Patents by Inventor Byung Jin Choi

Byung Jin Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11020894
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Grant
    Filed: October 30, 2018
    Date of Patent: June 1, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20210159230
    Abstract: A semiconductor device may comprise: a plurality of lower electrodes which are on a substrate; a first electrode support which is between adjacent lower electrodes and comprises a metallic material; a dielectric layer which is on the lower electrodes and the first electrode support to extend along profiles of the first electrode support and each of the lower electrodes; and an upper electrode which is on the dielectric layer.
    Type: Application
    Filed: September 25, 2020
    Publication date: May 27, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Yoon Young CHOI, Seung Jin KIM, Byung-Hyun LEE, Sang Jae PARK
  • Publication number: 20210157229
    Abstract: Systems and methods for shaping a film. The method of shaping a film may comprise dispensing a polymerizable fluid as a plurality of droplets onto a substrate. The method of shaping a film may further comprise bringing an initial superstrate contact region of a superstrate into contact with an initial subset of droplets of the plurality of droplets. The initial subset of droplets may merge and form an initial fluid film over the initial substrate contact region. The method of shaping a film may further comprise prior to the superstrate coming into contact with the remaining plurality of droplets on the substrate, polymerizing a region of the initial fluid film on the initial substrate contact region.
    Type: Application
    Filed: November 25, 2019
    Publication date: May 27, 2021
    Inventors: Anshuman Cherala, Mario Johannes Meissl, Byung-Jin Choi
  • Publication number: 20210159075
    Abstract: An apparatus is provided. The apparatus has a chuck having a first side configured to retain a superstrate or a template and a second side, an array of image sensors disposed at the second side of the chuck and spaced from the chuck, and an array of light sources disposed between the transparent chuck and the array of image sensors.
    Type: Application
    Filed: November 26, 2019
    Publication date: May 27, 2021
    Inventor: Byung-Jin Choi
  • Patent number: 11018045
    Abstract: A deposition apparatus for depositing a material on a wafer, the apparatus including a lower shower head; an upper shower head disposed on the lower shower head, the upper shower head facing the lower shower head; and a support structure between the upper shower head and the lower shower head, the wafer being supportable by the support structure, wherein the upper shower head includes upper holes for providing an upper gas onto the wafer, the lower shower head includes lower holes for providing a lower gas onto the wafer, the support structure includes a ring body surrounding the wafer; a plurality of ring support shafts between the ring body and the lower shower head; and a plurality of wafer supports extending inwardly from a lower region of the ring body to support the wafer, and the plurality of wafer supports are spaced apart from one another.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: May 25, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji Youn Seo, Byung Sun Park, Sung Jin Park, Ji Woon Im, Hyun Seok Lim, Byung Ho Chun, Yu Seon Kang, Hyuk Ho Kwon, Tae Yong Eom, Dae Hun Choi, Dong Hyeop Ha
  • Patent number: 11003268
    Abstract: A touch sensor includes a base layer, first sensing electrodes arranged on the base layer along a first direction, second sensing electrodes arranged on the base layer along a second direction, first compensation electrodes on the first sensing electrodes, and second compensation electrodes on the second sensing electrodes. The first compensation electrodes entirely cover each of the first sensing electrodes in a plan view, and the second compensation entirely cover each of the second sensing electrodes in a plan view.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: May 11, 2021
    Assignee: DONGWOO FINE-CHEM CO., LTD.
    Inventors: Byung Jin Choi, Min Hyuk Park, Jae Hyun Lee
  • Patent number: 11000481
    Abstract: The present invention relates to a composite preparation with various dosage forms comprising mosapride and rabeprazole. The composite preparation prepared according to the present invention allows rapid release of a drug without deteriorating its release by an interaction between mosapride and rabeprazole, thus exhibiting an improved drug release rate and bioavailability, while having excellent product stability and being capable of significantly lowering the amount of the excipient. Accordingly, the composite preparation of the present invention can improve patients' drug compliance due to the size of its dosage form.
    Type: Grant
    Filed: June 27, 2016
    Date of Patent: May 11, 2021
    Assignee: KOREA UNITED PHARM. INC.
    Inventors: Youn Woong Choi, Hee Yong Song, Dae-Chul Ha, Byung Jin Kim
  • Publication number: 20210129712
    Abstract: A seat apparatus for a vehicle is provided, wherein a base bracket and a moving bracket are mounted to a body floor to lift and lower a seat, and a seat track is mounted to the moving bracket to move the seat in forward and rearward directions, so that the seat is moved and lifted and lowered. Accordingly, since the lifting/lowering structure of the seat is mounted to the body floor, space is secured below the seat, so indoor atmosphere is improved due to the increase of the space efficiency.
    Type: Application
    Filed: March 26, 2020
    Publication date: May 6, 2021
    Applicants: Hyundai Motor Company, Kia Motors Corporation, Daechang Seat Co., LTD-Dongtan
    Inventors: Hyung Jin PARK, Guk Mu PARK, Byeong Kwang KIM, Sang Uk YU, So Young YOO, Seon Chae NA, Byung Yong CHOI, Myung Soo LEE, Chan Ki CHO, Gyeong Jae LEE
  • Patent number: 10996561
    Abstract: A head module of an imprint lithography system includes a base, a control body coupled to the base, a first set of actuators configured to generate a first force to translate the control body relative to the base along a first axis and to rotate the control body relative to the base about a second axis perpendicular to the first axis and about a third axis perpendicular to the first axis and to the second axis, a second set of actuators configured to generate a second force to translate the control body relative to the base in a plane defined by the second axis and the third axis and to rotate the control body relative to the base about the first axis, and a flexure coupling the base and the control body and restricting translation and rotation of the control body with respect to the base.
    Type: Grant
    Filed: December 26, 2017
    Date of Patent: May 4, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Seth J. Bamesberger, Jeremy Sevier, Byung-Jin Choi, Philip D. Schumaker, Mario Johannes Meissl
  • Patent number: 10996560
    Abstract: Reducing an alignment error of an imprint lithography template with respect to a substrate includes locating central alignment marks of the template with respect to corresponding central alignment marks of the substrate and locating peripheral alignment marks of the template with respect to corresponding peripheral alignment marks of the substrate. In-plane alignment error of the template is assessed based on relative positions of central alignment marks of the template and corresponding central alignment marks of the substrate. A combined alignment error of the template is assessed based on relative positions of peripheral alignment marks of the template and corresponding peripheral alignment marks of the substrate. Out-of-plane alignment error of the template is assessed based on a difference between the-combined and the in-plane alignment error of the template, and a relative position of the template and the substrate is adjusted to reduce the out-of-plane alignment error of the template.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: May 4, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Anshuman Cherala, Mario Johannes Meissl, Byung-Jin Choi
  • Publication number: 20210125855
    Abstract: A chuck for retaining a superstrate or a template. The chuck comprises a geometric structure formed on a surface of the chuck. The geometric structure includes at least one of a rounded edge portion and a roughened surface portion, such that an intensity variation of light transmitting through the geometric structure and an area of the chuck adjacent to the geometric structure is reduced.
    Type: Application
    Filed: October 29, 2019
    Publication date: April 29, 2021
    Inventors: Nilabh K. Roy, Mario Johannes Meissl, Seth J. Bamesberger, Ozkan Ozturk, Byung-Jin Choi
  • Patent number: 10991582
    Abstract: A template for imprint lithography can include a body. The body can include a base surface and have a recession extending from the base surface lying along a base plane, the recession including a main portion having a tapered sidewall. In a particular embodiment, the recession includes an intermediate portion having an intermediate sidewall. The intermediate sidewall is rounded or at least part of the intermediate sidewall lies at a different angle as compared to an average tapered angle of the main portion. In another aspect, a method of fabricating a semiconductor device can include forming a patterned resist layer having a tapered sidewall over a substrate having device layers; patterning the device layers using the patterned resist layer; and etching portions of at least some of device layers to expose lateral portions of the at least some device layers. The template is well suited for forming 3D memory arrays.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: April 27, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Byung-Jin Choi
  • Patent number: 10990234
    Abstract: The present invention relates to a touch sensor having an antenna. The touch sensor comprises: a touch sensor part including a sensing electrode part; and an antenna part formed on the touch sensor part. The antenna part is formed in a state of being insulated from the sensing electrode part on the sensing electrode part composing the touch sensor part. According to the present invention, even when mounting the antenna on a display region in which a touch sensor is installed, noise due to interference between a touch sensor signal and an antenna transmission/reception signal can be minimized.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: April 27, 2021
    Assignee: DONGWOO FINE-CHEM CO., LTD.
    Inventors: Jong Min Kim, Dong Pil Park, Byung Jin Choi
  • Publication number: 20210113998
    Abstract: The present disclosure relates to a catalyst for directly decomposing urea, a method for preparing the same and a system for decomposing urea including the same, whereby the efficiency of decomposing urea to ammonia may be improved while preventing the formation of a byproduct such as biuret at temperatures of 200° C. or below by controlling the oxygen composition of the catalyst including titania and ceria.
    Type: Application
    Filed: September 2, 2020
    Publication date: April 22, 2021
    Inventors: Sei Youn Noh, Nam Ha Kim, Byung Han Seo, Hyo Sang Lee, Myoung Jin Kha, Jong Min Won, Gyeong Ryun Choi
  • Publication number: 20210104400
    Abstract: A method of deposition is disclosed. The method can include dispensing a formable material over a substrate, where the substrate includes a non-uniform surface topography, and where the substrate includes an active zone and an exclusion zone. The method can also include curing the formable material in the exclusion zone to form a circular edge between the exclusion zone and the active zone, contacting the formable material with a superstrate, and curing the formable material in the active zone to form a layer over the substrate, wherein curing is performed while the superstrate is contacting the formable material.
    Type: Application
    Filed: October 8, 2019
    Publication date: April 8, 2021
    Inventor: Byung-Jin CHOI
  • Patent number: 10968516
    Abstract: Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: April 6, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Se-Hyun Ahn, Byung-Jin Choi, Frank Y. Xu
  • Patent number: 10969680
    Abstract: Methods, systems, and apparatus for adjusting a relative position of templates including determining a first plurality of position points of a surface of a region adjacent to an active region of a first template, the surface of the adjacent region and a surface of the active region forming a continuous surface of the first template; identifying a plane of the surface of the adjacent region of the first template based on the first plurality of position points; determining a second plurality of position points of a surface of an active region of a second template, the active region of the second template protruding from a surface of the second template; identifying a plane of the surface of the active region of the second template based on the second plurality of position points; and adjusting a relative position of the first template and the second template based on the identified planes.
    Type: Grant
    Filed: November 30, 2016
    Date of Patent: April 6, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Byung-Jin Choi, Makoto Mizuno
  • Patent number: 10942599
    Abstract: An electrode connection unit is to be electrically connected with electrode terminals. The electrode connection unit includes a metallic core part having a plurality of first holes therein and a conductive nonmetallic coating layer on the metallic core part. An image display device and a touch screen panel include the electrode connection unit.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: March 9, 2021
    Assignee: DONGWOO FINE-CHEM CO., LTD.
    Inventors: Byung Jin Choi, Dong Hwan Kim
  • Publication number: 20210063870
    Abstract: Reducing an overlay error in nanoimprint lithography includes forming an imprinted substrate having pairs of corresponding peripheral overlay marks and corresponding central overlay marks on the imprinted substrate. An in-plane overlay error is assessed based on relative positions of corresponding central overlay marks, and a combined overlay error is assessed based on relative positions of corresponding peripheral overlay marks. A difference between the combined overlay error and the in-plane overlay error is assessed to yield an adjusted overlay error for each pair of corresponding peripheral overlay marks.
    Type: Application
    Filed: November 12, 2020
    Publication date: March 4, 2021
    Inventors: Anshuman Cherala, Mario Johannes Meissl, Byung-Jin Choi
  • Patent number: D920364
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: May 25, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Byung-Jin Kang, Ji-Hyun Choi, Kyu-Hong Kim, Gwan-Young Yoo, Do-Hyung Lee, Yu-Sun Cheong, Byeong-Seok Choi