Patents by Inventor Chandra Mouli

Chandra Mouli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8703566
    Abstract: A memory device includes an array of memory cells and peripheral devices. At least some of the individual memory cells include carbonated portions that contain SiC. At least some of the peripheral devices do not include any carbonated portions. A transistor includes a first source/drain, a second source/drain, a channel including a carbonated portion of a semiconductive substrate that contains SiC between the first and second sources/drains and a gate operationally associated with opposing sides of the channel.
    Type: Grant
    Filed: May 24, 2013
    Date of Patent: April 22, 2014
    Assignee: Micron Technology, Inc.
    Inventor: Chandra Mouli
  • Publication number: 20140106539
    Abstract: A method of formation of an isolation structure for vertical semiconductor devices, the resulting isolation structure, and a memory device to prevent leakage among adjacent vertical semiconductor devices are described.
    Type: Application
    Filed: December 12, 2013
    Publication date: April 17, 2014
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Kamal Karda, Chandra Mouli
  • Patent number: 8686494
    Abstract: The disclosed recessed thyristor-based memory cell comprises in one embodiment a conductive plug recessed into the bulk of the substrate, which is coupled to or comprises the enable gate of the cell. Vertically disposed around this recessed gate is a thyristor, whose anode is connected to the bit line and cathode is connected to the word line. The disclosed cell comprises no other gate, such as an access transistor, and hence is essentially a one-transistor device. As facilitated by the vertical disposition of the thyristor, the disclosed cell takes up a small amount of area on an integrated circuit when compared to a traditional DRAM cell. The disclosed cell is simple to manufacture in its various embodiments, and is easy to configure into an array of cells. Isolation underneath the cell assists in improving the data retention of the cell and extends the time needed between cell refresh.
    Type: Grant
    Filed: February 16, 2012
    Date of Patent: April 1, 2014
    Assignee: Micron Technology, Inc.
    Inventor: Chandra Mouli
  • Patent number: 8686487
    Abstract: Semiconductor devices include one or more transistors having a floating gate and a control gate. In at least one embodiment, the floating gate comprises an intermediate portion extending between two end portions. The intermediate portion has an average cross-sectional area less than one or both of the end portions. In some embodiments, the intermediate portion may comprise a single nanowire. In additional embodiments, semiconductor devices have one or more transistors having a control gate and a floating gate in which a surface of the control gate opposes a lateral side surface of a floating gate that defines a recess in the floating gate. Electronic systems include such semiconductor devices. Methods of forming semiconductor devices include, for example, forming a floating gate having an intermediate portion extending between two end portions, and configuring the intermediate portion to have an average cross-sectional area less than one or both of the end portions.
    Type: Grant
    Filed: June 14, 2007
    Date of Patent: April 1, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Gurtej Sandhu, Chandra Mouli, Di Li
  • Publication number: 20140054666
    Abstract: Some embodiments include a memory cell string having a body having a channel extending therein and in contact with a source/drain, a select gate adjacent to the body, a plurality of access lines adjacent to the body, and a dielectric in a portion of the body between the source/drain and a level corresponding to an end of the plurality of access lines most adjacent to the select gate. The dielectric in the portion of the body does not extend along an entire length of the body. Other embodiments are described and claimed.
    Type: Application
    Filed: August 22, 2012
    Publication date: February 27, 2014
    Inventors: Haitao Liu, Akira Goda, Chandra Mouli, Krishna K. Parat
  • Publication number: 20140051214
    Abstract: In one embodiment, a floating body field-effect transistor includes a pair of source/drain regions having a floating body channel region received therebetween. The source/drain regions and the floating body channel region are received over an insulator. A gate electrode is proximate the floating body channel region. A gate dielectric is received between the gate electrode and the floating body channel region. The floating body channel region has a semiconductor SixGe(1-x)-comprising region. The floating body channel region has a semiconductor silicon-comprising region received between the semiconductor SixGe(1-x)-comprising region and the gate dielectric. The semiconductor SixGe(1-x)-comprising region has greater quantity of Ge than any quantity of Ge within the semiconductor silicon-comprising region. Other embodiments are contemplated, including methods of forming floating body field-effect transistors.
    Type: Application
    Filed: February 7, 2013
    Publication date: February 20, 2014
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: Jun Liu, Michael P. Violette, Chandra Mouli, Howard Kirsch, Di Li
  • Patent number: 8643087
    Abstract: Methods and structures are described for reducing leakage currents in semiconductor memory storage cells. Vertically oriented nanorods may be used in the channel region of an access transistor. The nanorod diameter can be made small enough to cause an increase in the electronic band gap energy in the channel region of the access transistor, which may serve to limit channel leakage currents in its off-state. In various embodiments, the access transistor may be electrically coupled to a double-sided capacitor. Memory devices according to embodiments of the invention, and systems including such devices are also disclosed.
    Type: Grant
    Filed: September 20, 2006
    Date of Patent: February 4, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Gurtej S. Sandhu, Chandra Mouli
  • Patent number: 8633564
    Abstract: A method of formation of an isolation structure for vertical semiconductor devices, the resulting isolation structure, and a memory device to prevent leakage among adjacent vertical semiconductor devices are described.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: January 21, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Kamal Karda, Chandra Mouli
  • Patent number: 8630522
    Abstract: The invention includes optical signal conduits having rare earth elements incorporated therein. The optical signal conduits can, for example, contain rare earth elements incorporated within a dielectric material matrix. For instance, erbium or cerium can be within silicon nanocrystals dispersed throughout dielectric material of optical signal conduits. The dielectric material can define a path for the optical signal, and can be wrapped in a sheath which aids in keeping the optical signal along the path. The sheath can include any suitable barrier material, and can, for example, contain one or more metallic materials. The invention also includes methods of forming optical signal conduits, with some of such methods being methods in which the optical signal conduits are formed to be part of semiconductor constructions.
    Type: Grant
    Filed: August 8, 2011
    Date of Patent: January 14, 2014
    Assignee: Micron Technology, Inc.
    Inventor: Chandra Mouli
  • Patent number: 8623722
    Abstract: Devices and methods for providing JFET transistors with improved operating characteristics are provided. Specifically, one or more embodiments of the present invention relate to JFET transistors with a higher diode turn-on voltage. For example, one or more embodiments include a JFET with a PIN gate stack. One or more embodiments also relate to systems and devices in which the improved JFET may be employed, as well as methods of manufacturing the improved JFET.
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: January 7, 2014
    Assignee: Micron Technology, Inc.
    Inventor: Chandra Mouli
  • Patent number: 8626530
    Abstract: A system and method may provide a refill interface and service which allow a customer to order refills of one or more prescription medications in a quick and hassle-free manner from a mobile device. The customer provides prescription data from a barcode image that includes a number associated with an order. The prescription number is received by a server and a pickup store and a pickup time are determined. The user is provided an opportunity to select a new pickup store and/or a new pickup time. The refill system and method provide the service through a series of web pages and/or via an application running on a mobile device.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: January 7, 2014
    Assignee: Walgreen Co.
    Inventors: Quynh Chieu H. Tran, Satya Chandra Mouli Kota, Tim McCauley
  • Publication number: 20130322158
    Abstract: Some embodiments include memory cells including a memory component having a first conductive material, a second conductive material, and an oxide material between the first conductive material and the second conductive material. A resistance of the memory component is configurable via a current conducted from the first conductive material through the oxide material to the second conductive material. Other embodiments include a diode comprising metal and a dielectric material and a memory component connected in series with the diode. The memory component includes a magnetoresistive material and has a resistance that is changeable via a current conducted through the diode and the magnetoresistive material.
    Type: Application
    Filed: August 5, 2013
    Publication date: December 5, 2013
    Applicant: Micron Technology, Inc.
    Inventor: Chandra Mouli
  • Publication number: 20130285124
    Abstract: In accordance with the present techniques, there is provided a JFET device structures and methods for fabricating the same. Specifically, there is provided a transistor including a semiconductor substrate having a source and a drain. The transistor also includes a doped channel formed in the semiconductor substrate between the source and the drain, the channel configured to pass current between the source and the drain. Additionally, the transistor has a gate comprising a semiconductor material formed over the channel and dielectric spacers on each side of the gate. The source and the drain are spatially separated from the gate so that the gate is not over the drain and source.
    Type: Application
    Filed: June 24, 2013
    Publication date: October 31, 2013
    Inventor: Chandra Mouli
  • Patent number: 8560343
    Abstract: A system and method may provide a refill interface and service which allow a customer to order refills of one or more prescription medications in a quick and hassle-free manner from a mobile device. The customer provides prescription data from a barcode image that includes a number associated with an order. The prescription number is received by a server and a pickup store and a pickup time are determined. The user is provided an opportunity to select a new pickup store and/or a new pickup time. The refill system and method provide the service through a series of web pages and/or via an application running on a mobile device.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: October 15, 2013
    Assignee: Walgreen Co.
    Inventors: Quynh Chieu H. Tran, Satya Chandra Mouli Kota, Tim McCauley
  • Patent number: 8546935
    Abstract: The invention includes semiconductor packages having grooves within a semiconductor die backside; and includes semiconductor packages utilizing carbon nanostructures (such as, for example, carbon nanotubes) as thermally conductive interface materials. The invention also includes methods of cooling a semiconductor die in which coolant is forced through grooves in a backside of the die, and includes methods of making semiconductor packages.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: October 1, 2013
    Assignee: Micron Technology, Inc.
    Inventors: Chandra Mouli, Gurtej S. Sandhu
  • Publication number: 20130248885
    Abstract: A memory device includes an array of memory cells and peripheral devices. At least some of the individual memory cells include carbonated portions that contain SiC. At least some of the peripheral devices do not include any carbonated portions. A transistor includes a first source/drain, a second source/drain, a channel including a carbonated portion of a semiconductive substrate that contains SiC between the first and second sources/drains and a gate operationally associated with opposing sides of the channel.
    Type: Application
    Filed: May 24, 2013
    Publication date: September 26, 2013
    Applicant: Micron Technology, Inc.
    Inventor: Chandra Mouli
  • Publication number: 20130252359
    Abstract: Some embodiments include communication methods, methods of forming an interconnect, signal interconnects, integrated circuit structures, circuits, and data apparatuses. In one embodiment, a communication method includes accessing an optical signal comprising photons to communicate information, accessing an electrical signal comprising electrical data carriers to communicate information, and using a single interconnect, communicating the optical and electrical signals between a first spatial location and a second spatial location spaced from the first spatial location.
    Type: Application
    Filed: May 20, 2013
    Publication date: September 26, 2013
    Applicant: Micron Technology, Inc.
    Inventor: Chandra Mouli
  • Publication number: 20130234206
    Abstract: Memory devices are shown that include a body region and a connecting region that is formed from a semiconductor with a lower band gap than the body region. Connecting region configurations can provide increased gate induced drain leakage during an erase operation. Configurations shown can provide a reliable bias to a body region for memory operations such as erasing, and containment of charge in the body region during a boost operation.
    Type: Application
    Filed: April 29, 2013
    Publication date: September 12, 2013
    Applicant: Micron Technology, Inc.
    Inventors: Haitao Liu, Jian Li, Chandra Mouli
  • Patent number: 8525248
    Abstract: Some embodiments include memory cells that contain floating bodies and diodes. The diodes may be gated diodes having sections doped to a same conductivity type as the floating bodies, and such sections of the gated diodes may be electrically connected to the floating bodies. The floating bodies may be adjacent channel regions, and spaced from the channel regions by a dielectric structure. The dielectric structure of a memory cell may have a first portion between the floating body and the diode, and may have a second portion between the floating body and the channel region. The first portion may be more leaky to charge carriers than the second portion. The diodes may be formed in semiconductor material that is different from a semiconductor material that the channel regions are in. The floating bodies may have bulbous lower regions. Some embodiments include methods of making memory cells.
    Type: Grant
    Filed: December 17, 2012
    Date of Patent: September 3, 2013
    Assignee: Micron Technology, Inc.
    Inventor: Chandra Mouli
  • Patent number: 8502291
    Abstract: Some embodiments include memory cells including a memory component having a first conductive material, a second conductive material, and an oxide material between the first conductive material and the second conductive material. A resistance of the memory component is configurable via a current conducted from the first conductive material through the oxide material to the second conductive material. Other embodiments include a diode comprising metal and a dielectric material and a memory component connected in series with the diode. The memory component includes a magnetoresistive material and has a resistance that is changeable via a current conducted through the diode and the magnetoresistive material.
    Type: Grant
    Filed: April 20, 2011
    Date of Patent: August 6, 2013
    Assignee: Micron Technology, Inc.
    Inventor: Chandra Mouli