hans-Jürgen Nolte, Andreas Fischer, Peter Marquardt, Jürgen Berkowitsch, Joachim Schneider
  • Rotary atomizer
    Patent number: D643510
    Type: Grant
    Filed: May 13, 2010
    Date of Patent: August 16, 2011
    Assignee: Duerr Systems GmbH
    Inventors: Hans-Jürgen Nolte, Andreas Fischer, Peter Marquardt, Jürgen Berkowitsch, Joachim Schneider