Abstract: This Cassegrain reflector 200 is provided with a primary mirror 201 and a secondary mirror 202 disposed coaxially with the primary mirror 201 and laterally supported by a plurality of supporting rods. The Cassegrain reflector 200 causes the light incident through an opening 212 formed along an axial line L of the primary mirror 201 to be reflected onto the secondary mirror 202, and then causes the light to be reflected onto the primary mirror 201 in order to emit the light toward a measurement position through an opening 231 formed on the side of the secondary mirror 202. A Cassegrain reflector retention mechanism 6 for retaining the Cassegrain reflector 200 is provided with a retainer 61 for retaining the Cassegrain reflector 200, and a rotation adjustment mechanism 60 for adjusting the rotational position of the plurality of supporting rods.

Abstract: An infrared microscope includes an illumination optical system which guides infrared red to an analysis position on a sample; a connection optical system which guides infrared light, supplied from an infrared spectrophotometer, to said illumination optical system; a visible light source unit which outputs visible light to a region including said analysis position on the sample; an image acquisition unit which inputs visible light from the region including said analysis position on the sample to a detection surface and acquires a visible light image; and a detection unit which detects infrared light from said analysis position on the sample. The connection optical system can be positionally adjusted, and said image acquisition unit is capable of acquiring an infrared light image by inputting infrared light to a detection surface.

Abstract: An objective optical system includes a convex secondary mirror configured to reflect a measurement light irradiated from an infrared microscope, a concave primary mirror configured to reflect the measurement light reflected by the secondary mirror, a prism to which the measurement light reflected by the primary mirror is irradiated, and a light shielding means provided on an optical path of the measurement light between the primary mirror and the prism to shield a part of the light beam of the measurement light.

Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; an EUV light focusing mirror located in the chamber; and a hydrogen gas release unit that is located in the chamber and includes an opening configured to release a hydrogen gas inward from around the EUV light focusing mirror and a first cooling medium channel through which a cooling medium passes.

Abstract: An infrared microscope includes an illumination optical system which guides infrared red to an analysis position on a sample; a connection optical system which guides infrared light, supplied from an infrared spectrophotometer, to said illumination optical system; a visible light source unit which outputs visible light to a region including said analysis position on the sample; an image acquisition unit which inputs visible light from the region including said analysis position on the sample to a detection surface and acquires a visible light image; and a detection unit which detects infrared light from said analysis position on the sample. The connection optical system can be positionally adjusted, and said image acquisition unit is capable of acquiring an infrared light image by inputting infrared light to a detection surface.

Abstract: The present invention provides halichondrin analogs, such as compounds of Formula (I). The compounds may bind to microtubule sites, thereby inhibiting microtubule dynamics. Also provided are methods of synthesis, pharmaceutical compositions, kits, methods of treatment, and uses that involve the compounds for treatment of a proliferative disease (e.g., cancer). Compounds of the present invention are particularly useful for the treatment of metastatic breast cancer, non-small cell lung cancer, prostate cancer, and sarcoma. The included methods of synthesis are useful for the preparation of compounds of Formula (I)-(III) along with naturally occurring halicondrins (e.g., halichondrin B & C, norhalichondrin A, B, & C, and homohalichondrin A, B, & C). Also included are methods for interconverting between the halichondrins, norhalichondrins, and homohalichondrins and their unnatural epimers at the C38 ketal stereocenter through the use of an acid-mediated equilibration.

Abstract: An extreme ultraviolet light generation device includes: a chamber (2) having inside a plasma generating region (22) in which plasma is generated from a droplet of a target substance; an EUV light focusing mirror (23) having a reflection surface (23A) that reflects EUV light generated by the droplet being turned into the plasma in the plasma generating region; a magnetic field generation unit configured to generate a magnetic field ML for converging, toward a wall of the chamber, a charged particle generated by the droplet being turned into the plasma; and an etching gas supply unit (32) configured to supply etching gas along the reflection surface from an outer periphery of the EUV light focusing mirror, the etching gas supply unit being configured such that flow speed of etching gas supplied from one side of a plane S is higher than flow speed of etching gas supplied from the other side.

Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; an EUV light focusing mirror located in the chamber; and a hydrogen gas release unit that is located in the chamber and includes an opening configured to release a hydrogen gas inward from around the EUV light focusing mirror and a first cooling medium channel through which a cooling medium passes.

Abstract: An optical scanning device provided with a casing, a plurality of light sources, a deflection scanning unit that deflects and scans light beams from the plurality of light sources onto a plurality of bodies to be scanned, and a plurality of optical units arranged between the deflection scanning unit and the bodies to be scanned, in which optical unit supporting members that support the optical units are provided, the optical unit supporting members support the plurality of optical units arranged at predetermined intervals, and a thermal expansion coefficient of the optical unit supporting members is lower than a thermal expansion coefficient of the casing.

Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.

Abstract: A nonaqueous electrolyte secondary battery including an electrode assembly the electrode assembly being fastened with a rectangular or square fixing tape applied to cover the end of the coil, the side of the fixing tape in contact with the electrode assembly including self-adhesive portions having a pressure-sensitive adhesive and a non-adhesive portion having no pressure-sensitive adhesive, the self-adhesive portions being disposed at both ends of the non-adhesive portion in the direction of the width of the fixing tape so that the non-adhesive portion is interposed between the self-adhesive portions, the battery satisfying 0.9?Wb/Wa?1 and 0.35?Wc/Wa?0.8 wherein Wa is the height of the electrode assembly, Wb is the width of the fixing tape and Wc is the width of the non-adhesive portion.

Abstract: A major object of the present invention is to provide an effective means for promoting polyamine synthesis in an organism (in particular, in humans). Lactobacillus paracasei having polyamine production promoting activity in an organism.

Abstract: A first mirror and a second mirror are disposed on a mounting surface of a housing in an exposure device of an image forming apparatus. A back surface of the first mirror is supported by ribs and the first mirror is pressed against the ribs by elastically pressing a reflecting surface thereof by a spring member. A reflecting surface of the second mirror is supported by ribs and the second mirror is pressed against the ribs by elastically pressing a back surface thereof by a spring member.

Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.

Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a target supply device configured to successively supply targets into the chamber, and an extreme ultraviolet light collector mirror including a reflective surface having a through-hole at the center thereof. The reflective surface may reflect and collect extreme ultraviolet light generated at a predetermined emission cycle because of irradiation of the successively supplied targets with a laser beam. A gas ejection device may be disposed in the through-hole to jut out from the reflective surface and have a gas ejection opening to eject etching gas for debris onto the reflective surface. The gas ejection device may be configured so that the etching gas takes a longer time than the predetermined emission cycle to reach the through-hole-side end of effective reflective area of the reflective surface after being ejected from the gas ejection opening.

Abstract: This Cassegrain reflector 200 is provided with a primary mirror 201 and a secondary mirror 202 disposed coaxially with the primary mirror 201 and laterally supported by a plurality of supporting rods. The Cassegrain reflector 200 causes the light incident through an opening 212 formed along an axial line L of the primary mirror 201 to be reflected onto the secondary mirror 202, and then causes the light to be reflected onto the primary mirror 201 in order to emit the light toward a measurement position through an opening 231 formed on the side of the secondary mirror 202. A Cassegrain reflector retention mechanism 6 for retaining the Cassegrain reflector 200 is provided with a retainer 61 for retaining the Cassegrain reflector 200, and a rotation adjustment mechanism 60 for adjusting the rotational position of the plurality of supporting rods.

Abstract: An image processing apparatus with at least one circuit provided to perform a process of determining a candidate color region including at least a partial region in an image using color information of an input image signal, prompt a user to select an extraction color region in case a plurality of color regions are determined as the candidate color region, and perform image processing on at least one of the extraction color region of the input image signal and the remaining region of the input image signal excluding the extraction color region, to obtain an output image signal.

Abstract: A microscope equipped with an imaging device used for the positioning of a sample, the microscope capable of removing distortion and blind spots from an image generated by the imaging device and reducing cost by using a commercially available imaging device. A sample holder for holding a sample; a measurement light source for irradiating the sample held by the sample holder with irradiation light; a focusing optical element for focusing measurement light derived from the irradiation light transmitted through or reflected from the sample; a detection unit for detecting the measurement light focused by the focusing optical element; an image capture device for capturing the image of the sample; and an objective optical system switching unit arranged to switch either the focusing optical element or the image capture device with the other to a position facing the sample.

Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.

Abstract: A method for manufacturing a nonaqueous electrolyte secondary battery according to an embodiment of the present invention is a method for manufacturing a nonaqueous electrolyte secondary battery including a positive electrode plate and a negative electrode plate provided with a negative electrode mixture layer containing graphite and a silicon material and includes a step of applying positive electrode mixture slurry containing a lithium-transition metal composite oxide and polyvinylidene fluoride to a positive electrode current collector, a step of forming a positive electrode mixture layer by drying the positive electrode mixture slurry, and a step of heat-treating the positive electrode mixture layer. The temperature of heat treatment is preferably 160° C. to 350° C.