Abstract: A lithography method is provided in accordance with some embodiments. The lithography method includes forming an under layer on a substrate; forming a silicon-containing middle layer on the under layer, wherein the silicon-containing middle layer has a thermal base generator (TBG) composite; forming a photosensitive layer on the silicon-containing middle layer; performing an exposing process to the photosensitive layer; and developing the photosensitive layer, thereby forming a patterned photosensitive layer.

Abstract: Provided is a material composition and method for that includes forming a silicon-based resin over a substrate. In various embodiments, the silicon-based resin includes a nitrobenzyl functional group. In some embodiments, a baking process is performed to cross-link the silicon-based resin. Thereafter, the cross-linked silicon-based resin is patterned and an underlying layer is etched using the patterned cross-linked silicon-based resin as an etch mask. In various examples, the cross-linked silicon-based resin is exposed to a radiation source, thereby de-cross-linking the silicon-based resin. In some embodiments, the de-cross-linked silicon-based resin is removed using an organic solution.

Abstract: A resist material and methods for forming a semiconductor structure including using the resist material are provided. The method for forming a semiconductor structure includes forming a resist layer over a substrate and exposing a portion of the resist layer to form an exposed portion of the resist layer by performing an exposure process. The method for forming a semiconductor structure further includes developing the resist layer in a developer. In addition, the resist layer is made of a resist material including a photosensitive polymer and a contrast promoter, and a protected functional group of the photosensitive polymer is deprotected to form a deprotected functional group during the exposure process, and a functional group of the contrast promoter bonds to the deprotected functional group of the photosensitive polymer.

Abstract: The present disclosure provides a method for lithography patterning. The method includes coating a bottom layer on a substrate, wherein the bottom layer includes a carbon-rich material; forming a middle layer on the bottom layer, wherein the middle layer has a composition such that its silicon concentration is enhanced to be greater than 42% in weight; coating a photosensitive layer on the middle layer; performing an exposing process to the photosensitive layer; and developing the photosensitive layer to form a patterned photosensitive layer.

Abstract: A touch display is disclosed including a display module, a polarizer disposed on the display module, and a plurality of touch electrodes at least partly coated on the polarizer, wherein the touch electrodes are formed by nano-silver. Since the touch electrodes formed by nano-silver is employed in the display, a multifunctional touch display is provided. A method for making the touch display is also disclosed.

Abstract: An OLED touch display device includes an OLED display and a laminated package component covering the OLED display and including a quarter-wave plate, a liquid crystal polarizer, a first touch sensor layer and a second touch sensor layer. The first touch sensor layer and the second touch sensor layer are configured to cooperatively detect touch events.

Abstract: A touch module and a manufacturing method thereof are disclosed. The touch module includes a substrate, at least one first touch electrode, and at least one second touch electrode. The first touch electrode is embedded into the substrate. The second touch electrode is embedded into the substrate. A height of the first touch electrode relative to a first surface of the substrate is different from a height of the second touch electrode relative to the first surface of the substrate, such that the first touch electrode and the second touch electrode are insulated from each other.

Abstract: The present invention provides a touch panel, including a lower substrate, an organic light-emitting component, disposed on the lower substrate, a nano silver sensing layer, disposed on the organic light emitting component, and an upper substrate, disposed on the nano silver sensing layer.

Abstract: A touch module and a manufacturing method thereof are disclosed. The touch module includes a substrate, at least two first touch electrodes, at least two second touch electrodes, at least one electrode channel, and at least one bridge. All of the first touch electrodes, the second touch electrodes, and the electrode channel are embedded in the substrate. The electrode channel is configured to connect the second touch electrodes to each other. The bridge crosses over the electrode channel, is configured to electrically connect the first touch electrodes to each other. The first touch electrodes and the second touch electrodes are insulated from each other.

Abstract: A method for lithography patterning includes forming a material layer over a substrate; exposing a portion of the material layer to a radiation; and removing the exposed portion of the material layer in a developer, resulting in a patterned material layer. The developer comprises water, an organic solvent, and a basic solute. In an embodiment, the basic solute is less than 30% of the developer by weight.

Abstract: A method of lithography patterning includes forming a resist layer over a substrate and providing a radiation with a first exposure dose to define an opening to be formed in the resist layer. The opening is to have a target critical dimension CD1 after developed by a negativ-tone development (NTD) process. The method further includes exposing the resist layer to the radiation with a second exposure dose less than the first exposure dose and developing the resist layer in a negative-tone development process to remove unexposed portions of the resist layer, resulting in an opening between resist patterns. A critical dimension CD2 of the opening is greater than CD1 by a delta. The method further includes forming an interfacial layer on sidewalls of the resist patterns. The interfacial layer has a thickness that is substantially equal to half of the delta.

Abstract: A touch panel is partitioned into a sensing region and a circuit region and the circuit region is positioned around the edges of the sensing region. The touch panel comprises an electrode layer, a first wire layer, a second wire layer and an insulating layer. The electrode layer is disposed in the sensing region. The first wire layer is disposed in the circuit region and electrically connects to the electrode layer. The second wire layer electrically connects to the first wire layer in the circuit region. The insulating layer has a portion being disposed between the first wire layer and the second wire layer in the circuit, and has a plurality of first through holes wherein the first wire layer electrically connects to the second wire layer through the first through holes. The present disclosure also provides a method of manufacturing a touch panel.

Abstract: A photosensitive material and methods of making a pattern on a substrate are disclosed. The photosensitive material includes a polymer that turns soluble to a developer solution after a chemically amplified reaction, and at least one chemical complex having a single diffusion length. The material includes at least one photo-acid generator (PAG) linked to at least one photo decomposable base (PDB) or quencher.

Abstract: Methods and materials for making a semiconductor device are described. The method includes forming a surface preparation layer over the semiconductor substrate. The surface preparation material layer includes an aziridine structure. A coating layer may then be deposited on the surface preparation material layer.

Abstract: Present invention discloses a touch panel and a manufacturing method thereof, the touch panel comprises: a substrate; a silver nano-wire electrode layer provided on the substrate comprising a connecting area and a non-connecting area; a first protective layer provided on silver nano-wire electrode layer having a first hole corresponding to connecting area; a second protective layer provided on first protective layer having a second hole corresponding to position of first hole; and a connecting wire provided on second protective layer connected to silver nano-wire electrode layer in connecting area through second hole and first hole. With the touch panel, the problem that etching solution can't seep when a single protective layer is too thick and the problem that a silver nano-wire layer is easily oxidized and the adhesion of the silver nano-wire layer is poor when a single protective layer is too thin can be avoided.

Abstract: A method of lithography patterning includes forming a resist layer over a substrate and providing a radiation with a first exposure dose to define an opening to be formed in the resist layer. The opening is to have a target critical dimension CD1 after developed by a negativ-tone development (NTD) process. The method further includes exposing the resist layer to the radiation with a second exposure dose less than the first exposure dose and developing the resist layer in a negative-tone development process to remove unexposed portions of the resist layer, resulting in an opening between resist patterns. A critical dimension CD2 of the opening is greater than CD1 by a delta. The method further includes forming an interfacial layer on sidewalls of the resist patterns. The interfacial layer has a thickness that is substantially equal to half of the delta.

Abstract: A wireless detection and control device is provided, which is applicable a lighting device, and may include a first connection interface, a processing module, a detection module and a control module. The first connection interface may be detachably coupled to the power conversion module of the lighting device. The processing module may be coupled to the first connection interface. The detection module may include two second connection interfaces, and be detachably coupled to the processing module via one of the second connection interfaces; the detection module may detect the change of the surrounding environment to generate a detection signal. The control module may be detachably coupled to the processing module. The detection module may transmit the detection signal to the power conversion module, or transmit the detection signal to the control module for the control module to generate a control signal accordingly so as to control a controlled device.

Abstract: A lithography method is provided in accordance with some embodiments. The lithography method includes providing a substrate, forming a crosslinked layer over the substrate, wherein the crosslinked layer is in contact with the substrate, forming a patterned layer over the crosslinked layer, forming a pattern in the crosslinked layer and further in the substrate by using the patterned layer as a mask, treating the crosslinked layer by using a radiation source to transition the crosslinked layer to a de-crosslinked layer with a reduced molecular weight, and removing the de-crosslinked layer by using a solution that is not subject to cause damage on the substrate.

Abstract: Present invention discloses a touch panel and a manufacturing method thereof, the touch panel comprises: a substrate; a silver nano-wire electrode layer provided on the substrate comprising a connecting area and a non-connecting area; a first protective layer provided on silver nano-wire electrode layer having a first hole corresponding to connecting area; a second protective layer provided on first protective layer having a second hole corresponding to position of first hole; and a connecting wire provided on second protective layer connected to silver nano-wire electrode layer in connecting area through second hole and first hole. With the touch panel, the problem that etching solution can't seep when a single protective layer is too thick and the problem that a silver nano-wire layer is easily oxidized and the adhesion of the silver nano-wire layer is poor when a single protective layer is too thin can be avoided.

Abstract: A touch panel stackup comprises a substrate having a substantially transparent first region and a substantially opaque second region, a sensing electrode detecting a tactile signal, a conductive circuit electrically coupled with the sensing electrode, and a masking element configured on the second region of the substrate, wherein the sensing electrode, the conductive circuit, and the masking element are integrally formed on the substrate.