Abstract: A multiphoton absorption lithography processing system configured to process a to-be-processed object is provided. The multiphoton absorption lithography processing system includes a femtosecond laser source, a spatial light modulator, a lens array, and a stage. The femtosecond laser source is configured to emit a femtosecond laser beam. The spatial light modulator is configured to modulate the femtosecond laser beam into a modulated beam. The lens array is disposed on a path of the modulated beam and configured to divide the modulated beam into a plurality of sub-beams and make the sub-beams be focused on a plurality of position points at the to-be-processed object, so as to form multiphoton absorption reaction at the position points. The stage is configured to carry the to-be-processed object. The stage and the lens array are adapted to move with respect to each other in three dimensions.

Abstract: A clock and data recovery circuit with jitter tolerance enhancement is provided. The CDR circuit includes: a bang-bang phase detector, a digital filter, a digitally controlled oscillator, and an adaptive loop gain control circuit. The CDR circuit detects a loop bandwidth variation and adjusts the loop bandwidth of CDR circuit by adjusting proportional path and integral path gain factors of the digital filter of the CDR circuit. The loop gain controller uses two methods to adjust the loop gain in CDR circuit: bang-bang adjusting method and linear adjusting method.