Patents by Inventor Brian Fletcher

Brian Fletcher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7845931
    Abstract: The present invention includes a method of solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerizable process.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: December 7, 2010
    Assignee: Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Edward Brian Fletcher, Pankaj B. Lad, Michael P. C. Watts
  • Publication number: 20100287025
    Abstract: In a method for scheduling tasks for a mobile resource, task schedule data for a mobile resource is accessed. The task schedule data comprises a scheduled location of the mobile resource, and the task schedule data is planned before initiation of the task. The task schedule data and the real-time location data of the mobile resource are correlated. An alert is transmitted in real-time based on correlating the task schedule data and the real-time mobile resource location data.
    Type: Application
    Filed: December 17, 2009
    Publication date: November 11, 2010
    Inventors: Brian Fletcher, Robert Laithwaite, Robert Collins
  • Publication number: 20100109201
    Abstract: A nano-imprint lithography template includes a non-porous base layer, a cap layer, and a porous layer between the base layer and the cap layer. The porous layer defines a multiplicity of pores and has an ordered pore structure. The cap layer is permeable to helium, and the pores in the porous layer are configured to accept gas passing through the cap layer during an imprint lithography process. The porous layer provides high porosity with a Young's modulus and hardness that are advantageous for imprint lithography processes.
    Type: Application
    Filed: October 30, 2009
    Publication date: May 6, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Edward Brian Fletcher, Frank Y. Xu, Weijun Liu, Marlon Menezes
  • Publication number: 20100084376
    Abstract: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
    Type: Application
    Filed: October 2, 2009
    Publication date: April 8, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Niyaz Khusnatdinov, Weijun Liu, Frank Y. Xu, Fen Wan, Edward Brian Fletcher, Marlon Menezes
  • Publication number: 20100072671
    Abstract: A nano-imprint lithography template includes a rigid support layer, a cap layer, and a flexible cushion layer positioned between the support layer and the cap layer. Treating an imprint lithography template includes heating the template to desorb gases from the template. Heating the template includes radiating the template at a selected wavelength with, for example, infrared radiation. The selected wavelength may correspond to a wavelength at which the template material is strongly absorbing.
    Type: Application
    Filed: September 25, 2009
    Publication date: March 25, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Gerard M. Schmid, Weijun Liu, Edward Brian Fletcher, Frank Y. Xu, Fen Wan
  • Publication number: 20090199192
    Abstract: Embodiments of the invention are concerned with allocating resources to tasks and have particular application to situations where the availability of resources and the tasks to be performed change dynamically and the resources are mobile. When dealing with a mobile resource such as a field technician, typically a series of tasks, known for example as a “tour” of tasks, is allocated to the resource. A known factor in scheduling tasks in a tour is travel time between tasks, and as a result the geographical position of the tasks can be a factor in building a tour. If a resource reports in and the scheduling system adjusts the provisional schedule, for example by adding one or more tasks to a tour, those tasks will be chosen at least in part with regard to the geographical location of the resource and that of existing tasks in the tour.
    Type: Application
    Filed: February 5, 2008
    Publication date: August 6, 2009
    Inventors: Robert Laithwaite, Brian Fletcher, Guy Johnson
  • Publication number: 20090155583
    Abstract: An imprint lithography imprinting stack includes a substrate and a polymeric adhesion layer adhered to the substrate. The polymeric adhesion layer includes polymeric components with an extended backbone length of at least about 2 nm. The backbones of the polymeric components may be substantially aligned in a planar configuration on the surface of the substrate, such that a thickness of the polymeric adhesion layer is less than about 2 nm.
    Type: Application
    Filed: December 2, 2008
    Publication date: June 18, 2009
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Frank Y. Xu, Edward Brian Fletcher
  • Publication number: 20090140458
    Abstract: An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
    Type: Application
    Filed: November 21, 2008
    Publication date: June 4, 2009
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Frank Y. Xu, Weijun Liu, Edward Brian Fletcher, Sidlgata V. Sreenivasan, Byung Jin Choi, Niyaz Khusnatdinov, Anshuman Cherala, Kosta S. Selinidis
  • Publication number: 20080308971
    Abstract: A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.
    Type: Application
    Filed: June 16, 2008
    Publication date: December 18, 2008
    Applicant: Molecular Imprints, Inc.
    Inventors: Weijun Liu, Frank Y. Xu, Edward Brian Fletcher
  • Publication number: 20080303187
    Abstract: An imprint lithography template with an active area arranged to receive imprinting material during an imprint lithography process and a non-active area adjacent the active area is described. At least a portion of the non-active area is treated to inhibit flow of the imprinting material from the active area to the non-active area during the imprint lithography process.
    Type: Application
    Filed: December 28, 2007
    Publication date: December 11, 2008
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Nicholas A. Stacey, Edward Brian Fletcher, Michael N. Miller, Michael P.C. Watts
  • Patent number: 7240245
    Abstract: A fault management system is operated for an access network which forms part of a communications network. In the access network, terminating lines in the form of pairs of copper wires extend from a local switch through a series of nodes to terminal equipment provided for users of the network. The fault management system includes a test head and an access network system. Each night, the test head performs a series of tests on each of the terminating lines. The results of the tests are transmitted to the access network management. The test results are then analyzed with respect to a set of parameters to identify characteristics that would indicate that a fault is likely to occur on the associated circuit within a predetermined period e.g. 1 year. Further analysis can then be carried out to establish the probability of the fault actually occurring and/or whether the potential fault analyzed is going to occur in either the underground or the over-ground part of the network.
    Type: Grant
    Filed: December 17, 2001
    Date of Patent: July 3, 2007
    Assignee: British Telecommunications
    Inventors: Richard Maxwell, Brian A Fletcher
  • Publication number: 20070093319
    Abstract: A high performance golf ball having a reduced overall distance while maintaining the appearance of a high performance trajectory. The golf ball includes a combination of low CoR core and cover materials coupled with a less efficient aerodynamic dimple pattern that achieves a reduction in carry and overall distance of at least 5 yards versus a conventional golf ball, while still providing the look, sound, feel and apparent flight of a conventional golf ball. A high performance golf ball having a reduced distance is also achieved by maintaining the lift to weight ratio to be greater than 1.5 at a Reynolds number of about 205,000 and a spin rate of 2900 rpm.
    Type: Application
    Filed: December 5, 2006
    Publication date: April 26, 2007
    Inventors: Michael Sullivan, Edmund Hebert, Nicholas Nardacci, Derek Ladd, Brian Fletcher
  • Publication number: 20040039957
    Abstract: There is described a method of operating a fault management system for an access network which forms part of a communications network. In the access network, terminating lines in the form of pairs of copper wires extend from a local switch (10) through a series of nodes to terminal equipment provided for user of the network. The fault management system includes a test head (104) and an access network management system (102).
    Type: Application
    Filed: June 6, 2003
    Publication date: February 26, 2004
    Inventors: Richard Maxwell, Brian A. Fletcher
  • Patent number: 4643831
    Abstract: A system for water treatment includes the steps of superchlorinating the water to a level sufficient to destroy bacterial content in the water very rapidly, passing the water through a sand filter in which the medium includes beads of magnesium hydroxide and subjecting different portions of the filtered water to differing degrees of filtration by an activated charcoal filter, whereby to remove a sufficient proportion of the chlorine added to the water to reduce the residual chlorine to a level sufficient to maintain the water sterile without substantially influencing the taste of the water. Preferably, the sand and charcoal filters are disposed horizontally, and the depths of the filter beds are graded horizontally to provide the differing degrees of filtration to the water.
    Type: Grant
    Filed: December 23, 1985
    Date of Patent: February 17, 1987
    Assignee: EWS Water Treatment Inc.
    Inventor: Brian Fletcher