Patents by Inventor Chang-Woo Yoo

Chang-Woo Yoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140345913
    Abstract: Provided is a method of manufacturing a printed circuit board, the method including: preparing an insulating substrate including a resin material in which a solid component is impregnated; forming a circuit pattern groove on the resin material by etching an upper surface of the insulating substrate; forming a plated layer in which the circuit pattern groove is buried; and forming a buried circuit pattern by removing the plated layer until the insulating layer is exposed, wherein the solid component has a diameter of less than 5% to a width of the buried circuit pattern. Thus, as a filler of a predetermined size or less is applied into the insulating layer for forming the circuit pattern, the occurrence of a void due to separation of the filler from a boundary part with the circuit pattern can be reduced, and reliability can be also secured.
    Type: Application
    Filed: December 12, 2012
    Publication date: November 27, 2014
    Inventors: Yeong Uk Seo, Ki Do Chun, Chang Woo Yoo, Hyun Seok Seo, Byeong Ho Kim, Sang Myung Lee
  • Publication number: 20140332255
    Abstract: Provided are a printed circuit board and a method of manufacturing the same, the printed circuit board according to the present invention, the printed circuit board, including: an insulating substrate having a plurality of circuit pattern grooves formed on a surface thereof; and a plurality of circuit patterns formed by burying the circuit pattern grooves, wherein the circuit patterns protrude as much as a predetermined thickness from an upper surface of the insulating substrate.
    Type: Application
    Filed: December 12, 2012
    Publication date: November 13, 2014
    Inventors: Chang Woo Yoo, Yeong Uk Seo, Byeong Ho Kim, Hyun Seok Seo, Sang Myung Lee, Ki Do Chun
  • Patent number: 8743008
    Abstract: The invention relates to a base station antenna, that includes two or more reflector plates, each provided with a radiating element. The base station antenna also includes a reflector plate connecting member connected to each reflector plate for enabling the rotation of the reflector plates. The base station antenna also includes a reflector plate controller providing control signals for controlling the rotation and stoppage of the reflector plates.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: June 3, 2014
    Assignee: KMW Inc.
    Inventors: In-Ho Kim, Jae-Jun Lee, Kee-Bum Kim, Chang-Woo Yoo
  • Publication number: 20130299964
    Abstract: A method for forming a fine pattern using isotropic etching, includes the steps of forming an etching layer on a semiconductor substrate, and coating a photoresist layer on the etching layer, performing a lithography process with respect to the etching layer coated with the photoresist layer, and performing a first isotropic etching process with respect to the etching layer including a photoresist pattern formed through the lithography process, depositing a passivation layer on the etching layer including the photoresist pattern, and performing a second isotropic etching process with respect to the passivation layer. The second isotropic etching process is directly performed without removing the predetermined portion of the passivation layer.
    Type: Application
    Filed: June 13, 2013
    Publication date: November 14, 2013
    Inventors: Sang-Yu Lee, Jee-Heum Paik, Soo-Hong Kim, Chang-Woo Yoo, Sung-Woon Yoon
  • Patent number: 8486838
    Abstract: A method for forming a fine pattern using isotropic etching, includes the steps of forming an etching layer on a semiconductor substrate, and coating a photoresist layer on the etching layer, performing a lithography process with respect to the etching layer coated with the photoresist layer, and performing a first isotropic etching process with respect to the etching layer including a photoresist pattern formed through the lithography process, depositing a passivation layer on the etching layer including the photoresist pattern, and performing a second isotropic etching process with respect to the passivation layer. The second isotropic etching process is directly performed without removing the predetermined portion of the passivation layer.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: July 16, 2013
    Assignee: LG Innotek Co., Ltd.
    Inventors: Sang-Yu Lee, Jee-Heum Paik, Soo-Hong Kim, Chang-Woo Yoo, Sung-Woon Yoon
  • Publication number: 20120280874
    Abstract: The invention relates to a base station antenna, that includes two or more reflector plates, each provided with a radiating element. The base station antenna also includes a reflector plate connecting member connected to each reflector plate for enabling the rotation of the reflector plates. The base station antenna also includes a reflector plate controller providing control signals for controlling the rotation and stoppage of the reflector plates.
    Type: Application
    Filed: December 21, 2010
    Publication date: November 8, 2012
    Inventors: In-Ho Kim, Jae-Jun Lee, Kee-Bum Kim, Chang-Woo Yoo
  • Patent number: 8004844
    Abstract: An enclosure device of a wireless communication apparatus, which has a tubular structure with increased heat dissipation not unknown heretofore. A section of the enclosure device has a polygonal or circular shape, such as a substantially cylindrical structure, and the enclosure, which has a plurality of radiation fins arranged on an outer surface of the enclosure in a vertical direction, is formed integrally with the radiation fins by using a compression method. Various communication devices of the wire communication apparatus are mounted on the interior of the enclosure. The structure is preferably formed by the radiation fins and exhibits an increased radiation effect than that of a structure where radiation fins are arranged side by side on a flat plane.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: August 23, 2011
    Assignee: KMW, Inc.
    Inventors: Duk-Yong Kim, Jung-Pil Lee, Kyoung-Seuk Kim, Chang-Woo Yoo, Sung-Ho Jang
  • Publication number: 20100041237
    Abstract: A method for forming a fine pattern using isotropic etching, includes the steps of forming an etching layer on a semiconductor substrate, and coating a photoresist layer on the etching layer, performing a lithography process with respect to the etching layer coated with the photoresist layer, and performing a first isotropic etching process with respect to the etching layer including a photoresist pattern formed through the lithography process, depositing a passivation layer on the etching layer including the photoresist pattern, and performing a second isotropic etching process with respect to the passivation layer. The second isotropic etching process is directly performed without removing the predetermined portion of the passivation layer.
    Type: Application
    Filed: September 20, 2007
    Publication date: February 18, 2010
    Inventors: Sang-Yu Lee, Jee-Heum Paik, Soo-Hong Kim, Chang-Woo Yoo, Sung-Woon Yoon
  • Publication number: 20090231815
    Abstract: An enclosure device of a wireless communication apparatus, which has a tubular structure with increased heat dissipation not unknown heretofore. A section of the enclosure device has a polygonal or circular shape, such as a substantially cylindrical structure, and the enclosure, which has a plurality of radiation fins arranged on an outer surface of the enclosure in a vertical direction, is formed integrally with the radiation fins by using a compression method. Various communication devices of the wire communication apparatus are mounted on the interior of the enclosure. The structure is preferably formed by the radiation fins and exhibits an increased radiation effect than that of a structure where radiation fins are arranged side by side on a flat plane.
    Type: Application
    Filed: March 12, 2009
    Publication date: September 17, 2009
    Inventors: Duk-Yong KIM, Jung-Pil Lee, Kyoung-Seuk Kim, Chang-Woo Yoo, Sung-Ho Jang