Patents by Inventor Brian Fletcher

Brian Fletcher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220091500
    Abstract: A system and method of generating a drop pattern. The method may include receiving an initial drop pattern. The method may include receiving a target drop pattern exclusion edge for each of a plurality of locations. The method may include receiving one or more constraints of a dispensing system. The method may include generating a base drop pattern exclusion edge line based on the target drop pattern exclusion edge. The method may include generating a new drop pattern wherein drops deposited at an edge of the new drop pattern are positioned on integer multiples of the pitch constraint from the optimum base drop pattern exclusion edge line.
    Type: Application
    Filed: September 22, 2020
    Publication date: March 24, 2022
    Inventors: Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher
  • Patent number: 11273888
    Abstract: Cuff assemblies for sports board leashes, where the cuff assembly includes a central section that having a precurved molded insert that is configured to connect to a cord of the sports board leash, a first wing attached to a first side of the central section, and a second wing attached to a second side of the central section. The maximum width of the central section of the cuff assembly is greater than the maximum width of either of the first wing or second wing, and the first wing and second wing are configured to overlap and fasten to each other in order to secure the cuff assembly around a person's limb portion.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: March 15, 2022
    Assignee: Dakine IP Holdings LP
    Inventors: Zachary West, John Martin, Brian Fletcher, Mirona Motoc, Jay Willet, Aaron Ambuske
  • Patent number: 11249397
    Abstract: A method of forming a cured layer on a substrate can include applying on the exterior surface of the substrate a first liquid film and subjecting the first liquid film to actinic radiation in at least one first region of the film. The actinic radiated region can modify the substrate surface such that the drop spreading of a region not subjected to actinic radiation is larger than the drop spreading in a region subjected to actinic radiation.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: February 15, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Niyaz Khusnatdinov, Timothy Brian Stachowiak, Edward Brian Fletcher
  • Publication number: 20220044943
    Abstract: An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid droplet pattern includes an imprint field, wherein the imprint field has a side and a drop exclusion zone along the side, and the drop exclusion zone is narrower at a first point farther from the center of a side and wider at a second point closer to the center of the side. In another aspect, a method can be carried out using the apparatus. The apparatus and method can be useful in filling an imprint field with a formable material relatively quickly without extrusion defects or other complications.
    Type: Application
    Filed: October 26, 2021
    Publication date: February 10, 2022
    Inventors: Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher
  • Publication number: 20220043340
    Abstract: Systems for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.
    Type: Application
    Filed: October 21, 2021
    Publication date: February 10, 2022
    Inventors: Amir Tavakkoli Kermani Ghariehali, Mehul N. Patel, Edward Brian Fletcher
  • Patent number: 11194247
    Abstract: An imprinting template, an imprinting system, and an imprinting method for imprinting a pattern in a formable material on a substrate. The template includes an edge region that surrounds a pattern region. A full height represents an absolute value of a distance between top surface and bottom surface of the pattern region. The edge region extends to an edge of a mesa of the template. A portion of the edge region may be at least a full height below the top surface of the pattern region. An area of the portion of the edge region may be at least large enough to prevent formable material that is between the template and the substrate from extruding out beyond the edge of the mesa.
    Type: Grant
    Filed: January 31, 2018
    Date of Patent: December 7, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Edward Brian Fletcher, Teresa Perez Estrada, Amir Tavakkoli Kermani Ghariehali
  • Publication number: 20210369019
    Abstract: A pillow includes a first lobe, a second lobe, and a third lobe extending outwardly from a central node and containing cushioning filling. A closure mechanism extends around perimeter of the first and second lobe. The third lobe is covered by the first and second lobe in a stowed position and not covered in a sleeping position. Portions of the first and second lobe exposed in the stowed position are covered by durable fabric. A Y-shaped inner pillow case may contain the filling and be positioned within the lobes. The filling may include an air bladder with a valve exposed in the stowed position.
    Type: Application
    Filed: May 25, 2021
    Publication date: December 2, 2021
    Inventors: Aaron Alan Ambuske, Brian Fletcher, Hedvig von Beetzen, Mirona Motoc, Zac West
  • Patent number: 11181819
    Abstract: Systems and methods for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.
    Type: Grant
    Filed: May 31, 2019
    Date of Patent: November 23, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Amir Tavakkoli Kermani Ghariehali, Mehul N. Patel, Edward Brian Fletcher
  • Patent number: 11164302
    Abstract: Systems and processes for analyzing an image. Analyzing the image may comprise selecting a computer vision parameter for an image feature identification process. The image feature identification process may identify at least one feature in the image when using the computer vision parameter. Analyzing the image may further comprise segmenting the image into a region of interest T and a background region B. Analyzing the image may further comprise calculating a set of statistical values about the region of interest T of the image. Analyzing the image may further comprise classifying the image based on both the computer vision parameter and the set of statistical values as one of either: a defect containing image or a defect free image.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: November 2, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kathryn Brenda Bean, Teresa Perez Estrada, Edward Brian Fletcher, Mehul N. Patel
  • Publication number: 20210251343
    Abstract: Reel devices, systems, and related methods are disclosed. The reel devices are modular and include an automatic shift assembly that shifts to provide a mechanical advantage when used to tighten a cord. For instance, the reel devices are configured to provide a first drive ratio and automatically transition to a second drive ratio in response to a torque force. The reel devices include a drive assembly and a shift assembly. The drive assembly includes a cycloidal gear.
    Type: Application
    Filed: February 12, 2021
    Publication date: August 19, 2021
    Inventors: John Martin, Brian Fletcher, Aaron Ambuske, Zachary West, Jay Barrett Willet, Ana Mirona Motoc, Dan Herbert, Hedvig Von Beetzen, Joseph Mahon, Jimmy Capra, Matthew Sinclair
  • Patent number: 11069207
    Abstract: An apparatus for creating haptic stimulations is provided. The apparatus includes one or more pods coupled to a garment, each pod including: (i) an internal structure, and (ii) an airtight bladder surrounding the internal structure, where the bladder is pneumatically coupled to a pneumatic device that is configured to control a pressurized state of the bladder. Each pod is configured to: (i) have a first degree of flexibility when the bladder of the pod is in a first pressurized state; and (ii) have a second degree of flexibility, less than the first degree of flexibility, when the bladder of the pod is in a second pressurized state different from the first pressurized state. Each pod provides a haptic stimulation to a wearer of the garment when the corresponding bladder is in the second pressurized state.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: July 20, 2021
    Assignee: FACEBOOK TECHNOLOGIES, LLC
    Inventors: Zachary Daniel West, Aaron Alan Ambuske, John Dietrich Martin, Brian Fletcher, Nicholas Roy Corson, Brian Cox, Charles Stewart, Tristan Thomas Trutna
  • Publication number: 20210187795
    Abstract: A template and method of using the template is disclosed. The template can include a body with a first side and a second side, and an extension. The extension can include a first surface adjacent the body, a second surface, and a third surface between the first surface and the second surface, where the first surface includes a curvature and where a portion of the curvature of the first surface is interior to the third surface. The method can include dispensing a formable material over a substrate, where the substrate includes a non-uniform surface topography. The method can also include curing the formable material contacting the second surface of the extension to form a layer over the substrate while the formable material contacting the third surface of the extension remains in a liquid state, wherein curing is performed while the template is contacting the formable material.
    Type: Application
    Filed: December 18, 2019
    Publication date: June 24, 2021
    Inventors: Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher
  • Publication number: 20210181621
    Abstract: Imprinting methods and imprinting systems configured to cure formable material between a substrate and a template. With a first spatial light modulator with a first set of modulation elements configured to expose the formable material between the substrate and the template to a first pattern of actinic radiation; and a second spatial light modulator with a second set of modulation elements configured to expose the formable material between the substrate and the template to a second pattern of actinic radiation. At a plane of the formable material, a first set of centers of the first pattern associated with centers of the first set of modulation elements may be offset from a second set of centers of the second pattern associated with centers of the second set of modulation elements.
    Type: Application
    Filed: December 12, 2019
    Publication date: June 17, 2021
    Inventors: Edward Brian Fletcher, James W. Irving, Nilabh K. Roy
  • Patent number: 11020894
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Grant
    Filed: October 30, 2018
    Date of Patent: June 1, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20210157236
    Abstract: A method of forming a cured layer on a substrate can include applying on the exterior surface of the substrate a first liquid film and subjecting the first liquid film to actinic radiation in at least one first region of the film. The actinic radiated region can modify the substrate surface such that the drop spreading of a region not subjected to actinic radiation is larger than the drop spreading in a region subjected to actinic radiation.
    Type: Application
    Filed: November 22, 2019
    Publication date: May 27, 2021
    Inventors: Niyaz KHUSNATDINOV, Timothy Brian STACHOWIAK, Edward Brian FLETCHER
  • Publication number: 20210124260
    Abstract: Systems and methods for shaping a film. Formable material in an imprint field on the substrate may be contacted with a shaping surface of a template. Outer boundaries of the imprint field correspond to outer boundaries of the shaping surface. Shaping the film includes forming a cured layer within the imprint field while the shaping surface is in contact with the formable material. Shaping the film may include separating the shaping surface from the cured layer. Shaping the film may include moving the template away from the imprint field to a first offset location wherein the outer boundaries of the shaping surface are offset relative to the outer boundaries of the imprint field. Shaping the film may include curing a second portion of the formable material while the template is at the first offset location so as to form the shaped film.
    Type: Application
    Filed: October 23, 2019
    Publication date: April 29, 2021
    Inventors: Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher
  • Patent number: 10990004
    Abstract: An apparatus, method, and frame window configured to clean mesa sidewalls of a template with photodissociation radiation. Material on the mesa sidewalls are removed from the mesa sidewalls by exposing the portion of a first gap adjacent to the mesa sidewalls to the photodissociation radiation.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: April 27, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventor: Edward Brian Fletcher
  • Patent number: 10935885
    Abstract: Devices, systems, and methods position a template for imprinting a formable material over one or more gas-flow channels on a stage, wherein the template includes a patterning surface, a mesa, and at least one mesa sidewall; and direct a gas flow through the one or more gas-flow channels toward a portion of the at least one mesa sidewall.
    Type: Grant
    Filed: February 11, 2020
    Date of Patent: March 2, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventors: Mehul N. Patel, Edward Brian Fletcher
  • Patent number: 10935883
    Abstract: A nanoimprint lithography template, method of fabrication, and method of manufacturing an article using the same. The template includes a body having first and second opposed sides, the second side having a mesa extending therefrom, with the mesa having sidewalls and a surface. A recessed shelf extends around a perimeter of the mesa surface, with a light-blocking material positioned on at least the recessed shelf and at a thickness such that the light-blocking material does not extend beyond a plane defined by the mesa surface.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: March 2, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventors: Amir Tavakkoli Kermani Ghariehali, Edward Brian Fletcher
  • Patent number: D921802
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: June 8, 2021
    Assignee: Dakine IP Holdings LP
    Inventors: Zachary West, John Martin, Brian Fletcher, Mirona Motoc, Jay Willet, Aaron Ambuske