Patents by Inventor Bausan Yuan
Bausan Yuan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20040128918Abstract: A precision assembly (10) includes a stage assembly (220) having a first stage (208), a first mover assembly (210) and a control system (24). The first mover assembly (210) moves the first stage (208) during a first iteration (300) and a subsequent second iteration (302) having a similar movement to the first iteration (300). The first iteration (300) generates positioning data that is sent to the control system (24) to control the first mover assembly (210) to adjust movement of the first stage (208) during the second iteration (302) based on at least a portion of the positioning data from the first iteration (300). The positioning data can include the position of the first stage (208) along a first axis, a second axis and/or a third axis. The stage assembly can also include a second stage (206) and a second mover assembly (204) that moves the second stage (206) synchronously with the first stage (208).Type: ApplicationFiled: November 5, 2003Publication date: July 8, 2004Inventors: Pai-Hsueh Yang, Bausan Yuan, Susumu Makinouchi, Yoshiji Itakura, Kazuhiro Hirano, Hideyuki Hashimoto, Ryoichi Kawaguchi
-
Publication number: 20040046947Abstract: An adjuster assembly (12) that adjusts the location where an image (18) from an object (20) is transferred onto a device (16) includes an adjuster (54) and a stage mover assembly (244). The stage mover assembly (244) adjusts the position of the adjuster (54). This moves the position where the image (18) is transferred onto the device (16). The adjuster assembly (12) can include a damper assembly (250) that is coupled to the stage mover assembly (244) and reduces the effect of vibration from the stage mover assembly (244) causing vibration on the rest of the apparatus.Type: ApplicationFiled: March 26, 2002Publication date: March 11, 2004Inventors: Bausan Yuan, Martin Lee, Takeshi Asami
-
Patent number: 6686990Abstract: A positioning method in which a system performs operations relative to areas on a substrate by a series of relative movements between the system and substrate scanning exposures. The method includes the steps of disposing a first area relative to a system performing an operation relative to the first area, and moving the substrate from a first position where the first operation relative to the first area has finished to a second position where a second operation relative to a second area is to start, and synchronously moving the system from a third position where the first operation relative to the first area has finished to a fourth position where the second operation relative to the second area is to start. An acceleration of the substrate during movement from the first position to the second position and an acceleration of the system during movement from the third position to the fourth position continually have absolute values greater than zero.Type: GrantFiled: November 30, 2000Date of Patent: February 3, 2004Assignee: Nikon Corporation, Inc.Inventors: Andrew J. Hazelton, Bausan Yuan
-
Patent number: 6646719Abstract: A support assembly (12) for an exposure apparatus (10) is provided herein. The support assembly (12) supports the components of the exposure apparatus (10) above a mounting base (32). The exposure apparatus (10) includes noisy components (42) and quiet components (44). The support assembly (12) includes an outer frame (34) and an inner frame (36). As provided herein, the outer frame (34) supports some of the components of the exposure apparatus (10) and the inner frame (36) supports some of the components of the exposure apparatus (10). Preferably, the outer frame (34) is used to support the quiet components (44) while the inner frame (36) is used to support the noisy components (42). Uniquely, a portion of the inner frame (36) is positioned within a portion of the outer frame (34). As a result of this design, both frames (34) (36) can effectively be mounted at the same mounting locations 37 of the mounting base (32). Further, the overall space taken up by the frames (34) (36) is minimized.Type: GrantFiled: January 31, 2001Date of Patent: November 11, 2003Assignee: Nikon CorporationInventors: Martin E. Lee, Bausan Yuan, Yutaka Hayashi
-
Patent number: 6590639Abstract: An active vibration isolation system includes a pneumatic control system and an electronic control system. The pneumatic control system supports a mass sensitive to vibration and isolates the mass from high frequency external disturbances. The electronic control system isolates the mass from low frequency external disturbances. The pneumatic control system includes a compliance chamber filled with a fluid to pneumatically support the mass, apparatus for directly measuring a pressure level in the compliance chamber, and apparatus for controlling the pressure level to minimize the effects of pressure variation in the compliance chamber. The measuring apparatus includes an instrument to measure an absolute pressure level of the compliance chamber or an instrument to measure a differential pressure level between the compliance chamber and a reference chamber having a predetermined pressure level.Type: GrantFiled: September 15, 2000Date of Patent: July 8, 2003Assignee: Nikon CorporationInventors: Bausan Yuan, Michael Binnard, Martin Lee
-
Publication number: 20030111912Abstract: In electric motor assemblies, separating the x and y coils may achieve significant advantages. An advantageous design includes pairs of interacting magnet array/coil arrays. Separated coil arrays are provided, with a coil array on an arm connected to a following stage, and another coil array on a stage base (the stage being one to which is attached magnet arrays). Positioning devices, moving magnet motor assemblies, moving coil motor assemblies, and methods of driving a stage are provided. By differential driving and creation of torques about the x and y axes, a stage may be driven in six independent degrees of freedom.Type: ApplicationFiled: December 19, 2001Publication date: June 19, 2003Inventors: Michael Binnard, Bausan Yuan
-
Publication number: 20030102721Abstract: A control system for a moving coil type planar motor is disclosed that operates with a commutation circuit requiring a decreased number of amplifiers as compared to moving magnet type planar motors. The control system permits positioning with three degrees of freedom. Motor force and torque ripple during translational forces and yaw torque is minimized by the control system.Type: ApplicationFiled: December 4, 2001Publication date: June 5, 2003Inventors: Toshio Ueta, Bausan Yuan
-
Publication number: 20030102722Abstract: A control system for a moving magnet type planar motor is disclosed that permits positioning with three degrees of freedom. Motor force ripple compensation is achievable with the control system, and cross coupling between translation forces and torque is substantially decreased.Type: ApplicationFiled: December 4, 2001Publication date: June 5, 2003Inventors: Toshio Ueta, Bausan Yuan, Ting-Chien Teng
-
Publication number: 20030097205Abstract: This invention provides a platform and stage support apparatus and method that isolates the platform from vibration and maintains platform position within an exposure apparatus while the stage is moved about. The apparatus includes a base, platform, stage, pneumatic and electromagnetic supports from the base to the stage, and a controller for positioning the platform in response to data from stage and platform position sensors and pneumatic support pressure sensors. The method includes using a model that provides a target pressure for each pneumatic support in response to an input stage location. The apparatus and method use the pneumatic supports to carry the majority of platform and stage weight, thus requiring less force from the electromagnetic supports to maintain a desired platform position.Type: ApplicationFiled: November 20, 2001Publication date: May 22, 2003Inventors: Bausan Yuan, Ting-Chien Teng, Katsumi Toma
-
Patent number: 6509953Abstract: A high-precision scanning positioning system with magnification and orthogonality correction. A scanning position system, such as a microlithographic system, has a mask fine stage and a plate fine stage mounted on a coarse stage that moves at a constant velocity during exposure. By moving one fine stage relative to the other fine stage in the same or opposite direction of the scan during the exposure of the plate, an increase or decrease in magnification may be achieved. Likewise, by moving one fine stage relative to the other fine stage perpendicular to the direction of the scan during the exposure, a change in orthogonality may be achieved, and by rotating one fine stage relative to the other, correction of any rotation error may be achieved.Type: GrantFiled: February 9, 1998Date of Patent: January 21, 2003Assignee: Nikon CorporationInventors: Kazuaki Saiki, Bausan Yuan
-
Patent number: 6486941Abstract: A stage assembly (10) for moving and positioning a device (24) includes a stage base (12), a first stage frame (40), and a second stage frame (66). The stage assembly (10) also includes a pair of X movers (82) (84), and a first stage Y mover (86) that precisely move the first stage frame (40) relative to the stage base (12). Uniquely, the first stage frame (40) is guideless along the X axis, along the Y axis and about the Z axis. With this design, movers (82) (84) (86) can precisely control the position of the first stage frame (40) along the X axis, along the Y axis and about the Z axis. Further, current to the X movers (82) (84) is varied according to the position of the second stage frame (66) relative to the first stage frame (40). These features allow for more accurate positioning of the device (24) by the stage assembly (10) and better performance of the stage assembly (10).Type: GrantFiled: April 24, 2000Date of Patent: November 26, 2002Assignee: Nikon CorporationInventors: Andrew J. Hazelton, Bausan Yuan
-
Patent number: 6472777Abstract: In a stage assembly, for instance a fine stage using a pair of push-pull electro-magnetic actuators to move the stage back and forth along an axis, there is typically a sensor to determine the actual stage location. This sensor's home position must correspond to the actual stage position where the two opposed actuators are observed to exert forces of the same magnitude but opposing directions on this stage. Since the actuators depend on the sensor reading to exert their forces correctly, misalignment of the home position will decrease system performance. The calibration of this sensor is accomplished using actual system feedback signals, which are the currents drawn by the two opposed actuators, during run time conditions. The sensor is considered calibrated (meaning a virtual “null” position) when each of the two opposed actuators draws the same amount of current. If this is not the case a feedback process calibrates the sensor.Type: GrantFiled: March 14, 2000Date of Patent: October 29, 2002Assignee: Nikon CorporationInventors: Ting-Chien Teng, Bausan Yuan
-
Publication number: 20020137358Abstract: A device stage assembly (10) for positioning a device (26) is provided herein. The device stage assembly (10) includes a mover housing (44), a device stage (14), a support assembly (18), and a control system (22). The support assembly (18) moves the device stage (14) relative to the mover housing (44) under the control of the control system (22). Uniquely, the support assembly (18) includes at least four, spaced apart Z device stage movers (84), (86), (88), (90) that move the device stage (14) relative to the mover housing (44). Further, the control system (22) controls the Z device stage movers (84), (86), (88), (90) to inhibit dynamic and static deformation of the device stage (14) during movement of the device stage (14). Further, the four Z device stage movers (84), (86), (88), (90) distribute forces on the device stage (14) in a way that more closely matches the gravitational and inertial loads on the device stage (14).Type: ApplicationFiled: February 8, 2001Publication date: September 26, 2002Inventors: Mike Binnard, Kazuya Ono, Bausan Yuan, Martin E. Lee
-
Publication number: 20020102481Abstract: A support assembly (12) for an exposure apparatus (10) is provided herein. The support assembly (12) supports the components of the exposure apparatus (10) above a mounting base (32). The exposure apparatus (10) includes noisy components (42) and quiet components (44). The support assembly (12) includes an outer frame (34) and an inner frame (36). As provided herein, the outer frame (34) supports some of the components of the exposure apparatus (10) and the inner frame (36) supports some of the components of the exposure apparatus (10). Preferably, the outer frame (34) is used to support the quiet components (44) while the inner frame (36) is used to support the noisy components (42). Uniquely, a portion of the inner frame (36) is positioned within a portion of the outer frame (34). As a result of this design, both frames (34) (36) can effectively be mounted at the same mounting locations 37 of the mounting base (32). Further, the overall space taken up by the frames (34) (36) is minimized.Type: ApplicationFiled: January 31, 2001Publication date: August 1, 2002Inventors: Martin E. Lee, Bausan Yuan
-
Publication number: 20020093637Abstract: A stage assembly and support system are provided to stabilize a stage base, such as a wafer stage base or a reticle stage base, minimizing forces transmitted from the stage assembly to a stationary surface, such as the ground, and thereby preventing vibration of other parts or systems in a wafer manufacturing process. Depending of the applicable photolithography system, a reticle stage and/or a wafer stage are accelerated in response to a wafer manufacturing control system to position the semiconductor substrates. The jerking motions of the reticle stage and/or wafer stage cause reaction forces acting on the reticle stage base and/or wafer stage base. The reaction forces induce vibration to the stationary surface and surrounding parts of the photolithography system. The wafer stage assembly and support system according to this invention allow the reticle stage base and/or wafer stage base to move relative the stationary surface.Type: ApplicationFiled: January 16, 2001Publication date: July 18, 2002Inventors: Bausan Yuan, Michael Binnard
-
Patent number: 6320345Abstract: A command trajectory drives a stage to produce a smooth motion while minimizing any vibrations or oscillations of the structure. The command trajectory provides an acceleration and a deceleration that have derivatives, known as the jerk, equal to zero at the beginning and end of the acceleration and deceleration periods. Because the jerk is equal to zero at the beginning and end of acceleration and deceleration, the influence of the reactive forces on the positioning system's structure is reduced, thereby minimizing oscillation of the structure. Moreover, the jerk is continuous throughout the acceleration and deceleration periods, resulting in a smooth continuous motion of the stage. The jerk on the stage during acceleration and deceleration has an adjustable duration to reduce the structural disturbances and decrease settling time.Type: GrantFiled: March 5, 1998Date of Patent: November 20, 2001Assignee: Nikon CorporationInventors: Bausan Yuan, Kazuaki Saiki, Henry Kwok Pang Chau
-
Publication number: 20010021009Abstract: A method and apparatus for controlling trajectory in a scan and step wafer stepper are described. A control computer controls the motion of a stage by accelerating the stage during an acceleration period. The computer commands the stage to move at a constant velocity during a working period that starts after an end of the acceleration period, so that acceleration of the stage is continuous at the endpoints of the acceleration period. The stage is accelerated and moved so that jerk of the stage is zero and continuous at the endpoints of the acceleration period. The stage may be adapted to support a workpiece. The workpiece may be a semiconductor wafer, in which case the computer causes the wafer to be exposed to radiation during the working period.Type: ApplicationFiled: August 28, 1998Publication date: September 13, 2001Inventors: BAUSAN YUAN, JAMES MINOR
-
Patent number: 6287735Abstract: A method and apparatus for controlling the leveling table of a wafer stage is described. More generally, the invention includes control circuitry for controlling motion of a stage, where the stage is adapted to support a workpiece. The control circuitry measures position in a vicinity of the workpiece. Based upon the measured position, the control circuitry drives the stage toward a target position while accounting for nonlinear dynamics of the stage. The nonlinear dynamics may include inertia, in which case the control circuitry adaptively estimates the inertia of the stage. The nonlinear dynamics may also include tilt due to acceleration or deceleration of the stage, in which case the circuitry adaptively estimates the tilt of the stage. The stage may generally travel in a plane, and the circuitry measures position in a direction orthogonal to the plane. The circuitry may measure the position of the workpiece itself, or the position of an upper surface of the stage.Type: GrantFiled: September 16, 1998Date of Patent: September 11, 2001Assignee: Nikon CorporationInventor: Bausan Yuan
-
Patent number: 6285438Abstract: A positioning method in which a system performs operations relative to areas on a substrate by a series of relative movements between the system and substrate scanning exposures. The method includes the steps of disposing a first area relative to a system performing an operation relative to the first area, and moving the substrate from a first position where the first operation relative to the first area has finished to a second position where a second operation relative to a second area is to start, and synchronously moving the system from a third position where the first operation relative to the first area has finished to a fourth position where the second operation relative to the second area is to start. An acceleration of the substrate during movement from the first position to the second position and an acceleration of the system during movement from the third position to the fourth position continually have absolute values greater than zero.Type: GrantFiled: May 19, 1999Date of Patent: September 4, 2001Assignee: Nikon CorporationInventors: Andrew J. Hazelton, Bausan Yuan
-
Patent number: 6260282Abstract: A positioning system used, by way of example, for lithography, uses the position of the wafer stage as the trajectory command for the reticle fine stage control circuit. The reticle fine stage position is combined with the position of the wafer stage to generate a synchronous error. The reticle fine stage control circuit uses a Jacobian differential transformation to convert the synchronous error into an positional error for the center of gravity of the reticle fine stage. Thus, any inaccuracies due to measurement errors caused by rotation of reticle fine stage are avoided. A controller filter circuit uses the positional error for the center of gravity to calculate the force on the center of gravity that will minimize the synchronous error. The controller filter circuit includes saturation limited integration behavior that minimizes the settling time. A feedforward loop also generates a feedforward force, which reduces settling time, and is combined with the force signal from the controller filter.Type: GrantFiled: March 27, 1998Date of Patent: July 17, 2001Assignee: Nikon CorporationInventors: Bausan Yuan, Susumu Makinouchi, Hideyaki Hashimoto