Patents by Inventor Anh Duong
Anh Duong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8809140Abstract: A method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process is disclosed, including a multi-step residue cleaning, including exposing the substrate to an aqua regia solution, followed by an exposure to a solution having hydrochloric acid and hydrogen peroxide. The SC2 solution can further react with remaining platinum residues, rendering it more soluble in an aqueous solution and thereby dissolving it from the surface of the substrate.Type: GrantFiled: July 29, 2013Date of Patent: August 19, 2014Assignees: Intermolecular, Inc., GLOBALFOUNDRIES, Inc.Inventors: Anh Duong, Clemens Fitz, Olov Karlsson
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Patent number: 8784572Abstract: A method for cleaning platinum residues from a surface of a substrate is provided. The method initiates with exposing the surface to a first solution containing a mixture of nitric acid and hydrochloric acid. Then, the surface is exposed to a second solution containing hydrochloric acid.Type: GrantFiled: October 19, 2011Date of Patent: July 22, 2014Assignee: Intermolecular, Inc.Inventors: Anh Duong, Sean Barstow, Olov Karlsson, Bei Li, James Mavrinac
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Publication number: 20140188556Abstract: A method and system analyze marketplace listing strategies. In some embodiments, the method accesses data associated with multiple marketplace listings. Each marketplace listing is associated with a product category. A state-action model, associated with the product category, is created based on the data associated with the multiple marketplace listings. The state-action model is then analyzed to identify a marketplace listing strategy associated with the product category.Type: ApplicationFiled: March 6, 2014Publication date: July 3, 2014Applicant: EBAY INC.Inventors: Quang Anh Duong, Neelakantan Sundaresan, Nishith Parikh, Zeqian Shen
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Patent number: 8720586Abstract: A casing hanger seal assembly is lowered into a pocket between a casing hanger and a wellhead housing while in a run-in position. The seal assembly has a metal-to-metal upper seal ring and an elastomeric and metal lower seal ring carried by and below the upper seal ring. The upper and lower seal rings are movable from a run-in position to a set position sealing between the sidewalls of the casing hanger and the wellhead housing by applying a downward force. The downward force required to move the lower seal ring to the set position is less than the downward force required to move the upper seal ring to the set position. A downward force applied to the upper seal ring after the lower seal ring has landed in the pocket transfers to the lower seal ring to cause the lower seal ring to move to the set position before the upper seal ring moves to the set position.Type: GrantFiled: June 30, 2011Date of Patent: May 13, 2014Assignee: Vetco Gray Inc.Inventor: Khanh Anh Duong
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Patent number: 8697573Abstract: The invention discloses a method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process, comprising using an aqua regia cleaning solution (comprising a mixture of nitric acid and hydrochloric acid) with microwave assisted heating. Low boiling temperature of hydrochloric acid prevents heating the aqua regia solution to a high temperature, impeding the effectiveness of post silicidation nickel and platinum residue removal. Therefore, embodiments of the invention provide a microwave assisted heating of the substrate in an aqua regia solution, selectively heating platinum residues without significantly increasing the temperature of the aqua regia solution, rendering platinum residues to be more soluble in aqueous solution and thereby dissolving it from the surface of the substrate.Type: GrantFiled: November 9, 2011Date of Patent: April 15, 2014Assignee: Intermolecular, Inc.Inventors: Anh Duong, Olov Karlsson
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Patent number: 8688544Abstract: A method and system analyze marketplace listing strategies. In some embodiments, the method accesses data associated with multiple marketplace listings. Each marketplace listing is associated with a product category. A state-action model, associated with the product category, is created based on the data associated with the multiple marketplace listings. The state-action model is then analyzed to identify a marketplace listing strategy associated with the product category.Type: GrantFiled: March 25, 2011Date of Patent: April 1, 2014Assignee: eBay Inc.Inventors: Quang Anh Duong, Neelakantan Sundaresan, Nishith Parikh, Zeqian Shen
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Publication number: 20140062025Abstract: A seal assembly for use with a casing hanger that includes a pair of split rings held together by a threaded fastener. Torqueing the fastener axially compresses one of the rings so that it expands radially inward into sealing engagement with a wall of wellbore casing, and radially outward against an inner wall of a wellhead housing. Support grommets are provided where the fastener enters and exits the compressible ring. Protrusions on a side of the support grommets project into the compressible ring and create a sealing interface between each support grommet and compressible ring. O-rings line inner circumferences of the support grommets to seal between the support grommets and fasteners. A threaded end on a lower end of the fastener has a diameter less than an inner diameter of the O-rings to prevent damaging the O-rings during assembly.Type: ApplicationFiled: August 28, 2012Publication date: March 6, 2014Applicant: Vetco Gray Inc.Inventors: Chau Hoang, Khanh Anh Duong, William Ryan Moore, Karl A. Parfrey, Clayton Griffin
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Patent number: 8664014Abstract: Electrical testing of metal oxide semiconductor (MOS) high-k capacitor structures is used to evaluate photoresist strip or cleaning chemicals using a combinatorial workflow. The electrical testing can be able to identify the damages on the high-k dielectrics, permitting a selection of photoresist strip chemicals to optimize the process conditions in the fabrication of semiconductor devices. The high productivity combinatorial technique can provide a compatibility evaluation of photoresist strip chemicals with high-k devices.Type: GrantFiled: November 17, 2011Date of Patent: March 4, 2014Assignee: Intermolecular, Inc.Inventors: Bei Li, Sean Barstow, Anh Duong, Zhendong Hong, Ashley Lacey
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Publication number: 20130338305Abstract: Methods of modifying a patterned semiconductor substrate are presented including: providing a patterned semiconductor substrate surface including a dielectric region and a conductive region; and applying an amphiphilic surface modifier to the dielectric region to modify the dielectric region. In some embodiments, modifying the dielectric region includes modifying a wetting angle of the dielectric region. In some embodiments, modifying the wetting angle includes making a surface of the dielectric region hydrophilic. In some embodiments, methods further include applying an aqueous solution to the patterned semiconductor substrate surface. In some embodiments, the conductive region is selectively enhanced by the aqueous solution. In some embodiments, methods further include providing the dielectric region formed of a low-k dielectric material. In some embodiments, applying the amphiphilic surface modifier modifies an interaction of the low-k dielectric region with a subsequent process.Type: ApplicationFiled: August 20, 2013Publication date: December 19, 2013Applicant: Intermolecular, Inc.Inventors: Anh Duong, Tony Chiang, Zachary M. Fresco, Nitin Kumar, Chi-I Lang, Jinhong Tong, Anna Tsizelmon
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Publication number: 20130323890Abstract: A method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process is disclosed, including a multi-step residue cleaning, including exposing the substrate to an aqua regia solution, followed by an exposure to a solution having hydrochloric acid and hydrogen peroxide. The SC2 solution can further react with remaining platinum residues, rendering it more soluble in an aqueous solution and thereby dissolving it from the surface of the substrate.Type: ApplicationFiled: July 29, 2013Publication date: December 5, 2013Applicants: Intermolecular Inc.Inventors: Anh Duong, Clemens Fitz, Olov Karlsson
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Publication number: 20130299193Abstract: An apparatus and method can be used to positively retain a lockdown ring to axially secure a wellbore member in a wellhead housing. In embodiments, the wellbore member, such as a tubing hanger, can be secured by a lockdown ring having a cylindrical surface below a tapered surface. An energizing ring having a cylindrical surface above a tapered surface can be used to move the lockdown ring from an unset position to a set position, thus energizing the lockdown ring. After being energized, the two cylindrical surfaces can engage each other so that axial movement of the energizing ring, of up to a predetermined distance, does not cause the lockdown ring to move from a set position to an unset position.Type: ApplicationFiled: May 10, 2012Publication date: November 14, 2013Applicant: Vetco Gray Inc.Inventor: Khanh Anh Duong
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Patent number: 8575021Abstract: Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.Type: GrantFiled: March 14, 2013Date of Patent: November 5, 2013Assignee: Intermolecular, Inc.Inventors: Thomas R. Boussie, Tony P. Chiang, Anh Duong, Zachary Fresco, Nitin Kumar, Chi-I Lang, Sandra G. Malhotra, Jinhong Tong
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Publication number: 20130267091Abstract: The invention discloses a method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process. Post silicidation residues of nickel and platinum may not be removed adequately just by an aqua regia solution (comprising a mixture of nitric acid and hydrochloric acid). Therefore, embodiments of the invention provide a multi-step residue cleaning, comprising exposing the substrate to an aqua regia solution, followed by an exposure to a chlorine gas or a solution comprising dissolved chlorine gas, which may further react with remaining platinum residues, rendering it more soluble in aqueous solution and thereby dissolving it from the surface of the substrate.Type: ApplicationFiled: June 6, 2013Publication date: October 10, 2013Inventors: Anh Duong, John Foster, Olov Karlsson, James Mavrinac, Usha Raghuram
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Publication number: 20130244186Abstract: A composition for removing photoresist and bottom anti-reflective coating from a semiconductor substrate is disclosed. The composition may comprise a nontoxic solvent, the nontoxic solvent having a flash point above 80 degrees Celsius and being capable of dissolving acrylic polymer and phenolic polymer. The composition may further comprise Tetramethylammonium Hydroxide (TMAH) mixed with the nontoxic solvent.Type: ApplicationFiled: May 10, 2013Publication date: September 19, 2013Applicant: Intermolecular Inc.Inventors: Indranil De, Anh Duong
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Patent number: 8535972Abstract: Methods of modifying a patterned semiconductor substrate are presented including: providing a patterned semiconductor substrate surface including a dielectric region and a conductive region; and applying an amphiphilic surface modifier to the dielectric region to modify the dielectric region. In some embodiments, modifying the dielectric region includes modifying a wetting angle of the dielectric region. In some embodiments, modifying the wetting angle includes making a surface of the dielectric region hydrophilic. In some embodiments, methods further include applying an aqueous solution to the patterned semiconductor substrate surface. In some embodiments, the conductive region is selectively enhanced by the aqueous solution. In some embodiments, methods further include providing the dielectric region formed of a low-k dielectric material. In some embodiments, applying the amphiphilic surface modifier modifies an interaction of the low-k dielectric region with a subsequent process.Type: GrantFiled: July 11, 2008Date of Patent: September 17, 2013Assignee: Intermolecular, Inc.Inventors: Zachary M. Fresco, Chi-I Lang, Jinhong Tong, Anh Duong, Nitin Kumar, Anna Tsimelzon, Tony Chiang
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Patent number: 8518765Abstract: A method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process is disclosed, including a multi-step residue cleaning, including exposing the substrate to an aqua regia solution, followed by an exposure to a solution having hydrochloric acid and hydrogen peroxide. The SC2 solution can further react with remaining platinum residues, rendering it more soluble in an aqueous solution and thereby dissolving it from the surface of the substrate.Type: GrantFiled: June 5, 2012Date of Patent: August 27, 2013Assignees: Intermolecular, Inc., GLOBALFOUNDRIES, Inc.Inventors: Anh Duong, Clemens Fitz, Olov Karlsson
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Patent number: 8513117Abstract: The invention discloses a method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process. Embodiments of the invention provide a multi-step cleaning process, comprising exposing the substrate to a nitric acid solution after a first anneal, followed by an aqua regia solution after a second anneal. The substrate can be optionally exposed to a hydrochloric acid solution afterward to completely remove any remaining platinum residues.Type: GrantFiled: November 15, 2011Date of Patent: August 20, 2013Assignees: Intermolecular, Inc.Inventors: Anh Duong, Sean Barstow, Clemens Fitz, John Foster, Olov Karlsson, Bei Li, James Mavrinac
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Patent number: 8466058Abstract: The invention discloses a method for cleaning residues from a semiconductor substrate during a nickel platinum silicidation process. Post silicidation residues of nickel and platinum may not be removed adequately just by an aqua regia solution (comprising a mixture of nitric acid and hydrochloric acid). Therefore, embodiments of the invention provide a multi-step residue cleaning, comprising exposing the substrate to an aqua regia solution, followed by an exposure to a chlorine gas or a solution comprising dissolved chlorine gas, which may further react with remaining platinum residues, rendering it more soluble in aqueous solution and thereby dissolving it from the surface of the substrate.Type: GrantFiled: November 14, 2011Date of Patent: June 18, 2013Assignee: Intermolecular, Inc.Inventors: Anh Duong, John Foster, Olov Karlsson, James Mavrinac, Usha Raghuram
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Patent number: 8449681Abstract: A composition for removing photoresist and bottom anti-reflective coating from a semiconductor substrate is disclosed. The composition may comprise a nontoxic solvent, the nontoxic solvent having a flash point above 80 degrees Celsius and being capable of dissolving acrylic polymer and phenolic polymer. The composition may further comprise Tetramethylammonium Hydroxide (TMAH) mixed with the nontoxic solvent.Type: GrantFiled: December 16, 2010Date of Patent: May 28, 2013Assignee: Intermolecular, Inc.Inventors: Anh Duong, Indranil De
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Publication number: 20130130414Abstract: Electrical testing of metal oxide semiconductor (MOS) high-k capacitor structures is used to evaluate photoresist strip or cleaning chemicals using a combinatorial workflow. The electrical testing can be able to identify the damages on the high-k dielectrics, permitting a selection of photoresist strip chemicals to optimize the process conditions in the fabrication of semiconductor devices. The high productivity combinatorial technique can provide a compatibility evaluation of photoresist strip chemicals with high-k devices.Type: ApplicationFiled: November 17, 2011Publication date: May 23, 2013Applicant: Intermolecular, Inc.Inventors: Bei Li, Sean Barstow, Anh Duong, Zhendong Hong, Ashley Lacey