Patents by Inventor Chien Wang

Chien Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10278899
    Abstract: A device for cutting a medicine tablet includes a base extending along an axis, a cutting device having a fixed cutter and a movable cutter base, and a carrying plate movably disposed inside the base and having a carrying face for a medicine tablet. The fixed cutter is fixedly disposed inside the base, the movable cutter base is optionally positionably moves between protruding and retreating positions axially, the movable cutter base has a movable cutter, when the movable cutter is in the protruding position, a blade of the movable cutter is near a blade of the fixed cutter, and when the movable cutter base is in the retreating position, the blade of the movable cutter is remote from the blade of the fixed cutter. The carrying face faces the blade of the fixed cutter and is able to approach the blade of the fixed cutter.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: May 7, 2019
    Inventor: Yu-Chien Wang
  • Publication number: 20190117429
    Abstract: A rehabilitation shoe includes a shoe shell, a calf-supporting component, a shoe sole, a pedal and a shoe pad, the shoe shell has first engaging portions extending horizontally, the calf-supporting component is detachably arranged above a rear end of the shoe shell and extends upward, the shoe sole is made of a flexible material, an inner edge of a top portion of the shoe sole has second engaging portions extending horizontally, the second and first engaged portions are positionably engaged with each other so that the shoe sole is fixed on the bottom portion of the shoe shell; the pedal is made of a hard material and disposed on a top surface of the shoe shell; the shoe pad is made of a soft material and disposed on a top surface of the pedal, and the shoe pad is for a foot to step thereon.
    Type: Application
    Filed: October 19, 2017
    Publication date: April 25, 2019
    Inventor: YU-CHIEN WANG
  • Patent number: 10259107
    Abstract: A driving rod assembly includes a rod having an insertion section for coupling with a rotating head of a power tool and an operative section for coupling with an external tool. The rod further includes an outer periphery having first and second positioning grooves and a positioning portion between the first and second positioning grooves. The operative section includes a coupling portion located in front of the second positioning groove and having a stopper edge wider than the positioning portion. A coupling end is provided at a front end of the operative section. A C-clip is mounted on the positioning portion of the rod. A jacket includes a receiving section slideably mounted around the positioning portion. The jacket further includes a coupling section located mounted around the coupling portion of the rod to rotate together with the rod. The receiving section includes a coupling groove for receiving the C-clip.
    Type: Grant
    Filed: August 18, 2017
    Date of Patent: April 16, 2019
    Assignee: Compass Corporation
    Inventor: Tzu-Chien Wang
  • Publication number: 20190088694
    Abstract: Implementations of the disclosure provide a method of fabricating an image sensor device. The method includes forming first trenches in a first photoresist layer using a first photomask having a first pattern to expose a first surface of a substrate, directing ions into the exposed first substrate through the first trenches to form first isolation regions in the substrate, removing the first photoresist layer, forming second trenches in a second photoresist layer using a second photomask having a second pattern to expose a second surface of the substrate, the second pattern being shifted diagonally from the first pattern by half mask pitch, directing ions into the exposed second surface through the second trenches to form second isolation regions in the substrate, the first and second isolation regions being alternatingly disposed in the substrate, and the first and second isolation regions defining pixel regions therebetween, and removing the second photoresist layer.
    Type: Application
    Filed: November 5, 2018
    Publication date: March 21, 2019
    Inventors: Wei-Chao CHIU, Chih-Chien WANG, Feng-Jia SHIU, Ching-Sen KUO, Chun-Wei CHANG, Kai TZENG
  • Publication number: 20190054601
    Abstract: A driving rod assembly includes a rod having an insertion section for coupling with a rotating head of a power tool and an operative section for coupling with an external tool. The rod further includes an outer periphery having first and second positioning grooves and a positioning portion between the first and second positioning grooves. The operative section includes a coupling portion located in front of the second positioning groove and having a stopper edge wider than the positioning portion. A coupling end is provided at a front end of the operative section. A C-clip is mounted on the positioning portion of the rod. A jacket includes a receiving section slideably mounted around the positioning portion. The jacket further includes a coupling section located mounted around the coupling portion of the rod to rotate together with the rod. The receiving section includes a coupling groove for receiving the C-clip.
    Type: Application
    Filed: August 18, 2017
    Publication date: February 21, 2019
    Inventor: Tzu-Chien Wang
  • Publication number: 20190027519
    Abstract: Various examples of a technique for forming a pattern for substrate fabrication are disclosed herein. In an example, a method includes receiving a substrate. A patterned resist is formed on the substrate and has a trench defined therein. A dielectric is deposited on the patterned resist and within the trench such that the dielectric narrows a width of the trench to further define the trench. A fabrication process is performed on a region of the substrate underlying the trench defined by the dielectric.
    Type: Application
    Filed: July 18, 2017
    Publication date: January 24, 2019
    Inventors: Wei-Chao Chiu, Kai Tzeng, Chih-Chien Wang, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu, Cheng-Ta Wu
  • Publication number: 20190027530
    Abstract: A first photoresist pattern and a second photoresist pattern are formed over a substrate. The first photoresist pattern is separated from the second photoresist pattern by a gap. A chemical mixture is coated on the first and second photoresist patterns. The chemical mixture contains a chemical material and surfactant particles mixed into the chemical material. The chemical mixture fills the gap. A baking process is performed on the first and second photoresist patterns, the baking process causing the gap to shrink. At least some surfactant particles are disposed at sidewall boundaries of the gap. A developing process is performed on the first and second photoresist patterns. The developing process removes the chemical mixture in the gap and over the photoresist patterns. The surfactant particles disposed at sidewall boundaries of the gap reduce a capillary effect during the developing process.
    Type: Application
    Filed: September 26, 2018
    Publication date: January 24, 2019
    Inventors: Wei-Chao Chiu, Chih-Chien Wang, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai Tzeng
  • Patent number: 10186542
    Abstract: Various examples of a technique for forming a pattern for substrate fabrication are disclosed herein. In an example, a method includes receiving a substrate. A patterned resist is formed on the substrate and has a trench defined therein. A dielectric is deposited on the patterned resist and within the trench such that the dielectric narrows a width of the trench to further define the trench. A fabrication process is performed on a region of the substrate underlying the trench defined by the dielectric.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: January 22, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Wei-Chao Chiu, Kai Tzeng, Chih-Chien Wang, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu, Cheng-Ta Wu
  • Publication number: 20180354170
    Abstract: The method of manufacturing kinesio brace includes steps of: preparing an elastic body which is tube-shaped to have a first face inside and a second face outside, the elastic body defining an axial direction; inserting an inner mold into the elastic body so that the first face faces to the inner mold; placing the inner mold with the elastic body into an outer mold and closing the outer mold, the outer mold being formed with at least one groove on an inner surface thereof; injecting a plastic material into the groove to shape into a plastic layer which is engaged with the second face of the elastic body; removing the outer mold and the inner mold from the elastic body, reversing the elastic body to make the second face and the plastic layer face inward to provide a kinesio brace.
    Type: Application
    Filed: June 12, 2017
    Publication date: December 13, 2018
    Inventor: YU-CHIEN WANG
  • Publication number: 20180354163
    Abstract: The method of manufacturing kinesio brace includes steps of: preparing an elastic body which is tube-shaped to have a first face inside and a second face outside, the elastic body defining an axial direction; inserting an inner mold into the elastic body so that the first face faces to the inner mold; placing the inner mold with the elastic body into an outer mold and closing the outer mold, the outer mold being formed with at least one groove on an inner surface thereof; injecting a plastic material into the groove to shape into a plastic layer which is engaged with the second face of the elastic body; removing the outer mold and the inner mold from the elastic body to provide a kinesio brace.
    Type: Application
    Filed: August 10, 2018
    Publication date: December 13, 2018
    Inventor: YU-CHIEN WANG
  • Patent number: 10140480
    Abstract: A counter to monitor an amount of tool use that includes a fluid passage (23) with an inlet (21) and an outlet (22). A piston (30) and sensor target (50) (e.g., magnet) are positioned along the passage and are biased towards a first position by a biasing member (40). When the tool is not in operation, the piston and sensor target are located at a first position due to the biasing force. When the tool is in operation, fluid moves along the fluid passage. A force applied by the moving fluid on the piston and sensor target overcomes the force applied by the biasing member and moves the piston and sensor target along the fluid passage to a second position. A sensor is configured to sense the sensor target at the second position. A processing circuit (62) determines the tool usage based on the detection of the sensor target at the second position by the sensor.
    Type: Grant
    Filed: October 5, 2015
    Date of Patent: November 27, 2018
    Assignee: APEX BRANDS, INC.
    Inventors: Yen-Chien Wang, Lincoln Coleman Wilkes, Kevin William Myhill
  • Publication number: 20180326565
    Abstract: A tool bit coupling assembly includes a coupling rod having an insertion end receiving a coupling device. A slideable sleeve is movable on the insertion end. A receiving hole of the slideable sleeve is larger than the insertion end and includes a coupling section. The insertion end of the coupling rod is received in a rear stop ring including a smaller diameter portion slightly smaller than an inner diameter of the coupling section. The rear stop ring further includes a larger diameter portion slightly larger than the inner diameter of the coupling section. The first coupling section of the slideable sleeve is firstly coupled with the smaller diameter portion of the rear stop ring. When the slideable sleeve is moved toward the driving end of the coupling rod, the coupling section of the slideable sleeve is tightly fit around the larger diameter portion of the rear stop ring.
    Type: Application
    Filed: May 12, 2017
    Publication date: November 15, 2018
    Inventor: Tzu-Chien Wang
  • Patent number: 10124473
    Abstract: A screwdriver bit assembly includes a magnetic ring mounted in a front end of a sleeve hole of a sleeve. A retaining ring is made of a material more rigid than the sleeve, is mounted in the sleeve hole, and is located behind the magnetic ring. A screwdriver bit includes an insertion end, an extending section behind the insertion end, a flange section behind the extending section, and a clamping section behind the flange section. The front end of the screwdriver bit extends through the sleeve hole of the sleeve, the retaining ring, and the magnetic ring. The insertion end extends beyond the sleeve and is located in front of a front end face of the sleeve. The flange section abuts the retaining ring. The clamping section is held by a holding device mounted on the sleeve, providing a holding force towards a longitudinal axis of the sleeve hole.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: November 13, 2018
    Inventor: Tzu-Chien Wang
  • Patent number: 10124323
    Abstract: A nano-nickel catalyst and a hydrogenation device of carbon oxides are provided. The hydrogenation device is configured to reduce the carbon oxides to form low carbon hydrocarbons. The nano-nickel catalyst has a metallic nickel body and a plurality of microstructures connecting with at least one surface of the metallic nickel body. The microstructures are sharp, and have a length-diameter ratio ranging from 2 to 5.
    Type: Grant
    Filed: December 1, 2017
    Date of Patent: November 13, 2018
    Assignee: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Po-Wei Lan, Cheng-Wei Huang, Yu-Wen Hou, Chen-Chien Wang, Chuh-Yung Chen
  • Patent number: 10121811
    Abstract: Implementations of the disclosure provide a method of fabricating an image sensor device. The method includes forming first trenches in a first photoresist layer using a first photomask having a first pattern to expose a first surface of a substrate, directing ions into the exposed first substrate through the first trenches to form first isolation regions in the substrate, removing the first photoresist layer, forming second trenches in a second photoresist layer using a second photomask having a second pattern to expose a second surface of the substrate, the second pattern being shifted diagonally from the first pattern by half mask pitch, directing ions into the exposed second surface through the second trenches to form second isolation regions in the substrate, the first and second isolation regions being alternatingly disposed in the substrate, and the first and second isolation regions defining pixel regions therebetween, and removing the second photoresist layer.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: November 6, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wei-Chao Chiu, Chih-Chien Wang, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai Tzeng
  • Publication number: 20180309415
    Abstract: The present invention provides an amplifier circuit, wherein the amplifier circuit includes an operational amplifier and a feedback path. The operational amplifier has an input terminal and an output terminal, and is arranged for receiving an input signal to generate an output signal. The feedback path is coupled between the input terminal and the output terminal of the operational amplifier, wherein the feedback path comprises at least two poly resistors, and a depletion region of at least one of the two poly resistors is biased by the output signal generated by the operational amplifier.
    Type: Application
    Filed: March 5, 2018
    Publication date: October 25, 2018
    Inventors: Tsun-Yuan Fan, Tze-Chien Wang
  • Patent number: 10090357
    Abstract: A first photoresist pattern and a second photoresist pattern are formed over a substrate. The first photoresist pattern is separated from the second photoresist pattern by a gap. A chemical mixture is coated on the first and second photoresist patterns. The chemical mixture contains a chemical material and surfactant particles mixed into the chemical material. The chemical mixture fills the gap. A baking process is performed on the first and second photoresist patterns, the baking process causing the gap to shrink. At least some surfactant particles are disposed at sidewall boundaries of the gap. A developing process is performed on the first and second photoresist patterns. The developing process removes the chemical mixture in the gap and over the photoresist patterns. The surfactant particles disposed at sidewall boundaries of the gap reduce a capillary effect during the developing process.
    Type: Grant
    Filed: March 7, 2016
    Date of Patent: October 2, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wei-Chao Chiu, Chih-Chien Wang, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai Tzeng
  • Patent number: 10091793
    Abstract: A UE controls in-device coexistence (IDC) indication message generation to mitigate potential throughput impact on UE to maintain UE performance as much as possible. Under the proposed method, FDM-based solution is always preferred by the UE. Based on the IDC indication message generated by the UE, a network applies an IDC interference mitigation solution that prioritizes FDM-based solution. Specifically, the UE first sends an IDC message requesting FDM-based solution. In case the serving eNB does not respond, the UE sends a new IDC message by alternating IDC option. Even if a TDM-based solution has been received, the UE may continue requesting FDM-based solution to gain UE performance.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: October 2, 2018
    Assignee: MEDIATEK INC.
    Inventors: Li-Chun Ko, Yih-Shen Chen, Yu-Ting Chen, Chung-Wei Wang, Yi-Chien Wang
  • Publication number: 20180251597
    Abstract: A copolymer based on dimethyl carbonate and a method of preparing the same are provided. The copolymer based on dimethyl carbonate has a unit from dimethyl carbonate, diols, and a modification monomer. The copolymer based on dimethyl carbonate can be obtained by proceeding transesterification and polycondenastion.
    Type: Application
    Filed: May 4, 2018
    Publication date: September 6, 2018
    Inventors: CHUH-YUNG CHEN, CHENG-CHIEN WANG, CHI-YUAN HUNG, HSIN YU
  • Patent number: D838754
    Type: Grant
    Filed: May 4, 2017
    Date of Patent: January 22, 2019
    Assignee: Compass Corporation
    Inventor: Tzu-Chien Wang