Patents by Inventor Cheng-Yu (Sean) Lin

Cheng-Yu (Sean) Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8900374
    Abstract: A substrate is moved below a substrate cleaning module in a direction extending from a leading edge to a trailing edge of the substrate cleaning module. A cleaning material is dispensed downward toward a top surface of the substrate along the leading edge of the substrate cleaning module. A rinsing material is dispensed downward toward the top surface of the substrate along the trailing edge of the substrate cleaning module to generate a rinsing meniscus. Vacuum suction is applied at a vacuum suction location along a bottom surface of the substrate cleaning module and parallel to the leading and trailing edges of the substrate cleaning module. The vacuum location is positioned between a dispense location of the cleaning material and a dispense location of the rinsing material. A plenum region located between the dispense location of the cleaning material and the vacuum location is vented.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: December 2, 2014
    Assignee: Lam Research Corporation
    Inventors: Cheng-Yu (Sean) Lin, Mark Kawaguchi, Mark Wilcoxson, Russell Martin, Leon Ginzburg
  • Patent number: 8900400
    Abstract: A proximity head defined by a body having a length. The body includes a main bore defined therein and extending along the length. A resistor bore is defined in the body and extends along the length. The resistor bore defined below the main bore. A first plurality of bores defined between the main bore and the resistor bore and a second plurality of bores defined between the resistor bore and an exterior surface of the body. The exterior surface of the body defining a proximity surface of the proximity head.
    Type: Grant
    Filed: October 26, 2012
    Date of Patent: December 2, 2014
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin, Russell Martin
  • Patent number: 8757177
    Abstract: A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
    Type: Grant
    Filed: November 6, 2012
    Date of Patent: June 24, 2014
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu (Sean) Lin, Mark Wilcoxson, Leon Ginzburg, Mark Kawaguchi
  • Patent number: 8739805
    Abstract: In an example embodiment, a linear wet system includes a carrier and a proximity head in a chamber. The proximity head includes three sections in a linear arrangement. The first section suctions liquid from the upper surface of a semiconductor wafer as the wafer is transported by the carrier under the proximity head. The second section is configured to cause a film (or meniscus) of cleaning foam which is a non-Newtonian fluid to flow onto the upper surface of the wafer. The third section is configured to cause a film of rinsing fluid to flow onto the upper surface of the wafer as the wafer is carried under the proximity head. The third section is defined partially around the second section and up to the first section, so that the third section and the first section create a confinement of the cleaning foam with respect to the chamber.
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: June 3, 2014
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin, Leon Ginzburg, Mark Mandelboym, Gregory A. Tomasch, Anwar Husain
  • Patent number: 8557051
    Abstract: A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.
    Type: Grant
    Filed: April 12, 2012
    Date of Patent: October 15, 2013
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Anwar Husain, Gregory A. Tomasch, Cheng-Yu (Sean) Lin
  • Publication number: 20130068261
    Abstract: A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
    Type: Application
    Filed: November 6, 2012
    Publication date: March 21, 2013
    Inventors: Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu (Sean) Lin, Mark Wilcoxson, Leon Ginzburg, Mark Kawaguchi
  • Publication number: 20130048765
    Abstract: A proximity head defined by a body having a length. The body includes a main bore defined therein and extending along the length. A resistor bore is defined in the body and extends along the length. The resistor bore defined below the main bore. A first plurality of bores defined between the main bore and the resistor bore and a second plurality of bores defined between the resistor bore and an exterior surface of the body. The exterior surface of the body defining a proximity surface of the proximity head.
    Type: Application
    Filed: October 26, 2012
    Publication date: February 28, 2013
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin, Russell Martin
  • Patent number: 8317966
    Abstract: Conditioning fluid flow into a proximity head is provided for fluid delivery to a wafer surface. An upper plenum connected to a plurality of down flow bores is supplied by a main bore. The down flow bores provide fluid into the upper plenum, and a resistor bore is connected to the upper plenum. The resistor bore receives a resistor having a shape so as to limit flow of the fluid through the resistor bore. A lower plenum connected to the resistor bore is configured to receive fluid from the resistor bore as limited by the resistor for flow to a plurality of outlet ports extending between the lower plenum and surfaces of the head surface. Fluid flowing through the upper plenum, the resistor bore with the resistor and the lower plenum is substantially conditioned to define a substantially uniform fluid outflow from the plurality of outlet ports, across the width of the proximity head.
    Type: Grant
    Filed: February 7, 2009
    Date of Patent: November 27, 2012
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin, Russell Martin
  • Patent number: 8317934
    Abstract: A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: November 27, 2012
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu (Sean) Lin, Mark Wilcoxson, Leon Ginzburg, Mark Kawaguchi
  • Patent number: 8313582
    Abstract: A system and method of forming and using a proximity head. The proximity head includes a head surface including a first zone, a second zone and an inner return zone. The first zone including a first flat surface region and multiple first discrete holes connected to a corresponding first conduit and arranged in a first row. The second zone including a second flat region and multiple second discrete holes connected to a corresponding second conduit. The inner return zone being disposed between and adjacent to the first zone and the second zone and including multiple inner return discrete holes connected to a corresponding inner return conduit and arranged in an inner return row. The first row and the inner return row are parallel. A portion of an edge of each of the inner return discrete holes is recessed into the head surface.
    Type: Grant
    Filed: February 9, 2012
    Date of Patent: November 20, 2012
    Assignee: Lam Research Corporation
    Inventors: Robert O'Donnell, Cheng-Yu (Sean) Lin, Arnold Kholodenko
  • Patent number: 8246755
    Abstract: In an example embodiment, a wet system delivers a flow of cleaning foam through a channel in a proximity head to a meniscus interfacing with a semiconductor wafer. The wet system diverts a sample of the flow from the channel through a transparent cell that is connected to the channel by an input passage that leads from the channel to the transparent cell and by an output passage that leads from the transparent cell back to the channel. The wet system illuminates the sample in the transparent cell with an LED from the top or the back and captures an image of the illuminated sample with a CCD camera. The image shows a morphological attribute of the cleaning foam such as bubble diameter or spacing. The wet system generates a statistical characterization from the morphological attribute and adjusts other attributes of the cleaning foam based on the statistical characterization.
    Type: Grant
    Filed: November 5, 2009
    Date of Patent: August 21, 2012
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Gregrory A. Tomasch, Leonid Ginzburg, Cheng-Yu (Sean) Lin
  • Publication number: 20120138098
    Abstract: A system and method of forming and using a proximity head. The proximity head includes a head surface including a first zone, a second zone and an inner return zone. The first zone including a first flat surface region and multiple first discrete holes connected to a corresponding first conduit and arranged in a first row. The second zone including a second flat region and multiple second discrete holes connected to a corresponding second conduit. The inner return zone being disposed between and adjacent to the first zone and the second zone and including multiple inner return discrete holes connected to a corresponding inner return conduit and arranged in an inner return row. The first row and the inner return row are parallel. A portion of an edge of each of the inner return discrete holes is recessed into the head surface.
    Type: Application
    Filed: February 9, 2012
    Publication date: June 7, 2012
    Inventors: Robert O'Donnell, Cheng-Yu (Sean) Lin, Arnold Kholodenko
  • Patent number: 8161984
    Abstract: In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the cleaning system. The plug includes a premix chamber which receives the fluid from the aperture and into which a gas is injected to form a foam. In an example embodiment, the chamber is a hollow cylinder and the gas is injected into the cylinder through channels which are tangential to the cylinder. The plug also includes a solid cylinder with a continuous helical indentation on the outside of the solid cylinder. When the male plug is inserted into the female housing, the continuous helical indentation and the inner surface of the housing form a helical channel through which the foam flows and is further mixed on its way back into the cleaning system.
    Type: Grant
    Filed: August 4, 2008
    Date of Patent: April 24, 2012
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Anwar Husain, Gregory A. Tomasch, Cheng-Yu (Sean) Lin
  • Patent number: 8141566
    Abstract: A system and method of forming and using a proximity head. The proximity head includes a head surface including a first zone, a second zone and an inner return zone. The first zone including a first flat surface region and multiple first discrete holes connected to a corresponding first conduit and arranged in a first row. The second zone including a second flat region and multiple second discrete holes connected to a corresponding second conduit. The inner return zone being disposed between and adjacent to the first zone and the second zone and including multiple inner return discrete hole connected to a corresponding inner return conduit and arranged in an inner return row. The first row and the inner return row are parallel. A portion of an edge of each of the inner return discrete holes is recessed into the head surface.
    Type: Grant
    Filed: June 19, 2007
    Date of Patent: March 27, 2012
    Assignee: Lam Research Corporation
    Inventors: Robert O'Donnell, Cheng-Yu (Sean) Lin, Arnold Kholodenko
  • Patent number: 7998304
    Abstract: Methods configure a proximity head for conditioning fluid flow relative to a proximity head in processing of a surface of a wafer by a meniscus. The methods configure the head in one piece while maintaining head rigidity even as the head is lengthened for cleaning of large diameter wafers. The one-piece head configuring separates main fluid flows from separate flows of fluid relative to the wafer surface, with the separation being by a high resistance fluid flow configuration, resulting in substantially uniform fluid flows across increased lengths of the head in a unit for either fluid supply or return.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: August 16, 2011
    Assignee: Lam Research Corporation
    Inventors: Arnold Kholodenko, Cheng-Yu (Sean) Lin
  • Publication number: 20110100399
    Abstract: In an example embodiment, a wet system delivers a flow of cleaning foam through a channel in a proximity head to a meniscus interfacing with a semiconductor wafer. The wet system diverts a sample of the flow from the channel through a transparent cell that is connected to the channel by an input passage that leads from the channel to the transparent cell and by an output passage that leads from the transparent cell back to the channel. The wet system illuminates the sample in the transparent cell with an LED from the top or the back and captures an image of the illuminated sample with a CCD camera. The image shows a morphological attribute of the cleaning foam such as bubble diameter or spacing. The wet system generates a statistical characterization from the morphological attribute and adjusts other attributes of the cleaning foam based on the statistical characterization.
    Type: Application
    Filed: November 5, 2009
    Publication date: May 5, 2011
    Applicant: Lam Research Corporation
    Inventors: Arnold Kholodenko, Gregrory A. Tomasch, Leonid Ginzburg, Cheng-Yu (Sean) Lin
  • Publication number: 20110048467
    Abstract: An upper processing head includes a topside module defined to apply a cleaning material to a top surface of a substrate and then expose the substrate to a topside rinsing meniscus. The topside module is defined to flow a rinsing material through the topside rinsing meniscus in a substantially uni-directional manner towards the cleaning material and opposite a direction of movement of the substrate. A lower processing head includes a bottomside module defined to apply a bottomside rinsing meniscus to the substrate so as to balance a force applied to the substrate by the topside rinsing meniscus. The bottomside module is defined to provide a drain channel for collecting and draining the cleaning material dispensed from the upper processing head when the substrate is not present between the upper and lower processing heads. The upper and lower processing heads can include multiple instantiations of the topside and bottomside modules, respectively.
    Type: Application
    Filed: November 9, 2010
    Publication date: March 3, 2011
    Applicant: Lam Research Corporation
    Inventors: Cheng-Yu (Sean) Lin, Mark Kawaguchi, Mark Wilcoxson, Russell Martin, Leon Ginzburg
  • Patent number: 7849554
    Abstract: An upper processing head includes a topside module defined to apply a cleaning material to a top surface of a substrate and then expose the substrate to a topside rinsing meniscus. The topside module is defined to flow a rinsing material through the topside rinsing meniscus in a substantially uni-directional manner towards the cleaning material and opposite a direction of movement of the substrate. A lower processing head includes a bottomside module defined to apply a bottomside rinsing meniscus to the substrate so as to balance a force applied to the substrate by the topside rinsing meniscus. The bottomside module is defined to provide a drain channel for collecting and draining the cleaning material dispensed from the upper processing head when the substrate is not present between the upper and lower processing heads. The upper and lower processing heads can include multiple instantiations of the topside and bottomside modules, respectively.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: December 14, 2010
    Assignee: Lam Research Corporation
    Inventors: Cheng-Yu (Sean) Lin, Mark Kawaguchi, Mark Wilcoxson, Russell Martin, Leon Ginzburg
  • Publication number: 20100288311
    Abstract: A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
    Type: Application
    Filed: May 13, 2009
    Publication date: November 18, 2010
    Applicant: Lam Research Corporation
    Inventors: Arnold Kholodenko, Katrina Mikhaylichenko, Cheng-Yu (Sean) Lin, Mark Wilcoxson, Leon Ginzburg, Mark Kawaguchi
  • Publication number: 20100269285
    Abstract: An upper processing head includes a topside module defined to apply a cleaning material to a top surface of a substrate and then expose the substrate to a topside rinsing meniscus. The topside module is defined to flow a rinsing material through the topside rinsing meniscus in a substantially unidirectional manner towards the cleaning material and opposite a direction of movement of the substrate. A lower processing head includes a bottomside module defined to apply a bottomside rinsing meniscus to the substrate so as to balance a force applied to the substrate by the topside rinsing meniscus. The bottomside module is defined to provide a drain channel for collecting and draining the cleaning material dispensed from the upper processing head when the substrate is not present between the upper and lower processing heads. The upper and lower processing heads can include multiple instantiations of the topside and bottomside modules, respectively.
    Type: Application
    Filed: April 28, 2009
    Publication date: October 28, 2010
    Applicant: Lam Research Corporation
    Inventors: Cheng-Yu (Sean) Lin, Mark Kawaguchi, Mark Wilcoxson, Russell Martin, Leon Ginzburg