Abstract: The present invention provides a new species of tobamovirus and its use to identify plants comprising resistance against the virus.

Abstract: A method of controlling a vehicle engine comprising estimating a value for the actual engine torque, comparing this with a further calculated (expected) torque value, and controlling the engine consequent to said comparing, the value for the actual engine torque being determined from the following steps: ?a) from a crankshaft signal, providing a plot or signal indicative of instantaneous crankshaft speed; ?b) differentiating said plot or signal indicative of instantaneous crankshaft speed with respect to time to determine acceleration values; ?c) within a crankshaft/time interval, determining a maximum and a minimum acceleration value from step b); ?d) determining the difference between said maximum and minimum acceleration values; ?e) determining a torque value dependent on said difference from step d).

Abstract: A method for processing pharmaceutical powders, which comprises providing a feeder module including a plurality of feeder units each with a storage hopper, a weighing cell, a conveyer, and a discharge end, connecting the storage hopper to a refilling system with a refilling valve, connecting the refilling valve to a level or weight indicator disposed above the refilling valve, connecting the discharge end to a common receiving container, refilling the storage hopper with a powder intermittently 40 to 80 times per hour, storing data during refilling, transporting powder from the storage hopper with the respective conveyer, and discharging powder from each feeder unit into the common receiving container. During each refilling of the storage hopper, the refilling valve dispenses powder into the storage hopper and, during the step of transporting the powder from the storage hopper, the conveyer is operated according to the data collected during previous refills.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: Disclosed is a method of determining a characteristic of interest, in particular focus, relating to a structure on a substrate formed by a lithographic process, and an associated patterning device and lithographic system. The method comprises forming a modified substrate feature on the substrate using a corresponding modified reticle feature on a patterning device, the modified substrate feature being formed for a primary function other than metrology, more specifically for providing a support for a vertically integrated structure. The modified reticle feature is such that said modified substrate feature is formed with a geometry dependent on the characteristic of interest during formation. The modified substrate feature can be measured to determine said characteristic of interest.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A dart holder (10) comprising: first positioning means (1), holding means (3) for holding optionally at least the tip and/or part of the barrel of a dart in a settled position in the first positioning means (1) such that the barrel of said dart is accessible for being grabbed by a user's hand, a first landing area (4) arranged on the first positioning means (1) in respect to the holding means (3) such that said first landing area (4) provides a reference to at least part of the hand for grabbing the barrel at a target position, wherein the holding means (3) is formed by a shaft (30) extending from the first landing area (4) at least partially through the first positioning means (1) up to a shaft end (31) facing away from the first landing area (4), wherein the shaft (30) is provided with a limitation reference means (8) to define a limitation for the tip of the barrel when it is inserted in the shaft (30).

Abstract: The present invention provides a new species of tobamovirus and its use to identify plants comprising resistance against the virus.

Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus needs to be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.

Abstract: A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.

Abstract: The present invention provides a new species of tobamovirus and its use to identify plants comprising resistance against the virus.

Abstract: A dart holder (10) comprising: first positioning means (1), holding means (3) for holding optionally at least the tip and/or part of the barrel of a dart in a settled position in the first positioning means (1) such that the barrel of said dart is accessible for being grabbed by a user's hand, a first landing area (4) arranged on the first positioning means (1) in respect to the holding means (3) such that said first landing area (4) provides a reference to at least part of the hand for grabbing the barrel at a target position, wherein the holding means (3) is formed by a shaft (30) extending from the first landing area (4) at least partially through the first positioning means (1) up to a shaft end (31) facing away from the first landing area (4), wherein the shaft (30) is provided with a limitation reference means (8) to define a limitation for the tip of the barrel when it is inserted in the shaft (30).

Abstract: A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A lithographic apparatus prints a focus metrology pattern (T) on a substrate, the printed pattern including at least a first array of features (800). Features at any location within the array define a pattern that repeats at in at least a first direction of periodicity (X), while geometric parameters of the repeating pattern (w1, w3) vary over the array. A focus measurement is derived from measurements of the array at a selected subset of locations (ROI). As a result, the geometric parameters upon which the measurement of focus performance is based can be optimized by selection of locations within the array. The need to optimize geometric parameters of a target design on a reticle (MA) is reduced or eliminated. The measured property may be asymmetry, for example, and/or diffraction efficiency. The measured property for all locations may be captured by dark-field imaging, and a subset of locations selected after capture.

Abstract: A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.

Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus needs to be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.

Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus should be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, the reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.

Abstract: A lithographic apparatus prints a focus metrology pattern (T) on a substrate, the printed pattern including at least a first array of features (800). Features at any location within the array define a pattern that repeats at in at least a first direction of periodicity (X), while geometric parameters of the repeating pattern (w1, w3) vary over the array. A focus measurement is derived from measurements of the array at a selected subset of locations (ROI). As a result, the geometric parameters upon which the measurement of focus performance is based can be optimized by selection of locations within the array. The need to optimize geometric parameters of a target design on a reticle (MA) is reduced or eliminated. The measured property may be asymmetry, for example, and/or diffraction efficiency. The measured property for all locations may be captured by dark-field imaging, and a subset of locations selected after capture.