Abstract: An operating method of a nonvolatile memory device including a page buffer array in which a plurality of page buffers are arranged in a matrix form includes counting fail bits stored in the page buffers included in first columns determined based on an operation mode from among a plurality of columns of the page buffer array, and determining whether or not a program has passed with respect to memory cells to which the page buffer array is connected, based on a count result corresponding to a number of the fail bits and a reference count determined based on the operation mode.

Abstract: A nonvolatile memory device includes a semiconductor substrate including a page buffer region, a memory cell array, bitlines, first vertical conduction paths, and second vertical conduction paths. The memory cell array is formed in a memory cell region above the semiconductor substrate and includes memory cells. The bitlines extend in a column direction above the memory cell array. Each of bitlines is cut into each of first bitline segments and each of second bitline segments. The first vertical conduction paths extend in a vertical direction and penetrate a column-directional central region of the memory cell region. The first vertical conduction paths connect the first bitline segments and the page buffer region. The second vertical conduction paths extend in the vertical direction and penetrate the column-directional central region. The second vertical conduction paths connect the second bitline segments and the page buffer region.

Abstract: A nonvolatile memory device includes a memory cell array and a bad block remapping circuit. The memory cell array includes a first mat and a second mat that are paired with each other. The first mat includes a plurality of first memory blocks. The second mat includes a plurality of second memory blocks. A first selection memory block among the plurality of first memory blocks and a second selection memory block among the plurality of second memory blocks are accessed based on a first address. The bad block remapping circuit generates a first remapping address based on the first address when it is determined that the first selection memory block is defective. A first remapping memory block among the plurality of first memory blocks and the second selection memory block are accessed based on the first remapping address.

Abstract: An erase voltage is applied to channels of a selected string group to erase only the selected string group. A size and a number of the spare blocks for storing meta data are reduced and thus a size of the nonvolatile memory device is reduced by reducing unit capacity of the erase operation through grouping of the cell strings. Lifetime of the nonvolatile memory device is extended by having control over erasing some cell strings and not others. Control of cell strings for erasure includes allowing some control lines to float, in some embodiments. In some embodiments, ground select transistors with different thresholds and appropriately applied voltages are used to control erasure of particular cell strings. In some embodiments, biasing of word lines is applied differently to portions of a particular cell string to only erase a portion of the particular cell string.

Abstract: A nonvolatile memory device including a memory cell array having a plurality of planes; a plurality of page buffers arranged corresponding to each of the plurality of planes; and a control logic circuit configured to transmit a bit line setup signal to each of the plurality of page buffers. Each of the plurality of page buffers includes a precharge circuit configured to precharge a sensing node and a bit line in response to the bit line setup signal, and a shutoff circuit configured to perform a bit line shutoff operation in response to a bit line shutoff signal. The control logic circuit is configured to control a transition time when a level of the bit line setup signal is changed according to a gradient of the bit line shutoff signal which is changed from a first level to a second level.

Abstract: A non-volatile memory includes a first semiconductor layer vertically stacked on a second semiconductor layer and including a first memory group, a second memory group, a third memory group and a fourth memory group. The second semiconductor layer includes a first region, a second region, a third region and a fourth region respectively underlying the first memory group, second memory group, third memory group and fourth memory group. The first region includes one driving circuit connected to memory cells of one of the second memory group, third memory group and fourth memory group through a first word line, and another driving circuit connected to memory cells of the first memory group through a first bit line, wherein the first word line and first bit line extend in the same horizontal direction.

Abstract: A nonvolatile memory device includes a plurality of gate lines extending in a first direction and stacked in a second direction to form a memory block, where the second direction is perpendicular to the first direction, an address decoder disposed at a first side of the plurality of gate lines to drive the plurality of gate lines, a voltage compensation line extending in the first direction substantially in parallel with the plurality of gate lines, and overlapping with a target gate line among the plurality of gate lines in the second direction, a rising vertical contact extending in the second direction to connect the address decoder and a first portion of the voltage compensation line, and conduction paths connecting in the second direction the first and second portions of the voltage compensation line with near and far end portions of the target gate line.

Abstract: A memory device includes an array of vertical NAND strings of nonvolatile memory cells, on an underlying substrate. An erase control circuit is provided, which is configured to drive a plurality of bit lines electrically coupled to the array of vertical NAND strings of nonvolatile memory cells with respective erase voltages having unequal magnitudes during an operation to erase the nonvolatile memory cells in the array of vertical NAND strings. This erase control circuit may also be configured to drive a first of the plurality of bit lines with a first erase voltage for a first duration and drive a second of the plurality of bit lines with a second erase voltage for a second duration unequal to the first duration during the operation to erase the nonvolatile memory cells in the array of vertical NAND strings.

Abstract: In a method of erasing data in a nonvolatile memory device including a memory block, it is determined whether a data erase characteristic for the memory block is degraded for each predetermined cycle. The memory block has a plurality of memory cells therein, the plurality of memory cells being stacked in a vertical direction relative to an underlying substrate. A data erase operation is performed by changing a level of a voltage applied to selection transistors for selecting the memory block as an erase target block when it is determined that the data erase characteristic is degraded.

Abstract: Provided are a nonvolatile memory and a method of operating the same. The nonvolatile memory includes a first sub-block defined by a first string select line and a first word line; a second sub-block defined by a second string select line different from the first string select line and a second word line different from the first word line; a first vacant block defined by the first string select line and the second word line; and a second vacant block defined by the second string select line and the first word line. First data is programmed in the first sub-block with, second data is programmed in the second sub-block, and no data is programmed in the first vacant block and the second vacant block.

Abstract: A method of operating a nonvolatile memory device is provided where the nonvolatile memory device includes a plurality of cell strings, and each cell string includes a plurality of multi-level cells. a voltage of a selected word line is sequentially changed to sequentially have a plurality of read voltages for determining threshold voltage states of the plurality of multi-level cells. A voltage of an adjacent word line adjacent to the selected word line is sequentially changed in synchronization with voltage changing time points of the selected word line. A load of the selected word line is reduced and an operation speed of the nonvolatile memory device is increased by synchronizing the voltage change of the selected word line and the voltage change of the adjacent word line in the same direction.

Abstract: A three-dimensional (3D) nonvolatile memory includes a stacked structure that includes a plurality of conductive layers that alternate with and are spaced apart from each other by a plurality of interlayer insulating layers. The stacked structure includes a first cell region, a second cell region spaced apart from the first cell region, and a connection region between the first cell region and the second cell region. The connection region includes a first step portion that contacts the first cell region and has a stepped shape that descends in a direction approaching the second cell region, a second step portion that contacts the second cell region and has a stepped shape that descends in a direction approaching the first cell region, and a connection portion that connects the first cell region and the second cell region.

Abstract: A non-volatile memory includes a page buffer array in which page buffers are arranged in a matrix form. A method of operating the non-volatile memory includes selecting columns from among multiple columns of the page buffer array, and counting fail bits stored in page buffers included in the selected columns.

Abstract: An erase voltage is applied to channels of a selected string group to erase only the selected string group. A size and a number of the spare blocks for storing meta data are reduced and thus a size of the nonvolatile memory device is reduced by reducing unit capacity of the erase operation through grouping of the cell strings. Lifetime of the nonvolatile memory device is extended by having control over erasing some cell strings and not others. Control of cell strings for erasure includes allowing some control lines to float, in some embodiments. In some embodiments, ground select transistors with different thresholds and appropriately applied voltages are used to control erasure of particular cell strings. In some embodiments, biasing of word lines is applied differently to portions of a particular cell string to only erase a portion of the particular cell string.

Abstract: An operating method of a nonvolatile memory device including a page buffer array in which a plurality of page buffers are arranged in a matrix form includes counting fail bits stored in the page buffers included in first columns determined based on an operation mode from among a plurality of columns of the page buffer array, and determining whether or not a program has passed with respect to memory cells to which the page buffer array is connected, based on a count result corresponding to a number of the fail bits and a reference count determined based on the operation mode.

Abstract: To program in a nonvolatile memory device, a memory block is provided with a plurality of sub blocks disposed in a vertical direction where the memory block includes a plurality of cell strings each including a plurality of memory cells connected in series and disposed in the vertical direction. A plurality of intermediate switching transistors are disposed in a boundary portion between two adjacent sub blocks in the vertical direction. Each of the plurality of intermediate switching transistors is selectively activated based on a program address during a program operation. The selectively activating each of the plurality of intermediate switching transistors includes selectively turning on one or more intermediate switching transistors in a selected cell string based on the program address.

Abstract: A nonvolatile memory device includes a plurality of gate lines extending in a first direction and stacked in a second direction to form a memory block, where the second direction is perpendicular to the first direction, an address decoder disposed at a first side of the plurality of gate lines to drive the plurality of gate lines, a voltage compensation line extending in the first direction substantially in parallel with the plurality of gate lines, and overlapping with a target gate line among the plurality of gate lines in the second direction, a rising vertical contact extending in the second direction to connect the address decoder and a first portion of the voltage compensation line, and conduction paths connecting in the second direction the first and second portions of the voltage compensation line with near and far end portions of the target gate line.

Abstract: A nonvolatile memory device including: a first semiconductor layer including word lines, bit lines, first and second upper substrates adjacent to each other and a memory cell array, wherein the memory cell array includes a first vertical structure on the first upper substrate and a second vertical structure on the second upper substrate; and a second semiconductor layer under the first semiconductor layer, wherein the second semiconductor layer includes a lower substrate that includes row decoder and page buffer circuits, wherein the first vertical structure includes a first via area in which a first through-hole via is provided, wherein the first through-hole via passes through the first vertical structure and connects a first bit line and a first page buffer circuit, and the second vertical structure includes a first partial block, wherein the first partial block overlaps the first via area.

Abstract: A nonvolatile memory device and a method of manufacturing the device, the device including a first semiconductor layer, the first semiconductor layer including an upper substrate, and a memory cell array, the memory cell array including a plurality of gate conductive layers stacked on the upper substrate and a plurality of pillars passing through the plurality of gate conductive layers and extending in a direction perpendicular to a top surface of the upper substrate; and a second semiconductor layer under the first semiconductor layer, the second semiconductor layer including a lower substrate, at least one contact plug between the lower substrate and the upper substrate, and a common source line driver on the lower substrate and configured to output a common source voltage for the plurality of pillars through the at least one contact plug.

Abstract: A nonvolatile memory device comprises a first semiconductor layer including, an upper substrate, and a memory cell array in which a plurality of word lines on the upper substrate extend in a first direction and a plurality of bit lines extend in a second direction. The nonvolatile memory device comprises a second semiconductor layer under the first semiconductor layer in a third direction perpendicular to the first and second directions, the second semiconductor layer including, a lower substrate, and a substrate control circuit on the lower substrate and configured to output a bias voltage to the upper substrate. The second semiconductor layer is divided into first through fourth regions, each of the first through fourth regions having an identical area, and the substrate control circuit overlaps at least a portion of the first through fourth regions in the third direction.