Patents by Inventor Boris Fishkin
Boris Fishkin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6139406Abstract: The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.Type: GrantFiled: June 24, 1997Date of Patent: October 31, 2000Assignee: Applied Materials, Inc.Inventors: Daniel Kennedy, Boris Fuksshimov, Victor Belitsky, Boris Fishkin, Kyle Brown, Tom Osterheld, Jeff Beeler, Ginetto Addiego
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Patent number: 6119708Abstract: A method and apparatus for cleaning wafer edges is provided. The inventive wafer cleaner employs a transducer equal in length to the diameter of a wafer to be cleaned, and positioned to direct sonic energy in line with the wafer's edge. Supporting and rotating mechanisms are positioned along the wafer's edge, outside of the transducer's high energy field, and preferably such that approximately 50 percent of the wafer is positioned between the wafer supports and the transducer. Therefore, minimal sonic energy is blocked from reaching the wafer's surface. The transducer dimensions relative to the wafer, and the positioning of the wafer supports relative to the transducer enable the system to achieve an approximately 50 percent edge cleaning duty cycle as the wafer is rotated.Type: GrantFiled: November 11, 1998Date of Patent: September 19, 2000Assignee: Applied Materials, Inc.Inventors: Boris Fishkin, Brian J. Brown, Jianshe Tang
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Patent number: 6082948Abstract: A system for vacuum-processing objects such as electronic integrated circuit wafers comprises (a) a carrier for transporting the wafers under vacuum in a cassette, the cassette being supported on a movable wall that serves as a bottom cover member of the carrier; and (b) a processing machine having a transfer chamber that is also maintained under vacuum, the transfer chamber having a movable wall in the form of an elevatable stage that sealingly closes the transfer chamber in its outermost position. There is a small sealingly closed interface chamber extending between the movable walls when the cassette is mounted onto the machine. A vacuum pump evacuates the interface chamber in preparation for lowering of the cassette into the transfer chamber by an elevator mechanism.Type: GrantFiled: September 26, 1994Date of Patent: July 4, 2000Assignee: Applied Materials, Inc.Inventors: Boris Fishkin, Seiji Sato, Robert B. Lowrance
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Patent number: 6027574Abstract: A method of removing liquid on a substrate, the method comprising the steps of placing the substrate in a fluid reservoir having a surface level, maintaining a partial pressure of vapor over the fluid surface level, lowering the fluid surface level of the reservoir while adding fluid, whereby the liquid flows off the substrate, and holding the substrate at different holding points, while lowering the fluid surface level so that the lowering surface level does not pass across a holding point that is being used to hold the substrate.Type: GrantFiled: December 18, 1998Date of Patent: February 22, 2000Assignee: Applied Materials, Inc.Inventors: Boris Fishkin, John S. Hearne, Robert B. Lowrance
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Patent number: 6011622Abstract: An improved particle monitoring sensor is described which uses a variety of techniques to prolong the effective life of the optical surfaces within the particle monitoring'sensor. Substantially inert purging gas is directed over the particle monitoring sensor windows, which are normally exposed to a harsh operating environment. The surfaces of these windows are heated by heating elements in direct thermal contact with the windows. In addition, a restrictive slit is placed over the detector window to reduce the exposed area and to increase the velocity of gas flowing over the window surface. While this slit reduces the detector's field of view, the signal loss is reduced by using a linearly polarized light source and aligning the elongated slit's major axis with the direction of polarization.Type: GrantFiled: June 16, 1997Date of Patent: January 4, 2000Assignee: Applied Materials, Inc.Inventors: Boris Fishkin, Phil Salzman
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Patent number: 5957754Abstract: A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.Type: GrantFiled: August 29, 1997Date of Patent: September 28, 1999Assignee: Applied Materials, Inc.Inventors: Kyle A. Brown, Boris Fishkin
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Patent number: 5884640Abstract: A drying apparatus 20 for removing residual liquid from a substrate surface comprises a vapor chamber 25 having a vapor distributor 30 for introducing vapor into the chamber. The drying apparatus 20 further comprises a fluid system 35 comprising (i) a reservoir 40, (ii) a fluid dispenser 45 for introducing fluid into the reservoir, and (iii) a fluid level adjuster 50 for lowering a fluid surface level in the reservoir 40. A multi-point holder 62 is used for holding the substrate 55 at different holding points 63 on the substrate, while the fluid surface level is lowered relative to the substrate, so that residual liquid flows off the substrate surface without intersection of the lowering fluid surface level with holding points 63 on the substrate. The drying apparatus 20 dries substrates 55 substantially without forming stains or streaks, or causing contamination or liquid residue to remain on the substrate 55.Type: GrantFiled: August 7, 1997Date of Patent: March 23, 1999Assignee: Applied Materials, Inc.Inventors: Boris Fishkin, John S. Hearne, Robert B. Lowrance
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Patent number: 5697750Abstract: A system for vacuum-processing objects such as electronic integrated circuit wafers comprises (a) a carrier for transporting the wafers under vacuum in a cassette, the cassette being supported on a movable wall that serves as a bottom cover member of the carrier; and (b) a processing machine having a transfer chamber that is also maintained under vacuum, the transfer chamber having a movable wall in the form of an elevatable stage that sealingly closes the transfer chamber in its outermost position. There is a small sealingly closed interface chamber extending between the movable walls when the cassette is mounted onto the machine. A vacuum pump evacuates the interface chamber in preparation for lowering of the cassette into the transfer chamber by an elevator mechanism.Type: GrantFiled: August 16, 1995Date of Patent: December 16, 1997Assignee: Applied Materials, Inc.Inventors: Boris Fishkin, Seiji Sato, Robert B. Lowrance
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Patent number: 5565985Abstract: An improved particle monitoring sensor is described which uses a variety of techniques to prolong the effective life of the optical surfaces within the particle monitoring sensor. Substantially inert purging gas is directed over the particle monitoring sensor windows, which are normally exposed to a harsh operating environment. The surfaces of these windows are heated by heating elements in direct thermal contact with the windows. In addition, a restrictive slit is placed over the detector window to reduce the exposed area and to increase the velocity of gas flowing over the window surface. While this slit reduces the detector's field of view, the signal loss is reduced by using a linearly polarized light source and aligning the elongated slit's major axis with the direction of polarization.Type: GrantFiled: June 6, 1995Date of Patent: October 15, 1996Assignee: Applied Materials, Inc.Inventors: Boris Fishkin, Phil Salzman
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Patent number: 5463460Abstract: An improved particle monitoring sensor is described which uses a variety of techniques to prolong the effective life of the optical surfaces within the particle monitoring sensor. Substantially inert purging gas is directed over the particle monitoring sensor windows, which are normally exposed to a harsh operating environment. The surfaces of these windows are heated by heating elements in direct thermal contact with the windows. In addition, a restrictive slit is placed over the detector window to reduce the exposed area and to increase the velocity of gas flowing over the window surface. While this slit reduces the detector's field of view, the signal loss is reduced by using a linearly polarized light source and aligning the elongated slit's major axis with the direction of polarization.Type: GrantFiled: July 8, 1993Date of Patent: October 31, 1995Assignee: Applied Materials, Inc.Inventors: Boris Fishkin, Phil Salzman
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Patent number: 5287725Abstract: Surface Volatile Material Detector including a vacuum chamber that is adapted to hold a silicon wafer for testing. The surface of the wafer is exposed to a heat source which evaporates the volatile contaminants on the surface of the wafer. A gas composition analyzer samples the atmosphere within the chamber to detect the evaporated contaminants. The device is designed such that the wafer is thermally insulated from the chamber, whereby the wafer is heated while the chamber walls remain cool, and any contaminants which might exist on the walls of the chamber are not evaporated. In the preferred embodiment, the wafer is heated by infrared light illumination.Type: GrantFiled: June 23, 1993Date of Patent: February 22, 1994Assignee: Applied Materials, Inc.Inventors: Jun Zhao, Laszlo Szalai, Boris Fishkin, Terry Francis
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Patent number: 5083865Abstract: A particle monitor for a processing chamber exhaust line is disclosed which incorporates exhaust line heating, purge gas flow over surfaces such as optical windows in the exhaust gas line, and a thermally and electrically insulating particle monitor mounting arrangement. The features collectively protect the particle monitor from electrical disturbance and from the heated inlet and maintain the optical surfaces clean and free of depositions from the exhaust gas flow for an extended period. The arrangement also suppresses etching of the optical surfaces.Type: GrantFiled: May 11, 1990Date of Patent: January 28, 1992Assignee: Applied Materials, Inc.Inventors: Patrick Kinney, Boris Fishkin, Jun Zhao, Anand Gupta, Robert Bendler
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Patent number: 5047648Abstract: A method for detecting particles in an ion implantation characterized by the steps of placing a particle sensor within the vacuum chamber of the ion implantation machine, exposing the substrate to an ion beam, thereby dislodging a stream of free particles, and detecting a portion of the free particle sensor. The particle sensor is preferably shielded from radiation to prevent false readings, and is positioned substantially along the plane of rotation of a substrate support wheel. By positioning the particle counter both along the plane of rotation and tangential to the rotation of the wheel at the point of ion impact, the particle counter intercepts the particle stream at the point of maximum particle flux. The apparatus includes a laser beam, a photodetector responsive to a portion of the laser beam scattered off of particles in the particle stream and a lead shield to shield the photodetector from x-rays generated within the vacuum chamber of the ion implantation machine.Type: GrantFiled: November 26, 1990Date of Patent: September 10, 1991Assignee: Applied Materials, Inc.Inventors: Boris Fishkin, Michael Current