Abstract: A constant velocity universal joint includes an inner race having an outer peripheral face on which inner grooves are formed, an outer race having an inner peripheral face on which outer grooves are formed, a plurality of balls each engaging with each pair of inner groove and outer groove, and an annular cage disposed between the inner race and the outer race and including window portions for retaining respective balls. A coefficient of sliding friction between the ball and a rolling face on the inner groove with which the ball is in contact, and a coefficient of sliding friction between the ball and a rolling face on the outer groove with which the ball is in contact are larger than a coefficient of sliding friction between the ball and a sliding face on the window portion with which the ball is in contact.

Abstract: Provided is a charged particle beam exposure method placing an mask having openings in an exposure apparatus that including a deflector which deflects a charged particle beam on the mask, applying a first voltage to the deflector, the first voltage deflects the beam at an first opening, sequentially exposing all the character patterns which can be exposed by the beam shaped by the first opening after a stabilization time set as a function of a voltage has elapsed after applying the first voltage, applying a second voltage to the deflector after all the character patterns have been exposed by the beam shaped by the first opening, the second voltage deflects the beam at a next opening, and exposing all the character patterns which can be exposed by the beam shaped by the next opening after the stabilization time has elapsed after applying the second voltage.

Abstract: A charged particle beam apparatus includes: a charged particle beam source which generates a charged particle beam to irradiate the charged particle beam onto a specimen; a demagnification optical system which demagnifies the charged particle beam; a deflector which deflects the charged particle beam to scan the specimen; and a first charged particle detector having a detection surface to detect a charged particle generated from the specimen which has been irradiated with the charged particle beam; wherein the detection surface of the first charged particle detector is disposed so as to face towards the charged particle beam source.

Abstract: The video compression transmission apparatus comprises a video input unit for inputting pictures, a video compression unit for compressing input pictures, a video transmission unit for transmitting compressed pictures via a communication line, and a controller for controlling operation of each unit. Video compression via a video compression unit and video transmission via a video transmission unit are performed in parallel. Video compression method via the video compression unit and video transmission method via a video transmission unit are controlled by the controller so that each processing time becomes about the same.

Abstract: A method for creating charged-particle-beam exposure data containing a description of an exposure sequence of character patterns to perform exposure of a charged-particle-beam according to a character projection technique, comprising selecting first or second values as a parameter to transfer one character pattern and then transferring a subsequent character pattern, the first value regarding performance of a shaping deflector which deflects the charged particle beam so that the charged particle beam is applied to an arbitrarily character aperture formed in a CP aperture mask and a character beam having the shape of the character aperture is thereby created, and the second value regarding performance of an objective deflector which deflects the character beam so that the character beam is applied to an arbitrarily position of the deflection region of the specimen, and determining the exposure sequence of the character patterns in the deflection region in accordance with the selected parameter.

Abstract: A constant velocity universal unit includes an outer joint member whose inner peripheral face is formed with three guide grooves, an inner joint member including three tripod shafts each formed with a tripod spherical face, three roller units each including an outer peripheral face and an inner peripheral face coaxially formed with each other. The guide groove includes a pair of strip-shaped inner side faces formed with a pair of guide projections having a substantially half arc shape in cross section whose diameter is smaller than a height of the inner side face of the guide groove. The constant velocity universal joint further includes an annular recess formed on a substantially center portion in a height direction of the outer peripheral face of the roller unit and engaging with the pair of guide projections in a rolling manner and rotatable relative to a central axis of the guide projection.

Abstract: A sample chamber and a column are connected to each other and comprise a magnetic substance. An exhaust section controls a pressure in the sample chamber and the column. A stage controller controls a stage, above which a sample is placed, in the sample chamber. An electron beam source power supply supplies power to an electron beam source, which emits an electron beam to the sample. A power supply supplies voltage to electron optic system, which controls the electron beam. The sample chamber, exhaust section, stage controller, electron beam source power supply and power supply are grounded by a first, second, third, fourth and fifth grounding point, respectively. The electron beam source and the electron optic system are electrically insulated from the sample chamber, column, exhaust section and stage. One of the first, second and third grounding point is different from the fourth or fifth grounding point.

Abstract: In a tripod-type constant velocity joint having an inner joint member, an outer joint member, and three roller units, the radius R1, outer width W1, and inner width W2 of the outer periphery cylindrical surface of each roller unit, and the radius R3 of the center hole of each roller unit are determined to satisfy the following two inequalities: 0.5Rtc(1/cos0.3??1)+(R1?R3)?<W1 1.5Rtc(1?cos0.3?)+(R1?R3)?<W2 where Rtc: the radius of a circle passing through the respective centers of tripod spherical surfaces of the inner joint member, ?: the maximum joint angle between the outer joint member and the inner joint member, and ?: coefficient of friction between each tripod spherical surface and the wall surface of the center hole of the corresponding roller unit.

Abstract: A charged particle beam lithography system includes a charged particle beam emitter which emits a charged particle beam to a wafer at an acceleration voltage lower than a voltage causing a proximity effect; an illumination optical system which adjusts a beam radius of the charged beam; a cell aperture having a cell pattern corresponding to a desired pattern to be written; a first deflector which deflects the charged particle beam with a first electric field to enter a desired cell pattern of the cell aperture; a demagnification projection optical system which demagnifies the charged particle beam form the cell aperture with a second electric field to form an image on the wafer; and a second deflector which deflects the charged particle beam from the cell aperture with a third electric field to adjust an irradiation position of the charged particle beam on the wafer.

Abstract: To achieve down-sizing and improvements of throughputs, light exposure and charge beam exposure are sometimes used together. In case of performing exposure of a desired pattern in a plurality of stages, a positional displacement of each of exposure patterns in the stages leads to a decrease in exposure accuracy. According to the present invention, in case of forming a fine pattern by exposure after exposure of a rough pattern, the exposure position of the rough pattern is adjusted, based on a latent image of the rough pattern which has been subjected to exposure. As a result, a positional-displacement between rough and fine patterns is reduced so that a desired pattern can be formed with high accuracy.

Abstract: A charged particle beam apparatus includes: a charged particle beam source which generates a charged particle beam to irradiate the charged particle beam onto a specimen; a demagnification optical system which demagnifies the charged particle beam; a deflector which deflects the charged particle beam to scan the specimen; and a first charged particle detector having a detection surface to detect a charged particle generated from the specimen which has been irradiated with the charged particle beam; wherein the detection surface of the first charged particle detector is disposed so as to face towards the charged particle beam source.

Abstract: A charged particle beam lithography system includes: a charged particle beam source which generates a charged particle beam and irradiates a substrate therewith; an aperture in which has been formed a pattern of a shape corresponding to an arbitrary pattern to be drawn; an illuminator which adjusts the diameter of the charged particle beam and illuminates the aperture with the charged particle beam; a first deflector which deflects the charged particle beam by an electrical field to cause the charged particle beam to be incident on an arbitrary pattern, allowing the charged particle beam to pass through the aperture and be reflected back along the optical axis; a first demagnification optical projection system which demagnifies the aperture image of the charged particle beam which has passed through the aperture with the use of an electrical field or electromagnetic field; a second demagnification optical projection system which demagnifies the aperture image of the charged particle beam which has been demagn

Abstract: A multimedia title including sources of plural data-types such as a motion picture, still picture and text data, presentation methods of respective sources, and the data-types is edited in every frame, so that a video signal is created. Based on a scenario, the video signal is coded adaptively to respective data-types of each source. As a result, calculation volume is reduced and picture quality is improved.

Abstract: A method for creating charged-particle-beam exposure data containing a description of an exposure sequence of character patterns to perform exposure of a charged-particle-beam according to a character projection technique, comprising selecting first or second values as a parameter to transfer one character pattern and then transferring a subsequent character pattern, the first value regarding performance of a shaping deflector which deflects the charged particle beam so that the charged particle beam is applied to an arbitrarily character aperture formed in a CP aperture mask and a character beam having the shape of the character aperture is thereby created, and the second value regarding performance of an objective deflector which deflects the character beam so that the character beam is applied to an arbitrarily position of the deflection region of the specimen, and determining the exposure sequence of the character patterns in the deflection region in accordance with the selected parameter.

Abstract: A charged particle beam exposure method for shaping a charged particle beam by using an aperture mask having character apertures corresponding to the character shapes extracted from a semiconductor device pattern, the method comprises arranging the character apertures in the aperture mask, each of the character apertures having a shape corresponding to character shapes extracted from a standard cell pattern used for designing a semiconductor device, and varying the shape of the charged particle beam according to the outer shape of each of the character apertures, thereby applying the shaped charged particle beam to the character apertures.

Abstract: A high Al hot-dip Zn—Al—Mg plated steel sheet is obtained by forming on a steel sheet surface a hot-dip plating layer comprising, in mass %, Al: more than 10 to 22% and Mg: 1-5%, and, optionally, Ti: 0.002-0.1%, B: 0.001-0.045% and Si: 0.005-0.5%. The plating layer exhibits a metallic structure of [primary crystal Al phase] mixed in a matrix of [Al/Zn/Zn2Mg ternary eutectic crystal structure]. Substantially no Zn11Mg2 phase is present in the metallic structure of the plating layer.

Abstract: A charged particle beam lithography system includes a charged particle beam emitter which generates a charged particle beam and which emits the charged particle beam to a wafer, the charged particle beam emitter emitting the charged particle beam at an acceleration voltage lower than a voltage causing a proximity effect that back scattered electrons generated from the wafer by irradiation of the charged particle beam influence an exposure amount of a pattern to be written close to an irradiation position of the charged particle beam; an illumination optical system which adjusts a beam radius of the charged particle beam; a cell aperture having a cell pattern of a shape corresponding to a desired pattern to be written; a first deflector which deflects the charged particle beam with a first electric field so as to enter a desired cell pattern of the cell aperture, and which deflects the charged particle beam which passes through the cell pattern back to an optical axis thereof; a demagnification projection opti

Abstract: A resolution transformation apparatus which has longitudinal and lateral change ratio input means 101 for inputting the longitudinal and lateral change ratios of an image, low-frequency orthogonal transformation block extraction means 103 for extracting only low-frequency areas of N orthogonal transformation blocks required for resolution transformation from before-transformation orthogonal transformation image memory 102 for storing orthogonal transformation images before undergoing resolution transformation, resolution transformation means 104 for executing resolution transformation and generating M orthogonal transformation blocks from the N low-frequency orthogonal transformation blocks, and orthogonal transformation block storage means 105 for storing the Morthogonal transformation blocks after resolution transformation in after-transformation orthogonal transformation image memory 106.

Abstract: An assembly part for constituting a unit in a vacuum column is provided with wirings and wiring terminals. Each wiring is provided on a first insulating film, and is covered with a second insulating film made of an electro-deposited polyimide film. The assembly part is used to constitute a semiconductor manufacturing system such as an electron beam exposure system.

Abstract: To achieve down-sizing and improvements of throughputs, light exposure and charge beam exposure are sometimes used together. In case of performing exposure of a desired pattern in a plurality of stages, a positional displacement of each of exposure patterns in the stages leads to a decrease in exposure accuracy. According to the present invention, in case of forming a fine pattern by exposure after exposure of a rough pattern, the exposure position of the rough pattern is adjusted, based on a latent image of the rough pattern which has been subjected to exposure. As a result, a positional-displacement between rough and fine patterns is reduced so that a desired pattern can be formed with high accuracy.