Abstract: Embodiments of the invention relate to a cable force feedforward approach that takes into account the cable force in the counter-mass trajectory computation to reduce or eliminate vibration of the lens body caused by the cable force disturbance and corrective force exerted by the trim motors. In one embodiment, a method provides cable force feedforward control for a counter-mass of a stage with a cable connected to the counter-mass and using the cable force feedforward control to control one or more trim motors to produce a trim motor output force to be applied to the counter-mass, the counter-mass moving in response to a reaction force from movement of the stage.

Abstract: Embodiments of the present invention are directed to compensating for force ripple of an apparatus driven by a force produced by a linear motor. In one embodiment, a method of compensating for force ripple comprises generating force commands for a trajectory starting at a plurality of starting positions of the apparatus driven by the linear motor to produce different trajectory motions based on the same trajectory at the plurality of starting positions, the force commands each including peaks of large acceleration/deceleration and valleys of low force levels; calculating an average of the force commands during large acceleration/deceleration generated based on trajectory motions for the plurality of starting positions; calculating a variation ratio of the force command for each trajectory motion to the calculated average of the force commands; and compensating for force ripple in the apparatus based on the calculated variation ratio to control the force applied by the linear motor to the apparatus.

Abstract: An adjuster assembly (12) that adjusts the location where an image (18) from an object (20) is transferred onto a device (16) includes an adjuster (54) and a stage mover assembly (244). The stage mover assembly (244) adjusts the position of the adjuster (54). This moves the position where the image (18) is transferred onto the device (16). The adjuster assembly (12) can include a damper assembly (250) that is coupled to the stage mover assembly (244) and reduces the effect of vibration from the stage mover assembly (244) causing vibration on the rest of the apparatus.

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: A stage assembly (220) for moving a device (200) includes a stage (208), an attraction-only type actuator pair (426) that moves the stage (208), and a control system (24). In one embodiment, the actuator pair (426) includes a first electromagnet (436F), a first conductor (438F) and a first target (440F) having a first target surface (442F). The actuator pair also includes a second electromagnet (436S), a second conductor (438S) and a second target (440S) having a second target surface (442S). The first electromagnet (436F) is positioned at a first angle ?1 relative to a first target surface (442F) and the second electromagnet (436S) is positioned at a second angle ?2 relative to the second target surface (442S). The control system (24) directs a first current to one or more of the electromagnets based on at least one of the angles ?1, ?2. Further, one or more electromagnets (436) can include a first measurement point and a second measurement point.

Abstract: A stage assembly (220) includes a stage base (202) having a guide surface (203), a first stage (206), a second stage (208), and a first mover subassembly (216) including a first mover (231) and a second mover (232) that are arranged in series. The stage base (202) supports the first stage (206), which moves relative to the stage base (202). The movers (231, 232) cooperate to move the second stage (208) relative to the first stage (206). The movers (231, 232) can include one or more attraction-only type actuators. The movers (231, 232) cooperate to move the second stage (208) along an axis that is substantially perpendicular to the guide surface (203). The stage assembly (220) can also include a second mover subassembly (216) that cooperates with the first mover subassembly (216) to move the second stage (208) with two or more degrees of freedom relative to the first stage (206). Further, the first mover (231) can directly move a portion of the second mover (232).

Abstract: Methods and apparatus for isolating or separating a reticle stage arrangement from a lens assembly are disclosed. According to one aspect of the present invention, an apparatus includes a reticle stage assembly, a lens assembly, and an isolator assembly. The isolator assembly is arranged to substantially prevent vibrations from being transmitted from the reticle stage assembly to the lens assembly. In one embodiment, the apparatus also includes a frame structure that supports the lens assembly and the reticle stage assembly.

Abstract: A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).

Abstract: Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing a second force of a second magnitude to the stage using a secondary actuator. The first force is arranged to cause the stage to translate along a first axis. The secondary actuator is also arranged to cause the stage to translate along the first axis, and has a relatively high positioning bandwidth. The first force is arranged to enable the stage to be relatively coarsely positioned and the second force is arranged to enable the stage to be relatively finely positioned. In one embodiment, the secondary actuator is one of a voice coil motor and a piezoelectric motor.

Abstract: A stage assembly and support system are provided to stabilize a stage base, such as a wafer stage base or a reticle stage base, minimizing forces transmitted from the stage assembly to a stationary surface, such as the ground, and thereby preventing vibration of other parts or systems in a wafer manufacturing process. Depending of the applicable photolithography system, a reticle stage and/or a wafer stage are accelerated in response to a wafer manufacturing control system to position the semiconductor substrates. The jerking motions of the reticle stage and/or wafer stage cause reaction forces acting on the reticle stage base and/or wafer stage base. The reaction forces induce vibration to the stationary surface and surrounding parts of the photolithography system. The wafer stage assembly and support system according to this invention allow the reticle stage base and/or wafer stage base to move relative the stationary surface.

Abstract: Embodiments of the present invention are directed to an apparatus and a method for through lens measurement for a projection system. In one embodiment, an apparatus for through lens image measurement comprises a projection lens housing containing lens elements therein, and a reflective member having a center of curvature on a first plane. The reflective member is attached to the lens housing. An optical system includes a light source, a position detector, and one or more optical elements. The optical system is attached to the lens housing and configured to direct a light from the light source through the lens elements to the reflective member which reflects the light back through the lens elements and toward the position detector. The position detector is configured to detect any image shift at the first plane due to misalignment of the lens elements with respect to the lens housing.

Abstract: A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.

Abstract: Embodiments of the present invention are directed to a control system and method for controlling the trajectory and alignment of one or more stages by incorporating a grouping method in the control methodology. In one embodiment, a method of controlling movement of one or more stages of a precision assembly to process a substrate having a plurality of process regions comprises dividing the substrate into blocks according to one or more preset criteria, each block of the substrate including one or more process regions; generating learning data for one or more representative process regions for each block of the substrate; and using the generated learning data of the one or more representative process regions of each block to control movement of the one or more stages to process the block of one or more process regions of the substrate.

Abstract: A stage assembly (220) for moving a device (200) includes a stage (208), and actuator pair (226) and a control system (224). The actuator pair (226) includes a first actuator (228) that is coupled to the stage (208). The first actuator (228) has a first E core (236) and a first I core (240) that is spaced apart a first gap (g1) from the first E core (236). The control system (224) directs current to the first actuator (228) to move the stage (208). In one embodiment, the amount of current directed to the first actuator (228) is determined utilizing a first parameter (a) that is added to the first gap (g1). The value of the first parameter (a) is determined by experimental testing. Additionally, the amount of current directed to the first actuator (228) can be determined utilizing a second parameter (b) that is added to the first gap (g1). The value of the second parameter (b) is determined by experimental testing.

Abstract: Methods and apparatus for applying a uniform polishing pressure on a wafer are disclosed. According to one aspect of the present invention, a chemical mechanical planarization polishing apparatus includes a polishing pad, a wafer holder, and a force control system. The wafer holder supports a wafer to be polished using the polishing pad. The polishing pad is arranged to move relative to the wafer holder such that an area of contact between the wafer holder and the polishing pad varies. The force control system including a controller and a plurality of actuators that apply forces to the polishing pad. The controller controls the forces as the area of contact varies to substantially maintain a first polishing pressure on the wafer arranged to be supported by the wafer holder.

Abstract: An actuator assembly (432) for positioning a pad (48) includes a first actuator assembly (440), a second actuator subassembly (442) and a control system (524). In one embodiment, the first actuator subassembly (440) includes a first core (502), and a conductor (504) secured to the first core (502), and the second actuator subassembly (442) includes a second core (506) spaced apart a component gap (444) from the first core (502). Further, the control system (524) directs current to the conductor (504) to attract the second core (506) to the first core (502). In one embodiment, the amount of current directed to the conductor (504) is calculated without measuring the component gap (444).

Abstract: A stage assembly (220) for moving a device (200) includes a stage (208), an attraction-only type actuator pair (426) that moves the stage (208), and a control system (24). In one embodiment, the actuator pair (426) includes a first electromagnet (436F), a first conductor (438F) and a first target (440F) having a first target surface (442F). The actuator pair also includes a second electromagnet (436S), a second conductor (438S) and a second target (440S) having a second target surface (442S). The first electromagnet (436F) is positioned at a first angle ?1 relative to a first target surface (442F) and the second electromagnet (436S) is positioned at a second angle ?2 relative to the second target surface (442S). The control system (24) directs a first current to one or more of the electromagnets based on at least one of the angles ?1, ?2. Further, one or more electromagnets (436) can include a first measurement point and a second measurement point.

Abstract: In electric motor assemblies, separating the x and y coils may achieve significant advantages. An advantageous design includes pairs of interacting magnet array/coil arrays. Separated coil arrays are provided, with a coil array on an arm connected to a following stage, and another coil array on a stage base (the stage being one to which is attached magnet arrays). Positioning devices, moving magnet motor assemblies, moving coil motor assemblies, and methods of driving a stage are provided. By differential driving and creation of torques about the x and y axes, a stage may be driven in six independent degrees of freedom.

Abstract: An actuator assembly (432) for positioning a pad (48) includes a first actuator assembly (440), a second actuator subassembly (442) and a control system (524). In one embodiment, the first actuator subassembly (440) includes a first core (502), and a conductor (504) secured to the first core (502), and the second actuator subassembly (442) includes a second core (506) spaced apart a component gap (444) from the first core (502). Further, the control system (524) directs current to the conductor (504) to attract the second core (506) to the first core (502). In one embodiment, the amount of current directed to the conductor (504) is calculated without measuring the component gap (444).

Abstract: A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.