Abstract: An electronic device having a display area and a non-display area includes a substrate; a first transistor including a first semiconductor layer and disposed in the non-display area; a second transistor including a second semiconductor layer and a gate electrode and disposed in the display area, wherein a material of the first semiconductor layer is different from a material of the second semiconductor layer; a barrier layer overlapping the gate electrode of the second transistor; and an organic layer disposed on the first transistor and the second transistor, wherein the organic layer includes a first portion disposed in the non-display area and a second portion disposed in the display area. A minimum distance from the substrate to the first portion is a first distance, a minimum distance from the substrate to the second portion is a second distance, and the first distance is different from the second distance.

Abstract: An electronic device including a substrate, a circuit layer, an optical filter layer and a medium layer is disclosed. The circuit layer is disposed on the substrate and includes a signal line. The optical filter layer is disposed on the circuit layer and includes a plurality of optical filter patterns. One of the optical filter patterns includes a first arc corner and a second arc corner, and the first arc corner and the second arc corner are adjacent to the signal line. The optical filter layer is disposed between the circuit layer and the medium layer. A curvature radius of the first arc corner is different from a curvature radius of the second arc corner.

Abstract: An electronic device is provided by the present disclosure. The electronic device includes a substrate; a first transistor disposed on the substrate and including a first semiconductor layer and a gate electrode; a first insulating layer disposed between the first semiconductor layer and the gate electrode; a second insulating layer disposed on the first insulating layer, wherein the first semiconductor layer and the gate electrode are located between the substrate and the second insulating layer; a barrier layer disposed on the second insulating layer; and a second transistor disposed on the barrier layer and including a second semiconductor layer, wherein the barrier layer is disposed between the second semiconductor layer and the second insulating layer.

Abstract: An electronic device includes a substrate, a first active layer, a second active layer, an insulating layer and a metal line. The first active layer is disposed on the substrate and includes a first end. The second active layer is disposed on the substrate and includes a second end, wherein the second end is adjacent to the first end. The insulating layer is disposed on the first active layer and the second active layer. The metal line is disposed on the insulating layer. In a cross-sectional view of the electronic device, the insulating layer includes a first opening, and a portion of the metal line is disposed in the first opening and overlapped with the first end, and in a top view of the electronic device, the first end has an edge, a portion of the edge is arc-shaped and located between the first opening and the second end.

Abstract: ABSTRACT OF DISCLOSURE A display device includes a substrate, scan lines disposed on the substrate and extending along a first direction, data lines disposed on the substrate and extending along a second direction, and spacers. The scan lines and the data lines cross each other at crossing positions and form sub-pixel regions, and one of the sub-pixel regions has a sub-pixel width. The spacers are disposed on the crossing positions and arranged in a plurality of rows in the second direction. The spacers include a plurality of nth row spacers and a plurality of n+1th row spacers arranged along the first direction. The nth row spacers and the n+1th row spacers are staggered in the second direction. A first pitch is included between adjacent two of the spacers in one of the rows in the first direction, and the first pitch is 2-12 times the sub-pixel width.

Abstract: A device includes a fin extending from a semiconductor substrate; a gate stack over the fin; a first spacer on a sidewall of the gate stack; a source/drain region in the fin adjacent the first spacer; an inter-layer dielectric layer (ILD) extending over the gate stack, the first spacer, and the source/drain region, the ILD having a first portion and a second portion, wherein the second portion of the ILD is closer to the gate stack than the first portion of the ILD; a contact plug extending through the ILD and contacting the source/drain region; a second spacer on a sidewall of the contact plug; and an air gap between the first spacer and the second spacer, wherein the first portion of the ILD extends across the air gap and physically contacts the second spacer, wherein the first portion of the ILD seals the air gap.

Abstract: A semiconductor device including a fin field effect transistor (FinFET) with a cut metal gate (CMG) and a method of manufacturing the semiconductor device are described herein. The method includes forming a CMG protective helmet structure at a top portion of a CMG dummy gate plug formed within a semiconductor substrate. The CMG protective helmet structure prevents consumption and damage of a dummy filler material in a CMG region and prevents undesirable polymer/residue byproducts from forming on top surfaces of epitaxial regions of the FinFET during etching processes.

Abstract: In a method of manufacturing a semiconductor device, a first layer containing an amorphous first material is formed by a deposition process over a semiconductor layer. A second layer containing a metal second material is formed over the first layer. A thermal process is performed to form an alloy layer of the amorphous first material and the metal second material.

Abstract: A device includes a fin extending from a semiconductor substrate; a gate stack over the fin; a first spacer on a sidewall of the gate stack; a source/drain region in the fin adjacent the first spacer; an inter-layer dielectric layer (ILD) extending over the gate stack, the first spacer, and the source/drain region, the ILD having a first portion and a second portion, wherein the second portion of the ILD is closer to the gate stack than the first portion of the ILD; a contact plug extending through the ILD and contacting the source/drain region; a second spacer on a sidewall of the contact plug; and an air gap between the first spacer and the second spacer, wherein the first portion of the ILD extends across the air gap and physically contacts the second spacer, wherein the first portion of the ILD seals the air gap.

Abstract: A semiconductor device including a fin field effect transistor (FinFET) with a cut metal gate (CMG) and a method of manufacturing the semiconductor device are described herein. The method includes forming a CMG protective helmet structure at a top portion of a CMG dummy gate plug formed within a semiconductor substrate. The CMG protective helmet structure prevents consumption and damage of a dummy filler material in a CMG region and prevents undesirable polymer/residue byproducts from forming on top surfaces of epitaxial regions of the FinFET during etching processes.

Abstract: A method includes etching a first semiconductor fin and a second semiconductor fin to form first recesses. The first and the second semiconductor fins have a first distance. A third semiconductor fin and a fourth semiconductor fin are etched to form second recesses. The third and the fourth semiconductor fins have a second distance equal to or smaller than the first distance. An epitaxy is performed to simultaneously grow first epitaxy semiconductor regions from the first recesses and second epitaxy semiconductor regions from the second recesses. The first epitaxy semiconductor regions are merged with each other, and the second epitaxy semiconductor regions are separated from each other.

Abstract: In a method of manufacturing a semiconductor device, a first layer containing an amorphous first material is formed by a deposition process over a semiconductor layer. A second layer containing a metal second material is formed over the first layer. A thermal process is performed to form an alloy layer of the amorphous first material and the metal second material.

Abstract: A measurement assistance system and method are provided. The measurement assistance system includes: a measurement platform, having an operation area configured for a to-be-measured object and a measurement tool to be placed; a camera, arranged on the measurement platform and configured to obtain a measurement image; and a server module, electrically connected to the camera and configured to execute a measurement tool identification program, a measurement part identification program, and a measurement posture identification program according to the measurement image, and determine whether a measurement tool appearance image, a measurement part image, and a measurement posture image are correct. The server module has a processing unit. When the measurement tool appearance image, the measurement part image, and the measurement posture image are all correct, a measurement result is generated according to measurement data.

Abstract: A semiconductor device includes a substrate, an isolation feature disposed on the substrate, first and second fins protruding from the substrate and upwardly through the isolation feature, and a gate stack engaging each of the fins. The semiconductor device also includes a first epitaxial layer having a first portion over top and sidewall surfaces of S/D regions of the first fin and a second portion over top and sidewall surfaces of S/D regions of the second fin, a second epitaxial layer having a first portion over top and sidewall surfaces of the first portion of the first epitaxial layer and a second portion over top and sidewall surfaces of the second portion of the first epitaxial layer. The first and second portions of the second epitaxial layer are spaced apart. Each of the first and second portions of the second epitaxial layer is in physical contact with the isolation feature.

Abstract: A semiconductor device includes a substrate and two fins protruding from the substrate. Each fin includes two source/drain (S/D) regions and a channel region. Each fin includes a top surface that remains flat across the S/D regions and the channel region. The semiconductor device also includes a gate stack engaging each fin at the respective channel region, a first dielectric layer on sidewalls of the gate stack, a first epitaxial layer over top and sidewall surfaces of the S/D regions of the two fins, and a second epitaxial layer over top and sidewall surfaces of the first epitaxial layer.

Abstract: Semiconductor device and the manufacturing method thereof are disclosed herein. An exemplary semiconductor device comprises a substrate, at least two gate structures disposed over the substrate, each of the at least two gate structures including a gate electrode and a spacer disposed along sidewalls of the gate electrode, wherein the spacer includes a refill portion and a bottom portion, the refill portion of the spacer has a funnel shape such that a top surface of the refill portion of the spacer is larger than a bottom surface of the refill portion of the spacer, and a source/drain contact disposed over the substrate and between the spacers of the at least two gate structures.

Abstract: Semiconductor device and the manufacturing method thereof are disclosed herein. An exemplary semiconductor device comprises a substrate, at least two gate structures disposed over the substrate, each of the at least two gate structures including a gate electrode and a spacer disposed along sidewalls of the gate electrode, wherein the spacer includes a refill portion and a bottom portion, the refill portion of the spacer has a funnel shape such that a top surface of the refill portion of the spacer is larger than a bottom surface of the refill portion of the spacer, and a source/drain contact disposed over the substrate and between the spacers of the at least two gate structures.

Abstract: An electronic device is provided. The electronic device includes a substrate, a data line and a gate line that are disposed on the substrate. The data line extends in a first direction. The electronic device also includes a thin film transistor. The thin film transistor is disposed on the substrate and includes a semiconductor structure. The semiconductor structure includes a channel region, a source region, and a drain region. The gate line overlaps the channel region. The source region is electrically connected to the data line. The source region and the drain region are located on opposite sides of the gate line. The source region includes a first portion extending in a second direction, and an acute angle is formed between the first direction and the second direction.

Abstract: A measurement assistance system and method are provided. The measurement assistance system includes: a measurement platform, having an operation area configured for a to-be-measured object and a measurement tool to be placed; a camera, arranged on the measurement platform and configured to obtain a measurement image; and a server module, electrically connected to the camera and configured to execute a measurement tool identification program, a measurement part identification program, and a measurement posture identification program according to the measurement image, and determine whether a measurement tool appearance image, a measurement part image, and a measurement posture image are correct. The server module has a processing unit. When the measurement tool appearance image, the measurement part image, and the measurement posture image are all correct, a measurement result is generated according to measurement data.

Abstract: A method for removing branches from trained deep learning models is provided. The method includes steps (i)-(v). In step (i), a trained model is obtained. The trained model has a branch structure involving one or more original convolutional layers and a shortcut connection. In step (ii), the shortcut connection is removed from the branch structure. In step (iii), a reparameterization model is built by linearly expanding each of the original convolutional layers into a reparameterization block in the reparameterization model. In step (iv), parameters of the reparameterization blocks are optimized by training the reparameterization model. In step (v), each of the optimized reparameterization blocks is transformed into a reparameterized convolutional layer to form a branchless structure that replaces the branch structure in the trained model.