Patents by Inventor Andreas Fischer

Andreas Fischer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120006916
    Abstract: Various exemplary illustrations of an electrode assembly for an electrostatic atomizer, for example for a rotation atomizer, and exemplary methods of making and/or using the same, are disclosed. An exemplary electrode assembly may include an electrode holder arrangement for holding at least one electrode creating an electrostatic field about a symmetrical axis, wherein there is a dielectric material for influencing a discharge current component extending in the direction of the symmetrical axis.
    Type: Application
    Filed: March 19, 2010
    Publication date: January 12, 2012
    Inventors: Hans-Jurgen Nolte, Andreas Fischer, Peter Marquardt, Jurgen Berkowitsch, Joachim Schneider
  • Publication number: 20110311845
    Abstract: The invention relates to an improved industrial apparatus for the large-scale storage of energy and a process for storing and transporting electric energy by means of this apparatus.
    Type: Application
    Filed: June 22, 2011
    Publication date: December 22, 2011
    Applicant: BASF SE
    Inventors: CHRISTOPH ÜBLER, Dietmar Bender, Günther Huber, Andreas Fischer, Bernd Schube, Glyn Atherton, Francis Michael Stackpool, Cord-Henrich Dustmann
  • Publication number: 20110306673
    Abstract: This invention relates to solid crystalline forms of (1RS,3RS,6RS)-6-Dimethylaminomethyl-1-(3-methoxy-phenyl)cyclohexane-1,3-diol hydrochloride (1), methods of producing 1, methods of use of 1, use of 1 as analgesics and pharmaceutical compositions comprising 1.
    Type: Application
    Filed: February 21, 2006
    Publication date: December 15, 2011
    Applicant: GRUENENTHAL GMBH
    Inventors: Michael Gruss, Helmut Buschmann, Andreas Fischer, Wolfgang Hell, Dagmar Lischke
  • Patent number: 8069817
    Abstract: Showerhead electrodes for a semiconductor material processing apparatus are disclosed. An embodiment of the showerhead electrodes includes top and bottom electrodes bonded to each other. The top electrode includes one or more plenums. The bottom electrode includes a plasma-exposed bottom surface and a plurality of gas holes in fluid communication with the plenum. Showerhead electrode assemblies including a showerhead electrode flexibly suspended from a top plate are also disclosed. The showerhead electrode assemblies can be in fluid communication with temperature-control elements spatially separated from the showerhead electrode to control the showerhead electrode temperature. Methods of processing substrates in plasma processing chambers including the showerhead electrode assemblies are also disclosed.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: December 6, 2011
    Assignee: Lam Research Corporation
    Inventors: Andreas Fischer, Rajinder Dhindsa
  • Publication number: 20110294898
    Abstract: A hitherto unknown crystalline form of (?)-(1R,2R)-3-(3-dimethylamino-1-ethyl-2-methylpropyl)-phenol hydrochloride, pharmaceutical compositions containing the new crystalline form, methods of producing the new crystalline form, and a related method of use including treatment of, e.g., pain and/or urinary incontinence.
    Type: Application
    Filed: June 29, 2011
    Publication date: December 1, 2011
    Applicant: Gruenenthal GmbH
    Inventors: Andreas FISCHER, Helmut Buschmann, Michael Gruss, Dagmar Lischke
  • Patent number: 8058476
    Abstract: A crystalline salt of 3-[2-(dimethylamino)methyl(cyclohex-1-yl)]phenol and hydrogen chloride, preferably in a 1:1 composition, including various crystalline forms of this salt, processes for preparing the various crystalline forms of this salt, pharmaceutical compositions containing the various crystalline forms of this salt, and the use of this salt as a pharmacologically active agent in a pharmaceutical composition to treat or inhibit pain or other disorders or disease states.
    Type: Grant
    Filed: January 18, 2008
    Date of Patent: November 15, 2011
    Assignee: Gruenenthal GmbH
    Inventors: Michael Gruss, Andreas Fischer, Markus Kegel, Wolfgang Hell, Markus Von Raumer, Joerg Berghausen, Susan Margaret Paul
  • Publication number: 20110275219
    Abstract: A method of bevel edge processing a semiconductor in a bevel plasma processing chamber in which the semiconductor substrate is supported on a semiconductor substrate support is provided. The method comprises evacuating the bevel etcher to a pressure of 3 to 100 Torr and maintaining RF voltage under a threshold value; flowing a process gas into the bevel plasma processing chamber; energizing the process gas into a plasma at a periphery of the semiconductor substrate; and bevel processing the semiconductor substrate with the plasma.
    Type: Application
    Filed: May 11, 2011
    Publication date: November 10, 2011
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Tong Fang, Yunsang S. Kim, Andreas Fischer
  • Publication number: 20110260100
    Abstract: Described is an electrode material which is suitable for a lithium ion accumulator and comprises a porous metal-organic framework, wherein the framework comprises lithium ions and optionally at least one further metal ion and at least one bidentate organic compound and the at least one bidentate organic compound is based on a dihydroxydicarboxylic acid which can be reversibly oxidized to a quinoid structure. Also described is a porous metalorganic framework, the use thereof and also lithium ion accumulators comprising such electrode materials.
    Type: Application
    Filed: April 18, 2011
    Publication date: October 27, 2011
    Applicant: BASF SE
    Inventors: Natalia Trukhan, Ulrich Müller, Alexander Panchenko, Itamar Michael Malkowsky, Andreas Fischer
  • Publication number: 20110259520
    Abstract: An apparatus for improving bevel etch repeatability among substrates is provided. The apparatus includes an optical arrangement disposed to ascertain at least one bevel edge characteristic of a bevel edge of a substrate. The apparatus also includes a logic module for deriving at least one compensation factor from the at least one bevel edge characteristic. At least one compensation factor pertains to an adjustment in a bevel etch process parameter. The apparatus further includes a plasma processing chamber for performing bevel etching utilizing the at least one compensation factor.
    Type: Application
    Filed: July 7, 2011
    Publication date: October 27, 2011
    Inventors: Andreas Fischer, Neungho Shin, Fransisco Camargo
  • Publication number: 20110263130
    Abstract: A method for etching a layer over a substrate in a process chamber, wherein the process chamber including a first electrode and a second electrode and the first electrode is disposed opposite of the second electrode is provided. The method includes placing the substrate on the second electrode and providing an etching gas into the process chamber. The method also includes providing a first radio frequency (RF) signal into the process chamber and modulating the first RF signal. The method further includes providing a second RF signal into the process chamber and modulating the second RF signal.
    Type: Application
    Filed: July 7, 2011
    Publication date: October 27, 2011
    Inventors: Peter Loewenhardt, Mukund Sriniyasan, Andreas Fischer
  • Publication number: 20110251287
    Abstract: A crystalline salt of 3-[2-(dimethylamino)methyl(cyclohex-1-yl)]phenol and hydrogen chloride, preferably in a 1:1 composition, including various crystalline forms of this salt, processes for preparing the various crystalline forms of this salt, pharmaceutical compositions containing the various crystalline forms of this salt, and the use of this salt as a pharmacologically active agent in a pharmaceutical composition to treat or inhibit pain or other disorders or disease states.
    Type: Application
    Filed: June 21, 2011
    Publication date: October 13, 2011
    Applicant: Gruenenthal GmbH
    Inventors: Michael GRUSS, Andreas Fischer, Markus Kegel, Wolfgang Hell, Markus Von Raumer, Joerg Berghausen, Susan Margaret Paul
  • Publication number: 20110245106
    Abstract: A sample carrier such as a multi-well platform with one or more recesses, in each of which a substance to be analyzed is disposed, and an analysis method in which one or more substances, each of which is located in a recess of the sample carrier, are aligned on a uniform plane relative to the surface of the sample carrier before being analyzed.
    Type: Application
    Filed: May 3, 2011
    Publication date: October 6, 2011
    Applicant: Gruenenthal GmbH
    Inventors: Andreas FISCHER, Dagmar Lischke, Dagmar Peters-Groth
  • Publication number: 20110237484
    Abstract: The present invention relates to a washing machine comprising an electrochemical cell, to a process for electrochemical cleaning of fibers, to laundry detergents for electrochemical cleaning of fibers and to the fibers thus cleaned.
    Type: Application
    Filed: March 24, 2011
    Publication date: September 29, 2011
    Applicant: BASF SE
    Inventors: Ulrich GRIESBACH, Steffen Maas, Florian Stecker, Andreas Fischer
  • Patent number: 7994364
    Abstract: A hitherto unknown crystalline form of (?)-(1R,2R)-3-(3-dimethylamino-1-ethyl-2-methylpropyl)-phenol hydrochloride, pharmaceutical compositions containing the new crystalline form, methods of producing the new crystalline form, and a related method of use including treatment of, e.g., pain and/or urinary incontinence.
    Type: Grant
    Filed: December 10, 2009
    Date of Patent: August 9, 2011
    Assignee: Gruenenthal GmbH
    Inventors: Andreas Fischer, Helmut Buschmann, Michael Gruss, Dagmar Lischke
  • Patent number: 7976673
    Abstract: An apparatus for providing a plasma etch of a layer over a wafer is provided. A capacitively coupled process chamber is provided. A gas source is provided. A first and a second electrode are provided within the process chamber. A first radio frequency power source is electrically connected to at least one of the first and second electrodes, where the first radio frequency power source provides radio frequency power. A second radio frequency power source is electrically connected to at least one of the first and second electrodes. A first modulation control is connected to the first radio frequency power source, to provide a controlled modulation of the first radio frequency power source.
    Type: Grant
    Filed: May 6, 2003
    Date of Patent: July 12, 2011
    Assignee: Lam Research Corporation
    Inventors: Peter Loewenhardt, Mukund Srinivasan, Andreas Fischer
  • Patent number: 7977123
    Abstract: A method, performed in connection with bevel etching of a substrate, for improving bevel-etch repeatability among substrates, is disclosed. The method includes providing an optical arrangement and ascertaining at least one bevel edge characteristic of a bevel edge of said substrate. The method also includes deriving at least one compensation factor from said at least one bevel edge characteristic, said at least one compensation factor pertaining to an adjustment in a bevel etch process parameter. The method further includes performing said bevel etching utilizing said at least one compensation factor.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: July 12, 2011
    Assignee: Lam Research Corporation
    Inventors: Andreas Fischer, Neungho Shin, Fransisco Camargo
  • Patent number: 7976998
    Abstract: The present invention relates to a process for the deionization of a cooling medium in a fuel cell (11) circulating in a cooling circuit (20), in which the cooling medium is subjected to at least intermittent, but preferably continuous, electrochemical deionization. To this end, at least one electrode deionization cell (23) , through which a diluate stream (27) serving as cooling medium and a concentrate stream (28) flow, is arranged in the cooling circuit. The concentrate stream (28) may be part of a secondary cooling circuit.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: July 12, 2011
    Assignee: BASF Aktiengesellschaft
    Inventors: Claudius Kormann, Andreas Fischer
  • Patent number: 7971805
    Abstract: The invention relates to an atomizer and method of operation for an atomizer having an application element for applying a spray of coating medium on a component to be coated and at least one integrated shroud air nozzle for delivering conditioned shroud air which at least partially surrounds the spray of the coating medium.
    Type: Grant
    Filed: April 26, 2007
    Date of Patent: July 5, 2011
    Assignee: Durr Systems Inc.
    Inventors: Hans-Jürgen Nolte, Frank Herre, Andreas Fischer, Peter Marquardt
  • Publication number: 20110147228
    Abstract: The invention relates to a process for preparing biaryl alcohols, in which anodic dehydrodimerization of substituted phenols is carried out in the presence of partially fluorinated and/or periluorinated mediators and a supporting electrolyte at a graphite electrode.
    Type: Application
    Filed: August 28, 2009
    Publication date: June 23, 2011
    Applicant: BASF SE
    Inventors: Andreas Fischer, Itamar Michael Malkowsky, Florian Stecker, Siegfried Waldvogel, Axel Kirste
  • Patent number: D643510
    Type: Grant
    Filed: May 13, 2010
    Date of Patent: August 16, 2011
    Assignee: Duerr Systems GmbH
    Inventors: Hans-Jürgen Nolte, Andreas Fischer, Peter Marquardt, Jürgen Berkowitsch, Joachim Schneider