Patents by Inventor Boaz Brill
Boaz Brill has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20160109225Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined.Type: ApplicationFiled: November 9, 2015Publication date: April 21, 2016Inventors: Moshe FINAROV, Boaz BRILL
-
Patent number: 9310192Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.Type: GrantFiled: January 12, 2015Date of Patent: April 12, 2016Assignee: NOVA MEASURING INSTRUMENTS, LTD.Inventors: Boaz Brill, Moshe Finarov, David Schiener
-
Publication number: 20150352229Abstract: Apparatus is provided that contains cells for implantation into a human subject. The apparatus includes a substantially non-degradable three-dimensional scaffold having surfaces to which the cells are attached, and a hydrogel, which is attached to the cells. The scaffold, the cells, and the hydrogel are arranged such that the cells are sandwiched in spaces between the hydrogel and the surfaces of the scaffold, thereby allowing mobility and proliferation of the cells in the spaces between the hydrogel and the surfaces of the scaffold, and preventing the mobility and the proliferation of the cells to locations outside of the spaces between the hydrogel and the surfaces of the scaffold.Type: ApplicationFiled: December 27, 2013Publication date: December 10, 2015Inventors: Boaz BRILL, Itamar WEISMAN, Micha GLADNIKOFF
-
Publication number: 20150343093Abstract: A method is provided, including implanting a chamber containing cells in a subject, and subsequently administering, to the subject, a drug capable of killing the cells. For example, the drug may be administered after the cells cease to function for their intended purpose, or if the cells escape from the implanted chamber. Alternatively, the drug may be administered to kill the cells while the cells are in the implanted chamber. Other embodiments are also described.Type: ApplicationFiled: August 12, 2015Publication date: December 3, 2015Applicant: GluSense Ltd.Inventors: Tehila HYMAN, Boaz BRILL
-
Patent number: 9184102Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.Type: GrantFiled: September 24, 2014Date of Patent: November 10, 2015Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Moshe Finarov, Boaz Brill
-
Patent number: 9140544Abstract: An optical system is presented for use in measuring in patterned structures having vias. The optical system comprises an illumination channel for propagating illuminated light onto the structure being measured; a detection channel for collecting light returned from the illuminated structure to a detection unit; and an attenuation assembly accommodated in the illumination and detection channels and being configured and operable for selectively attenuating light propagating along the detection channel, the attenuation creating a predetermined condition for the selectively attenuated light, said predetermined condition being defined by a predetermined ratio between a first light portion corresponding to a dark field condition and a second light portion corresponding to a bright field condition in said selectively attenuated light, detected selectively attenuated light being therefore indicative of at least one parameter of the via being illuminated.Type: GrantFiled: July 18, 2012Date of Patent: September 22, 2015Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Boaz Brill
-
Publication number: 20150168132Abstract: A measurement system and method are presented for use in measuring in patterned structures having annularly-shaped vias. The system comprises illumination and detection channels, a polarization orientation system, a navigation system, and a control unit. The polarization orientation system provides at least one of a first polarization orientation condition corresponding to a first measurement mode enabling determination a depth of the via, and a second polarization orientation condition corresponding to a second measurement mode enabling determination of one or more parameters of a profile of the via, the first and second polarization orientation conditions defining first and second predetermined orientations respectively for polarization of the incident light relative a sidewall of the via.Type: ApplicationFiled: February 12, 2013Publication date: June 18, 2015Inventors: Gilad Barak, Boaz Brill
-
Publication number: 20150124255Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.Type: ApplicationFiled: January 12, 2015Publication date: May 7, 2015Inventors: Boaz BRILL, Moshe FINAROV, David SCHIENER
-
Patent number: 8964178Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.Type: GrantFiled: December 24, 2013Date of Patent: February 24, 2015Assignee: Nova Measuring Instruments Ltd.Inventors: Yoel Cohen, Boaz Brill
-
Patent number: 8941832Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.Type: GrantFiled: January 23, 2013Date of Patent: January 27, 2015Assignee: Nova Measuring Instruments, Ltd.Inventors: Boaz Brill, Moshe Finarov, David Schiener
-
Publication number: 20150009504Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined.Type: ApplicationFiled: September 24, 2014Publication date: January 8, 2015Inventors: Moshe FINAROV, Boaz BRILL
-
Patent number: 8848185Abstract: An optical system is presented for use in measuring in patterned structures having vias. The system is configured and operable to enable measurement of a via profile parameters. The system comprises an illumination channel for propagating illuminated light onto the structure being measured, a detection channel for collecting light returned from the illuminated structure to a detection unit, and a modulating assembly configured and operable for implementing a dark-field detection mode by carrying out at least one of the following: affecting at least one parameter of light propagating along at least one of the illumination and detection channels, and affecting propagation of light along at least the detection channel.Type: GrantFiled: January 18, 2012Date of Patent: September 30, 2014Assignee: Nova Measuring Instruments Ltd.Inventors: Gilad Barak, Boaz Brill
-
Publication number: 20140195194Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.Type: ApplicationFiled: August 1, 2012Publication date: July 10, 2014Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventors: Boaz Brill, Boris Sherman, Igor Turovets
-
Publication number: 20140168646Abstract: An optical system is presented for use in measuring in patterned structures having vias. The optical system comprises an illumination channel for propagating illuminated light onto the structure being measured; a detection channel for collecting light returned from the illuminated structure to a detection unit; and an attenuation assembly accommodated in the illumination and detection channels and being configured and operable for selectively attenuating light propagating along the detection channel, the attenuation creating a predetermined condition for the selectively attenuated light, said predetermined condition being defined by a predetermined ratio between a first light portion corresponding to a dark field condition and a second light portion corresponding to a bright field condition in said selectively attenuated light, detected selectively attenuated light being therefore indicative of at least one parameter of the via being illuminated.Type: ApplicationFiled: July 18, 2012Publication date: June 19, 2014Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventors: Gilad Barak, Boaz Brill
-
Publication number: 20140142869Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.Type: ApplicationFiled: December 24, 2013Publication date: May 22, 2014Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventors: Yoel COHEN, Boaz BRILL
-
Publication number: 20140079312Abstract: A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.Type: ApplicationFiled: June 16, 2011Publication date: March 20, 2014Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventor: Boaz Brill
-
Patent number: 8658982Abstract: An apparatus and method are presented for use in optical processing of an article. The apparatus comprises: one or more optical windows for directing predetermined electromagnetic radiation therethrough to illuminate a region of interest and collecting radiation returned from the illuminated region; and two or more ports operable for inputting or discharging one or more gases from the vicinity of the region of interest on the article being processed to create in the vicinity of said region a substantially static state of environment, non-absorbable for said electromagnetic radiation, thereby reducing amount of ambient gas in the vicinity of said region of interest and enabling optical processing of the article while maintaining it in the ambient gas environment.Type: GrantFiled: June 5, 2008Date of Patent: February 25, 2014Assignee: Nova Measuring Instruments Ltd.Inventors: Boaz Brill, Oleg Korshunov
-
Patent number: 8643842Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.Type: GrantFiled: October 16, 2012Date of Patent: February 4, 2014Assignee: Nova Measuring Instruments Ltd.Inventors: Yoel Cohen, Boaz Brill
-
Publication number: 20140028993Abstract: A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of patterned features, b) illuminating the periodic structure with a light, thereby producing a non-zero order diffraction signal, c) collecting the diffraction signal to produce a test signature, d) matching the test signature with a reference signature, where the reference signature was previously produced by performing steps a), b), and c) with respect to a reference structure that is at least similar to the periodic structure, and e) controlling a manufacturing process using a control setting set associated with the matching reference signature.Type: ApplicationFiled: January 12, 2012Publication date: January 30, 2014Inventor: Boaz Brill
-
Publication number: 20140009760Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined.Type: ApplicationFiled: September 9, 2013Publication date: January 9, 2014Applicant: NOVA MEASURING INSTRUMENTS LTD.Inventors: Moshe FINAROV, Boaz BRILL