Abstract: In large area plasma processing systems, process gases may be introduced to the chamber via the showerhead assembly which may be driven as an RF electrode. The gas feed tube, which is grounded, is electrically isolated from the showerhead. The gas feed tube may provide not only process gases, but also cleaning gases from a remote plasma source to the process chamber. The inside of the gas feed tube may remain at either a low RF field or a zero RF field to avoid premature gas breakdown within the gas feed tube that may lead to parasitic plasma formation between the gas source and the showerhead. By feeding the gas through an RF choke, the RF field and the processing gas may be introduced to the processing chamber through a common location and thus simplify the chamber design.

Abstract: The present invention generally includes a remote plasma source and a method of generating a plasma in a remote plasma source. Cleaning gas may be ignited into a plasma in a remote location and then provided to the processing chamber. By flowing the cleaning gas outside of a cooled RF coil, a plasma may be ignited at either high or low pressure while providing a high RF bias to the coil. Cooling the RF coil may reduce sputtering of the coil and thus reduce undesirable contaminants from being fed to the processing chamber with the cleaning gas plasma. Reduced sputtering from the coil may extend the useful life of the remote plasma source.

Abstract: An RF feed for a processing apparatus is disclosed. Coupling an RF generator to an RF matching network by a rigid RF feed lessens the amount of power that is lost during transmission from the generator to the matching network. The rigid RF feed comprises an inverted J shaped section that decouples the generator from the matching network whenever servicing the chamber is necessary. The J shape section has two parallel portions coupled together by a perpendicular portion. The J shaped section may be removed as a one piece assembly by uncoupling the J shaped section at a location disposed near the top of the chamber and a location near the floor of the chamber. The connections between the J shaped section and the remainder of the RF feed face the same direction to ensure easy coupling and decoupling without twisting and/or bending any portion of the rigid RF feed.

Abstract: A method and apparatus for monitoring the integrity of a ground member coupling a substrate support to a chamber body in a plasma processing system is provided. In one embodiment, a processing chamber is provided that includes a ground path member coupled between a substrate support and a chamber body. A sensor is positioned to sense a metric indicative of current passing through the ground member. In another embodiment, a method monitoring the integrity of a ground member coupling a substrate support to a chamber body in a plasma processing chamber includes monitoring a metric indicative of current passing through the ground member during processing, and setting a flag in response to the metric exceeding a predefined threshold.

Abstract: A system and method for performing friction stir welding of non-planar materials having high melting temperatures, wherein a process is provided for performing longitudinal and radial welds on objects such as pipes, flanges, tanks, and shrouds, and wherein an active or passive mandrel provides support for the friction stir welding process.

Abstract: A probe for friction stir welding MMCs, ferrous alloys, non-ferrous alloys, and superalloys, as well as non-ferrous alloys, the probe including a shank, a shoulder, and a pin disposed through the shoulder and into the shank, wherein the pin and the shoulder at least include a coating comprised of a superabrasive material, the Din and shoulder being designed to reduce stress risers, disposing a collar around a portion of the shoulder and the shank to thereby prevent movement of the shoulder relative to the shank, and incorporating thermal management by providing a thermal flow barrier between the shoulder and the shank, and between the collar and the tool.

Abstract: A chamber for plasma processing a substrate. The chamber includes one or more chamber walls defining a plasma processing region and an RF transmitting device configured to transmit RF energy to the plasma processing region. The RF transmitting device comprises a first coil portion and a second coil portion connected in parallel. Each of the first coil portion and the second coil portion is a half turn coil and the voltage at an input of the first coil portion and the voltage at an input of the second coil portion are about the same.

Abstract: In certain aspects, a substrate deposition apparatus, including a gas tube coupled to a gas source, an RF power source and a substrate processing chamber, is provided. The gas tube is adapted to carry process gas and cleaning plasma from the gas source/remote plasma gas source to the substrate processing chamber and the RF power source is adapted to couple RF power to the substrate processing chamber. Furthermore an RF choke coupled to the RF power source and the gas source wherein the RF choke is adapted to attenuate a voltage difference between the RF power source and the gas source to prevent plasma formation in the gas tube during substrate processing. Numerous other aspects are provided.

Abstract: Apparatus and methods are provided that are adapted to match the impedance of an electrical load to an impedance of an electrical signal generator. The invention includes providing a plurality of electrical components adapted to collectively match the impedance of the electrical load to the impedance of the electrical signal generator. The electrical components are arranged symmetrically and concentrically about an axis. Additionally, the invention may also include a first connector adapted to electrically couple the electrical signal generator to the electrical components. Additionally, the invention may also include a second connector adapted to electrically couple the load to the electrical components. Numerous other aspects are provided.

Abstract: A method of selecting a geometry for a friction stirring tool, said tool having a melting point that is higher than the workpiece material, wherein the tool is placed in motion against the workpiece to generate heat in the workpiece such that workpiece material is transported in surface features of the tool, and wherein surface features manage workpiece material flow around the tool, and wherein the tool can be used in friction stir processing, friction stir mixing, friction stir welding, and friction stir spot welding of high melting temperature materials or high softening temperature materials.

Abstract: An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the chamber wall and the second end adapted to be connected to the substrate support, wherein the curtain further comprises at least one fold in the curtain material, located an axial distance between the first end and the second end, and at least one perforation cut into the curtain proximate the second end.

Abstract: A friction stir welding anvil and method of producing a friction stir welding anvil that precludes diffusion or mechanical bonding of the anvil to the work pieces are provided. The alternatives for producing such an anvil comprise coating the anvil with diffusion barriers such as oxides, nitrides, intermetallics, and/or refractory metals; manufacturing an anvil either completely or partially from the same; or placing a coating of such materials in the form of a thin sheet or a powder between the anvil and the work pieces. The anvil disclosed herein exhibits high strength and hardness even at elevated temperatures, such as those greater than 800° C., so as to prevent the anvil from mechanically or diffusion bonding to the work pieces and so as to minimize, or eliminate altogether, anvil deformation.

Abstract: An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the chamber wall and the second end adapted to be connected to the substrate support, wherein the curtain further comprises at least one fold in the curtain material, located an axial distance between the first end and the second end, and at least one perforation cut into the curtain proximate the second end.

Abstract: In certain aspects, a plasma chamber is provided that has (1) a chamber size of at least about 1.8 by 2.0 meters; and (2) an effective inductance having an inductive reactance of not more than about 12-15 ohms. The plasma chamber may be used, for example, to process substrates used for flat panel displays. Numerous other aspects are provided.

Abstract: In certain embodiments, an apparatus for providing a fixed impedance transformation network for driving a plasma chamber includes a pre-match network adapted to couple between an Active RF match network and a plasma chamber load associated with the plasma chamber. The pre-match network includes (1) a first capacitive element; (2) an inductive element connected in parallel with the first capacitive element to form a parallel circuit that presents a stepped-up impedance to an output of the Active RF match network such that a voltage required to drive the plasma chamber load is reduced; and (3) a second capacitive element coupled to the parallel circuit and adapted to couple to the plasma chamber load. The second capacitive element reduces or cancels at least in part a reactance corresponding to an inductance associated with the plasma chamber load. Numerous other aspects are provided.

Abstract: Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.

Abstract: A method comprising a bulk processing technique for joining different metals and alloys using friction stir welding, wherein a block of a first material has at least two apertures disposed therein, wherein at least a first tube and a second tube are disposed in the at least two apertures, wherein friction stir welding is performed to join the block, the first tube and the second tube together in a solid state form, and the resulting workpiece is then machined to produce the completed joint.

Abstract: A control system and method of use that enables friction stir welding of metal matrix composites, ferrous alloys, non-ferrous alloys, and superalloys when using a superabrasive tool, wherein the control system and method enables control of various operational aspects of a friction stir welding mill in order to make it possible to perform friction stir welding that is repeatable, reliable, and results in a superior finished workpiece.

Abstract: A system and method for performing friction stir welding of non-planar materials having high melting temperatures, wherein a process is provided for performing longitudinal and radial welds on objects such as pipes, flanges, tanks, and shrouds, and wherein an active or passive mandrel provides support for the friction stir welding process.

Abstract: A friction stir welding anvil and method of producing a friction stir welding anvil that precludes diffusion or mechanical bonding of the anvil to the work pieces are provided. The alternatives for producing such an anvil comprise coating the anvil with diffusion barriers such as oxides, nitrides, intermetallics, and/or refractory metals; manufacturing an anvil either completely or partially from the same; or placing a coating of such materials in the form of a thin sheet or a powder between the anvil and the work pieces. The anvil disclosed herein exhibits high strength and hardness even at elevated temperatures, such as those greater than 800° C., so as to prevent the anvil from mechanically or diffusion bonding to the work pieces and so as to minimize, or eliminate altogether, anvil deformation.