Abstract: In an exposure process or etching process, an image feature amount useful for estimating a cross-sectional shape of a target evaluation pattern, process conditions for the pattern, or device characteristics of the pattern is calculated from an SEM image. The image feature amount is compared with learning data that correlates data preliminarily stored in a database, which data includes cross-sectional shapes of patterns, process conditions for the patterns, or device characteristics of the patterns, to the image feature amount calculated from the SEM image. Thereby, the cross-sectional shape of the target evaluation pattern, the process conditions of the pattern, or the device characteristics of the pattern are nondestructively calculated.

Abstract: It is predicted that an observational direction (or an incident direction of an electron beam) in an observed image actually obtained has some errors compared to a set value. The error portion affects the analysis of the observed image later. Therefore, a convergent electron beam is irradiated on a specimen with a known shape, electrons discharged from the specimen surface are detected, an image of the electron is obtained, an incident direction of the convergent electron beam is estimated based on a geometric deformation on an image of the specimen with a known shape, and a 3D shape or a shape of a cross section of a specimen to be observed from a SEM image of the specimen to be observed is obtained by use of the information of the incident direction of the estimated convergent electron beam.

Abstract: An apparatus and method is disclosed wherein motion data which define motions of an end effecter of a robot such as a hand tip can be produced simply and conveniently. The apparatus and method provide a motion editing environment in which motion data for allowing a robot to plot a picture or a character can be edited simply and conveniently based on interactions such as hand-written inputting of a user through a mouse, a tablet or the like. By reproducing the produced motion data on a robot, a motion of plotting an arbitrary character or picture by the robot can be implemented simply.

Abstract: In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.

Abstract: In order to provide an imaging-recipe arranging or creating apparatus and method adapted so that selection rules for automatic arrangement of an imaging recipe can be optimized by teaching in a SEM apparatus or the like, the imaging-recipe arranging or creating apparatus in this invention that arranges an imaging recipe for SEM-observing a semiconductor pattern using a scanning electron microscope includes a database that receives and stores layout information of the above semiconductor pattern in a low-magnification field, and an imaging-recipe arranging unit which, on the basis of the database-stored semiconductor pattern layout information, arranges the imaging recipe automatically in accordance with the automatic arrangement algorithm that includes teaching-optimized selection rules for selecting an imaging point(s).

Abstract: In the past, when a shape was corrected by adjusting parameters of a shape calculating equation proper for a measuring method used in measuring a two-dimensional or three-dimensional shape by correlating the parameters and a shape index value, the degree of freedom of modifying a shape by correction depended on a model equation used in the calculation of the shape, and therefore such a shape correction method was unsuitable for objects of correction having a number of shape variations. According to the present invention, the three-dimensional shape is corrected by fitting a curvature equation to a three-dimensional shape of a semiconductor pattern measured by any three-dimensional shape measuring method and by adjusting parameters of the curvature equation based on a shape index value separately calculated. The relations between the shape index value and the parameters are stored in a data base, and at the time of measurement the measured shapes are corrected based on the relations mentioned above.

Abstract: To implement a dynamic, elegant motion performance of an actual robot, a motion editing system is provided which includes a motion editor to edit motions of an upper body and whole body of the robot and a foot trajectory editor to create a gait pattern and lower-body motion to stabilize the entire robot. The foot trajectory editor includes the same gait pattern generator and motion stabilized as those installed in the actual robot. Before performing the edited motions on the actual robot, the motions are created, corrected and stabilized on a 3D viewer.

Abstract: The invention provides a novel rinse solution used in the step of rinse treatment of a patterned photoresist layer developed with an aqueous alkaline developer solution in a photolithographic process for the manufacture of semiconductor devices and liquid crystal display panels. The rinse solution provided by the invention is an aqueous solution of a nitrogen-containing heterocyclic compound such as imidazoline, pyridine and the like in a concentration up to 10% by mass. Optionally, the rinse solution of the invention further contains a water-miscible alcoholic or glycolic organic solvent and/or a water-soluble resin. The invention also provides a lithographic method for the formation of a patterned photoresist layer including a step of rinse treatment of an alkali-developed resist layer with the rinse solution defined above. The invention provides an improvement on the lithographic process in respect of the product quality and efficiency of the process.

Abstract: A motion editing system for a robot in which the motion of a robot edited is corrected as the movements performed by an actual robot are checked. An optional range of motion data is reproduced using an actual robot. At this time, an output from each sensor mounted to the actual robot, that is, the sensor information, is transmitted to the motion editing system. The robot's movements are evaluated on the motion editing system based on the sensor information acquired during motion reproduction. If, as a result of the robot's movements, a predetermined evaluation criterium is not met, the motion correction processing is carried out. If the predetermined evaluation criterium is met, a motion data file, in which is embedded the reference sensor information, is formulated.

Abstract: A regenerative refrigerating apparatus which can increase the speed of cooling and heating a subject to be cooled. The specific constitution of the regenerating type refrigerating apparatus includes a pressure control means 4 having a compressor 4a, a high pressure selector valve 4b, and a low pressure selector valve 4c, an expanding/compressing unit 1 having a room temperature end 1a and a low temperature end 1b, and a regenerating unit 2 having a room temperature end 2a and a low temperature end 2b, carries out heat transfer to a subject to be cooled, and is comprised of a flow path for working gas connecting the low temperature end 1b of the expanding/compressing unit and the low temperature end 2b of the regenerating unit with each other, and simultaneously extending to the subject to be cooled 7.

Abstract: A clock recovery circuit is provided with an STC counter, an adder for setting the initial value of the STC counter by adding the value of a PCR and the multiplexing delay time; a subtracter for subtracting the multiplexing delay time from the output of the STC counter; a latched STC register for latching the subtraction result of the subtracter; a PCR register for latching the value of the PCR; and a PWM for controlling the frequency of an external clock oscillation source that supplies a clock signal to the STC counter. The clock oscillation source is provided with an LPF and a VCO, wherein a clock signal outputted from the VCO is supplied to the STC counter and a timer within a stream multiplexing circuit. The clock signal outputted from the clock oscillation source is a reference clock signal of an MPEG system. Thereby, the scale of the entire device can be reduced by reducing the number of separation and decoding circuits.

Abstract: In an automatic defect classifying method, defects not reviewed are assigned with defect classes having the same definitions as those of reviewed defects in order to effectively use information on defects not reviewed, the defects not reviewed occupying most of defects on a wafer. Defects not reviewed are assigned defect classes having the same definitions, by using defect data of defects detected with an inspection equipment and defect classes of already reviewed defects given by ADC of a review equipment. Since all defects are assigned the defect classes having the same definitions, more detailed analysis is possible in estimating the generation reasons of defects.

Abstract: A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified sample such as a pyramidal sample. The images before and after the tilting are acquired and processed to determine the tilt angle value and the distortion amount. The tilt angle adjustment and the adjustment for correction of the distortion are automated in accordance with a predetermined processing flow.

Abstract: The present invention relates to a method and apparatus for measuring a three-dimensional profile using a SEM, capable of accurately measuring the three-dimensional profile of even a flat surface or a nearly vertical surface based on the inclination angle dependence of the amount of secondary electron image signal detected by the SEM. Specifically, a tilt image obtaining unit obtains a tilt image (a tilt secondary electron image) I(2) of flat regions a and c1 on a pattern to be measured by using an electron beam incident on the pattern from an observation direction ?(2). Then, profile measuring units presume the slope (or surface inclination angle) at each point on the pattern based on the obtained tilt image and integrate successively each presumed slope value (or surface inclination angle value) to measure three-dimensional profiles S2a and S2c. This arrangement allows a three-dimensional profile to be accurately measured.

Abstract: An operator sets a distance from the page head of an alignment mark using a mark position setting switch mounted in a duplex printing system. A first printer forms the alignment mark in a position of the distance from the page head of a web, and reports position information about the alignment mark to a second printer. The alignment mark is detected by mark detection means of the second printer. Control means performs control of a web transport speed so that a phase between generation timing of a mark detection signal which the mark detection means generates by detecting the alignment mark and control timing calculated from alignment mark position data, alignment mark interval data and a web feed control signal generated at a preset period becomes constant.

Abstract: It is predicted that an observational direction (or an incident direction of an electron beam) in an observed image actually obtained has some errors compared to a set value. The error portion affects the analysis of the observed image later. Therefore, a convergent electron beam is irradiated on a specimen with a known shape, electrons discharged from the specimen surface are detected, an image of the electron is obtained, an incident direction of the convergent electron beam is estimated based on a geometric deformation on an image of the specimen with a known shape, and a 3D shape or a shape of a cross section of a specimen to be observed from a SEM image of the specimen to be observed is obtained by use of the information of the incident direction of the estimated convergent electron beam.

Abstract: To implement a dynamic, elegant motion performance of an actual robot, a motion editing system is provided which includes a motion editor to edit motions of an upper body and whole body of the robot and a foot trajectory editor to create a gait pattern and lower-body motion to stabilize the entire robot. The foot trajectory editor includes the same gait pattern generator and motion stabilized as those installed in the actual robot. Before performing the edited motions on the actual robot, the motions are created, corrected and stabilized on a 3D viewer.

Abstract: A legged mobile robot gives up a normal walking motion and starts a tumbling motion when an excessively high external force or external moment is applied thereto and a behavior plan of a foot part thereof is disabled. At this time, the variation amount ?S/?t of the area S of a support polygon of the body per time t is minimized and the support polygon when the body drops onto a floor is maximized to distribute an impact which acts upon the body from the floor when the body drops onto the floor to the whole body to suppress the damage to the body to the minimum. Further, the legged mobile robot autonomously restores a standing up posture from an on-floor posture thereof such as a supine posture or a prone posture.

Abstract: A classification model optimum for realization of a defect classification request by a user is not known by the user. Then, the user sets a classification model which is not necessarily suitable and makes classification, resulting in degradation in classification performance. Therefore, the present invention automatically generates plural potential classification models and combines class likelihoods calculated from the plural classification models to classify. To combine, an index about the adequacy of each model, in other words, an index indicating a reliable level of likelihood calculated from the each potential classification model, is also calculated. Considering the calculated result, the class likelihoods calculated from the plural classification models are combined to execute classification.

Abstract: With little efforts, to estimate the appropriateness of automatic defect classification, and to make classification criteria settable with a guarantee for the better classification performance, defects unknown with their classification classes are classified based on two different classification criteria. Also, defects differed in classification results are collected, and each thereto, a defect classification class is provided by using a manual. Then, the defects provided with the classification classes are divided into two types of groups: one is a setting group for the classification criteria; and the other is an evaluation group. Based on the classification criteria that is so set as to classify the defects included in the setting group with the maximum performance, the classification performance of a case where classification is applied to defects included in the evaluation group is calculated, and the appropriateness of thus set classification criteria is evaluated.