Patents by Inventor Ce Ma

Ce Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020072220
    Abstract: Methods for depositing a low-k dielectric film on the surfaces of semiconductors and integrated circuits are disclosed. A Si—O—C-in-ring cyclic siloxane precursor compound is applied to the surface by chemical vapor deposition where it will react with the surface and form a film having a dielectric constant, k, less than 2.5. The compound generally has the formula (—O—R1—O—)SiR2R3 or the formula (—R1—O—)SiR2R3.
    Type: Application
    Filed: October 5, 2001
    Publication date: June 13, 2002
    Inventors: Qing Min Wang, Ce Ma
  • Patent number: 6012325
    Abstract: A method and apparatus for measuring metallic impurities within a fluid by X-ray fluorescence in which a sample stream flowing at a constant flow rate is passed through a microporous filter. The microporous filter contains substantially no metallic impurities and is configured to adsorb the particulate solid phase and vapor phase of the compounds. Excitation of the metallic compounds by X-ray produces an X-ray florescence having an intensity that can be measured. The change in intensity is compared with that produced by a calibrated inflow of a standard gas sample to derive the impurity concentration. In a preferred embodiment, the filter is housed within a chamber having a window that is preferably fabricated from Beryllium so as not to appreciably attenuate the X-rays.
    Type: Grant
    Filed: November 5, 1997
    Date of Patent: January 11, 2000
    Assignee: The BOC Group, Inc. (a Delaware Corporation)
    Inventor: Ce Ma