Abstract: Examples are described relating to control of a geographical position of a mobile unit in time. In one example, a dispatch control system is provided. The dispatch control system has a data store with records of previously-attended geographical positions. These records indicate at least a duration of attendance. The dispatch control system is arranged to calculate one or more stochastic characteristics for the durations of attendance based on the records stored in the data store, the one or more measured stochastic characteristics being representative of a variability of the durations of attendance at said past geographical positions. It is also arranged to generate data indicative of an order of attendance for a mobile unit based on travel and estimated durations of attendance. This data is re-ordered and volatility metrics for each set of modified data are determined. The set of volatility metrics is used to modify the data indicative of an order of attendance for a mobile unit.

Abstract: A handle for a luggage item is provided with at least one channel or conduit for receiving a strap for a duffel bag or similar luggage item. The handle is capable of selectively receiving at least one strap and further capable of being provided around or otherwise secured to a second strap. The handles may be used for single-handed carry of two or more straps and allow for the release or separation of the two or more straps as desired.

Abstract: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.

Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.

Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.

Abstract: Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.

Abstract: Provided is an imprint apparatus that applies a resin to several locations on a substrate, brings the resin and a mold into contact, and transfers a contoured pattern formed in the mold to the resin, comprising: a controller that sets a principal axis direction according to the contoured pattern and determines the application positions of the resin based on the principal axis direction that has been set such that the distances between resin drops that have been applied so as to be separated in the principal axis direction is larger than the distances between resin drops that have been applied so as to be separated in a direction that is perpendicular to the principal axis direction; and a dispenser that applies the resin based on the application position that has been determined.

Abstract: Provided is an imprint apparatus that applies a resin (drops) dispersed, at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.

Abstract: An imprint lithography imprinting stack includes a substrate and a polymeric adhesion layer adhered to the substrate. The polymeric adhesion layer includes polymeric components with an extended backbone length of at least about 2 nm. The backbones of the polymeric components may be substantially aligned in a planar configuration on the surface of the substrate, such that a thickness of the polymeric adhesion layer is less than about 2 nm.

Abstract: The invention provides a method of applying an adhesion primer layer for an imprint lithography process that includes contacting a fluid with a surface of a substrate in a coating process and initiating a chemical reaction that forms a covalent bond between a component in the fluid and the surface of the substrate such that an adhesion primer layer is adhered to the surface of the substrate. A polymeric layer may be adhered to the surface of the substrate coated with the adhesion primer layer. The method allows adhesion primer coating for double-sided imprinting applications including patterned magnetic media.

Abstract: A system is described that has a first engine configured to determine an assignment of a resource to a task. The assignment is based on a schedule representation comprising at least resource profile data and task profile data. The resource profile data represents a resource profile associated with the resource and the task profile data represents a task profile associated with the task. The system also has a data store configured to store a set of rules, the set of rules comprising data indicative of one or more functions to be applied to one or more input data sources to output at least one variable value for the schedule representation. This then allows a second engine coupled to the data store to be configured to update the schedule representation in accordance with the set of rules.

Abstract: An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance.

Abstract: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.

Abstract: Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween.

Abstract: Systems and methods are provided for importing data into a spreadsheet from an external data source. A set of cells containing formulas is identified. A first user defined function is executed to access a particular data record from the external data source. The execution of the first user defined function includes determining which of the stored formulas contain user defined functions to access data records from the external data source, resolving parameters of the identified user defined functions, generating a bulk query to the external data source requesting data for certain user defined functions having sufficient parameters resolved for identifying a data record plus more data records than are specified by the user defined functions, storing the data records specified in a hash table, storing the more data records than are specified in a memory, and returning the particular data record to the spreadsheet.

Abstract: Systems and methods are provided for importing data into a spreadsheet from an external data source. A set of cells containing formulas is identified. A first user defined function is executed to access a particular data record from the external data source. The execution of the first user defined function includes determining which of the stored formulas contain user defined functions to access data records from the external data source, resolving parameters of the identified user defined functions, generating a bulk query to the external data source requesting data for certain user defined functions having sufficient parameters resolved for identifying a data record plus more data records than are specified by the user defined functions, storing the data records specified in a hash table, storing the more data records than are specified in a memory, and returning the particular data record to the spreadsheet.

Abstract: A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.

Abstract: Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process.

Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.

Abstract: Fabricating a solar cell stack includes forming a nanopatterned polymeric layer on a first surface of a silicon wafer and etching the first surface of the silicon wafer to transfer a pattern of the nanopatterned polymeric layer to the first surface of the silicon wafer. A layer of reflective electrode material is formed on a second surface of the silicon wafer. The nanopatterned first surface of the silicon wafer undergoes a buffered oxide etching. After the buffered oxide etching, the nanopatterned first surface of the silicon wafer is treated to decrease a contact angle of water on the nanopatterned first surface. Electron donor material is deposited on the nanopatterned first surface of the silicon wafer to form an electron donor layer, and a transparent electrode material is deposited on the electron donor layer to form a transparent electrode layer on the electron donor layer.