Patents by Inventor Anil U. Mane

Anil U. Mane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190382893
    Abstract: Transition metal dichalcogenides (TMDs) are deposited as thin layers on a substrate. The TMDs may be grown on oxide substrates and may have a tunable TMD-oxide interface.
    Type: Application
    Filed: March 6, 2019
    Publication date: December 19, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Steven Letourneau, Elton Graugnard
  • Publication number: 20190341618
    Abstract: An electrode comprises an electrode core. A composite bilayer coating is conformally disposed on the electrode core. The composite bilayer coating comprises a first layer disposed on at least a portion of the electrode core. The first layer comprises a metal fluoride, a metal oxide or a metal sulfide. A second layer is disposed on the first layer and comprises a metal fluoride, a metal oxide or a metal sulfide.
    Type: Application
    Filed: May 1, 2018
    Publication date: November 7, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jason R. Croy, Jeffrey W. Elam, Mahalingam Balasubramanian
  • Publication number: 20190318896
    Abstract: The invention provides a gain device having a plurality of channels having a polygonal shape with four or more sides. The invention also provides a method for producing microchannel plates (MCPs) having the steps of providing a pre-polymer; and directing a laser over the pre-polymer into a pre-determined pattern. Also provided is method for efficiently 3D printing an object.
    Type: Application
    Filed: June 21, 2019
    Publication date: October 17, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Robert G. Wagner, Michael J. Pellin, Howard Nicholson, Lei Xia, Jingbo Wang, Junqi Xie, Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20190279870
    Abstract: Transition metal dichalcogenides (TMDs) are deposited by atomic layer deposition as thin layers on a substrate. The TMDs may be grown on oxide substrates and may have a tunable TMD-oxide interface. The TMD may be etched using an atomic layer etching technique.
    Type: Application
    Filed: March 6, 2019
    Publication date: September 12, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Patent number: 10403464
    Abstract: The invention provides a gain device having a plurality of channels having a polygonal shape with four or more sides. The invention also provides a method for producing microchannel plates (MCPs) having the steps of providing a pre-polymer; and directing a laser over the pre-polymer into a pre-determined pattern. Also provided is method for efficiently 3D printing an object.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: September 3, 2019
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Robert G. Wagner, Michael J. Pellin, Howard Nicholson, Lei Xia, Jingbo Wang, Junqi Xie, Anil U. Mane, Jeffrey W. Elam
  • Patent number: 10294564
    Abstract: A method for forming boron (B) containing Al2O3 composite layers includes (a) reacting a substrate surface with an aluminum-containing precursor to form a first monolayer, (b) purging excess aluminum-containing precursor and reaction by-product, (c) reacting the first monolayer with a second precursor, and (d) purging excess second precursor and reaction by-product, such that steps (a) to (d) constitute one cycle, the composite layers being formed after a plurality of cycles, and the resultant composite layers have a chemical formula of BxAl2?xO3, where x varies in the range of 0 and 2.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: May 21, 2019
    Assignee: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20190109320
    Abstract: The fabrication of robust interfaces between transition metal oxides and non-aqueous electrolytes is one of the great challenges of lithium ion batteries. Atomic layer deposition (ALD) of aluminum tungsten fluoride (AlWxFy) improves the electrochemical stability of LiCoO2. AlWxFy thin films were deposited by combining trimethylaluminum and tungsten hexafluoride. in-situ quartz crystal microbalance and transmission electron microscopy studies show that the films grow in a layer-by-layer fashion and are amorphous nature. Ultrathin AlWxFy coatings (<10 ?) on LiCoO2 significantly enhance stability relative to bare LiCoO2 when cycled to 4.4 V. The coated LiCoO2 exhibited superior rate capability (up to 400 mA/g) and discharge capacities at a current of 400 mA/g were 51% and 92% of the first cycle capacities for the bare and AlWxFy coated materials.
    Type: Application
    Filed: December 3, 2018
    Publication date: April 11, 2019
    Applicant: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Joong Sun Park, Jason R. Croy
  • Publication number: 20190096623
    Abstract: The invention provides a gain device having a plurality of channels having a polygonal shape with four or more sides. The invention also provides a method for producing microchannel plates (MCPs) having the steps of providing a pre-polymer; and directing a laser over the pre-polymer into a pre-determined pattern. Also provided is method for efficiently 3D printing an object.
    Type: Application
    Filed: September 28, 2017
    Publication date: March 28, 2019
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Robert G. Wagner, Michael J. Pellin, Howard Nicholson, Lei Xia, Jingbo Wang, Junqi Xie, Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20190062915
    Abstract: A method for forming boron (B) containing Al2O3 composite layers includes (a) reacting a substrate surface with an aluminum-containing precursor to form a first monolayer, (b) purging excess aluminum-containing precursor and reaction by-product, (c) reacting the first monolayer with a second precursor, and (d) purging excess second precursor and reaction by-product, such that steps (a) to (d) constitute one cycle, the composite layers being formed after a plurality of cycles, and the resultant composite layers have a chemical formula of BxAl2-xO3, where x varies in the range of 0 and 2.
    Type: Application
    Filed: August 28, 2017
    Publication date: February 28, 2019
    Inventors: Anil U. MANE, Jeffrey W. ELAM
  • Publication number: 20190066961
    Abstract: An enhanced electron amplifier structure includes a microporous substrate having a front surface and a rear surface, the microporous substrate including at least one channel extending substantially through the substrate between the front surface and the rear surface, an ion diffusion layer formed on a surface of the channel, the ion diffusion layer comprising a metal oxide, a resistive coating layer formed on the first ion diffusion layer, an emissive coating layer formed on the resistive coating layer, and an optional ion feedback layer formed on the front surface of the structure. The emissive coating produces a secondary electron emission responsive to an interaction with a particle received by the channel. The ion diffusion layer, the resistive coating layer, the emissive coating layer, and the ion feedback layer are independently deposited via chemical vapor deposition or atomic layer deposition.
    Type: Application
    Filed: August 30, 2017
    Publication date: February 28, 2019
    Inventors: Anil U. MANE, Jeffrey W. ELAM
  • Patent number: 10180508
    Abstract: An enhanced electron amplifier structure includes a substrate configured to amplify a signal of an incident particle by causing a cascade of secondary electron emissions and an enhancement layer configured to increase a sensitivity of the substrate to the incident particle. The enhancement layer is provided on an upper surface of the substrate.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: January 15, 2019
    Assignee: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Patent number: 10177365
    Abstract: The fabrication of robust interfaces between transition metal oxides and non-aqueous electrolytes is one of the great challenges of lithium ion batteries. Atomic layer deposition (ALD) of aluminum tungsten fluoride (AlWxFy) improves the electrochemical stability of LiCoO2. AlWxFy thin films were deposited by combining trimethylaluminum and tungsten hexafluoride. in-situ quartz crystal microbalance and transmission electron microscopy studies show that the films grow in a layer-by-layer fashion and are amorphous nature. Ultrathin AlWxFy coatings (<10 ?) on LiCoO2 significantly enhance stability relative to bare LiCoO2 when cycled to 4.4 V. The coated LiCoO2 exhibited superior rate capability (up to 400 mA/g) and discharge capacities at a current of 400 mA/g were 51% and 92% of the first cycle capacities for the bare and AlWxFy coated materials.
    Type: Grant
    Filed: April 22, 2015
    Date of Patent: January 8, 2019
    Assignee: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam, Joong Sun Park, Jason R. Croy
  • Patent number: 10121642
    Abstract: Scalable electron amplifier devices and methods of fabricating the devices an atomic layer deposition (“ALD”) fabrication process are described. The ALD fabrication process allows for large area (e.g., eight inches by eight inches) electron amplifier devices to be produced at reduced costs compared to current fabrication processes. The ALD fabrication process allows for nanostructure functional coatings, to impart a desired electrical conductivity and electron emissivity onto low cost borosilicate glass micro-capillary arrays to form the electron amplifier devices.
    Type: Grant
    Filed: April 13, 2018
    Date of Patent: November 6, 2018
    Assignee: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Patent number: 10062555
    Abstract: Scalable electron amplifier devices and methods of fabricating the devices an atomic layer deposition (“ALD”) fabrication process are described. The ALD fabrication process allows for large area (e.g., eight inches by eight inches) electron amplifier devices to be produced at reduced costs compared to current fabrication processes. The ALD fabrication process allows for nanostructure functional coatings, to impart a desired electrical conductivity and electron emissivity onto low cost borosilicate glass micro-capillary arrays to form the electron amplifier devices.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: August 28, 2018
    Assignee: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20180233339
    Abstract: Scalable electron amplifier devices and methods of fabricating the devices an atomic layer deposition (“ALD”) fabrication process are described. The ALD fabrication process allows for large area (e.g., eight inches by eight inches) electron amplifier devices to be produced at reduced costs compared to current fabrication processes. The ALD fabrication process allows for nanostructure functional coatings, to impart a desired electrical conductivity and electron emissivity onto low cost borosilicate glass micro-capillary arrays to form the electron amplifier devices.
    Type: Application
    Filed: April 13, 2018
    Publication date: August 16, 2018
    Applicant: UChicago Argonne, LLC
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Patent number: 9951291
    Abstract: A lubricant composition includes an oil including a plurality of long-chain hydrocarbon molecules. A quantity of a catalytically active metal-organic additive is mixed with the oil. The metal-organic additive is formulated to fragment the long-chain hydrocarbon molecules of the oil into at least one of dimers and trimers under the influence of at least one of a mechanical loading and a thermal loading. In some embodiments, the metal-organic additive includes a compound of formula II: where: X is Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Rf, Db, Sg, Bh, Hs, Mt, Ds, Rg or Cn, and R1, R2, R3 and R4 are alkyl or alkyl halide.
    Type: Grant
    Filed: May 22, 2015
    Date of Patent: April 24, 2018
    Assignee: UChicago Argonne, LLC
    Inventors: Ali Erdemir, Anil U. Mane, Jeffrey W. Elam, Giovanni Ramirez, Osman Eryilmaz
  • Publication number: 20180094352
    Abstract: A method for creating a thin film. A barrier layer is applied to a substrate and a metal layer deposited on the thin film. The barrier layer may comprise a tungsten composition and the metal layer may comprise pure tungsten.
    Type: Application
    Filed: September 30, 2016
    Publication date: April 5, 2018
    Inventors: Anil U. Mane, Jeffrey W. Elam
  • Publication number: 20180010248
    Abstract: A method of fabricating an foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.
    Type: Application
    Filed: July 7, 2017
    Publication date: January 11, 2018
    Inventors: Seth B. DARLING, Jeffrey W. ELAM, Anil U. MANE, Seth W. SNYDER
  • Publication number: 20170227678
    Abstract: Selective receiver coatings provide high performance for concentrated solar power applications. The coating provides high solar absorptivity (90% or greater) with low IR emissivity (0.1 or less) while maintaining stability at temperatures greater than 700° C. The coating comprises a composite of nanoparticles forming mesoporous with a conformal coating.
    Type: Application
    Filed: February 5, 2016
    Publication date: August 10, 2017
    Applicant: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Anil U. Mane, Angel Yanguas-Gil, Joseph A. Libera
  • Publication number: 20170229593
    Abstract: Selective receiver coatings provide high performance for concentrated solar power applications. The coating provides high solar absorptivity (90% or greater) with low IR emissivity (0.1 or less) while maintaining stability at temperatures greater than 700° C. The coating comprises a composite of a mesoporous photonic matrix with a conformal optical coating.
    Type: Application
    Filed: February 6, 2016
    Publication date: August 10, 2017
    Applicant: UChicago Argonne, LLC
    Inventors: Jeffrey W. Elam, Anil U. Mane, Angel Yanguas-Gil, Joseph A. Libera