Patents by Inventor Chien-Chang Lin

Chien-Chang Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250126821
    Abstract: A method includes forming a fin over a substrate, forming an isolation region adjacent the fin, forming a dummy gate structure over the fin, and recessing the fin adjacent the dummy gate structure to form a first recess using a first etching process. The method also includes performing a plasma clean process on the first recess, the plasma clean process including placing the substrate on a holder disposed in a process chamber, heating the holder to a process temperature between 300° C. and 1000° C., introducing hydrogen gas into a plasma generation chamber connected to the process chamber, igniting a plasma within the plasma generation chamber to form hydrogen radicals, and exposing surfaces of the recess to the hydrogen radicals. The method also includes epitaxially growing a source/drain region in the first recess.
    Type: Application
    Filed: December 23, 2024
    Publication date: April 17, 2025
    Inventors: Chien-Wei Lee, Che-Yu Lin, Hsueh-Chang Sung, Yee-Chia Yeo
  • Publication number: 20250126837
    Abstract: A device includes a substrate. A first channel region of a first transistor overlies the substrate and a source/drain region is in contact with the first channel region. The source/drain region is adjacent to the first channel region along a first direction, and the source/drain region has a first surface opposite the substrate and side surfaces extending from the first surface. A dielectric fin structure is adjacent to the source/drain region along a second direction that is transverse to the first direction, and the dielectric fin structure has an upper surface, a lower surface, and an intermediate surface that is disposed between the upper and lower surfaces. A silicide layer is disposed on the first surface and the side surfaces of the source/drain region and on the intermediate surface of the dielectric fin structure.
    Type: Application
    Filed: December 20, 2024
    Publication date: April 17, 2025
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shih-Cheng CHEN, Zhi-Chang LIN, Jung-Hung CHANG, Chien-Ning YAO, Tsung-Han CHUANG, Kuo-Cheng CHIANG, Chih-Hao WANG
  • Publication number: 20250110307
    Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.
    Type: Application
    Filed: December 12, 2024
    Publication date: April 3, 2025
    Inventors: Chao-Chang HU, Chih-Wei WENG, Chia-Che WU, Chien-Yu KAO, Hsiao-Hsin HU, He-Ling CHANG, Chao-Hsi WANG, Chen-Hsien FAN, Che-Wei CHANG, Mao-Gen JIAN, Sung-Mao TSAI, Wei-Jhe SHEN, Yung-Ping YANG, Sin-Hong LIN, Tzu-Yu CHANG, Sin-Jhong SONG, Shang-Yu HSU, Meng-Ting LIN, Shih-Wei HUNG, Yu-Huai LIAO, Mao-Kuo HSU, Hsueh-Ju LU, Ching-Chieh HUANG, Chih-Wen CHIANG, Yu-Chiao LO, Ying-Jen WANG, Shu-Shan CHEN, Che-Hsiang CHIU
  • Publication number: 20250107215
    Abstract: The present disclosure relates to an integrated chip. The integrated chip includes a first capacitor conductor disposed over an isolation structure arranged within a substrate. The isolation structure laterally extends past opposing outer sidewalls of the first capacitor conductor. A capacitor dielectric is arranged along one of the opposing outer sidewalls of the first capacitor conductor and over a top surface of the first capacitor conductor. A second capacitor conductor is arranged along an outer sidewall of the capacitor dielectric and over a top surface of the capacitor dielectric. The second capacitor conductor laterally overlaps parts of both the capacitor dielectric and the first capacitor conductor.
    Type: Application
    Filed: September 22, 2023
    Publication date: March 27, 2025
    Inventors: Jhu-Min Song, Ying-Chou Chen, Yi-Kai Ciou, Chi-Te Lin, Yi-Huan Chen, Chien-Chih Chou, Fei-Yun Chen, Yu-Chang Jong
  • Publication number: 20250089295
    Abstract: A nano-FET and a method of forming is provided. In some embodiments, a nano-FET includes an epitaxial source/drain region contacting ends of a first nanostructure and a second nanostructure. The epitaxial source/drain region may include a first semiconductor material layer of a first semiconductor material, such that the first semiconductor material layer includes a first segment contacting the first nanostructure and a second segment contacting the second nanostructure, wherein the first segment is separated from the second segment. A second semiconductor material layer is formed over the first segment and the second segment. The second semiconductor material layer may include a second semiconductor material having a higher concentration of dopants of a first conductivity type than the first semiconductor material layer. The second semiconductor material layer may have a lower concentration percentage of silicon than the first semiconductor material layer.
    Type: Application
    Filed: November 22, 2024
    Publication date: March 13, 2025
    Inventors: Yan-Ting Lin, Yen-Ru Lee, Chien-Chang Su, Chih-Yun Chin, Chien-Wei Lee, Pang-Yen Tsai, Chii-Horng Li, Yee-Chia Yeo
  • Publication number: 20250069881
    Abstract: Embodiments are directed to a method for minimizing electrostatic charges in a semiconductor substrate. The method includes depositing photoresist on a semiconductor substrate to form a photoresist layer on the semiconductor substrate. The photoresist layer is exposed to radiation. The photoresist layer is developed using a developer solution. The semiconductor substrate is cleaned with a first cleaning liquid to wash the developer solution from the photoresist layer. A tetramethylammonium hydroxide (TMAH) solution is applied to the semiconductor substrate to reduce charges accumulated in the semiconductor substrate.
    Type: Application
    Filed: November 7, 2024
    Publication date: February 27, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Lin CHANG, Chih-Chien WANG, Chihy-Yuan CHENG, Sz-Fan CHEN, Chien-Hung LIN, Chun-Chang CHEN, Ching-Sen KUO, Feng-Jia SHIU
  • Patent number: 12230589
    Abstract: A semiconductor package includes a substrate, a semiconductor device, and a ring structure. The semiconductor device disposed on the substrate. The ring structure disposed on the substrate and surrounds the semiconductor device. The ring structure includes a first portion and a second portion. The first portion bonded to the substrate. The second portion connects to the first portion. A cavity is between the second portion and the substrate.
    Type: Grant
    Filed: May 30, 2023
    Date of Patent: February 18, 2025
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Yang Yu, Jung-Wei Cheng, Yu-Min Liang, Jiun-Yi Wu, Yen-Fu Su, Chien-Chang Lin, Hsin-Yu Pan
  • Patent number: 12218222
    Abstract: A method includes forming a fin over a substrate, forming an isolation region adjacent the fin, forming a dummy gate structure over the fin, and recessing the fin adjacent the dummy gate structure to form a first recess using a first etching process. The method also includes performing a plasma clean process on the first recess, the plasma clean process including placing the substrate on a holder disposed in a process chamber, heating the holder to a process temperature between 300° C. and 1000° C., introducing hydrogen gas into a plasma generation chamber connected to the process chamber, igniting a plasma within the plasma generation chamber to form hydrogen radicals, and exposing surfaces of the recess to the hydrogen radicals. The method also includes epitaxially growing a source/drain region in the first recess.
    Type: Grant
    Filed: June 6, 2022
    Date of Patent: February 4, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chien-Wei Lee, Che-Yu Lin, Hsueh-Chang Sung, Yee-Chia Yeo
  • Publication number: 20250030337
    Abstract: A circuit of a resonant power converter comprising: a high-side switch and a low-side switch, coupled to form a half-bridge switching circuit which is configured to switch a transformer for generating an output voltage; a high-side drive circuit, generating a high-side drive signal coupled to drive the high-side switch in response to a high-side control signal; a bias voltage, coupled to a bootstrap diode and a bootstrap capacitor providing a power source from the bootstrap capacitor for the high-side drive circuit; wherein the high-side drive circuit generates the high-side drive signal with a fast slew rate to turn on the high-side switch when the high-side switch is to be turned on with soft-switching; the high-side drive circuit generates the high-side drive signal with a slow slew rate to turn on the high-side switch when the high-side switch is to be turned on without soft-switching.
    Type: Application
    Filed: February 6, 2024
    Publication date: January 23, 2025
    Inventors: Kun-Yu Lin, Hsin-Yi Wu, Yu-Chang Chen, Fu-Ciao Syu, Chia-Hsien Yang, Chien-Fu Tang, Ta-Yung Yang
  • Patent number: 12205998
    Abstract: A device includes a substrate. A first channel region of a first transistor overlies the substrate and a source/drain region is in contact with the first channel region. The source/drain region is adjacent to the first channel region along a first direction, and the source/drain region has a first surface opposite the substrate and side surfaces extending from the first surface. A dielectric fin structure is adjacent to the source/drain region along a second direction that is transverse to the first direction, and the dielectric fin structure has an upper surface, a lower surface, and an intermediate surface that is disposed between the upper and lower surfaces. A silicide layer is disposed on the first surface and the side surfaces of the source/drain region and on the intermediate surface of the dielectric fin structure.
    Type: Grant
    Filed: January 14, 2022
    Date of Patent: January 21, 2025
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shih-Cheng Chen, Zhi-Chang Lin, Jung-Hung Chang, Chien-Ning Yao, Tsung-Han Chuang, Kuo-Cheng Chiang, Chih-Hao Wang
  • Patent number: 12204163
    Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.
    Type: Grant
    Filed: February 5, 2024
    Date of Patent: January 21, 2025
    Assignee: TDK TAIWAN CORP.
    Inventors: Chao-Chang Hu, Chih-Wei Weng, Chia-Che Wu, Chien-Yu Kao, Hsiao-Hsin Hu, He-Ling Chang, Chao-Hsi Wang, Chen-Hsien Fan, Che-Wei Chang, Mao-Gen Jian, Sung-Mao Tsai, Wei-Jhe Shen, Yung-Ping Yang, Sin-Hong Lin, Tzu-Yu Chang, Sin-Jhong Song, Shang-Yu Hsu, Meng-Ting Lin, Shih-Wei Hung, Yu-Huai Liao, Mao-Kuo Hsu, Hsueh-Ju Lu, Ching-Chieh Huang, Chih-Wen Chiang, Yu-Chiao Lo, Ying-Jen Wang, Shu-Shan Chen, Che-Hsiang Chiu
  • Patent number: 12192633
    Abstract: An image capturing assembly including a mounting base, a driving component, a first gear, a second gear, a lens assembly, a third gear and a resistance component. The driving component is disposed on the mounting base. The first gear is connected to the driving component and configured to be driven by the driving component. The second gear is pivotally connected to the mounting base and connected to the first gear. The driving component is configured to drive the second gear via the first gear. The lens assembly is fixed to the second gear. The third gear is pivotally connected to the mounting base and engaged with the second gear. The resistance component presses against the third gear to allow the third gear to transmit a resistance against the second gear during a rotation of the second gear.
    Type: Grant
    Filed: March 1, 2023
    Date of Patent: January 7, 2025
    Assignee: AVER INFORMATION INC.
    Inventors: Ming-Te Cheng, Chien-Chang Lin
  • Publication number: 20240407598
    Abstract: A casing of an oven includes a base, two first plates and two second plates. The base has two first pivot portions and two second pivot portions. Two first axes and two second axes are defined. Each of the two first axes passes through one of the two first pivot portions. Each of the two second axes passes through one of the two second pivot portions. Each of the two first axes and the two second axes re spaced apart from one another in a height direction of the base. Each of the two first plates is pivotally connected to one of the two first pivot portions. Each of the two second plates is pivotally connected to one of the two second pivot portions. As the four axes are respectively located at different positions in the height direction of the base, the two first plates could be stacked and the two second plates could be stacked upon folding the casing.
    Type: Application
    Filed: June 7, 2023
    Publication date: December 12, 2024
    Applicant: GRAND MATE CO., LTD.
    Inventors: CHIN-YING HUANG, HSIN-MING HUANG, HSING-HSIUNG HUANG, YEN-JEN YEH, CHIEN-CHANG LIN
  • Publication number: 20240304561
    Abstract: A semiconductor package is provided. The semiconductor package includes a semiconductor die, a stack of polymer layers, redistribution elements and a passive filter. The polymer layers cover a front surface of the semiconductor die. The redistribution elements and the passive filter are disposed in the stack of polymer layers. The passive filter includes a ground plane and conductive patches. The ground plane is overlapped with the conductive patches, and the conductive patches are laterally separated from one another. The ground plane is electrically coupled to a reference voltage. The conductive patches are electrically connected to the ground plane, electrically floated, or electrically coupled to a direct current (DC) voltage.
    Type: Application
    Filed: May 14, 2024
    Publication date: September 12, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Sen-Kuei Hsu, Hsin-Yu Pan, Chien-Chang Lin
  • Patent number: 12014992
    Abstract: A semiconductor package is provided. The semiconductor package includes a semiconductor die, a stack of polymer layers, redistribution elements and a passive filter. The polymer layers cover a front surface of the semiconductor die. The redistribution elements and the passive filter are disposed in the stack of polymer layers. The passive filter includes a ground plane and conductive patches. The ground plane is overlapped with the conductive patches, and the conductive patches are laterally separated from one another. The ground plane is electrically coupled to a reference voltage. The conductive patches are electrically connected to the ground plane, electrically floated, or electrically coupled to a direct current (DC) voltage.
    Type: Grant
    Filed: November 9, 2022
    Date of Patent: June 18, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Sen-Kuei Hsu, Hsin-Yu Pan, Chien-Chang Lin
  • Publication number: 20240071888
    Abstract: A package structure including a redistribution circuit structure, a wiring substrate, first conductive terminals, an insulating encapsulation, and a semiconductor device is provided. The redistribution circuit structure includes stacked dielectric layers, redistribution wirings and first conductive pads. The first conductive pads are disposed on a surface of an outermost dielectric layer among the stacked dielectric layers, the first conductive pads are electrically connected to outermost redistribution pads among the redistribution wirings by via openings of the outermost dielectric layer, and a first lateral dimension of the via openings is greater than a half of a second lateral dimension of the outermost redistribution pads. The wiring substrate includes second conductive pads. The first conductive terminals are disposed between the first conductive pads and the second conductive pads. The insulating encapsulation is disposed on the surface of the redistribution circuit structure.
    Type: Application
    Filed: August 28, 2022
    Publication date: February 29, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chien-Chang Lin, Yen-Fu Su, Chin-Liang Chen, Wei-Yu Chen, Hsin-Yu Pan, Yu-Min Liang, Hao-Cheng Hou, Chi-Yang Yu
  • Publication number: 20230307385
    Abstract: A semiconductor package includes a substrate, a semiconductor device, and a ring structure. The semiconductor device disposed on the substrate. The ring structure disposed on the substrate and surrounds the semiconductor device. The ring structure includes a first portion and a second portion. The first portion bonded to the substrate. The second portion connects to the first portion. A cavity is between the second portion and the substrate.
    Type: Application
    Filed: May 30, 2023
    Publication date: September 28, 2023
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Yang Yu, Jung-Wei Cheng, Yu-Min Liang, Jiun-Yi Wu, Yen-Fu Su, Chien-Chang Lin, Hsin-Yu Pan
  • Publication number: 20230283905
    Abstract: An image capturing assembly including a mounting base, a driving component, a first gear, a second gear, a lens assembly, a third gear and a resistance component. The driving component is disposed on the mounting base. The first gear is connected to the driving component and configured to be driven by the driving component. The second gear is pivotally connected to the mounting base and connected to the first gear. The driving component is configured to drive the second gear via the first gear. The lens assembly is fixed to the second gear. The third gear is pivotally connected to the mounting base and engaged with the second gear. The resistance component presses against the third gear to allow the third gear to transmit a resistance against the second gear during a rotation of the second gear.
    Type: Application
    Filed: March 1, 2023
    Publication date: September 7, 2023
    Applicant: AVER INFORMATION INC.
    Inventors: Ming-Te CHENG, Chien-Chang LIN
  • Patent number: 11705408
    Abstract: A semiconductor package includes a substrate, a semiconductor device, and a ring structure. The semiconductor device disposed on the substrate. The ring structure disposed on the substrate and surrounds the semiconductor device. The ring structure includes a first portion and a second portion. The first portion bonded to the substrate. The second portion connects to the first portion. A cavity is between the second portion and the substrate.
    Type: Grant
    Filed: February 25, 2021
    Date of Patent: July 18, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chi-Yang Yu, Jung-Wei Cheng, Yu-Min Liang, Jiun-Yi Wu, Yen-Fu Su, Chien-Chang Lin, Hsin-Yu Pan
  • Patent number: D1055615
    Type: Grant
    Filed: April 21, 2023
    Date of Patent: December 31, 2024
    Assignee: GRAND MATE CO., LTD.
    Inventors: Chin-Ying Huang, Hsin-Ming Huang, Hsing-Hsiung Huang, Yen-Jen Yeh, Chien-Chang Lin