Abstract: Disclosed is a system for drone-based recharging of a VR/AR wearable assembly. A system is disclosed comprising a wireless charging device; a wearable assembly; a light field capture VR/AR device comprising a first charging surface and a second connective surface, the first charging surface configured to be positioned on the wireless charging device, the second connective surface configured to be communicatively coupled to the wearable assembly; and a drone device including a network interface, the drone device configured to: receive notifications from the light field capture VR/AR device, the notification indicating that the light field capture VR/AR device is fully charged, remove the light field capture VR/AR device from the charging device, and attach the light field capture VR/AR device to the wearable assembly.

Abstract: A housing structure that can be used for forming a variety of camera arrays is disclosed. The housing structure comprises a plurality of camera retaining elements which can adaptably receive and retain cameras of various sizes and shapes. Adjacent camera retaining elements that form the housing structure are connected to each other via moveable couplings that enable the formation of camera arrays of various sizes and shapes.

Abstract: A housing structure that can be used for forming a variety of camera arrays is disclosed. The housing structure comprises a plurality of camera retaining elements which can adaptably receive and retain cameras of various sizes and shapes. Adjacent camera retaining elements that form the housing structure are connected to each other via moveable couplings that enable the formation of camera arrays of various sizes and shapes.

Abstract: An electric propulsion system comprising a plasma chamber having first and second apertures for producing ion beams. Respective first and second coils are arranged about the chamber to produce an electromagnetic field in regions adjacent to the apertures, and are driven differentially by a radio frequency (RF) drive module. By driving the coils differentially, the electric field in the region of the two apertures can be differentially controlled, and a variation of output thrusts at the two apertures is possible. In this way a net thrust can be produced, which net thrust is varied by controlling the drive to the two coils.

Abstract: Embodiments relate to systems and methods for vehicle monitoring with processing interruption tolerance. One or more vehicle sensors can transmit one or more data streams to a primary data processing system via a data channel. A secondary data buffer can be coupled to the data channel to continuously capture the set of data streams and/or subsets thereof. During normal operation, the set of data streams are processed by the primary data processing system. After a limited-duration fault occurs in the primary data processing system, it can recover by accessing the backup data in the secondary data buffer. The lost data can be retrieved from the secondary data buffer using timestamp information to process the data in its original time context and to ensure that no already-processed data is included. The set of data streams can be downsampled or decimated in the secondary data buffer to extend storage capacity.

Abstract: Disclosed herein are systems and methods for detecting motion of an object, such as the paw of rat. A tag comprising an inductive element and a capacitive element may be attached to the object and the motion detected by monitoring the affect of the tag on a time-varying magnetic field.

Abstract: A field device having a self-description is provided. The field device includes loop communication circuitry configured to communicate process information using a process standard communication protocol. A controller is coupled to the loop communication circuitry to communicate with one or more process devices using the loop communication circuitry. The controller is coupled to a non-volatile, writeable, non-transitory computer readable medium having a plurality of blocks. A first block contains device executable code, which when executed by the controller causes the field device to provide at least one process control function. A second block, at least as large as the first block, contains an electronic device description of the field device.

Abstract: Embodiments relate to systems and methods for vehicle monitoring with processing interruption tolerance. One or more vehicle sensors can transmit one or more data streams to a primary data processing system via a data channel. A secondary data buffer can be coupled to the data channel to continuously capture the set of data streams and/or subsets thereof. During normal operation, the set of data streams are processed by the primary data processing system. After a limited-duration fault occurs in the primary data processing system, it can recover by accessing the backup data in the secondary data buffer. The lost data can be retrieved from the secondary data buffer using timestamp information to process the data in its original time context and to ensure that no already-processed data is included. The set of data streams can be downsampled or decimated in the secondary data buffer to extend storage capacity.

Abstract: Embodiments of systems and methods for providing a hybrid illumination aperture in optical lithography are generally described herein. Other embodiments may be described and claimed.

Abstract: A field device having a self-description is provided. The field device includes loop communication circuitry configured to communicate process information using a process standard communication protocol. A controller is coupled to the loop communication circuitry to communicate with one or more process devices using the loop communication circuitry. The controller is coupled to a non-volatile, writeable, non-transitory computer readable medium having a plurality of blocks. A first block contains device executable code, which when executed by the controller causes the field device to provide at least one process control function. A second block, at least as large as the first block, contains an electronic device description of the field device.

Abstract: An electric propulsion system comprising a plasma chamber having first and second apertures for producing ion beams. Respective first and second coils are arranged about the chamber to produce an electromagnetic field in regions adjacent to the apertures, and are driven differentially by a radio frequency (RF) drive module. By driving the coils differentially, the electric field in the region of the two apertures can be differentially controlled, and a variation of output thrusts at the two apertures is possible. In this way a net thrust can be produced, which net thrust is varied by controlling the drive to the two coils.

Abstract: A method of forming a pattern on a wafer is provided. The method includes applying a photoresist on the wafer and exposing the wafer to define a first pattern on the photoresist. The method also includes exposing the wafer to define a second pattern on the photoresist, wherein each of the first and second patterns comprises unexposed portions of the photoresist and developing the wafer to form the first and second patterns on the photoresist, wherein the first and second patterns are formed by removing the unexposed portions of the photoresist.

Abstract: Embodiments of systems and methods for providing a hybrid illumination aperture in optical lithography are generally described herein. Other embodiments may be described and claimed.

Abstract: A method of forming a pattern on a wafer is provided. The method includes applying a photoresist on the wafer and exposing the wafer to define a first pattern on the photoresist. The method also includes exposing the wafer to define a second pattern on the photoresist, wherein each of the first and second patterns comprises unexposed portions of the photoresist and developing the wafer to form the first and second patterns on the photoresist, wherein the first and second patterns are formed by removing the unexposed portions of the photoresist.

Abstract: An electric propulsion system including a plasma chamber having a first output aperture having first acceleration and screen grids, and a second output aperture having second acceleration and screen grids. The screen grids are maintained at a constant positive potential. In use, ions are expelled from the two apertures in anti-parallel directions. By independently controlling the potentials of the acceleration grids to adjust the rates of ion extraction from the output apertures, small resultant thrusts at the ?N level may be obtained and the resultant thrust maybe continuously reduced to zero. By closing off apertures of one of the screen grids, thrust at the mN may be obtained with sub-?N accuracy. The system therefore provides functionality previously achievable only with plural types of electric propulsion system, providing weight and complexity savings for satellites or space-probes comprising such systems.

Abstract: Embodiments of methods for double patterning photoresist are generally described herein. Other embodiments may be described and claimed.

Abstract: The invention is directed to a ventilation control system for controlling the ventilation of a patient. The ventilation control system utilizes a user-friendly user interface for the display of patient data and ventilator status. The user interface includes a graphic representation of a breath cycle that displays the breath cycle currently being ventilated, and is also responsive to changes in ventilation settings to assist the user in evaluation the effect of those changes on the ventilator strategy before the changes are implemented.

Abstract: A method for forming two trenches with tight end-to-end spacing in a dielectric layer begins with providing a substrate having a dielectric layer. A hard-mask layer is deposited on the dielectric layer and a first photoresist layer is deposited on the hard-mask layer. The first photoresist layer is patterned to form an extended trench in the first photoresist layer. The hard-mask layer is then etched using the first photoresist layer as a mask to form an extended trench in the hard-mask layer. Next, a second photoresist layer is deposited on the hard-mask layer and patterned to form a resist line that intersects the extended trench. The resist line divides the extended trench into two separate trenches. The dielectric layer is then etched using the hard-mask layer and the resist line as a mask, thereby forming two trenches in the dielectric layer with end-to-end separation that corresponds to the resist line width.

Abstract: Diagonal corner-to-corner sub-resolution assist features for use in photolithography are described. The diagonal features may be applied to one or a group of main features. Such features may be developed starting by synthesizing a photolithography mask having a first feature aligned along a linear axis and having a corner and a second feature aligned along a linear axis and having a corner, the corners of first and second features being separated from each other by a gap. The features may be developed by determining at least one diagonal line between the corners of the features to bridge the gap between the corners, applying a sub-resolution assist feature along the determined line, and modifying the synthesized photolithography mask to include the sub-resolution assist feature.