Patents by Inventor Chia-Hsiang Lin
Chia-Hsiang Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20250149469Abstract: A package structure is provided. The package structure includes a reinforced plate and multiple conductive structures surrounded by the reinforced plate. The package structure also includes a redistribution structure over the reinforced plate. The redistribution structure has multiple polymer-containing layers and multiple conductive features, and the reinforced plate is thinner than the redistribution structure. A thickness ratio of a first thickness of the reinforced plate to a second thickness of the redistribution structure is greater than about 0.5. The package structure further includes one or more chip structures bonded to the redistribution structure.Type: ApplicationFiled: December 26, 2024Publication date: May 8, 2025Inventors: Shin-Puu JENG, Po-Yao LIN, Shuo-Mao CHEN, Chia-Hsiang LIN
-
Patent number: 12218080Abstract: A package structure is provided. The package structure includes a reinforced plate and multiple conductive structures penetrating through the reinforced plate. The package structure also includes a redistribution structure over the reinforced plate. The redistribution structure has multiple polymer-containing layers and multiple conductive features. The package structure further includes multiple chip structures bonded to the redistribution structure through multiple solder bumps. In addition, the package structure includes a protective layer surrounding the chip structures.Type: GrantFiled: March 13, 2023Date of Patent: February 4, 2025Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Shin-Puu Jeng, Po-Yao Lin, Shuo-Mao Chen, Chia-Hsiang Lin
-
Publication number: 20250038093Abstract: An embodiment interposer includes a first electrically conducting line structure, an electrically conducting via structure that is electrically connected to the first electrically conducting line structure, and a second electrically conducting line structure formed along with the electrically conducting via structure as a monolithic structure. In some embodiments, a portion of the first electrically conducting line structure may be provided within the electrically conducting via structure such that the first electrically conducting line structure is at least partially overlapping with the electrically conducting via structure such that the first electrically conducting line structure and the electrically conducting via structure share a common surface. In other embodiments, the interposer may further include a via land structure electrically connected to the first electrically conducting line structure.Type: ApplicationFiled: July 27, 2023Publication date: January 30, 2025Inventors: Monsen Liu, Hsin-Yu Chen, Shuo-Mao Chen, Chia-Hsiang Lin, Shin-Puu Jeng
-
Publication number: 20240363543Abstract: A method includes forming a first dielectric layer, forming a first redistribution line including a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes depositing a conductive material into the via opening to form a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, and the second via is offset from a center line of the conductive bump.Type: ApplicationFiled: July 9, 2024Publication date: October 31, 2024Inventors: Shu-Shen Yeh, Che-Chia Yang, Chia-Kuei Hsu, Po-Yao Lin, Shin-Puu Jeng, Chia-Hsiang Lin
-
Patent number: 12094828Abstract: A method includes forming a first dielectric layer, forming a first redistribution line including a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes depositing a conductive material into the via opening to form a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, and the second via is offset from a center line of the conductive bump.Type: GrantFiled: December 18, 2020Date of Patent: September 17, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Shu-Shen Yeh, Che-Chia Yang, Chia-Kuei Hsu, Po-Yao Lin, Shin-Puu Jeng, Chia-Hsiang Lin
-
Publication number: 20240145433Abstract: A package structure includes a first die and a second die embedded in a first molding material, a first redistribution structure over the first die and the second die, a second molding material over portions of the first die and the second die, wherein the second molding material is disposed between a first portion of the first redistribution structure and a second portion of the first redistribution structure, a first via extending through the second molding material, wherein the first via is electrically connected to the first die, a second via extending through the second molding material, wherein the second via is electrically connected to the second die and a silicon bridge electrically coupled to the first via and the second via.Type: ApplicationFiled: January 4, 2023Publication date: May 2, 2024Inventors: Po-Yao Lin, Chia-Hsiang Lin, Chien-Sheng Chen, Kathy Wei Yan
-
Publication number: 20240088061Abstract: A method includes forming a first dielectric layer, forming a first redistribution line comprising a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes forming a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, with a first center of conductive pad being offsetting from a second center of the conductive bump. The second via is further offset from the second center of the conductive bump.Type: ApplicationFiled: November 22, 2023Publication date: March 14, 2024Inventors: Shu-Shen Yeh, Che-Chia Yang, Chin-Hua Wang, Po-Yao Lin, Shin-Puu Jeng, Chia-Hsiang Lin
-
Patent number: 11855008Abstract: A method includes forming a first dielectric layer, forming a first redistribution line comprising a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes forming a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, with a first center of conductive pad being offsetting from a second center of the conductive bump. The second via is further offset from the second center of the conductive bump.Type: GrantFiled: August 10, 2022Date of Patent: December 26, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Shu-Shen Yeh, Che-Chia Yang, Chin-Hua Wang, Po-Yao Lin, Shin-Puu Jeng, Chia-Hsiang Lin
-
Publication number: 20230386951Abstract: In an embodiment, a package including: a redistribution structure including a first dielectric layer and a first conductive element disposed in the first dielectric layer; a first semiconductor device bonded to the redistribution structure, wherein the first semiconductor device includes a first corner; and an underfill disposed over the redistribution structure and including a first protrusion extending into the first dielectric layer of the redistribution structure, wherein the first protrusion of the underfill overlaps the first corner of the first semiconductor device in a plan view.Type: ApplicationFiled: May 31, 2022Publication date: November 30, 2023Inventors: Yu-Sheng Lin, Chien-Tung Yu, Chia-Hsiang Lin, Chin-Hua Wang, Shin-Puu Jeng
-
Publication number: 20230307338Abstract: A method includes forming a redistribution structure, wherein forming the redistribution structure includes forming a first conductive material on a portion of a first seed layer, forming a mask over the first seed layer and the first conductive material, wherein an opening in the mask at least partially exposes the first conductive material, forming a first conductive via in the opening, etching portions of the first seed layer using the first conductive material as an etching mask, depositing a first insulating layer over the first conductive via, the first conductive material and remaining portions of the first seed layer, and etching the first insulating layer such that a portion of the first conductive via protrudes above a top surface of the first insulating layer, and attaching a first die to the redistribution structure using first electrical connectors.Type: ApplicationFiled: March 28, 2022Publication date: September 28, 2023Inventors: Chien-Tung Yu, Chia-Hsiang Lin, Chi-Pu Lin, Shin-Puu Jeng
-
Publication number: 20230223360Abstract: A package structure is provided. The package structure includes a reinforced plate and multiple conductive structures penetrating through the reinforced plate. The package structure also includes a redistribution structure over the reinforced plate. The redistribution structure has multiple polymer-containing layers and multiple conductive features. The package structure further includes multiple chip structures bonded to the redistribution structure through multiple solder bumps. In addition, the package structure includes a protective layer surrounding the chip structures.Type: ApplicationFiled: March 13, 2023Publication date: July 13, 2023Inventors: Shin-Puu JENG, Po-Yao LIN, Shuo-Mao CHEN, Chia-Hsiang LIN
-
Patent number: 11670601Abstract: A method includes forming a first dielectric layer, forming a first redistribution line comprising a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes forming a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, with a first center of conductive pad being offsetting from a second center of the conductive bump. The second via is further offset from the second center of the conductive bump.Type: GrantFiled: December 18, 2020Date of Patent: June 6, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Shu-Shen Yeh, Che-Chia Yang, Chin-Hua Wang, Po-Yao Lin, Shin-Puu Jeng, Chia-Hsiang Lin
-
Patent number: 11605600Abstract: A package structure and a formation method of a package structure are provided. The method includes forming multiple conductive vias in a carrier substrate and forming a redistribution structure over the carrier substrate. The redistribution structure has multiple polymer-containing layers and multiple conductive features. The method also includes disposing multiple chip structures over the redistribution structure. The method further includes bonding the carrier substrate to a package structure.Type: GrantFiled: October 15, 2020Date of Patent: March 14, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Shin-Puu Jeng, Po-Yao Lin, Shuo-Mao Chen, Chia-Hsiang Lin
-
Publication number: 20220384313Abstract: A method includes forming a first dielectric layer, forming a first redistribution line comprising a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes forming a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, with a first center of conductive pad being offsetting from a second center of the conductive bump. The second via is further offset from the second center of the conductive bump.Type: ApplicationFiled: August 10, 2022Publication date: December 1, 2022Inventors: Shu-Shen Yeh, Che-Chia Yang, Chin-Hua Wang, Po-Yao Lin, Shin-Puu Jeng, Chia-Hsiang Lin
-
Patent number: 11251142Abstract: A package structure including a semiconductor die, a redistribution layer and a plurality of conductive elements is provided. At least one joint of the joints in the redistribution layer or on the semiconductor die is connected with the conductive element for electrically connecting the redistribution layer, the semiconductor die and the conductive elements. The fabrication methods for forming a package structure are provided.Type: GrantFiled: May 22, 2020Date of Patent: February 15, 2022Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chia-Hsiang Lin, Feng-Cheng Hsu, Shuo-Mao Chen, Shin-Puu Jeng, Arunima Banerjee
-
Publication number: 20220045016Abstract: A package structure and a formation method of a package structure are provided. The method includes forming multiple conductive vias in a carrier substrate and forming a redistribution structure over the carrier substrate. The redistribution structure has multiple polymer-containing layers and multiple conductive features. The method also includes disposing multiple chip structures over the redistribution structure. The method further includes bonding the carrier substrate to a package structure.Type: ApplicationFiled: October 15, 2020Publication date: February 10, 2022Inventors: Shin-Puu JENG, Po-Yao LIN, Shuo-Mao CHEN, Chia-Hsiang LIN
-
Publication number: 20220020700Abstract: A method includes forming a first dielectric layer, forming a first redistribution line comprising a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes forming a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, with a first center of conductive pad being offsetting from a second center of the conductive bump. The second via is further offset from the second center of the conductive bump.Type: ApplicationFiled: December 18, 2020Publication date: January 20, 2022Inventors: Shu-Shen Yeh, Che-Chia Yang, Chin-Hua Wang, Po-Yao Lin, Shin-Puu Jeng, Chia-Hsiang Lin
-
Publication number: 20220020693Abstract: A method includes forming a first dielectric layer, forming a first redistribution line including a first via extending into the first dielectric layer, and a first trace over the first dielectric layer, forming a second dielectric layer covering the first redistribution line, and patterning the second dielectric layer to form a via opening. The first redistribution line is revealed through the via opening. The method further includes depositing a conductive material into the via opening to form a second via in the second dielectric layer, and a conductive pad over and contacting the second via, and forming a conductive bump over the conductive pad. The conductive pad is larger than the conductive bump, and the second via is offset from a center line of the conductive bump.Type: ApplicationFiled: December 18, 2020Publication date: January 20, 2022Inventors: Shu-Shen Yeh, Che-Chia Yang, Chia-Kuei Hsu, Po-Yao Lin, Shin-Puu Jeng, Chia-Hsiang Lin
-
Publication number: 20210305821Abstract: A charger circuit for use in controlling charge of a battery pack, which includes a charge control switch, a discharging circuit and a control unit. The charger circuit has at least one power output terminal and one connection terminal for coupling the battery pack. The charge control switch is arranged to selectively provide a power from a power source to the battery pack through the power output terminal. The discharging circuit is selectively coupled to the power output terminal, and arranged to discharge a battery cell of the battery pack when being coupled to the power output terminal. The control unit is coupled to the charge control switch and the discharging circuit, and determines whether to turn off the charge control switch and control the discharging circuit to couple to the power output terminal according to at least an over-voltage detection based on a signal based on the connection terminal.Type: ApplicationFiled: April 26, 2021Publication date: September 30, 2021Applicant: Media Tek Inc.Inventors: Kuo-Chang Lo, Chia-Hsiang Lin, Chih-Chien Huang
-
Patent number: 11107801Abstract: A package structure and method for forming the same are provided. The package structure includes a first redistribution structure formed over a substrate, and the first redistribution structure includes a first conductive line, a second conductive line and a first overlapping conductive line between the first conductive line and the second conductive line. The first conductive line has a first width, the second conductive line which is parallel to the first conductive line has a second width, and the overlapping conductive line has a third width which is greater than the first width and the second width. The package structure includes a first package unit formed over the first redistribution structure, and the first package unit includes a first semiconductor die and a first die stack, and the first semiconductor die has a different function than the first die stack.Type: GrantFiled: December 27, 2018Date of Patent: August 31, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Shin-Puu Jeng, Po-Yao Lin, Shuo-Mao Chen, Feng-Cheng Hsu, Chia-Hsiang Lin