Abstract: A method for etching a bevel edge of a substrate is provided. A patterned photoresist mask is formed over the etch layer. The bevel edge is cleaned comprising providing a cleaning gas comprising at least one of a CO2, CO, CxHy, H2, NH3, CxHyFz and a combination thereof, forming a cleaning plasma from the cleaning gas, and exposing the bevel edge to the cleaning plasma. Features are etched into the etch layer through the photoresist features and the photoresist mask is removed.

Abstract: A baffle seal for a thrust reverser of a gas turbine engine includes a seal body of a resilient material. The seal body has a relatively flat central portion with opposed front and back sides. A raised sealing rim extends at least partially around the central portion. An outer periphery of the sealing rim extends beyond an outer periphery of the central portion so as to define an exposed sealing surface.

Abstract: A disk drive test apparatus has a plurality of bays each for receiving a respective disk drive to be tested. A plurality of card slots are provided each for receiving a test card via which a disk drive can be tested. Each of the test cards is either an environment test card or an interface test card. The card slots and the test cards are arranged such that each card slot (6) can selectively receive an environment test card or an interface test card. Other arrangements for disk drive test apparatus or disk drive mounting apparatus are disclosed.

Abstract: A method for etching a bevel edge of a substrate is provided. A patterned photoresist mask is formed over the etch layer. The bevel edge is cleaned comprising providing a cleaning gas comprising at least one of a CO2, CO, CxHy, H2, NH3, CxHyFz and a combination thereof, forming a cleaning plasma from the cleaning gas, and exposing the bevel edge to the cleaning plasma. Features are etched into the etch layer through the photoresist features and the photoresist mask is removed.

Abstract: The present invention relates to spirocyclic amide derivatives of the formula I, pharmaceutically acceptable salts thereof, a process for their preparation, pharmaceutical compositions containing them, and their use in therapy.

Abstract: A bleed duct is configured for bleeding fan air from the fan bypass duct in a turbofan aircraft engine. The bleed duct includes a tubular conduit having an inlet and outlet at opposite ends. The conduit is configured in flow area for recovering pressure from speeding fan air bled therethrough. A shroud extends forwardly from the duct inlet for suppressing dynamic pressure oscillations inside the conduit without degrading the pressure recovery.

Abstract: The invention provides compounds of formula (I), wherein R1, R2, R3, R4, R5 and X are as defined in the specification, a process for their preparation, pharmaceutical compositions containing them, a process for preparing pharmaceutical compositions and their use in therapy (I).

Abstract: The present invention provides compounds of formula (I) wherein the variables are as defined in the specification, processes for their preparation, pharmaceutical compositions containing them and their use in therapy.

Abstract: The present invention provides compounds of formula (I) wherein e, R1, R2, R3, R4, R5, R4?, R5?, R6, R7, A, D, m and n are as defined in the specification, processes for their preparation, pharmaceutical compositions containing them and their use in therapy.

Abstract: An apparatus and method for suppressing dynamic instability in a bleed duct of a gas turbine engine includes a fan bypass duct configured to permit a flow of air through the gas turbine engine. The fan bypass duct defines a fan duct surface, and the bleed duct has an inlet in fluid communication with the fan bypass duct and a flow control valve having an opened position and a closed position. A flow diverter is positioned on the fan duct surface proximate the inlet of the bleed duct and diverts the flow of air from the inlet when the flow control valve is closed, while permitting a portion of the flow of air to enter the inlet when the flow control valve is opened.

Abstract: The invention provides compounds of formula (I), wherein R1, R2, R3, R4, R5, n and X are as defined in the specification, a process for their preparation, pharmaceutical compositions containing them, a process for preparing pharmaceutical compositions, their use in therapy and intermediates of use in their preparation.

Abstract: The present invention relates to compounds according to formula (I), a process for preparing them, the intermediate compounds of the process and the use of the compounds in the manufacture of a medicament for use in treating diseases such as ARDS, pulmonary emphysema, bronchitis, bronchiectasis, COPD, asthma and rhinitis. The compounds are beta2 adrenoreceptor agonists.

Abstract: A transcowl for a gas turbine engine thrust reverser includes an arcuate outer wall; an arcuate inner wall; and an arcuate baffle positioned between the inner and outer walls at a forward end of the transcowl. The baffle has an arcuate cross-sectional shape which defines a forward-facing interior area. An arcuate forward seal is carried at a forward end of the inner wall. The forward seal includes a plurality of axially-extending, spaced-apart arcuate seal teeth which collectively define a labyrinth seal.

Abstract: The present invention therefore provides a compound of formula (I) and compositions for treating diseases associated with cysteine protease activity. The compounds are reversible inhibitors of cysteine proteases S, K, F, L and B. Of particular interest are diseases associated with Cathepsin S. In addition this invention also discloses processes for the preparation of such inhibitors.

Abstract: The present invention relates to compounds and compositions for treating diseases associated with cysteine protease activity. The compounds are reversible inhibitors of cysteine proteases S, K, F, L and B. Of particular interest are diseases associated with Cathepsin S. In addition this invention also discloses processes for the preparation of such inhibitors.

Abstract: A plasma etch processing chamber configured to clean a bevel edge of a substrate is provided. The chamber includes a bottom edge electrode and a top edge electrode defined over the bottom edge electrode. The top edge electrode and the bottom edge electrode are configured to generate a cleaning plasma to clean the bevel edge of the substrate. The chamber includes a gas feed defined through a top surface of the processing chamber. The gas feed introduces a processing gas for striking the cleaning plasma at a location in the processing chamber that is between an axis of the substrate and the top edge electrode. A pump out port is defined through the top surface of the chamber and the pump out port located along a center axis of the substrate. A method for cleaning a bevel edge of a substrate is also provided.

Abstract: An apparatus for removing material on a bevel of a wafer is provided. A wafer support with a diameter that is less than the diameter of the wafer, wherein the wafer support is on a first side of the wafer, and wherein an outer edge of the wafer extends beyond the wafer support around the wafer is provided. An RF power source is electrically connected to the wafer. A central cover is spaced apart from the wafer support. A first electrically conductive ring is on the first side of and spaced apart from the wafer. A second electrically conductive ring is spaced apart from the wafer. An electrically conductive liner surrounds the outer edge of the wafer. A switch is between the liner and ground, allowing the liner to be switched from being grounded to floating.

Abstract: Methods and apparatus for remedying arc-related damage to the substrate during plasma bevel etching. A plasma shield is disposed above the substrate to prevent plasma, which is generated in between two annular grounded plates, from reaching the exposed metallization on the substrate. Additionally or alternatively, a carbon-free fluorinated process source gas may be employed and/or the RF bias power may be ramped up gradually during plasma generation to alleviate arc-related damage during bevel etching. Also additionally or alternatively, helium and/or hydrogen may be added to the process source gas to alleviate arc-related damage during bevel etching.

Abstract: The present invention relates to compounds and compositions for treating diseases associated with cysteine protease activity. The compounds are reversible inhibitors of cysteine proteases S, K, F, L and B. Of particular interest are diseases associated with Cathepsin S. In addition this invention also discloses processes for the preparation of such inhibitors.

Abstract: The present invention relates to compounds and compositions for treating diseases associated with cysteine protease activity. The compounds are reversible inhibitors of cysteine proteases S, K, F, L and B. Of particular interest are diseases associated with Cathepsin S. In addition this invention also discloses processes for the preparation of such inhibitors.