Patents by Inventor Chao-Wen Shih

Chao-Wen Shih has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180148317
    Abstract: The present disclosure provides a semiconductor structure includes a sensing element configured to receive a signal from a sensing target, a molding surrounding the sensing element, a through via in the molding, a front side redistribution layer disposed at a front side of the sensing element and electrically connected thereto, and a back side redistribution layer disposed at a back side of the sensing element, the front side redistribution layer and the back side redistribution layer are electrically connected by the through via. The present disclosure also provides a method for manufacturing the semiconductor structure described herein.
    Type: Application
    Filed: March 10, 2017
    Publication date: May 31, 2018
    Inventors: ALBERT WAN, YU-SHENG HSIEH, CHAO-WEN SHIH, SHOU ZEN CHANG, CHUNG-SHI LIU, CHEN-HUA YU
  • Patent number: 9953942
    Abstract: The present disclosure provides a semiconductor package, which includes a substrate, a passivation layer, a post-passivation interconnect (PPI) having a top surface; and a conductive structure. The top surface of the PPI includes a first region receiving the conductive structure, and a second region surrounding the first region. The second region includes metal derivative transformed from materials made of the first region. The present disclosure provide a method of manufacturing a semiconductor package, including forming a first flux layer covering a portion of a top surface of a PPI; transforming a portion of the top surface of the PPI uncovered by the first flux layer into a metal derivative layer; removing the first flux layer; forming a second flux layer on the first region of the PPI; dropping a solder ball on the flux layer; and forming electrical connection between the solder ball and the PPI.
    Type: Grant
    Filed: November 10, 2016
    Date of Patent: April 24, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chao-Wen Shih, Kai-Chiang Wu, Ching-Feng Yang, Ming-Kai Liu, Shih-Wei Liang, Yen-Ping Wang
  • Publication number: 20180104153
    Abstract: An automatic medicine retrieving device includes a medicine tray, a medicine box, and a driving mechanism. The medicine tray includes a bearing plate defining an exit port and a medicine separating member rotatably positioned on the bearing plate. The medicine separating member has medicine separating areas and a positioning area. Medications in the form of pills are positioned on the bearing plate and received in the medicine separating areas. The medicine box is opposite to the exit port. The driving mechanism drives the medicine separating member to rotate from being opposite to the exit port, bringing the medicine separating area to a position opposite to the exit port. A pill in the medicine separating area then passes through the exit port to fall into an accepting mechanism.
    Type: Application
    Filed: December 5, 2016
    Publication date: April 19, 2018
    Inventors: YU-TING WANG, KING-LUNG HUANG, CHAO-WEN SHIH, PANG-YEN JAO
  • Publication number: 20180047664
    Abstract: A method of manufacturing a semiconductor device includes: receiving a first substrate with a surface; receiving a second substrate; determining a pad array on the surface of the first substrate, wherein the pad array includes a first type pad and a second type pad; forming a via pattern underlying the pad array in the first substrate according to the location of each via, wherein the first type pad in the pad array is directly contacting a via of the via pattern and the second type pad in the pad array is clear of any via of the via pattern; laterally connecting the second type pad with a conductive trace, wherein the conductive trace connects to another via that is same level with the via contacting the first type pad; and disposing a first conductive bump and a second conductive bump between the first substrate and the second substrate.
    Type: Application
    Filed: August 15, 2016
    Publication date: February 15, 2018
    Inventors: TSUNG-YUAN YU, HAO-YI TSAI, CHAO-WEN SHIH, HUNG-YI KUO, PI-LAN CHANG
  • Publication number: 20170345731
    Abstract: Sensor packages and manufacturing methods thereof are disclosed. One of the sensor packages includes a semiconductor chip and a redistribution layer structure. The semiconductor chip has a sensing surface. The redistribution layer structure is arranged to form an antenna transmitter structure aside the semiconductor chip and an antenna receiver structure over the sensing surface of the semiconductor chip.
    Type: Application
    Filed: August 12, 2016
    Publication date: November 30, 2017
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yung-Ping Chiang, Chao-Wen Shih, Shou-Zen Chang, Albert Wan, Yu-Sheng Hsieh
  • Publication number: 20170250130
    Abstract: A method includes forming a dielectric layer over a contact pad of a device, forming a first polymer layer over the dielectric layer, forming a first conductive line and a first portion of a second conductive line over the first polymer layer, patterning a photoresist to form an opening over the first portion of the second conductive feature, wherein after patterning the photoresist the first conductive line remains covered by photoresist, forming a second portion of the second conductive line in the opening, wherein the second portion of the second conductive line physically contacts the first portion of the second conductive line, and forming a second polymer layer extending completely over the first conductive line and the second portion of the second conductive line.
    Type: Application
    Filed: May 15, 2017
    Publication date: August 31, 2017
    Inventors: Chao-Wen Shih, Chen-Hua Yu, Han-Ping Pu, Hsin-Yu Pan, Hao-Yi Tsai, Sen-Kuei Hsu
  • Patent number: 9728477
    Abstract: The method of manufacturing a semiconductor device includes receiving a substrate. The substrate comprises at least one chip region and at least one scribe line next to the chip region, and each chip region comprises an active region. The method further includes disposing a buffer layer at least covering the scribe line, disposing a dielectric layer including an opening over each chip region, and disposing a bump material to the opening of the dielectric layer and electrically connecting to the active region. The method further includes forming a mold over the substrate, covering the buffer layer and cutting the substrate along the scribe line. Furthermore, the buffer layer includes an elastic modulus less than that of the mold, or the buffer layer includes a coefficient of thermal expansion less than that of the mold.
    Type: Grant
    Filed: April 27, 2016
    Date of Patent: August 8, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Nien-Fang Wu, Chao-Wen Shih, Yung-Ping Chiang, Hao-Yi Tsai
  • Patent number: 9653406
    Abstract: An embodiment device package includes a semiconductor device die comprising a passivation layer at a top surface, a first conductive line over the passivation layer and electrically connected to the device die, and a second conductive line over the passivation layer and electrically connected to the device die. The first conductive line is thicker than the second conductive line, and the first conductive line and the second conductive line are formed in a same device package layer.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: May 16, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chao-Wen Shih, Chen-Hua Yu, Han-Ping Pu, Hsin-Yu Pan, Hao-Yi Tsai, Sen-Kuei Hsu
  • Patent number: 9653341
    Abstract: A semiconductor structure includes a die including a first surface, a recess extended from an aperture disposed on the first surface and including a sidewall disposed within the die, and a polymeric member configured for filling and sealing the recess and including a first outer surface and a second outer surface, wherein the first outer surface is interfaced with the sidewall of the recess.
    Type: Grant
    Filed: March 5, 2014
    Date of Patent: May 16, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chia-Chun Miao, Chao-Wen Shih, Shih-Wei Liang, Ching-Feng Yang
  • Publication number: 20170103955
    Abstract: A method for manufacturing a semiconductor structure includes: receiving a semiconductive substrate with a post passivation interconnect including an oval landing area; forming a first conductor on the oval landing area; forming a polymer layer above the semiconductive substrate, thereby surrounding a portion of the first conductor; polishing the polymer layer and the first conductor in order to form a planarized surface; and forming a second conductor on the polished first conductor.
    Type: Application
    Filed: December 20, 2016
    Publication date: April 13, 2017
    Inventors: YUNG-PING CHIANG, CHAO-WEN SHIH, HAO-YI TSAI, MIRNG-JI LII
  • Patent number: 9589915
    Abstract: A semiconductor device includes a substrate defined with a seal ring region and a circuit region, the substrate includes a seal ring structure and an integrated circuit structure, the seal ring structure is disposed in the seal ring region and includes a plurality of stacked conductive layers interconnected by a plurality of via layers, the integrated circuit structure is disposed in the circuit region and includes an active or a passive device; a metal pad disposed over the seal ring region and contacted with the seal ring structure; a passivation layer disposed over the substrate and covering the metal pad; a polymeric layer disposed over the passivation layer and the circuit region; and a molding disposed over the passivation layer and the polymeric layer, wherein the seal ring structure is covered by the molding.
    Type: Grant
    Filed: July 17, 2014
    Date of Patent: March 7, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Tsung-Yuan Yu, Hao-Yi Tsai, Chao-Wen Shih, Wen-Hsin Chan, Chen-Chih Hsieh
  • Publication number: 20170062369
    Abstract: The present disclosure provides a semiconductor package, which includes a substrate, a passivation layer, a post-passivation interconnect (PPI) having a top surface; and a conductive structure. The top surface of the PPI includes a first region receiving the conductive structure, and a second region surrounding the first region. The second region includes metal derivative transformed from materials made of the first region. The present disclosure provide a method of manufacturing a semiconductor package, including forming a first flux layer covering a portion of a top surface of a PPI; transforming a portion of the top surface of the PPI uncovered by the first flux layer into a metal derivative layer; removing the first flux layer; forming a second flux layer on the first region of the PPI; dropping a solder ball on the flux layer; and forming electrical connection between the solder ball and the PPI.
    Type: Application
    Filed: November 10, 2016
    Publication date: March 2, 2017
    Inventors: CHAO-WEN SHIH, KAI-CHIANG WU, CHING-FENG YANG, MING-KAI LIU, SHIH-WEI LIANG, YEN-PING WANG
  • Patent number: 9543259
    Abstract: A semiconductor structure includes a semiconductive substrate, a post passivation interconnect (PPI) and a polymer layer. The PPI is disposed above the semiconductive substrate and includes a landing area for receiving a conductor. The polymer layer is on the PPI, wherein the conductor is necking a turning point so as to include an oval portion being substantially surrounded by the polymer layer, and the oval portion of the conductor is disposed on the landing area of the PPI.
    Type: Grant
    Filed: October 1, 2014
    Date of Patent: January 10, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Yung-Ping Chiang, Chao-Wen Shih, Hao-Yi Tsai, Mirng-Ji Lii
  • Patent number: 9543263
    Abstract: The present disclosure provides a semiconductor package, which includes a substrate, a passivation layer, a post-passivation interconnect (PPI) having a top surface; and a conductive structure. The top surface of the PPI includes a first region receiving the conductive structure, and a second region surrounding the first region. The second region includes metal derivative transformed from materials made of the first region. The present disclosure provide a method of manufacturing a semiconductor package, including forming a first flux layer covering a portion of a top surface of a PPI; transforming a portion of the top surface of the PPI uncovered by the first flux layer into a metal derivative layer; removing the first flux layer; forming a second flux layer on the first region of the PPI; dropping a solder ball on the flux layer; and forming electrical connection between the solder ball and the PPI.
    Type: Grant
    Filed: November 12, 2013
    Date of Patent: January 10, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chao-Wen Shih, Kai-Chiang Wu, Ching-Feng Yang, Ming-Kai Liu, Shih-Wei Liang, Yen-Ping Wang
  • Patent number: 9530759
    Abstract: A package, comprising a substrate having electrical devices disposed at a first side of the substrate, vias extending from the first side of the substrate to a second side of the substrate opposite the first side and metallization layers disposed on the first side of the substrate. Contact pads are disposed over the first metallization layers and a protection layer is disposed over the contact pads. Post-passivation interconnects are disposed over the protection layer and extend to the contact pads through openings in the protection layer. Connectors are disposed on the PPIs and a molding compound extends over the PPIs and around the connectors.
    Type: Grant
    Filed: April 4, 2016
    Date of Patent: December 27, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Hua Yu, Mirng-Ji Lii, Hung-Yi Kuo, Hao-Yi Tsai, Chao-Wen Shih, Tsung-Yuan Yu, Min-Chien Hsiao
  • Patent number: 9484308
    Abstract: A semiconductor device includes a substrate including a pad and an alignment feature disposed over the substrate, a passivation disposed over the substrate and a periphery of the pad, a post passivation interconnect (PPI) including a via portion disposed on the pad and an elongated portion receiving a conductive bump to electrically connect the pad with the conductive bump, a polymer covering the PPI, and a molding material disposed over the polymer and around the conductive bump, wherein the molding material comprises a first portion orthogonally aligned with the alignment feature and adjacent to an edge of the semiconductor device and a second portion distal to the edge of the semiconductor device, a thickness of the first portion is substantially smaller than a thickness of the second portion, thereby the alignment feature is visible through the molding material under a predetermined radiation.
    Type: Grant
    Filed: June 25, 2014
    Date of Patent: November 1, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Ming-Kai Liu, Chao-Wen Shih, Yung-Ping Chiang
  • Publication number: 20160307852
    Abstract: An embodiment device package includes a semiconductor device die comprising a passivation layer at a top surface, a first conductive line over the passivation layer and electrically connected to the device die, and a second conductive line over the passivation layer and electrically connected to the device die. The first conductive line is thicker than the second conductive line, and the first conductive line and the second conductive line are formed in a same device package layer.
    Type: Application
    Filed: April 16, 2015
    Publication date: October 20, 2016
    Inventors: Chao-Wen Shih, Chen-Hua Yu, Han-Ping Pu, Hsin-Yu Pan, Hao-Yi Tsai, Sen-Kuei Hsu
  • Patent number: 9437490
    Abstract: A semiconductor device includes a first substrate including a surface, and a pad array on the surface of the substrate, wherein the pad array comprises a first type pad and a second type pad located on a same level. The semiconductor device further includes a conductive bump connecting either the first type pad or the second type pad to a second substrate and a via connected a conductive feature at a different level to the first type pad and the via located within a projection area of the first type pad and directly contacting the first type pad. The semiconductor device also has a dielectric in the substrate and directly contacting the second type pad, wherein the second type pad is floated on the dielectric.
    Type: Grant
    Filed: March 31, 2014
    Date of Patent: September 6, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Tsung-Yuan Yu, Hao-Yi Tsai, Chao-Wen Shih, Hung-Yi Kuo, Pi-Lan Chang
  • Patent number: 9431360
    Abstract: A semiconductor structure includes a substrate including a front side, a conductive bump disposed over the front side, and an opaque molding disposed over the front side and around a periphery portion of an outer surface of the conductive bump, wherein the opaque molding includes a recessed portion disposed above a portion of the front side adjacent to a corner of the substrate and extended through the opaque molding to expose the portion of the front side and an alignment feature disposed within the portion of the front side.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: August 30, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Hsuan-Ting Kuo, Yu-Peng Tsai, Wei-Hung Lin, Chun-Lung Jao, Chao-Wen Shih, Ming-Da Cheng, Chung-Shi Liu
  • Publication number: 20160240453
    Abstract: The method of manufacturing a semiconductor device includes receiving a substrate. The substrate comprises at least one chip region and at least one scribe line next to the chip region, and each chip region comprises an active region. The method further includes disposing a buffer layer at least covering the scribe line, disposing a dielectric layer including an opening over each chip region, and disposing a bump material to the opening of the dielectric layer and electrically connecting to the active region. The method further includes forming a mold over the substrate, covering the buffer layer and cutting the substrate along the scribe line. Furthermore, the buffer layer includes an elastic modulus less than that of the mold, or the buffer layer includes a coefficient of thermal expansion less than that of the mold.
    Type: Application
    Filed: April 27, 2016
    Publication date: August 18, 2016
    Inventors: NIEN-FANG WU, CHAO-WEN SHIH, YUNG-PING CHIANG, HAO-YI TSAI