Patents by Inventor Carsten Von Koblinski

Carsten Von Koblinski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9013890
    Abstract: In one embodiment, a semiconductor package includes an isolating container having a recess, which forms an inner membrane portion and an outer rim portion. The rim portion is thicker than the membrane portion. The package includes a semiconductor chip disposed in the recess and a backplane disposed under the membrane portion of the isolating container.
    Type: Grant
    Filed: January 11, 2012
    Date of Patent: April 21, 2015
    Assignee: Infineon Technologies AG
    Inventors: Udo Ausserlechner, Carsten von Koblinski, Sigrid Wabnig, Volker Strutz, Robert Grünberger
  • Patent number: 8922016
    Abstract: A method for producing a composite material, associated composite material and associated semiconductor circuit arrangements is disclosed. A plurality of first electrically conducting material particles are applied to a carrier substrate and a second electrically conducting material is galvanically deposited on a surface of the first material particles in such a way that the second material mechanically and electrically bonds the plurality of first material particles to one another.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: December 30, 2014
    Assignee: Infineon Technologies AG
    Inventors: Oliver Hellmund, Daniel Kraft, Friedrich Kroener, Francisco Javier Santos Rodriguez, Carsten Von Koblinski
  • Publication number: 20140339694
    Abstract: A method for manufacturing semiconductor devices includes providing a stack having a semiconductor wafer and a glass substrate with openings and at least one trench attached to the semiconductor wafer. The semiconductor wafer includes a plurality of semiconductor devices. The openings of the glass substrate leave respective areas of the semiconductor devices uncovered by the glass substrate and the trench connects the openings. A metal layer is formed at least on exposed walls of the trench and the openings and on the uncovered areas of the semiconductor devices of the semiconductor wafer. A metal region is formed by electroplating metal in the openings and the trench and by subsequently grinding the glass substrate to remove the trenches. The stack of the semiconductor wafer and the attached glass substrate is cut to separate the semiconductor devices.
    Type: Application
    Filed: May 15, 2013
    Publication date: November 20, 2014
    Inventors: Carsten von Koblinski, Ulrike Fastner, Peter Zorn, Markus Ottowitz
  • Patent number: 8865522
    Abstract: A method for connecting a semiconductor chip to a metal layer of a carrier substrate is disclosed. A semiconductor chip is provided which has a first side, a second side opposite the first side, a glass substrate bonded to the second side of the semiconductor chip and including at least one opening leaving an area of the second side of the semiconductor chip uncovered by the glass substrate, and a metallization region arranged in the opening of the glass substrate and electrically contacting the second side of the semiconductor chip. The semiconductor chip with the bonded glass substrate is brought onto a metal layer of a carrier substrate. A firm mechanical and electrical connection is formed between the metal layer of the carrier substrate and the metallization region.
    Type: Grant
    Filed: April 18, 2013
    Date of Patent: October 21, 2014
    Assignee: Infineon Technologies Austria AG
    Inventors: Carsten von Koblinski, Gerald Lackner, Karin Schrettlinger, Markus Ottowitz
  • Patent number: 8841768
    Abstract: A chip package is provided, the chip package including: first encapsulation structure; first passivation layer formed over first encapsulation structure and first electrically conductive layer formed over first passivation layer; at least one chip arranged over first electrically conductive layer and passivation layer wherein at least one chip contact pad contacts first electrically conductive layer; at least one cavity formed in first encapsulation structure, wherein at least one cavity exposes a portion of first passivation layer covering at least one chip contact pad; second encapsulation structure disposed over first encapsulation structure and covering at least one cavity, wherein a chamber region over at least one chip contact pad is defined by at least one cavity and second encapsulation structure; wherein second encapsulation structure includes an inlet and outlet connected to chamber region, wherein inlet and outlet control an inflow and outflow of heat dissipating material to and from chamber region
    Type: Grant
    Filed: July 23, 2012
    Date of Patent: September 23, 2014
    Assignee: Infineon Technologies AG
    Inventors: Carsten Von Koblinski, Michael Knabl, Ursula Meyer, Francisco Javier Santos Rodriguez, Alexander Breymesser, Andre Brockmeier
  • Patent number: 8803312
    Abstract: A method for manufacturing semiconductor devices is disclosed. A semiconductor wafer is provided having a first surface and a second surface opposite to the first surface. A first glass substrate is provided which has at least one of cavities and openings at the bonding surface. The first glass substrate is bonded to the first surface of the semiconductor wafer such that the metal pads are arranged within respective cavities or openings of the first glass substrate. The second surface of the semiconductor wafer is machined. At least one metallization region is formed on the machined second surface of the semiconductor wafer.
    Type: Grant
    Filed: August 14, 2013
    Date of Patent: August 12, 2014
    Assignee: Infineon Technologies Austria AG
    Inventors: Carsten von Koblinski, Gerald Lackner, Karin Schrettlinger, Markus Ottowitz
  • Publication number: 20140167192
    Abstract: In one embodiment, a semiconductor device includes a glass substrate, a semiconductor substrate disposed on the glass substrate, and a magnetic sensor disposed within and/or over the semiconductor substrate.
    Type: Application
    Filed: February 24, 2014
    Publication date: June 19, 2014
    Applicant: Infineon Technologies AG
    Inventors: Carsten von Koblinski, Volker Strutz, Manfred Engelhardt
  • Patent number: 8722514
    Abstract: In one embodiment, a semiconductor device includes a glass substrate, a semiconductor substrate disposed on the glass substrate, and a magnetic sensor disposed within and/or over the semiconductor substrate.
    Type: Grant
    Filed: January 17, 2011
    Date of Patent: May 13, 2014
    Assignee: Infineon Technologies AG
    Inventors: Carsten von Koblinski, Volker Strutz, Manfred Engelhardt
  • Publication number: 20140021610
    Abstract: A chip package is provided, the chip package including: first encapsulation structure; first passivation layer formed over first encapsulation structure and first electrically conductive layer formed over first passivation layer; at least one chip arranged over first electrically conductive layer and passivation layer wherein at least one chip contact pad contacts first electrically conductive layer; at least one cavity formed in first encapsulation structure, wherein at least one cavity exposes a portion of first passivation layer covering at least one chip contact pad; second encapsulation structure disposed over first encapsulation structure and covering at least one cavity, wherein a chamber region over at least one chip contact pad is defined by at least one cavity and second encapsulation structure; wherein second encapsulation structure includes an inlet and outlet connected to chamber region, wherein inlet and outlet control an inflow and outflow of heat dissipating material to and from chamber region
    Type: Application
    Filed: July 23, 2012
    Publication date: January 23, 2014
    Applicant: INFINEON TECHNOLOGIES AG
    Inventors: Carsten VON KOBLINSKI, Michael KNABL, Ursula MEYER, Francisco Javier SANTOS RODRIGUEZ, Alexander BREYMESSER, Andre BROCKMEIER
  • Publication number: 20130333203
    Abstract: A method for manufacturing a transformer device includes providing a glass substrate having a first side and a second side arranged opposite the first side, forming a first recess in the glass substrate at the first side of the glass substrate, forming a second recess in the glass substrate at the second side of the glass substrate opposite to the first recess, forming a first coil in the first recess, and forming a second coil in the second recess.
    Type: Application
    Filed: August 21, 2013
    Publication date: December 19, 2013
    Applicant: Infineon Technologies Austria AG
    Inventors: Friedrich Kroener, Carsten von Koblinski
  • Patent number: 8610257
    Abstract: A semiconductor device and method for producing such a device is disclosed. One embodiment provides a semiconductor functional wafer having a first and second main surface. Component production processes are performed for producing a component functional region at the first main surface, wherein the component production processes produce an end state that is stable up to at least a first temperature. A carrier substrate is fitted to the first main surface. Access openings are produced to the first main surface. At least one further component production process is performed for producing patterned component functional regions at the first main surface of the functional wafer in the access openings. The end state produced in this process is stable up to a second temperature, which is less than the first temperature.
    Type: Grant
    Filed: October 10, 2011
    Date of Patent: December 17, 2013
    Assignee: Infineon Technologies AG
    Inventors: Friedrich Kroener, Francisco Javier Santos Rodriguez, Carsten von Koblinski
  • Publication number: 20130328183
    Abstract: A method for manufacturing semiconductor devices is disclosed. A semiconductor wafer is provided having a first surface and a second surface opposite to the first surface. A first glass substrate is provided which has at least one of cavities and openings at the bonding surface. The first glass substrate is bonded to the first surface of the semiconductor wafer such that the metal pads are arranged within respective cavities or openings of the first glass substrate. The second surface of the semiconductor wafer is machined. At least one metallisation region is formed on the machined second surface of the semiconductor wafer.
    Type: Application
    Filed: August 14, 2013
    Publication date: December 12, 2013
    Applicant: Infineon Technologies Austria AG
    Inventors: Carsten von Koblinski, Gerald Lackner, Karin Schrettlinger, Markus Ottowitz
  • Patent number: 8552829
    Abstract: A transformer device includes a glass substrate having a first side and a second side arranged opposite the first side. A first recess is formed at the first side of the glass substrate. A second recess is formed at the second side of the glass substrate. The first and second recesses are arranged opposite to each other. A first coil is arranged in the first recess and a second coil is arranged in the second recess.
    Type: Grant
    Filed: November 19, 2010
    Date of Patent: October 8, 2013
    Assignee: Infineon Technologies Austria AG
    Inventors: Friedrich Kroener, Carsten von Koblinski
  • Patent number: 8546934
    Abstract: A method for manufacturing semiconductor devices is disclosed. A semiconductor wafer is provided having a first surface and a second surface opposite to the first surface. A first glass substrate is provided which has at least one of cavities and openings at the bonding surface. The first glass substrate is bonded to the first surface of the semiconductor wafer such that the metal pads are arranged within respective cavities or openings of the first glass substrate. The second surface of the semiconductor wafer is machined. At least one metallisation region is formed on the machined second surface of the semiconductor wafer.
    Type: Grant
    Filed: June 13, 2012
    Date of Patent: October 1, 2013
    Assignee: Infineon Technologies Austria AG
    Inventors: Carsten Von Koblinski, Gerald Lackner, Karin Schrettlinger, Markus Ottowitz
  • Publication number: 20130234297
    Abstract: A cavity is formed in a working surface of a substrate in which a semiconductor element is formed. A glass piece formed from a glass material is bonded to the substrate, and the cavity is filled with the glass material. For example, a pre-patterned glass piece is used which includes a protrusion fitting into the cavity. Cavities with widths of more than 10 micrometers are filled fast and reliably. The cavities may have inclined sidewalls.
    Type: Application
    Filed: March 8, 2012
    Publication date: September 12, 2013
    Applicant: INFINEON TECHNOLOGIES AUSTRIA AG
    Inventors: Alexander Breymesser, Andre Brockmeier, Francisco Javier Santos Rodriguez, Hans-Joachim Schulze, Carsten von Koblinski, Gerhard Schmidt
  • Publication number: 20130237034
    Abstract: A source material, which is based on a glass, is arranged on a working surface of a mold substrate. The mold substrate is made of a single-crystalline material. A cavity is formed in the working surface. The source material is pressed against the mold substrate. During pressing a temperature of the source material and a force exerted on the source material are controlled to fluidify source material. The fluidified source material flows into the cavity. Re-solidified source material forms a glass piece with a protrusion extending into the cavity. After re-solidifying, the glass piece may be bonded to the mold substrate. On the glass piece, protrusions and cavities can be formed with slope angles less than 80 degrees, with different slope angles, with different depths and widths of 10 micrometers and more.
    Type: Application
    Filed: March 8, 2012
    Publication date: September 12, 2013
    Applicant: INFINEON TECHNOLOGIES AG
    Inventors: Alexander Breymesser, Andre Brockmeier, Carsten von Koblinski, Francisco Javier Santos Rodriguez
  • Publication number: 20130228905
    Abstract: A method for connecting a semiconductor chip to a metal layer of a carrier substrate is disclosed. A semiconductor chip is provided which has a first side, a second side opposite the first side, a glass substrate bonded to the second side of the semiconductor chip and including at least one opening leaving an area of the second side of the semiconductor chip uncovered by the glass substrate, and a metallisation region arranged in the opening of the glass substrate and electrically contacting the second side of the semiconductor chip. The semiconductor chip with the bonded glass substrate is brought onto a metal layer of a carrier substrate. A firm mechanical and electrical connection is formed between the metal layer of the carrier substrate and the metallisation region.
    Type: Application
    Filed: April 18, 2013
    Publication date: September 5, 2013
    Applicant: Infineon Technologies Austria AG
    Inventors: Carsten von Koblinski, Gerald Lackner, Karin Schrettlinger, Markus Ottowitz
  • Publication number: 20120248631
    Abstract: A method for manufacturing semiconductor devices is disclosed. A semiconductor wafer is provided having a first surface and a second surface opposite to the first surface. A first glass substrate is provided which has at least one of cavities and openings at the bonding surface. The first glass substrate is bonded to the first surface of the semiconductor wafer such that the metal pads are arranged within respective cavities or openings of the first glass substrate. The second surface of the semiconductor wafer is machined. At least one metallisation region is formed on the machined second surface of the semiconductor wafer.
    Type: Application
    Filed: June 13, 2012
    Publication date: October 4, 2012
    Applicant: INFINEON TECHNOLOGIES AUSTRIA AG
    Inventors: Carsten Von Koblinski, Gerald Lackner, Karin Schrettlinger, Markus Ottowitz
  • Publication number: 20120181640
    Abstract: In one embodiment, a semiconductor device includes a glass substrate, a semiconductor substrate disposed on the glass substrate, and a magnetic sensor disposed within and/or over the semiconductor substrate.
    Type: Application
    Filed: January 17, 2011
    Publication date: July 19, 2012
    Inventors: Carsten von Koblinski, Volker Strutz, Manfred Engelhardt
  • Patent number: 8202786
    Abstract: A method for manufacturing semiconductor devices is disclosed. A semiconductor wafer is provided having a first surface and a second surface opposite to the first surface. A first glass substrate is provided which has at least one of cavities and openings at the bonding surface. The first glass substrate is bonded to the first surface of the semiconductor wafer such that the metal pads are arranged within respective cavities or openings of the first glass substrate. The second surface of the semiconductor wafer is machined. At least one metallization region is formed on the machined second surface of the semiconductor wafer.
    Type: Grant
    Filed: July 15, 2010
    Date of Patent: June 19, 2012
    Assignee: Infineon Technologies Austria AG
    Inventors: Carsten Von Koblinski, Gerald Lackner, Karin Schrettlinger, Markus Ottowitz