Abstract: With correct emotion classes selected as correct values of an emotion of an utterer of a first utterance from among a plurality of emotion classes C1, . . . , CK by listeners who have listened to the first utterance, as an input, the numbers of times ni that emotion classes Ci have been selected as the correct emotion classes are obtained, and rates of the numbers of times nk to a sum total of the numbers of times n1, . . . , nK or smoothed values of the rates are obtained as correct emotion soft labels tk(s) corresponding to the first utterance.

Abstract: A multiple beam image acquisition apparatus includes a stage to mount thereon a target object, a beam forming mechanism to form multiple primary electron beams and a measurement primary electron beam, a primary electron optical system to collectively irradiate the target object surface with the multiple primary electron beams and the measurement primary electron beam, a secondary electron optical system to collectively guide multiple secondary electron beams generated because the target object is irradiated with the multiple primary electron beams, and a measurement secondary electron beam generated because the target object is irradiated with the measurement primary electron beam, a multi-detector to detect the multiple secondary electron beams collectively guided, a measurement mechanism to measure a position of the measurement secondary electron beam collectively guided, and a correction mechanism to correct a trajectory of the multiple secondary electron beams by using a measured position of the measureme

Abstract: A multiple electron beam irradiation apparatus includes a forming mechanism which forms multiple primary electron beams; a plurality of electrode substrates being stacked in each of which a plurality of openings of various diameter dimensions are formed, the plurality of openings being arranged at passage positions of the multiple primary electron beams, and through each of which a corresponding one of the multiple primary electron beams passes, the plurality of electrode substrates being able to adjust an image plane conjugate position of each of the multiple primary electron beams depending on a corresponding one of the various diameter dimensions; and a stage which is capable of mounting thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode substrates.

Abstract: A multiple electron beam irradiation apparatus includes an electromagnetic lens configured to refract multiple electron beams incident, an aberration corrector arranged in the magnetic field of the electromagnetic lens and configured to be able to individually apply a bias potential and a deflection potential to each of the multiple electron beams, and an objective lens configured to focus the multiple electron beams, a trajectory of the each of which has been individually corrected by the bias potential and the deflection potential, onto a target object.

Abstract: A multiple electron beam irradiation apparatus includes a shaping aperture array substrate to form multiple primary electron beams, a plurality of electrode array substrates stacked each to dispose thereon a plurality of electrodes each arranged at a passage position of each of the multiple primary electron beams, each of the multiple primary electron beams surrounded by an electrode of the plurality of electrodes when each of the multiple primary electron beams passes through the passage position, the first wiring and the second wiring applied with one of different electric potentials, and a stage to mount thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode array substrates, wherein, in each of the plurality of electrode array substrates, each of the plurality of electrodes is electrically connected to either one of the first wiring and the second wiring.

Abstract: According to one aspect of the present invention, an optical system adjustment method of an image acquisition apparatus includes: extracting one primary electron beam after another from primary electron beams at a plurality of preset positions among multiple primary electron beams; and adjusting, a first detector being capable of individually detecting multiple secondary electrons emitted due to irradiation of a target with the multiple primary electron beams, a trajectory of the one primary electron beam using a primary electron optics while detecting secondary electrons corresponding to the one primary electron beam for each of the primary electron beams extracted one by one using a movable second detector having an inspection surface of a size capable of detecting the multiple secondary electrons as a whole and arranged on an optical path for guiding the multiple secondary electrons to the first detector.

Abstract: Provided is a multiple electron beam inspection apparatus including: an irradiation source irradiating a substrate with multiple electron beams; a stage on which is cable of mounting the substrate; an electromagnetic lens provided between the irradiation source and the stage, the electromagnetic lens generating a lens magnetic field, the multiple electron beams being capable of passing through the lens magnetic field; an electrostatic lens provided in the lens magnetic field, the electrostatic lens including a plurality of through-holes and a plurality of electrodes, the plurality of through-holes having wall surfaces respectively, each of the multiple electron beams being capable of passing through the corresponding each of the plurality of through-holes, each of the plurality of electrodes provided on each of the wall surfaces of the plurality of through-holes, at least one of the through-holes provided apart from a central axis of trajectory of the multiple electron beams having a spiral shape; and a power

Abstract: According to one aspect of the present invention, an electron beam image acquisition apparatus includes a first electrostatic lens group correcting a shift amount of a focus position of the primary electron beam from the reference position on the surface of the substrate occurring according to movement of the stage, and a plurality of variation amounts of the primary electron beam on the surface of the substrate by correcting the shift amount of the focus position of the primary electron beam; and a second electrostatic lens group correcting a plurality of variation amounts of an image of a secondary electron beam being emitted from the substrate by irradiating the substrate with the primary electron beam corrected by the first electrostatic lens group, the secondary electron beam passing through at least one electrostatic lens of the first electrostatic lens group.

Abstract: Estimation accuracies of a conversation satisfaction and a speech satisfaction are improved. A learning data storage unit (10) stores learning data including a conversation voice containing a conversation including a plurality of speeches, a correct answer value of a conversation satisfaction for the conversation, and a correct answer value of a speech satisfaction for each speech included in the conversation.

Abstract: According to one aspect of the present invention, an optical system adjustment method of an image acquisition apparatus includes: extracting one primary electron beam after another from primary electron beams at a plurality of preset positions among multiple primary electron beams; and adjusting, a first detector being capable of individually detecting multiple secondary electrons emitted due to irradiation of a target with the multiple primary electron beams, a trajectory of the one primary electron beam using a primary electron optics while detecting secondary electrons corresponding to the one primary electron beam for each of the primary electron beams extracted one by one using a movable second detector having an inspection surface of a size capable of detecting the multiple secondary electrons as a whole and arranged on an optical path for guiding the multiple secondary electrons to the first detector.

Abstract: A multi-electron beam image acquisition apparatus includes a first electrostatic lens and a second electrostatic lens configured to, using one of a table and an approximate expression, dynamically correct the focus position deviation amount deviated from the reference position because of a change of a height position of a surface of a substrate changed along with movement of a stage, and correct one of a rotation change amount and a magnification change amount depending on a focus position deviation amount by interaction; and an image processing circuit configured to, using the one of the table and the approximate expression, correct another of the rotation change amount and the magnification change amount depending on the focus position deviation amount, with respect to a secondary electron image based on a detection signal of multiple secondary electron beams having been detected.

Abstract: At the time of model learning, a state-of-satisfaction change pattern model including a set of transition weights in a state sequence of the states of satisfaction is obtained for each of predetermined change patterns of the state of satisfaction by using a state-of-satisfaction change pattern correct value indicating a correct value of a change pattern of the state of satisfaction of an utterer in a conversation and state-of-satisfaction correct values, each indicating a correct value of the state of satisfaction of the utterer at the time of each utterance in the conversation, and a state-of-satisfaction estimation model for obtaining the posteriori probability of the utterance feature amount given the state of satisfaction of an utterer is obtained by using the utterance-for-learning feature amount and a correct value of the state of satisfaction of an utterer who gave an utterance for learning corresponding to the utterance-for-learning feature amount.

Abstract: A multiple electron beam irradiation apparatus includes an electromagnetic lens configured to refract multiple electron beams incident, an aberration corrector arranged in the magnetic field of the electromagnetic lens and configured to be able to individually apply a bias potential and a deflection potential to each of the multiple electron beams, and an objective lens configured to focus the multiple electron beams, a trajectory of the each of which has been individually corrected by the bias potential and the deflection potential, onto a target object.

Abstract: A multiple electron beam image acquisition apparatus includes an electromagnetic lens to receive multiple electron beams and refract them, a beam selection mechanism, in the magnetic field of the electromagnetic lens, to individually correct the trajectory of each of the multiple electron beams and select a variable desired number of beams from the multiple electron beams, a limiting aperture substrate to block beams which were not selected from the multiple electron beams, a magnification adjustment system to change magnification of the beams selected, depending on the number of beams, being the desired number, selected from the multiple electron beams, an objective lens to focus the beams selected onto the target object surface, a beam separator to separate, from the beams selected, secondary electrons emitted because of the target object surface being irradiated with the beams selected, and a detector to detect the secondary electrons separated by the beam separator.

Abstract: A multiple beam inspection apparatus includes a multi-detector to detect multiple secondary electron beams generated because a target object is irradiated with multiple primary electron beams, and to include plural detection pixels each receiving irradiation of a corresponding one of the multiple secondary electron beams, and having a region which receives irradiation of a corresponding secondary electron beam and is larger than the irradiation spot size of the corresponding secondary electron beam, a shifting mechanism to shift irradiation positions of the multiple secondary electron beams irradiating the plural detection pixels, a determination circuitry to determine whether sensitivity of at least one of the plural detection pixels is degraded, and a setting circuitry to set, when sensitivity of at least one detection pixel is degraded, irradiation position shifting destinations of multiple secondary electron beams, irradiating the plural detection pixels, to be within respective corresponding same detecti

Abstract: A multiple beam image acquisition apparatus includes a stage to mount thereon a target object, a beam forming mechanism to form multiple primary electron beams and a measurement primary electron beam, a primary electron optical system to collectively irradiate the target object surface with the multiple primary electron beams and the measurement primary electron beam, a secondary electron optical system to collectively guide multiple secondary electron beams generated because the target object is irradiated with the multiple primary electron beams, and a measurement secondary electron beam generated because the target object is irradiated with the measurement primary electron beam, a multi-detector to detect the multiple secondary electron beams collectively guided, a measurement mechanism to measure a position of the measurement secondary electron beam collectively guided, and a correction mechanism to correct a trajectory of the multiple secondary electron beams by using a measured position of the measureme

Abstract: A conduit control device includes a cylinder member, a piston member, an attachment section including a rigid cylinder, a compression spring, a first elastic member being brought into contact with a contact surface of the rigid cylinder and elastically deformed to thereby seal a gap in a state in which the piston member is depressed via the button section, and a second elastic member brought into contact with an exterior member and elastically deformed to thereby seal a gap in a state in which the piston member is depressed via the button section.

Abstract: An electron beam inspection apparatus includes a stage to mount a substrate to be inspected thereon and to be continuously movable, an electron beam column, while the stage continuously moves, to scan the substrate by irradiating the substrate with multi-beams composed of a plurality of first electron beams in a plurality of beam rows, in each of which corresponding beams of the plurality of first electron beams are arranged at a same pitch in a straight line, such that the center of each of irradiation regions irradiated with the multi-beams does not overlap with the other irradiation regions in a movement direction of the stage, and a detector to detect a secondary electron emitted from the substrate due to irradiation of the multi-beams on the substrate.

Abstract: According to one aspect of the present invention, an optical system adjustment method of an image acquisition apparatus includes: extracting one primary electron beam after another from primary electron beams at a plurality of preset positions among multiple primary electron beams; and adjusting, a first detector being capable of individually detecting multiple secondary electrons emitted due to irradiation of a target with the multiple primary electron beams, a trajectory of the one primary electron beam using a primary electron optics while detecting secondary electrons corresponding to the one primary electron beam for each of the primary electron beams extracted one by one using a movable second detector having an inspection surface of a size capable of detecting the multiple secondary electrons as a whole and arranged on an optical path for guiding the multiple secondary electrons to the first detector.

Abstract: In the separation roller, an entire area of a circumferential surface of the separation roller facing the sending roller is exposed to come in direct contact with the banknote, moving from the storage unit, on the storage unit side with respect to a contact portion which is in contact with the sending roller, both end portions in an axial direction of the separation roller are formed of a material having a friction coefficient smaller than that of a central portion thereof, and the diameter of the both end portions is the same as the diameter of the central portion.