Patents by Inventor Atsushi Hirano

Atsushi Hirano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200031036
    Abstract: An instrument panel (10) includes a base material portion (20) made of a base material M1 and a different material portion (30) made of a different material M2 having a different thermal shrinkage from that of the base material M1, and in the instrument panel (10), the base material portion (20) and the different material portion (30) are connected in a state such that at least a part of the two materials do not overlap.
    Type: Application
    Filed: September 20, 2017
    Publication date: January 30, 2020
    Inventors: Taiki Moriizumi, Yuuki Kami, Noboru Hirano, Toshihiro Saimura, Hajime Miyamoto, Atsushi Yusa, Kazuhiro Kawano
  • Publication number: 20200031229
    Abstract: An instrument panel (10) is formed by bonding a base material portion (20) composed of a base material M1 and a different material portion (30) composed of a different material M2. The different material portion (30) is infiltrated into the base material portion (20) and the infiltration portion (33) has a plurality of intermittent recessed portions.
    Type: Application
    Filed: September 20, 2017
    Publication date: January 30, 2020
    Inventors: Taiki Moriizumi, Yuuki Kami, Noboru Hirano, Toshihiro Saimura, Hajime Miyamoto, Atsushi Yusa, Kazuhiro Kawano
  • Publication number: 20200002850
    Abstract: A first aspect of the present invention is carbon fiber wherein the surface of a monofilament has a center line average roughness Ra of 6.0 nm or more and 13 nm or less, and the monofilament has a long diameter/short diameter ratio of 1.11 or more and 1.245 or less. A second aspect of the present invention is carbon fiber precursor acrylic fiber wherein the surface of a monofilament has a center line average roughness Ra of 18 nm or more and 27 nm or less, and the monofilament has a long diameter/short diameter ratio of 1.11 or more and 1.245 or less. The carbon fiber according to the first aspect is obtained by stabilizing and carbonizing under specific conditions the carbon fiber precursor acrylic fiber according to the second aspect.
    Type: Application
    Filed: August 15, 2019
    Publication date: January 2, 2020
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Naomasa Matsuyama, Yuutarou Nakamura, Norifumi Hirota, Hiroko Matsumura, Katsuhiko Ikeda, Kouki Wakabayashi, Tadashi Ootani, Akihiro Itou, Kenji Hirano, Akito Hatayama, Kenji Kaneta, Atsushi Nakajima
  • Publication number: 20190331640
    Abstract: An electric transmission mechanism according to one aspect of the present invention may include a tubular ring fixed to a shaft electively connected to an electrode, at least one brush slidably contacting with a circumferential surface of the ring, a bearing including an inner race fixed to the ring, and a housing which is fixed to an outer race of the bearing and accommodates a contact part of the ring and the brush therein.
    Type: Application
    Filed: April 23, 2019
    Publication date: October 31, 2019
    Applicant: Yokogawa Electric Corporation
    Inventors: Takeshi KUWAGATA, Megumi Goto, Hikaru Shimizu, Saori Handa, Yukiko Hirano, Masaru Homma, Atsushi Otaki, Hideyuki Yagihashi
  • Patent number: 10339896
    Abstract: A head-mounted display apparatus (1) includes an image display part (10) configured to display an image, an optical unit (20, 30, 50) configured to lead the image to an eye of a wearer of the display apparatus (1), a light intensity detector (60) configured to detect light intensity (A) of external light, a dimmer filter (40) configured to vary transmittance to adjust the intensity (B) of the external light reaching the eye of the wearer, and a controller (70) configured to adjust the transmittance of the dimmer filter (40) and the light intensity (C) of a light source of the image display part (10) based on the light intensity (A) of the external light obtained by the light intensity detector (60).
    Type: Grant
    Filed: January 12, 2016
    Date of Patent: July 2, 2019
    Assignee: Ricoh Company, Ltd.
    Inventors: Yuuma Usui, Shigenobu Hirano, Ikue Kawashima, Yasuo Katano, Aino Hasegawa, Atsushi Ohshima
  • Publication number: 20190093224
    Abstract: A technique capable of adjusting a thickness balance of a film between substrates stacked in a process chamber of a substrate processing apparatus, includes a method of manufacturing a semiconductor device, including: (a) supplying source gas to substrates through a first nozzle vertically disposed along a stacking direction of the substrates in a process chamber where the substrates are stacked and accommodated; and (b) supplying reactive gas to the substrates through a second nozzle provided with opening portions and vertically disposed along the stacking direction of the substrates in the process chamber while adjusting a partial pressure balance of the reactive gas in the stacking direction of the substrates to a desired state along the stacking direction of the substrates, wherein an opening area of each of the opening portions increases along a direction from an upstream side to a downstream side of the second nozzle.
    Type: Application
    Filed: September 20, 2018
    Publication date: March 28, 2019
    Applicant: KOKUSAI ELECTRIC CORPORATION
    Inventors: Ryosuke YOSHIDA, Yukinao KAGA, Yuji TAKEBAYASHI, Masanori SAKAI, Atsushi HIRANO
  • Publication number: 20190024232
    Abstract: To reduce a temperature deviation on a surface of a substrate and shorten a temperature recovery time on the surface of the substrate, a substrate processing apparatus is provided. The substrate processing apparatus includes a substrate retainer configured to accommodate a plurality of substrates and heat insulating plates; a reaction tube within the substrate retainer; and a heating mechanism configured to heat the plurality of substrates, wherein the substrate retainer includes a substrate processing region where the plurality of substrates are accommodated and a heat insulating plate region where the heat insulating plates are accommodated. A reflectivity of each of the first heat insulating plates is accommodated in an upper layer portion of the heat insulating plate region and is higher than a reflectivity of each of the second heat insulating plates accommodated in a region other than the upper layer portion of the heat insulating plate region.
    Type: Application
    Filed: July 13, 2018
    Publication date: January 24, 2019
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Tetsuya KOSUGI, Hitoshi MURATA, Shingo NOHARA, Atsushi HIRANO
  • Publication number: 20180374734
    Abstract: A substrate processing apparatus, includes: a substrate holder including at least one support column to which a mounting part on which a substrate is mounted is attached and at least one auxiliary support column to which the mounting part is not attached, wherein the substrate holder is configured such that a diameter of the auxiliary support column is smaller than a diameter of the support column, and wherein the substrate holder is configured such that when the substrate is held by the mounting part, an end portion of the substrate and each of the support column is spaced apart from each other by a predetermined length.
    Type: Application
    Filed: August 10, 2018
    Publication date: December 27, 2018
    Applicant: KOKUSAI ELECTRIC CORPORATION
    Inventors: Atsushi HIRANO, Yuji TAKEBAYASHI, Yukinao KAGA, Masanori SAKAI, Masakazu SHIMADA
  • Publication number: 20180274098
    Abstract: There is provided a technique that includes: a process chamber in which a process of forming a film containing a main element on a substrate is performed; a first nozzle configured to supply a precursor containing the main element to the substrate in the process chart; a second nozzle separated from the first nozzle and configured to supply the precursor to the substrate in the process chamber; a third nozzle configured to supply a reactant to the substrate in the process chamber; and a plurality of first exhaust ports configured to exhaust an internal atmosphere of the process chamber, wherein each of the plurality of first exhaust ports is disposed at a position which does not face a first gas ejection hole of the first nozzle and a second gas ejection hole of the second nozzle, in a plan view.
    Type: Application
    Filed: March 22, 2018
    Publication date: September 27, 2018
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Kosuke TAKAGI, Risa YAMAKOSHI, Hideki HORITA, Atsushi HIRANO
  • Publication number: 20180274093
    Abstract: A substrate processing apparatus includes a process chamber accommodating a substrate; a gas supply system; and an exhaust system. The supply system includes a vaporizer and a mist filter, the mist filter including a plurality of first plates and a plurality of second plates. Each of the first plates includes a first plate portion having a plurality of first grooves on a surface thereof and a first flow path. Each of the second plates includes a second plate portion having a plurality of second grooves on a surface thereof and a second flow path. When the plurality of first and second plates are arranged alternatively, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to face the first flow path, such that the first flow path and the second flow path are not in-line.
    Type: Application
    Filed: March 12, 2018
    Publication date: September 27, 2018
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Kosuke Takagi, Atsushi Hirano
  • Publication number: 20180142353
    Abstract: A substrate processing apparatus includes a reaction tube defining a substrate processing chamber; a gas inlet provided at a lower portion of the reaction tube to supply a process gas; a first buffer unit for temporarily retaining the process gas, the first buffer unit at a first side of an inner surface of the reaction tube and includes a plurality of gas supply holes; and a gas outlet provided at a second side of the inner surface of the reaction tube opposite to the first side, to exhaust the process gas from the process chamber. The gas supply holes are provided from an upper end portion of the first buffer unit to a lower end portion of the first buffer unit, and the process gas is supplied through the plurality of gas supply holes into the process chamber, passes through the process chamber, and exhausted through the gas outlet.
    Type: Application
    Filed: November 17, 2017
    Publication date: May 24, 2018
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Tetsuya MARUBAYASHI, Satoru MURATA, Kosuke TAKAGI, Atsushi HIRANO, Kiyoaki YAMADA, Haruo MORIKAWA
  • Patent number: 9708708
    Abstract: A film is efficiently formed by sufficiently supplying a source gas to substrates accommodated in a process chamber, and the uniformity of a film formed on the substrates is improved. A method of a semiconductor device manufacturing includes (a) supplying a source gas to an upper region of a process chamber through a first gas supply hole disposed at a front end of a first nozzle disposed in a lower region of the process chamber where the source gas is not pyrolyzed; (b) supplying the source gas to substrates disposed in the lower region and a middle region of the process chamber through a plurality of second gas supply holes of a second nozzle; and (c) supplying a reactive gas to substrates disposed in the lower region, the middle region and the upper region of the process chamber through a plurality of third gas supply holes of a third nozzle.
    Type: Grant
    Filed: September 8, 2016
    Date of Patent: July 18, 2017
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Noriyuki Isobe, Yuji Takebayashi, Kenichi Suzaki, Takeshi Kasai, Atsushi Hirano, Koichi Oikawa
  • Publication number: 20170067159
    Abstract: A film is efficiently formed by sufficiently supplying a source gas to substrates accommodated in a process chamber, and the uniformity of a film formed on the substrates is improved. A method of a semiconductor device manufacturing includes (a) supplying a source gas to an upper region of a process chamber through a first gas supply hole disposed at a front end of a first nozzle disposed in a lower region of the process chamber where the source gas is not pyrolyzed; (b) supplying the source gas to substrates disposed in the lower region and a middle region of the process chamber through a plurality of second gas supply holes of a second nozzle; and (c) supplying a reactive gas to substrates disposed in the lower region, the middle region and the upper region of the process chamber through a plurality of third gas supply holes of a third nozzle.
    Type: Application
    Filed: September 8, 2016
    Publication date: March 9, 2017
    Inventors: Noriyuki ISOBE, Yuji TAKEBAYASHI, Kenichi SUZAKI, Takeshi KASAI, Atsushi HIRANO, Koichi OIKAWA
  • Patent number: 9350880
    Abstract: There is provided an image processing apparatus. An image sequence acquisition section acquires an image sequence including a plurality of images. A sorting information acquisition section analyzes the individual images included in the image sequence, and acquires sorting information corresponding to the images on the basis of an analysis result. An image sequence generation section generates, based on the sorting information, one or a plurality of pieces of information indicating an image sequence which includes at least part of the plurality of images.
    Type: Grant
    Filed: March 11, 2015
    Date of Patent: May 24, 2016
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Tetsuya Kimura, Atsushi Hirano, Hitoshi Okamoto, Kengo Shinozaki
  • Patent number: 9129566
    Abstract: The present invention provides an image display medium comprising a pair of substrates at least one of which having translucency, the substrates being disposed opposite to each other with a gap, a dispersion medium which has translucency and is enclosed in a space between the pair of substrates; and plural kinds of particle groups which are movably dispersed in the dispersion medium, move according to an electric field formed, and have different colors and forces for separation from the substrates.
    Type: Grant
    Filed: August 16, 2007
    Date of Patent: September 8, 2015
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Kiyoshi Shigehiro, Yasufumi Suwabe, Yoshinori Machida, Yoshiro Yamaguchi, Takeshi Matsunaga, Atsushi Hirano
  • Publication number: 20150189105
    Abstract: There is provided an image processing apparatus. An image sequence acquisition section acquires an image sequence including a plurality of images. A sorting information acquisition section analyzes the individual images included in the image sequence, and acquires sorting information corresponding to the images on the basis of an analysis result. An image sequence generation section generates, based on the sorting information, one or a plurality of pieces of information indicating an image sequence which includes at least part of the plurality of images.
    Type: Application
    Filed: March 11, 2015
    Publication date: July 2, 2015
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Tetsuya KIMURA, Atsushi HIRANO, Hitoshi OKAMOTO, Kengo SHINOZAKI
  • Patent number: 8988361
    Abstract: A writing apparatus includes: a voltage application unit that applies a voltage to a display medium whose display changes according to an irradiation of light and an applied voltage; an optical output unit that irradiates light toward the display medium; and a controller that (i) receives a position signal that has been output from an apparatus upon contact with an input device, the position signal indicating a position of the contact with the input device, (ii) specifies, based on the received position signal, a position on the display medium at which a display is to be changed, and (iii) controls the optical output unit so that light is irradiated toward the specified position on the display medium for a predetermined time period.
    Type: Grant
    Filed: August 3, 2009
    Date of Patent: March 24, 2015
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Haruo Harada, Taijyu Gan, Hiroshi Arisawa, Yasunori Okano, Chisato Urano, Takashi Morikawa, Atsushi Hirano
  • Patent number: 8804187
    Abstract: An image processing apparatus includes a composite image generator and a print controller. The composite image generator generates a composite image by superimposing, on a document image of a document represented by document data, two-dimensional code images individually corresponding to multiple document elements included in the document. The print controller causes a printer to print the composite image. The composite image generator determines positions of the two-dimensional code images corresponding to the document elements so that the positions do not overlap images of the document elements.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: August 12, 2014
    Assignee: Fuji Xerox Co.., Ltd.
    Inventors: Atsushi Hirano, Tetsuya Kimura, Hitoshi Okamoto, Kengo Shinozaki
  • Publication number: 20140092406
    Abstract: An image processing apparatus includes a composite image generator and a print controller. The composite image generator generates a composite image by superimposing, on a document image of a document represented by document data, two-dimensional code images individually corresponding to multiple document elements included in the document. The print controller causes a printer to print the composite image. The composite image generator determines positions of the two-dimensional code images corresponding to the document elements so that the positions do not overlap images of the document elements.
    Type: Application
    Filed: January 25, 2013
    Publication date: April 3, 2014
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Atsushi HIRANO, Tetsuya KIMURA, Hitoshi OKAMOTO, Kengo SHINOZAKI
  • Patent number: D839219
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: January 29, 2019
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Hidenari Yoshida, Toru Kagaya, Atsushi Hirano