Abstract: A system for use in metrology of a patterned structure, the system including a data input utility configured to receive a first type of data related to the patterned structure, the first type of data was obtained by a first type of metrology system and comprises first type measurements and first geometrical information regarding the patterned structure. The data input utility is also configured to receive a second type of data related to the patterned structure, the second type of data was obtained by a second type of metrology system and comprises second type measurement results and second geometrical information regarding the patterned structure; the second type of metrology system differs from the first type of metrology system; and a data processing and analyzing utility configured to determine values of parameters of interest based on the first type of data and the second type of data.

Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.

Abstract: A system for use in inspection of patterned structures, including a data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and a data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.

Abstract: Methods and systems, which are computerized, monitor the attention level of a subject, by obtaining at least one set of biomarkers from a subject during a time period, and, calculate, from asymmetries between the biomarkers of the at least one set of obtained biomarkers, a score of attention of the subject during the time period.

Abstract: An implantable unit includes fluorescent sensor molecules, each of which includes a binding site for an analyte, a donor fluorophore, and an acceptor fluorophore; and a first light source. An external system includes an external reading unit, which includes a light sensor; and a processor, which is configured to (i) during a first time period: (a) drive the first light source to generate light having a first illumination peak wavelength appropriate for excitation of the donor fluorophore, and (b) receive, from the light sensor, a first measurement of the fluorescent light emitted from the acceptor fluorophore, (ii) during a second time period: (a) drive a second light source to generate light having a second illumination peak wavelength appropriate for direct excitation of the acceptor fluorophore, and (b) receive, from the light sensor, a second measurement of the fluorescent light emitted from the acceptor fluorophore, and (iii) calculate the concentration of the analyte based on the measurements.

Abstract: A system for use in inspection of patterned structures, including a data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and a data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.

Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.

Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.

Abstract: A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of patterned features, b) illuminating the periodic structure with a light, thereby producing a non-zero order diffraction signal, c) collecting the diffraction signal to produce a test signature, d) matching the test signature with a reference signature, where the reference signature was previously produced by performing steps a), b), and c) with respect to a reference structure that is at least similar to the periodic structure, and e) controlling a manufacturing process using a control setting set associated with the matching reference signature.

Abstract: A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.

Abstract: A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract: An implantable unit includes fluorescent sensor molecules, each of which includes a binding site for an analyte, a donor fluorophore, and an acceptor fluorophore; and a first light source. An external system includes an external reading unit, which includes a light sensor; and a processor, which is configured to (i) during a first time period: (a) drive the first light source to generate light having a first illumination peak wavelength appropriate for excitation of the donor fluorophore, and (b) receive, from the light sensor, a first measurement of the fluorescent light emitted from the acceptor fluorophore, (ii) during a second time period: (a) drive a second light source to generate light having a second illumination peak wavelength appropriate for direct excitation of the acceptor fluorophore, and (b) receive, from the light sensor, a second measurement of the fluorescent light emitted from the acceptor fluorophore, and (iii) calculate the concentration of the analyte based on the measurements.

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract: A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of patterned features, b) illuminating the periodic structure with a light, thereby producing a non-zero order diffraction signal, c) collecting the diffraction signal to produce a test signature, d) matching the test signature with a reference signature, where the reference signature was previously produced by performing steps a), b), and c) with respect to a reference structure that is at least similar to the periodic structure, and e) controlling a manufacturing process using a control setting set associated with the matching reference signature.

Abstract: An implant system includes an implant, which is configured to be implanted in a body of a subject, and an external controller. The external controller includes a wireless energy transmitter. The implant comprises a wireless energy receiver, which is configured to receive energy from the wireless energy transmitter; and one or more electrical light sources, which are (a) electrically coupled to the wireless energy receiver, and (b) configured to emit light upon being triggered by the wireless energy receiver receiving the energy from the wireless energy transmitter.

Abstract: Apparatus is provided for implantation of live cells in a subject. The apparatus includes an implantable immunoisolation device, which includes (a) a chamber, which contains the live cells; (b) an inner membrane layer, which is disposed at an external surface of the chamber, and which comprises a selective membrane that is permeable to nutrients; and (c) an outer hydrogel layer, which comprises a hydrogel, and which is attached to and coats an outer surface of the inner membrane layer. Other embodiments are also described.

Abstract: A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of patterned features, b) illuminating the periodic structure with a light, thereby producing a non-zero order diffraction signal, c) collecting the diffraction signal to produce a test signature, d) matching the test signature with a reference signature, where the reference signature was previously produced by performing steps a), b), and c) with respect to a reference structure that is at least similar to the periodic structure, and e) controlling a manufacturing process using a control setting set associated with the matching reference signature.

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract: A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.