Patents by Inventor Atsushi Miyamoto

Atsushi Miyamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110187847
    Abstract: The present method comprises the steps of imaging the sample under different imaging conditions to acquire multiple images, generating degradation functions for the multiple acquired images, and then generating an image with an improved resolution using the multiple acquired images and the degradation functions corresponding to the acquired images to process the image with the improved resolution.
    Type: Application
    Filed: July 3, 2009
    Publication date: August 4, 2011
    Inventors: Jie Bai, Kenji Nakahira, Atsushi Miyamoto
  • Publication number: 20110181688
    Abstract: Provided is a panorama image synthesis technique using a scanning charged-particle microscope and capable of obtaining a panorama image synthesis that is robust against contamination and the imaging shift and distortion of an image in a wide-field imaging region (EP) for semiconductor fine patterns. The panorama image synthesis technique in the wide-field imaging region (EP) using the scanning charged-particle microscope is characterized in that the layout of each adjustment point, each local imaging region, and an imaging sequence comprising the imaging order of the each adjustment point are optimized and created as an imaging recipe.
    Type: Application
    Filed: September 2, 2009
    Publication date: July 28, 2011
    Inventors: Atsushi Miyamoto, Go Kotaki, Ryoichi Matsuoka
  • Publication number: 20110127429
    Abstract: In the dimension measurement of a circuit pattern using a scanning electron microscope (SEM), in order to make it possible to automatically image desired evaluation points (EPs) on a sample, and automatically measure the circuit pattern formed at the evaluation points, according to the present invention, in the dimension measurement of a circuit pattern using a scanning electron microscope (SEM), it is arranged that coordinate data of the EP and design data of the circuit pattern including the EP are used as an input, creation of a dimension measurement cursor for measuring the pattern existing in the EP and selection or setting of the dimension measurement method are automatically performed based on the EP coordinate data and the design data to automatically create a recipe, and automatic imaging/measurement is performed using the recipe.
    Type: Application
    Filed: February 10, 2011
    Publication date: June 2, 2011
    Inventors: Atsushi Miyamoto, Tomofumi Nishiura
  • Publication number: 20110125030
    Abstract: A medical diagnostic device is characterized in that an image processing means (22) includes an image noise removal part (211, 211?) which removes the noise in the generated image of a person to be examined, a signal component enhancement processing part (212, 212?) which generates an enhanced-signal component image by performing signal component enhancement processing of the image from which the noise is removed by the image noise removal part, and an image combining part (213, 213?) which generates a combined image by combining the image of the person to be examined, the image from which the noise is removed by the image noise removal part, and an enhanced-signal component image subjected to signal component enhancement processing by the signal component enhancement processing part.
    Type: Application
    Filed: April 2, 2009
    Publication date: May 26, 2011
    Inventors: Jie Bai, Kenji Nakahira, Atsushi Miyamoto
  • Patent number: 7935927
    Abstract: A method and device for observing a specimen, in which a convergent electron beam is irradiated and scanned from a desired direction, on a surface of a calibration substrate on which a pattern with a known shape is formed, and a beam SEM image of the pattern formed on the calibration substrate is obtained. An actual direction of the electron beam irradiated on the surface of the calibration substrate is calculated by use of the information about an apparent geometric deformation of the known shape on the SEM image, and the actual direction of the electron beam to the desired is adjusted direction by using information of the calculated direction. The pattern with the known shape formed on the calibration substrate has a crystal plane formed by anisotropic chemical etching.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: May 3, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Miyamoto, Maki Tanaka, Hidetoshi Morokuma
  • Patent number: 7930067
    Abstract: An apparatus and method is disclosed wherein motion data which define motions of an end effecter of a robot such as a hand tip can be produced simply and conveniently. The apparatus and method provide a motion editing environment in which motion data for allowing a robot to plot a picture or a character can be edited simply and conveniently based on interactions such as hand-written inputting of a user through a mouse, a tablet or the like. By reproducing the produced motion data on a robot, a motion of plotting an arbitrary character or picture by the robot can be implemented simply.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: April 19, 2011
    Assignee: Sony Corporation
    Inventors: Atsushi Miyamoto, Tomohisa Moridaira
  • Publication number: 20110076042
    Abstract: A printing system includes a first printing apparatus, a second printing apparatus, and a control device. The second printing apparatus is provided at a rear stage of the first printing apparatus, and includes a second preheating unit that preheats a recording medium from one surface before thermally fixing a toner image to another surface, and a temperature control unit that increase the temperature of the second preheating unit from a normal temperature to a target temperature, in response to a printing preparation instruction received in a temporary printing stop state from the control device. The control device starts printing, when the temperature of the second preheating unit reaches the target temperature. The temperature control unit decreases the temperature of the second preheating unit from the target temperature to the normal temperature, when the recording medium is conveyed by a length from a deformed portion to the second preheating unit.
    Type: Application
    Filed: September 21, 2010
    Publication date: March 31, 2011
    Inventors: Atsushi MIYAMOTO, Soushi Kikuchi
  • Publication number: 20110074817
    Abstract: A composite picture forming method and picture forming apparatus forms pattern attribute information contained in an overlapping domain for the overlapping domain between a plurality of pictures to select the pictures to be targeted for a composition in accordance with the pattern attribute information and combine the selected pictures, and the composition of the pictures is also performed in plural stages by using the pattern attribute information in the overlapping domain.
    Type: Application
    Filed: August 30, 2010
    Publication date: March 31, 2011
    Inventors: Shinichi Shinoda, Yasutaka Toyoda, Ryoichi Matsuoka, Atsushi Miyamoto, Go Kotaki
  • Patent number: 7897325
    Abstract: The invention provides a novel rinse solution used in the step of rinse treatment of a patterned photoresist layer developed with an aqueous alkaline developer solution in a photolithographic process for the manufacture of semiconductor devices and liquid crystal display panels. The rinse solution provided by the invention is an aqueous solution of a nitrogen-containing heterocyclic compound such as imidazoline, pyridine and the like in a concentration up to 10% by mass. Optionally, the rinse solution of the invention further contains a water-miscible alcoholic or glycolic organic solvent and/or a water-soluble resin. The invention also provides a lithographic method for the formation of a patterned photoresist layer including a step of rinse treatment of an alkali-developed resist layer with the rinse solution defined above. The invention provides an improvement on the lithographic process in respect of the product quality and efficiency of the process.
    Type: Grant
    Filed: December 8, 2005
    Date of Patent: March 1, 2011
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshihiro Sawada, Jun Koshiyama, Kazumasa Wakiya, Atsushi Miyamoto, Hidekazu Tajima
  • Patent number: 7888638
    Abstract: In the dimension measurement of a circuit pattern using a scanning electron microscope (SEM), in order to make it possible to automatically image desired evaluation points (EPs) on a sample, and automatically measure the circuit pattern formed at the evaluation points, according to the present invention, in the dimension measurement of a circuit pattern using a scanning electron microscope (SEM), it is arranged that coordinate data of the EP and design data of the circuit pattern including the EP are used as an input, creation of a dimension measurement cursor for measuring the pattern existing in the EP and selection or setting of the dimension measurement method are automatically performed based on the EP coordinate data and the design data to automatically create a recipe, and automatic imaging/measurement is performed using the recipe.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: February 15, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Miyamoto, Tomofumi Nishiura
  • Patent number: 7889908
    Abstract: In the past, when a shape was corrected by adjusting parameters of a shape calculating equation proper for a measuring method used in measuring a two-dimensional or three-dimensional shape by correlating the parameters and a shape index value, the degree of freedom of modifying a shape by correction depended on a model equation used in the calculation of the shape, and therefore such a shape correction method was unsuitable for objects of correction having a number of shape variations. According to the present invention, the three-dimensional shape is corrected by fitting a curvature equation to a three-dimensional shape of a semiconductor pattern measured by any three-dimensional shape measuring method and by adjusting parameters of the curvature equation based on a shape index value separately calculated. The relations between the shape index value and the parameters are stored in a data base, and at the time of measurement the measured shapes are corrected based on the relations mentioned above.
    Type: Grant
    Filed: January 20, 2006
    Date of Patent: February 15, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Miyamoto, Maki Tanaka, Hidetoshi Morokuma
  • Publication number: 20110013953
    Abstract: A lubricating device includes an lubricant impregnation member to coat a surface of a target member with lubricant, an lubricant supply member to supply lubricant to the lubricant impregnation member, a subsidiary roller to feed the lubricant impregnation member out, a main roller to reel in the lubricant impregnation member fed by the subsidiary roller, a drive motor to drive the main roller, an encoder disc provided at a rotational shaft of the subsidiary roller, an encoder sensor to detect a rotational state of the encoder disc, and a controller unit to calculate an outer diameter of the main roller and a portion of the lubricant impregnation member reeled by the main roller, based on a number of drive steps of the drive motor during a detection interval of the encoder disc.
    Type: Application
    Filed: July 6, 2010
    Publication date: January 20, 2011
    Inventor: Atsushi MIYAMOTO
  • Patent number: 7873205
    Abstract: A classification model optimum for realization of a defect classification request by a user is not known by the user. Then, the user sets a classification model which is not necessarily suitable and makes classification, resulting in degradation in classification performance. Therefore, the present invention automatically generates plural potential classification models and combines class likelihoods calculated from the plural classification models to classify. To combine, an index about the adequacy of each model, in other words, an index indicating a reliable level of likelihood calculated from the each potential classification model, is also calculated. Considering the calculated result, the class likelihoods calculated from the plural classification models are combined to execute classification.
    Type: Grant
    Filed: March 26, 2004
    Date of Patent: January 18, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hirohito Okuda, Yuji Takagi, Toshifumi Honda, Atsushi Miyamoto, Takehiro Hirai
  • Publication number: 20100280378
    Abstract: It is possible to improve an image quality of an ultrasonographic device and improve visibility of a tissue structure and a lesion. According to a noise amount estimated for each of at least two resolution levels and reliability of the noise amount estimation, a corrected noise amount is calculated. An intensity conversion is performed on a decomposition coefficient obtained by a multi-resolution decomposition process using the corrected noise amount. Moreover, by performing intensity conversion of the respective decomposition coefficients according to a plurality of decomposition coefficients, it is possible to generate a high-quality image. Furthermore, by switching processing parameters in accordance with the imaging condition, the image type, and the imaging object, it is possible to simultaneously realize the processing time and the image quality appropriate for the purpose.
    Type: Application
    Filed: May 9, 2008
    Publication date: November 4, 2010
    Inventors: Kenji Nakahira, Atsushi Miyamoto
  • Patent number: 7816062
    Abstract: In an exposure process or etching process, an image feature amount useful for estimating a cross-sectional shape of a target evaluation pattern, process conditions for the pattern, or device characteristics of the pattern is calculated from an SEM image. The image feature amount is compared with learning data that correlates data preliminarily stored in a database, which data includes cross-sectional shapes of patterns, process conditions for the patterns, or device characteristics of the patterns, to the image feature amount calculated from the SEM image. Thereby, the cross-sectional shape of the target evaluation pattern, the process conditions of the pattern, or the device characteristics of the pattern are nondestructively calculated.
    Type: Grant
    Filed: November 3, 2006
    Date of Patent: October 19, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Wataru Nagatomo, Hidetoshi Morokuma, Atsushi Miyamoto, Hideaki Sasazawa
  • Patent number: 7811748
    Abstract: A method of producing a high-quality product without damaging the physical properties of a pattern to be formed by a rinsing process based on a principle totally different from that for a conventional pattern collapse preventing method. A method for forming a resist pattern by subjecting a photo-resist layer provided on a substrate to image-forming exposure and then developing the resultant layer, wherein the resist pattern is formed, after the developing process, by the process of reducing a contact angle with respect to a contact liquid on the surface of the resist pattern to up to 40 degrees, then by the process of increasing it to at least 70 degrees, and further by drying it.
    Type: Grant
    Filed: April 20, 2005
    Date of Patent: October 12, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Jun Koshiyama, Kazumasa Wakiya, Fumitake Kaneko, Atsushi Miyamoto, Hidekazu Tajima, Yoshihiro Sawada
  • Patent number: 7795197
    Abstract: This invention provides a novel cleaning liquid for lithography that, for a photoresist pattern, is used for reducing a surface defect, that is, defect, of a product, preventing pattern collapse during water rinsing, and further imparting electron beam irradiation resistance to a resist to suppress pattern shrinkage. Further, in the novel cleaning liquid for lithography, bacteria contamination does not occur during storage. The cleaning liquid for lithography comprises an aqueous solution containing an amine oxide compound represented by general formula wherein R1 represents an alkyl or hydroxyalkyl group having 8 to 20 carbon atoms which may be interrupted by an oxygen atom; and R2 and R3 represent an alkyl or hydroxyalkyl group having 1 to 5 carbon atoms.
    Type: Grant
    Filed: November 29, 2005
    Date of Patent: September 14, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshihiro Sawada, Kazumasa Wakiya, Jun Koshiyama, Atsushi Miyamoto, Hidekazu Tajima
  • Patent number: 7764826
    Abstract: To realize reliable on-film/under-film defect classification (classification into 3 classes of on-film, under-film, and determination-disabled) with determination propriety determination, an on-film/under-film defect classification method and a method of narrowing a range of defect generation timing are given, the methods being robust to 4 variation factors, wherein an edge of a boundary line between a line pattern region and a base region is focused, and whether the edge is preserved between defect and reference images in a defective region is determined, thereby an on-film or under-film defect can be identified. Furthermore, a range of the defect generation timing can be narrowed based on an identification result of the on-film or under-film defect, and information of a defect classification class (defect type) such as particle defect or pattern defect as necessary.
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: July 27, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Miyamoto, Toshifumi Honda
  • Patent number: 7759074
    Abstract: An immunological latex turbidimetry method for analyzing an antigen or antibody in a sample, comprising the steps of: (1) bringing a sample which may contain the antigen or antibody to be analyzed into contact with a protease-treated albumin; and (2) bringing a mixture obtained in the above step (1) into contact with latex particles carrying an antibody or antigen specifically reacting with the antigen or antibody to be assayed, and analyzing a turbidity caused by a latex agglutination reaction, is disclosed. Further, an immunological latex turbidimetry reagent comprising (1) a first component containing a protease-treated albumin, and (2) a second component containing latex particles carrying an antibody or antigen specifically reacting with an antigen or antibody to be assayed is also disclosed.
    Type: Grant
    Filed: May 1, 2009
    Date of Patent: July 20, 2010
    Assignee: Mitsubishi Kagaku Iatron, Inc.
    Inventors: Atsushi Miyamoto, Tokio Sawai, Takeshi Matsuya, Tsuneo Okuyama
  • Patent number: 7756320
    Abstract: With little efforts, to estimate the appropriateness of automatic defect classification, and to make classification criteria settable with a guarantee for the better classification performance, defects unknown with their classification classes are classified based on two different classification criteria. Also, defects differed in classification results are collected, and each thereto, a defect classification class is provided by using a manual. Then, the defects provided with the classification classes are divided into two types of groups: one is a setting group for the classification criteria; and the other is an evaluation group. Based on the classification criteria that is so set as to classify the defects included in the setting group with the maximum performance, the classification performance of a case where classification is applied to defects included in the evaluation group is calculated, and the appropriateness of thus set classification criteria is evaluated.
    Type: Grant
    Filed: March 4, 2004
    Date of Patent: July 13, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshifumi Honda, Atsushi Miyamoto, Hirohito Okuda