Abstract: A method for processing pharmaceutical powders, which comprises providing a feeder module including a plurality of feeder units each with a storage hopper, a weighing cell, a conveyer, and a discharge end, connecting the storage hopper to a refilling system with a refilling valve, connecting the refilling valve to a level or weight indicator disposed above the refilling valve, connecting the discharge end to a common receiving container, refilling the storage hopper with a powder intermittently 40 to 80 times per hour, storing data during refilling, transporting powder from the storage hopper with the respective conveyer, and discharging powder from each feeder unit into the common receiving container. During each refilling of the storage hopper, the refilling valve dispenses powder into the storage hopper and, during the step of transporting the powder from the storage hopper, the conveyer is operated according to the data collected during previous refills.

Abstract: Focus performance of a lithographic apparatus is measured using pairs of targets that have been exposed (1110) with an aberration setting (e.g. astigmatism) that induces a relative best focus offset between them. A calibration curve (904) is obtained in advance by exposing similar targets on FEM wafers (1174, 1172). In a set-up phase, calibration curves are obtained using multiple aberration settings, and an anchor point (910) is recorded, where all the calibration curves intersect. When a new calibration curve is measured (1192), the anchor point is used to produce an adjusted updated calibration curve (1004?) to cancel focus drift and optionally to measure drift of astigmatism. Another aspect of the disclosure (FIGS. 13-15) uses two aberration settings (+AST, ?AST) in each measurement, reducing sensitivity to astigmatism drift. Another aspect (FIGS. 16-17) uses pairs of targets printed with relative focus offsets, by double exposure in one resist layer.

Abstract: Disclosed is a method of determining a characteristic of interest, in particular focus, relating to a structure on a substrate formed by a lithographic process, and an associated patterning device and lithographic system. The method comprises forming a modified substrate feature on the substrate using a corresponding modified reticle feature on a patterning device, the modified substrate feature being formed for a primary function other than metrology, more specifically for providing a support for a vertically integrated structure. The modified reticle feature is such that said modified substrate feature is formed with a geometry dependent on the characteristic of interest during formation. The modified substrate feature can be measured to determine said characteristic of interest.

Abstract: A method for processing pharmaceutical powders, which comprises providing a feeder module including a plurality of feeder units each with a storage hopper, a weighing cell, a conveyer, and a discharge end, connecting the storage hopper to a refilling system with a refilling valve, connecting the refilling valve to a level or weight indicator disposed above the refilling valve, connecting the discharge end to a common receiving container, refilling the storage hopper with a powder intermittently 40 to 80 times per hour, storing data during refilling, transporting powder from the storage hopper with the respective conveyer, and discharging powder from each feeder unit into the common receiving container. During each refilling of the storage hopper, the refilling valve dispenses powder into the storage hopper and, during the step of transporting the powder from the storage hopper, the conveyer is operated according to the data collected during previous refills.

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus should be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, the reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.

Abstract: Focus performance of a lithographic apparatus is measured using pairs of targets that have been exposed (1110) with an aberration setting (e.g. astigmatism) that induces a relative best focus offset between them. A calibration curve (904) is obtained in advance by exposing similar targets on FEM wafers (1174, 1172). In a set-up phase, calibration curves are obtained using multiple aberration settings, and an anchor point (910) is recorded, where all the calibration curves intersect. When a new calibration curve is measured (1192), the anchor point is used to produce an adjusted updated calibration curve (1004?) to cancel focus drift and optionally to measure drift of astigmatism. Another aspect of the disclosure (FIG. 13-15) uses two aberration settings (+AST, ?AST) in each measurement, reducing sensitivity to astigmatism drift. Another aspect (FIG. 16-17) uses pairs of targets printed with relative focus offsets, by double exposure in one resist layer.

Abstract: The present invention provides a new species of tobamovirus and its use to identify plants comprising resistance against the virus.

Abstract: A method for processing pharmaceutical powders, which comprises providing a feeder module including a plurality of feeder units each with a storage hopper, a weighing cell, a conveyer, and a discharge end, connecting the storage hopper to a refilling system with a refilling valve, connecting the refilling valve to a level or weight indicator disposed above the refilling valve, connecting the discharge end to a common receiving container, refilling the storage hopper with a powder intermittently 40 to 80 times per hour, storing data during refilling, transporting powder from the storage hopper with the respective conveyer, and discharging powder from each feeder unit into the common receiving container. During each refilling of the storage hopper, the refilling valve dispenses powder into the storage hopper and, during the step of transporting the powder from the storage hopper, the conveyer is operated according to the data collected during previous refills.

Abstract: A body arrangement having a longitudinal member arrangement, a bumper cross-member, and a support element. The bumper cross-member is fastened to one end of the longitudinal support and an end portion of the bumper cross-member projects in the transverse direction beyond the longitudinal support. The support element is fastened to the end portion of the bumper cross-member and extends over a predetermined length towards the rear in the longitudinal direction of the vehicle. The support element preferably extends substantially parallel to the longitudinal member arrangement. The support element is disposed or designed with a predetermined spacing with respect to the longitudinal member arrangement. The support element supports the end portion of the longitudinal member arrangement in the event of a deformation of the end portion of the bumper cross-member following a frontal collision of the vehicle, in particular a frontal collision with little overlap.

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device, the patterning device being capable of imparting an EUV radiation beam with a grating in its cross-section to form a patterned EUV radiation beam, and a projection system configured to project the patterned EUV radiation beam onto a target portion of the substrate, wherein the support structure is provided with a grating comprising a series of first reflective portions which alternates with a series of second reflective portions, the second reflective portions having a reflectivity which is less than the reflectivity of at least part of the first reflective portions and which is greater than zero.

Abstract: A LED lamp includes an at least partially optically transmissive enclosure and a base. A LED assembly having a plurality of LEDs is located in the enclosure where the LEDs are operable to emit light when energized through an electrical path from the base. A heat sink has a heat dissipating portion that is at least partially exposed to the ambient environment and a heat conducting portion that is thermally coupled to the at least one LED assembly. The LED assembly is mounted on the heat conducting portion under radial tension. A retention member restrains the LED assembly from moving in an axial direction relative to the heat conducting portion.

Abstract: A powered entrance barrier door alarm device and system is configured to alert someone of an unauthorized breach of a powered entrance barrier, such as a garage door, whereby the powered entrance barrier is opened without the use of the powered entrance barrier opener. The powered entrance barrier alarm system includes a powered entrance barrier position sensor, and a detector circuit coupled with a powered entrance barrier opener power supply. The detector circuit measures an electrical power parameter to a powered entrance barrier opener. A detector module having a controller monitors the inputs from the detector circuit and the powered entrance barrier positioning sensor to determine if an alarm should be initiated. A detector module may have an electrical plug and an electrical outlet for a powered entrance barrier opener.

Abstract: A LED lamp includes an at least partially optically transmissive enclosure and a base. A LED assembly having a plurality of LEDs is located in the enclosure where the LEDs are operable to emit light when energized through an electrical path from the base. A heat sink has a heat dissipating portion that is at least partially exposed to the ambient environment and a heat conducting portion that is thermally coupled to the at least one LED assembly. The LED assembly is mounted on the heat conducting portion under radial tension. A retention member restrains the LED assembly from moving in an axial direction relative to the heat conducting portion.

Abstract: A feeder unit comprises a storage hopper, a weighing cell, a conveyer, and a discharge end. The storage hopper is to be connected to a refilling system and the discharge end to a receiving container. A working space is defined by the arithmetic product of the dead weight of the feeder unit and the refilling interval, such that the working space is below 0.2 kgh. Furthermore a method for discharging a constant mass flow of one or more powders into a receiving container is defined.

Abstract: Electronic devices with support frames and mechanically-bonded plastic and methods for forming such electronic devices are provided. A representative electronic device includes: a housing that incorporates: a metal chassis having a base and a sidewall extending outwardly therefrom to define an interior, the chassis having an opening extending there through; a plastic part mechanically bonded to the metal of the chassis, the plastic part spanning the opening; and a support frame mounted at least partially within the housing such that the support frame increases rigidity of the housing.

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device, the patterning device being capable of imparting an EUV radiation beam with a grating in its cross-section to form a patterned EUV radiation beam, and a projection system configured to project the patterned EUV radiation beam onto a target portion of the substrate, wherein the support structure is provided with a grating comprising a series of first reflective portions which alternates with a series of second reflective portions, the second reflective portions having a reflectivity which is less than the reflectivity of at least part of the first reflective portions and which is greater than zero.

Abstract: Electronic devices with support frames and mechanically-bonded plastic and methods for forming such electronic devices are provided. A representative electronic device includes: a housing that incorporates: a metal chassis having a base and a sidewall extending outwardly therefrom to define an interior, the chassis having an opening extending there through; a plastic part mechanically bonded to the metal of the chassis, the plastic part spanning the opening; and a support frame mounted at least partially within the housing such that the support frame increases rigidity of the housing.

Abstract: Mobile devices with mechanically bonded connector assemblies and methods for forming such mobile devices are provided. A representative mobile device includes: a housing comprising a metal chassis; and a plastic connector assembly mechanically bonded to the metal of the chassis. A representative method includes: providing a metal chassis, the chassis defining an interior; and mechanically bonding a plastic connector assembly to the chassis, the connector being located within the interior.

Abstract: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.