Patents by Inventor Chen-Ming Huang
Chen-Ming Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11972984Abstract: A semiconductor device includes a fin-shaped structure on a substrate, a gate structure on the fin-shaped structure and an interlayer dielectric (ILD) layer around the gate structure, and a single diffusion break (SDB) structure in the ILD layer and the fin-shaped structure. Preferably, the SDB structure includes a bottom portion and a top portion on the bottom portion, in which the top portion and the bottom portion include different widths.Type: GrantFiled: December 26, 2022Date of Patent: April 30, 2024Assignee: UNITED MICROELECTRONICS CORP.Inventors: Ching-Ling Lin, Wen-An Liang, Chen-Ming Huang
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Patent number: 11954937Abstract: A fingerprint sensing system is configured to receive an illumination beam which is reflected by a finger and then transmitted to the fingerprint sensing system to generate a fingerprint image. The fingerprint sensing system includes a plurality of microlenses, a sensor, a first light filter layer, and a second light filter layer. The microlenses are arranged in an array. The sensor has a plurality of sensing pixels arranged in an array. The first light filter layer is disposed between the microlenses and the sensor and has a plurality of first openings. The second light filter layer is disposed between the first light filter layer and the sensor and has a plurality of second openings. The illumination beam passes through the first openings or the second openings, so that the sensor receives the illumination beam.Type: GrantFiled: March 16, 2021Date of Patent: April 9, 2024Assignee: Powerchip Semiconductor Manufacturing CorporationInventor: Chen-Ming Huang
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Publication number: 20240097035Abstract: Epitaxial source/drain structures for enhancing performance of multigate devices, such as fin-like field-effect transistors (FETs) or gate-all-around (GAA) FETs, and methods of fabricating the epitaxial source/drain structures, are disclosed herein. An exemplary device includes a dielectric substrate. The device further includes a channel layer, a gate disposed over the channel layer, and an epitaxial source/drain structure disposed adjacent to the channel layer. The channel layer, the gate, and the epitaxial source/drain structure are disposed over the dielectric substrate. The epitaxial source/drain structure includes an inner portion having a first dopant concentration and an outer portion having a second dopant concentration that is less than the first dopant concentration. The inner portion physically contacts the dielectric substrate, and the outer portion is disposed between the inner portion and the channel layer. In some embodiments, the outer portion physically contacts the dielectric substrate.Type: ApplicationFiled: November 29, 2023Publication date: March 21, 2024Inventors: Chen-Ming Lee, I-Wen Wu, Po-Yu Huang, Fu-Kai Yang, Mei-Yun Wang
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Publication number: 20240096830Abstract: A method includes forming a first sealing layer at a first edge region of a first wafer; and bonding the first wafer to a second wafer to form a wafer stack. At a time after the bonding, the first sealing layer is between the first edge region of the first wafer and a second edge region of the second wafer, with the first edge region and the second edge region comprising bevels. An edge trimming process is then performed on the wafer stack. After the edge trimming process, the second edge region of the second wafer is at least partially removed, and a portion of the first sealing layer is left as a part of the wafer stack. An interconnect structure is formed as a part of the second wafer. The interconnect structure includes redistribution lines electrically connected to integrated circuit devices in the second wafer.Type: ApplicationFiled: January 9, 2023Publication date: March 21, 2024Inventors: Yu-Yi Huang, Yu-Hung Lin, Wei-Ming Wang, Chen Chen, Shih-Peng Tai, Kuo-Chung Yee
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Patent number: 11937515Abstract: Semiconductor device and methods of forming the same are provided. A semiconductor device according to one embodiment includes a dielectric layer including a top surface, a plurality of magneto-resistive memory cells disposed in the dielectric layer and including top electrodes, a first etch stop layer disposed over the dielectric layer, a common electrode extending through the first etch stop layer to be in direct contact with the top electrodes, and a second etch stop layer disposed on the first etch stop layer and the common electrode. Top surfaces of the top electrodes are coplanar with the top surface of the dielectric layer.Type: GrantFiled: August 9, 2022Date of Patent: March 19, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chih-Fan Huang, Hsiang-Ku Shen, Liang-Wei Wang, Chen-Chiu Huang, Dian-Hau Chen, Yen-Ming Chen
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Publication number: 20240067796Abstract: A fluorine-containing elastomer composition includes a curable fluorine-containing polymer comprising at least one fluorinated cure site monomer having a cure site; an group IIIB element-containing reinforcing additive in an amount of 8 to 15 weight parts with respect to 100 weight parts of the curable fluorine-containing polymer; and a curative configured for curing the at least one fluorinated cure site monomer.Type: ApplicationFiled: August 24, 2022Publication date: February 29, 2024Inventors: CHUNG-MING HUANG, REN-GUAN DUAN, CHEN-HSIANG LU, TIEN-CHIH CHENG
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Patent number: 11903192Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a first gate structure over a substrate and laterally surrounded by a first sidewall spacer. The first gate structure protrudes outward from a top of the first sidewall spacer. A second gate structure is over the substrate and is laterally surrounded by a second sidewall spacer. The first gate structure has a first height that is larger than a second height of the second gate structure. The first sidewall spacer has a first cross-sectional profile that is a different shape and a different size than a second cross-sectional profile of the second sidewall spacer.Type: GrantFiled: July 21, 2021Date of Patent: February 13, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Josh Lin, Chia-Ta Hsieh, Chen-Ming Huang, Chi-Wei Ho
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Patent number: 11854621Abstract: A memory device and method of making the same are disclosed. The memory device includes transistor devices located in both a memory region and a logic region of the device. Transistor devices in the memory region include sidewall spacers having a first oxide layer over a side surface of a gate structure, a first nitride layer over the first oxide layer, a second oxide layer over the first nitride layer, and a second nitride layer over the second oxide layer. Transistor devices in the logic region include sidewall spacers having a first oxide layer over a side surface of a gate structure, a first nitride layer over the first oxide layer, and a second nitride layer over the first nitride layer.Type: GrantFiled: August 27, 2021Date of Patent: December 26, 2023Assignee: Taiwan Semiconductor Manufacturing Company LimitedInventors: Chen-Ming Huang, Wen-Tuo Huang, ShihKuang Yang, Yu-Chun Chang, Shih-Hsien Chen, Yu-Hsiang Yang, Yu-Ling Hsu, Chia-Sheng Lin, Po-Wei Liu, Hung-Ling Shih, Wei-Lin Chang
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Publication number: 20230335196Abstract: A memory device and method of making the same are disclosed. The memory device includes transistor devices located in both a memory region and a logic region of the device. Transistor devices in the memory region include sidewall spacers having a first oxide layer over a side surface of a gate structure, a first nitride layer over the first oxide layer, a second oxide layer over the first nitride layer, and a second nitride layer over the second oxide layer. Transistor devices in the logic region include sidewall spacers having a first oxide layer over a side surface of a gate structure, a first nitride layer over the first oxide layer, and a second nitride layer over the first nitride layer.Type: ApplicationFiled: June 20, 2023Publication date: October 19, 2023Inventors: Chen-Ming Huang, Wen-Tuo Huang, Yu-Hsiang Yang, Yu-Ling Hsu, Wei-Lin Chang, Chia-Sheng Lin, ShihKuang Yang, Yu-Chun Chang, Hung-Ling Shih, Po-Wei Liu, Shih-Hsien Chen
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Publication number: 20230135742Abstract: A semiconductor device includes a fin-shaped structure on a substrate, a gate structure on the fin-shaped structure and an interlayer dielectric (ILD) layer around the gate structure, and a single diffusion break (SDB) structure in the ILD layer and the fin-shaped structure. Preferably, the SDB structure includes a bottom portion and a top portion on the bottom portion, in which the top portion and the bottom portion include different widths.Type: ApplicationFiled: December 26, 2022Publication date: May 4, 2023Applicant: UNITED MICROELECTRONICS CORP.Inventors: Ching-Ling Lin, Wen-An Liang, Chen-Ming Huang
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Publication number: 20230062874Abstract: A memory device and method of making the same are disclosed. The memory device includes transistor devices located in both a memory region and a logic region of the device. Transistor devices in the memory region include sidewall spacers having a first oxide layer over a side surface of a gate structure, a first nitride layer over the first oxide layer, a second oxide layer over the first nitride layer, and a second nitride layer over the second oxide layer. Transistor devices in the logic region include sidewall spacers having a first oxide layer over a side surface of a gate structure, a first nitride layer over the first oxide layer, and a second nitride layer over the first nitride layer.Type: ApplicationFiled: August 27, 2021Publication date: March 2, 2023Inventors: Chen-Ming HUANG, Wen-Tuo HUANG, ShihKuang YANG, Yu-Chun CHANG, Shih-Hsien CHEN, Yu-Hsiang YANG, Yu-Ling HSU, Chia-Sheng LIN, Po-Wei LIU, Hung-Ling SHIH, Wei-Lin CHANG
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Patent number: 11569133Abstract: A semiconductor device includes a fin-shaped structure on a substrate, a gate structure on the fin-shaped structure and an interlayer dielectric (ILD) layer around the gate structure, and a single diffusion break (SDB) structure in the ILD layer and the fin-shaped structure. Preferably, the SDB structure includes a bottom portion and a top portion on the bottom portion, in which the top portion and the bottom portion include different widths.Type: GrantFiled: April 27, 2020Date of Patent: January 31, 2023Assignee: UNITED MICROELECTRONICS CORP.Inventors: Ching-Ling Lin, Wen-An Liang, Chen-Ming Huang
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Publication number: 20220245374Abstract: A fingerprint sensing system is configured to receive an illumination beam which is reflected by a finger and then transmitted to the fingerprint sensing system to generate a fingerprint image. The fingerprint sensing system includes a plurality of microlenses, a sensor, a first light filter layer, and a second light filter layer. The microlenses are arranged in an array. The sensor has a plurality of sensing pixels arranged in an array. The first light filter layer is disposed between the microlenses and the sensor and has a plurality of first openings. The second light filter layer is disposed between the first light filter layer and the sensor and has a plurality of second openings. The illumination beam passes through the first openings or the second openings, so that the sensor receives the illumination beam.Type: ApplicationFiled: March 16, 2021Publication date: August 4, 2022Applicant: Powerchip Semiconductor Manufacturing CorporationInventor: Chen-Ming Huang
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Patent number: 11358252Abstract: A method of using a polishing system includes securing a wafer to a support, wherein the wafer has a first diameter. The method further includes polishing the wafer using a first polishing pad rotating about a first axis, wherein the first polishing pad has a second diameter greater than the first diameter. The method further includes rotating the support about a second axis perpendicular to the first axis after polishing the wafer using the first polishing pad. The method further includes polishing the wafer using a second polishing pad after rotating the support, wherein the second polishing pad has a third diameter less than the first diameter. The method further includes releasing the wafer from the support following polishing the wafer using the second polishing pad.Type: GrantFiled: July 18, 2019Date of Patent: June 14, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Shih-Chi Lin, Kun-Tai Wu, You-Hua Chou, Chih-Tsung Lee, Min Hao Hong, Chih-Jen Wu, Chen-Ming Huang, Soon-Kang Huang, Chin-Hsiang Chang, Chih-Yuan Yang
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Publication number: 20210351195Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a first gate structure over a substrate and laterally surrounded by a first sidewall spacer. The first gate structure protrudes outward from a top of the first sidewall spacer. A second gate structure is over the substrate and is laterally surrounded by a second sidewall spacer. The first gate structure has a first height that is larger than a second height of the second gate structure. The first sidewall spacer has a first cross-sectional profile that is a different shape and a different size than a second cross-sectional profile of the second sidewall spacer.Type: ApplicationFiled: July 21, 2021Publication date: November 11, 2021Inventors: Josh Lin, Chia-Ta Hsieh, Chen-Ming Huang, Chi-Wei Ho
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Patent number: 11075212Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip having a flash gate structure disposed over a substrate and including a control gate separated from a floating gate by an inter-electrode dielectric. One or more first sidewall spacers laterally surround the flash gate structure. The inter-electrode dielectric is directly between the one or more first sidewall spacers. A logic gate structure is disposed over the substrate and is laterally surrounded by one or more second sidewall spacers having a smaller height than the one or more first sidewall spacers.Type: GrantFiled: March 25, 2020Date of Patent: July 27, 2021Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Josh Lin, Chia-Ta Hsieh, Chen-Ming Huang, Chi-Wei Ho
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Publication number: 20210205247Abstract: Disclosed herein is a sustained-release formulation that includes, based on the total weight of the sustained-release formulation, 5 wt % to 40 wt % of pregabalin, or a pharmaceutically acceptable salt, solvate or hydrate thereof, 0.1 wt % to 5 wt % of carbomer, and 20 wt % to 60 wt % of polyethylene oxide, wherein the formulation is free from polyvinyl acetate. The formulation can release pregabalin consistently over a time period of 24 hours, and is suitable for once-daily administration.Type: ApplicationFiled: March 27, 2020Publication date: July 8, 2021Inventors: Chih-Hung LI, Chen-Ming HUANG, Li-Chuan CHUANG
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Patent number: 10918558Abstract: A portable human exoskeleton system includes a pelvis module, a leg module and a foot module. The pelvis module includes a bendable member and a pelvis module connector. The foot module includes a foot module connector. The leg module includes: a femur module detachably coupled to the pelvis module connector; a tibia module detachably coupled to the foot module connector; and a knee joint component having at least two linkages with different lengths wherein each linkage is pivotally coupled to the femur module and the tibia module. Weight above the hip of the user is exerted on the pelvis module, and transferred to the leg module and the foot module. The exoskeleton system is easily disassembled and carried, and can be worn inside attire without affecting appearance of the user.Type: GrantFiled: February 9, 2016Date of Patent: February 16, 2021Inventors: Chen-Ming Huang, Yen-Chieh Mao
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Publication number: 20200258788Abstract: A semiconductor device includes a fin-shaped structure on a substrate, a gate structure on the fin-shaped structure and an interlayer dielectric (ILD) layer around the gate structure, and a single diffusion break (SDB) structure in the ILD layer and the fin-shaped structure. Preferably, the SDB structure includes a bottom portion and a top portion on the bottom portion, in which the top portion and the bottom portion include different widths.Type: ApplicationFiled: April 27, 2020Publication date: August 13, 2020Inventors: Ching-Ling Lin, Wen-An Liang, Chen-Ming Huang
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Publication number: 20200227425Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip having a flash gate structure disposed over a substrate and including a control gate separated from a floating gate by an inter-electrode dielectric. One or more first sidewall spacers laterally surround the flash gate structure. The inter-electrode dielectric is directly between the one or more first sidewall spacers. A logic gate structure is disposed over the substrate and is laterally surrounded by one or more second sidewall spacers having a smaller height than the one or more first sidewall spacers.Type: ApplicationFiled: March 25, 2020Publication date: July 16, 2020Inventors: Josh Lin, Chia-Ta Hsieh, Chen-Ming Huang, Chi-Wei Ho