Abstract: A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

Abstract: Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

Abstract: Disclosed are, inter alia, optical components that include an optical element (e.g., mirror) and at least three active-isolation mounts mounting the optical element to a frame (e.g., optical barrel or optical frame). An active-isolation mount has a non-contacting actuator connecting a respective location on the optical element to the frame and provides movability of the respective location relative to the frame in at least one direction. At least one displacement sensor is associated with each respective location on the optical element. The displacement sensors are sensitive to displacements of the respective locations in at least one respective direction and reference the displacements to an absolute reference. The actuators and sensors are connected to a servo control loop to provide feedback control.

Abstract: A precision assembly (210) for positioning a device (226) includes a stage (260) that retains the device (226), a dual mover assembly (228) that moves the stage (260), and the device (226) along a movement axis (266), a measurement system (222) and a control system (224). The dual mover assembly (228) includes a first mover (262) that moves the stage (260) along the movement axis (266) and a second mover (264) that moves the device (226) along the movement axis (266). The second mover (264) is rigidly coupled to the first mover (262) so that movement of the first mover (262) results in movement of the second mover (264). Further, the total output of the dual mover assembly (228) along the movement axis (266) is equal to the sum of the movement of the first mover (262) and the movement of the second mover (264). The measurement system (222) measures a movement position along the movement axis (266). The control system (224) controls the dual mover assembly (228) utilizing the movement position.

Abstract: Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: Methods, apparatus, and systems are disclosed for identifying force-ripple and/or side-forces in actuators used for moving a multiple-axis stage. The identified force-ripple and/or side-forces can be mapped, and maps of corresponding position-dependent compensation ratios useful for correcting same are obtained. The methods are especially useful for stages providing motion in at least one degree of freedom using multiple (redundant) actuators. In an exemplary method a stage member is displaced, using at least one selected actuator, multiple times over a set distance in the range of motion of the subject actuator(s). Each displacement has a predetermined trajectory and respective starting point in the range. For each displacement, respective section force-command(s) are extracted and normalized to a reference section force-command to define a section compensation-ratio.

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: A method and system for predicting a signal fluctuation due to a flow of gaseous fluid approximately transverse to an optical path between a stage and an interferometric measuring apparatus for determining a position of the stage in a direction of a stage movement. The method includes acquiring three interferometric signals of three parallel optical beams, lying within the flow of the gaseous fluid, reflected from predetermined portions of the stage, extracting a mutual signal fluctuation caused by fluctuations of the gaseous fluid properties from the three interferometric signals, and predicting a future fluctuation of the interferometric signals using a linear adaptive filter acting on the extracted mutual signal fluctuation. Prior to the processing with the adaptive filter, a low-pass filter removes high frequency stage motions, and an adaptive moving average algorithm removes low frequency stage motions.

Abstract: Embodiments of the invention relate to a cable force feedforward approach that takes into account the cable force in the counter-mass trajectory computation to reduce or eliminate vibration of the lens body caused by the cable force disturbance and corrective force exerted by the trim motors. In one embodiment, a method provides cable force feedforward control for a counter-mass of a stage with a cable connected to the counter-mass and using the cable force feedforward control to control one or more trim motors to produce a trim motor output force to be applied to the counter-mass, the counter-mass moving in response to a reaction force from movement of the stage.

Abstract: A projection optical device includes a projection optical system which projects an image of a pattern, a support device having a flexible structure to support the projection optical system, and a positioning device having an actuator to position the projection optical system. The projection optical device can include a frame to which one end of the flexible structure is attached. The projection optical system may hang from the frame via the support device, or it may be supported from below by the support device. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.

Abstract: Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing a second force of a second magnitude to the stage using a secondary actuator. The first force is arranged to cause the stage to translate along a first axis. The secondary actuator is also arranged to cause the stage to translate along the first axis, and has a relatively high positioning bandwidth. The first force is arranged to enable the stage to be relatively coarsely positioned and the second force is arranged to enable the stage to be relatively finely positioned. In one embodiment, the secondary actuator is one of a voice coil motor and a piezoelectric motor.

Abstract: “Hexapod” mountings are disclosed for use with optical elements. An exemplary mounting includes a base, a platform that is movable relative to the base, and six legs having nominally identical length. Three pairs of legs, having substantially equal stiffness, extend between the base and platform and support the platform relative to the base. In each pair of legs, respective first ends are coupled together in a ?-shaped manner forming a respective apex. Respective second ends are splayed relative to the apex, desirably forming an angle of substantially 109.5° at the apex. The apices are mounted equidistantly from each other on a circle on the platform. The respective second ends of the pairs of legs are mounted at respective locations on a circle on the base. The axes of each pair of legs define a respective leg plane substantially perpendicular to the base plane. Each leg has an actuator that, when energized, changes a length of the respective leg.

Abstract: Methods and apparatus for supporting the weight of a first stage of a stage apparatus using magnets are disclosed. According to one aspect of the present invention, and apparatus includes a first structure, a second structure, and an anti-gravity device. The anti-gravity device has a first magnet and a piston arrangement that includes a second magnet. The first magnet is coupled to the first structure, and the piston arrangement is movably interfaced with the second structure through an air bearing. The first magnet and the piston arrangement cooperate to support the first structure over the second structure relative to a vertical axis.

Abstract: A precision assembly (210) for positioning a device (226) includes a stage (260) that retains the device (226), a dual mover assembly (228) that moves the stage (260), and the device (226) along a movement axis (266), a measurement system (222) and a control system (224). The dual mover assembly (228) includes a first mover (262) that moves the stage (260) along the movement axis (266) and a second mover (264) that moves the device (226) along the movement axis (266). The second mover (264) is rigidly coupled to the first mover (262) so that movement of the first mover (262) results in movement of the second mover (264). Further, the total output of the dual mover assembly (228) along the movement axis (266) is equal to the sum of the movement of the first mover (262) and the movement of the second mover (264). The measurement system (222) measures a movement position along the movement axis (266). The control system (224) controls the dual mover assembly (228) utilizing the movement position.

Abstract: A stage assembly (220) for moving a device (200) includes a stage (208), and actuator pair (226) and a control system (224). The actuator pair (226) includes a first actuator (228) that is coupled to the stage (208). The first actuator (228) has a first E core (236) and a first I core (240) that is spaced apart a first gap (g1) from the first E core (236). The control system (224) directs current to the first actuator (228) to move the stage (208). In one embodiment, the amount of current directed to the first actuator (228) is determined utilizing a first parameter (a) that is added to the first gap (g1). The value of the first parameter (a) is determined by experimental testing. Additionally, the amount of current directed to the first actuator (228) can be determined utilizing a second parameter (b) that is added to the first gap (g1). The value of the second parameter (b) is determined by experimental testing.

Abstract: Methods and apparatus for isolating or separating a reticle stage arrangement from a lens assembly are disclosed. According to one aspect of the present invention, an apparatus includes a reticle stage assembly, a lens assembly, and an isolator assembly. The isolator assembly is arranged to substantially prevent vibrations from being transmitted from the reticle stage assembly to the lens assembly. In one embodiment, the apparatus also includes a frame structure that supports the lens assembly and the reticle stage assembly.

Abstract: Methods and apparatus for actively damping vibrations associated with a optical assembly of a photolithographic system are disclosed. According to one aspect of the present invention, an assembly that provides damping to a structure of a photolithographic apparatus that is subject to structural oscillations includes a counter mass, an active mechanism, an a controller. The active mechanism is coupled to the structure, supports the counter mass, and applies a force to the structure to counteract structural oscillations in the structure. The controller controls the force applied by the active mechanism on the structure, and utilizes information associated with movement of the structure to control the force.

Abstract: Embodiments of the present invention are directed to an apparatus for providing a low spring constant, pneumatic suspension using vacuum for the lens in a projection system. In one embodiment, a pneumatic suspension system for a load comprises a frame; and a body movably disposed in the frame and spaced from a side wall of the frame by a gap to define a chamber in the frame above the body, the body being configured to be connected to the load. The frame includes an outlet to draw a gas from the chamber to lower the pressure in the chamber with respect to an ambient pressure outside the frame. An air bearing is formed in the gap between the body and the side wall of the frame to provide non-contact between the body and the frame. The pressure in the chamber is sufficiently lower than the ambient pressure to produce a lift force to lift the body and the load connected thereto with respect to the frame.

Abstract: A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).