Patents by Inventor Bi-Ming Yen
Bi-Ming Yen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240021446Abstract: The present disclosure relates to an apparatus for wafer cleaning. The apparatus includes an enclosure made of a noncombustible material, a wafer holder, a cleaning nozzle, at least one sensor, and an exhaust unit. The wafer holder can hold and heat a wafer. The cleaning nozzle can supply a flow of a cleaning fluid onto a surface of the wafer. The at least one sensor can detect attributes of the wafer. The exhaust unit can expel a vapor generated by the cleaning fluid in the enclosure. The exhaust unit can include a rinse nozzle to rinse the vapor passing through the exhaust unit with a mist.Type: ApplicationFiled: July 31, 2023Publication date: January 18, 2024Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jieh-Chau HUANG, Ying Ting Hsia, Ping-Jung Huang, Pei Yen Hsia, Bi-Ming Yen, Hung-Lung Hu
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Publication number: 20230369056Abstract: Embodiments of the present disclosure relates to a wet bench processing including an in-situ pre-treatment prior to performing the first set of wet bench operations. The pre-treatment may include a pre-clean operation and/or a pre-heat operation. The pre-treatment may be performed in one of the existing ONB tanks without requiring adding new tanks to an existing wet bench tool. The pre-clean operation removes particles from a batch of wafers to avoid or reduce cross-contamination and defect issues, thus improving the yield rate of the wet bench process. The pre-heat operation provides better control and stabilize the temperature in the CHB tank to stabilize the process, such as to stabilize an etch rate.Type: ApplicationFiled: May 12, 2022Publication date: November 16, 2023Inventors: Chung-Wei CHANG, Bo-Wei CHOU, Chin-Ming LIN, Ping-Jung HUANG, Pi-Chun YU, Bi-Ming YEN, Peng SHEN
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Patent number: 11764081Abstract: The present disclosure relates to an apparatus for wafer cleaning. The apparatus includes an enclosure made of a noncombustible material, a wafer holder, a cleaning nozzle, at least one sensor, and an exhaust unit. The wafer holder can hold and heat a wafer. The cleaning nozzle can supply a flow of a cleaning fluid onto a surface of the wafer. The at least one sensor can detect attributes of the wafer. The exhaust unit can expel a vapor generated by the cleaning fluid in the enclosure. The exhaust unit can include a rinse nozzle to rinse the vapor passing through the exhaust unit with a mist.Type: GrantFiled: June 17, 2021Date of Patent: September 19, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jieh-Chau Huang, Bi-Ming Yen, Hung-Lung Hu, Ying Ting Hsia, Ping-Jung Huang, Pei Yen Hsia
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Patent number: 11495684Abstract: An embodiment method includes forming a patterned etch mask over a target layer and patterning the target layer using the patterned etch mask as a mask to form a patterned target layer. The method further includes performing a first cleaning process on the patterned etch mask and the patterned target layer, the first cleaning process including a first solution. The method additionally includes performing a second cleaning process to remove the patterned etch mask and form an exposed patterned target layer, the second cleaning process including a second solution. The method also includes performing a third cleaning process on the exposed patterned target layer, and performing a fourth cleaning process on the exposed patterned target layer, the fourth cleaning process comprising the first solution.Type: GrantFiled: April 27, 2020Date of Patent: November 8, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chun-Han Chu, Nai-Chia Chen, Ping-Jung Huang, Tsung-Min Chuo, Jui-Ming Shih, Bi-Ming Yen
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Publication number: 20210313200Abstract: The present disclosure relates to an apparatus for wafer cleaning. The apparatus includes an enclosure made of a noncombustible material, a wafer holder, a cleaning nozzle, at least one sensor, and an exhaust unit. The wafer holder can hold and heat a wafer. The cleaning nozzle can supply a flow of a cleaning fluid onto a surface of the wafer. The at least one sensor can detect attributes of the wafer. The exhaust unit can expel a vapor generated by the cleaning fluid in the enclosure. The exhaust unit can include a rinse nozzle to rinse the vapor passing through the exhaust unit with a mist.Type: ApplicationFiled: June 17, 2021Publication date: October 7, 2021Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jieh-Chau HUANG, Bi-Ming YEN, Hung-Lung HU, Ying Ting HSIA, Ping-Jing HUANG, Pei Yen HSIA
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Patent number: 11056358Abstract: The present disclosure describes an apparatus for wafer cleaning. The apparatus includes an enclosure made of a noncombustible material, a wafer holder, a cleaning nozzle, at least one sensor, and an exhaust unit. The wafer holder can hold and heat a wafer. The cleaning nozzle can supply a flow of a cleaning fluid onto a surface of the wafer. The at least one sensor can detect attributes of the wafer. The exhaust unit can expel a vapor generated by the cleaning fluid in the enclosure. The exhaust unit can include a rinse nozzle to rinse the vapor passing through the exhaust unit with a mist.Type: GrantFiled: August 10, 2018Date of Patent: July 6, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Jieh-Chau Huang, Bi-Ming Yen, Hung-Lung Hu, Ying Ting Hsia, Ping-Jung Huang, Pei Yen Hsia
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Publication number: 20200259017Abstract: An embodiment method includes forming a patterned etch mask over a target layer and patterning the target layer using the patterned etch mask as a mask to form a patterned target layer. The method further includes performing a first cleaning process on the patterned etch mask and the patterned target layer, the first cleaning process including a first solution. The method additionally includes performing a second cleaning process to remove the patterned etch mask and form an exposed patterned target layer, the second cleaning process including a second solution. The method also includes performing a third cleaning process on the exposed patterned target layer, and performing a fourth cleaning process on the exposed patterned target layer, the fourth cleaning process comprising the first solution.Type: ApplicationFiled: April 27, 2020Publication date: August 13, 2020Inventors: Chun-Han Chu, Nai-Chia Chen, Ping-Jung Huang, Tsung-Min Chuo, Jui-Ming Shih, Bi-Ming Yen
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Patent number: 10636908Abstract: An embodiment method includes forming a patterned etch mask over a target layer and patterning the target layer using the patterned etch mask as a mask to form a patterned target layer. The method further includes performing a first cleaning process on the patterned etch mask and the patterned target layer, the first cleaning process including a first solution. The method additionally includes performing a second cleaning process to remove the patterned etch mask and form an exposed patterned target layer, the second cleaning process including a second solution. The method also includes performing a third cleaning process on the exposed patterned target layer, and performing a fourth cleaning process on the exposed patterned target layer, the fourth cleaning process comprising the first solution.Type: GrantFiled: November 30, 2018Date of Patent: April 28, 2020Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun-Han Chu, Nai-Chia Chen, Ping-Jung Huang, Tsung-Min Chuo, Jui-Ming Shih, Bi-Ming Yen
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Patent number: 10553720Abstract: An embodiment method includes forming a patterned etch mask over a target layer and patterning the target layer using the patterned etch mask as a mask to form a patterned target layer. The method further includes performing a first cleaning process on the patterned etch mask and the patterned target layer, the first cleaning process including a first solution. The method additionally includes performing a second cleaning process to remove the patterned etch mask and form an exposed patterned target layer, the second cleaning process including a second solution. The method also includes performing a third cleaning process on the exposed patterned target layer, and performing a fourth cleaning process on the exposed patterned target layer, the fourth cleaning process comprising the first solution.Type: GrantFiled: October 27, 2017Date of Patent: February 4, 2020Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun-Han Chu, Nai-Chia Chen, Jui-Ming Shih, Ping-Jung Huang, Tsung-Min Chuo, Bi-Ming Yen
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Publication number: 20190148181Abstract: The present disclosure relates to an apparatus for wafer cleaning. The apparatus includes an enclosure made of a noncombustible material, a wafer holder, a cleaning nozzle, at least one sensor, and an exhaust unit. The wafer holder can hold and heat a wafer. The cleaning nozzle can supply a flow of a cleaning fluid onto a surface of the wafer. The at least one sensor can detect attributes of the wafer. The exhaust unit can expel a vapor generated by the cleaning fluid in the enclosure. The exhaust unit can include a rinse nozzle to rinse the vapor passing through the exhaust unit with a mist.Type: ApplicationFiled: August 10, 2018Publication date: May 16, 2019Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jieh-Chau HUANG, Bi-Ming YEN, Hung-Lung HU, Ying Ting HSIA, Ping-Jung HUANG, Pei Yen HSIA
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Publication number: 20190097052Abstract: An embodiment method includes forming a patterned etch mask over a target layer and patterning the target layer using the patterned etch mask as a mask to form a patterned target layer. The method further includes performing a first cleaning process on the patterned etch mask and the patterned target layer, the first cleaning process including a first solution. The method additionally includes performing a second cleaning process to remove the patterned etch mask and form an exposed patterned target layer, the second cleaning process including a second solution. The method also includes performing a third cleaning process on the exposed patterned target layer, and performing a fourth cleaning process on the exposed patterned target layer, the fourth cleaning process comprising the first solution.Type: ApplicationFiled: November 30, 2018Publication date: March 28, 2019Inventors: Chun-Han Chu, Nai-Chia Chen, Ping-Jung Huang, Tsung-Min Chuo, Jui-Ming Shih, Bi-Ming Yen
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Publication number: 20180151735Abstract: An embodiment method includes forming a patterned etch mask over a target layer and patterning the target layer using the patterned etch mask as a mask to form a patterned target layer. The method further includes performing a first cleaning process on the patterned etch mask and the patterned target layer, the first cleaning process including a first solution. The method additionally includes performing a second cleaning process to remove the patterned etch mask and form an exposed patterned target layer, the second cleaning process including a second solution. The method also includes performing a third cleaning process on the exposed patterned target layer, and performing a fourth cleaning process on the exposed patterned target layer, the fourth cleaning process comprising the first solution.Type: ApplicationFiled: October 27, 2017Publication date: May 31, 2018Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun-Han Chu, Nai-Chia Chen, Jui-Ming Shih, Ping-Jung Huang, Tsung-Min Chuo, Bi-Ming Yen
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Patent number: 9733570Abstract: Systems and methods are provided for forming features through photolithography. A polymer layer is formed over a substrate. The polymer layer is patterned to form a first feature and a second feature, the first feature and the second feature being separated at a first distance. A rinse material is applied to the polymer layer including the first feature and the second feature. The rinse material is removed from the polymer layer including the first feature and the second feature to cause the first feature and the second feature to come into contact with each other. A third feature is formed based on the first feature and the second feature being in contact with each other.Type: GrantFiled: October 15, 2015Date of Patent: August 15, 2017Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Chun-Liang Tai, Bi-Ming Yen, Chun-Hung Lee, De-Fang Chen
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Patent number: 9601333Abstract: A method includes providing a semiconductor substrate; forming a doping oxide layer on the semiconductor substrate; forming a patterning layer on the doping oxide layer, the patterning layer leaving exposed regions of the doping oxide layer; performing a sputtering process to the substrate; and after the sputtering process, performing a wet etching process to the semiconductor substrate to remove the doping oxide layer from the exposed regions.Type: GrantFiled: October 2, 2014Date of Patent: March 21, 2017Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ming-Hsi Yeh, Yih-Ann Lin, Bi-Ming Yen, Chao-Cheng Chen, Syun-Ming Jang
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Patent number: 9589798Abstract: A method of forming a semiconductor device includes forming a dielectric layer over a substrate. The method includes forming a layer set over the dielectric layer, wherein the layer set comprises a plurality of layers. The method further includes forming a bottom antireflective coating (BARC) layer over the layer set. The method further includes etching the layer set to form a tapered opening in the layer set, wherein etching the layer set comprises etching at least one layer comprising a silicon-rich photoresist material layer and a second material layer different from the silicon-rich photoresist material, and the tapered opening has sidewalls at an angle with respect to a top surface of the dielectric layer. The method further includes etching the dielectric layer using the layer set as a mask to form an opening in the dielectric layer, wherein etching the dielectric layer comprises reducing a thickness of the layer set.Type: GrantFiled: September 30, 2015Date of Patent: March 7, 2017Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Tsai-Chun Li, Bi-Ming Yen
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Patent number: 9455156Abstract: A method of making a semiconductor device includes forming an intermediate semiconductor device. The intermediate device includes a substrate; and a dielectric layer over the substrate. The intermediate device includes a first layer set, including a silicon-rich photoresist material, over the dielectric layer. The intermediate device includes a second layer set, including a carbon-rich organic material layer, over the first layer set. The method further includes etching the second layer set to form a tapered opening in the second layer set. The method further includes etching the first layer set to form an opening in the first layer set, wherein etching the first layer set comprises removing the carbon-rich organic material layer. The method further includes etching the dielectric layer using the first layer set as a mask to form an opening in the dielectric layer, wherein etching the dielectric layer comprises reducing a thickness of the first layer set.Type: GrantFiled: September 24, 2015Date of Patent: September 27, 2016Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Bi-Ming Yen, Tsai-Chun Li, Chun-Ming Hu
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Publication number: 20160099151Abstract: A method includes providing a semiconductor substrate; forming a doping oxide layer on the semiconductor substrate; forming a patterning layer on the doping oxide layer, the patterning layer leaving exposed regions of the doping oxide layer; performing a sputtering process to the substrate; and after the sputtering process, performing a wet etching process to the semiconductor substrate to remove the doping oxide layer from the exposed regions.Type: ApplicationFiled: October 2, 2014Publication date: April 7, 2016Inventors: Ming-Hsi Yeh, Yih-Ann Lin, Bi-Ming Yen, Chao-Cheng Chen, Syun-Ming Jang
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Publication number: 20160033871Abstract: Systems and methods are provided for forming features through photolithography. A polymer layer is formed over a substrate. The polymer layer is patterned to form a first feature and a second feature, the first feature and the second feature being separated at a first distance. A rinse material is applied to the polymer layer including the first feature and the second feature. The rinse material is removed from the polymer layer including the first feature and the second feature to cause the first feature and the second feature to come into contact with each other. A third feature is formed based on the first feature and the second feature being in contact with each other.Type: ApplicationFiled: October 15, 2015Publication date: February 4, 2016Inventors: CHUN-LIANG TAI, BI-MING YEN, CHUN-HUNG LEE, DE-FANG CHEN
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Publication number: 20160020088Abstract: A method of forming a semiconductor device includes forming a dielectric layer over a substrate. The method includes forming a layer set over the dielectric layer, wherein the layer set comprises a plurality of layers. The method further includes forming a bottom antireflective coating (BARC) layer over the layer set. The method further includes etching the layer set to form a tapered opening in the layer set, wherein etching the layer set comprises etching at least one layer comprising a silicon-rich photoresist material layer and a second material layer different from the silicon-rich photoresist material, and the tapered opening has sidewalls at an angle with respect to a top surface of the dielectric layer. The method further includes etching the dielectric layer using the layer set as a mask to form an opening in the dielectric layer, wherein etching the dielectric layer comprises reducing a thickness of the layer set.Type: ApplicationFiled: September 30, 2015Publication date: January 21, 2016Inventors: Tsai-Chun LI, Bi-Ming YEN
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Publication number: 20160013071Abstract: A method of making a semiconductor device includes forming an intermediate semiconductor device. The intermediate device includes a substrate; and a dielectric layer over the substrate. The intermediate device includes a first layer set, including a silicon-rich photoresist material, over the dielectric layer. The intermediate device includes a second layer set, including a carbon-rich organic material layer, over the first layer set. The method further includes etching the second layer set to form a tapered opening in the second layer set. The method further includes etching the first layer set to form an opening in the first layer set, wherein etching the first layer set comprises removing the carbon-rich organic material layer. The method further includes etching the dielectric layer using the first layer set as a mask to form an opening in the dielectric layer, wherein etching the dielectric layer comprises reducing a thickness of the first layer set.Type: ApplicationFiled: September 24, 2015Publication date: January 14, 2016Inventors: Bi-Ming YEN, Tsai-Chun LI, Chun-Ming HU