Patents by Inventor Chienliu Chang

Chienliu Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110187868
    Abstract: An acoustic-wave sensor (10) is constructed by a membrane (11) adapted to be displaced by an acoustic wave, a first waveguide (16a) for transmitting light therein, an optical coupling part (15) to which the light transmitted through the first waveguide (16a) is adapted to be optically coupled, and a second waveguide (16b) through which the light coupled from the optical coupling part (15) transmits. When the membrane (11) is displaced by its reception of the acoustic wave, at least one of an optical coupling coefficient between the first waveguide (16a) and the optical resonator (15) and an optical coupling coefficient between the second waveguide (16b) and the optical resonator (15) is changed to output a corresponding optical signal.
    Type: Application
    Filed: August 25, 2008
    Publication date: August 4, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Chienliu Chang, Kenichi Nagae
  • Patent number: 7959843
    Abstract: In a method of fabricating a structure by plastically deforming a processing portion provided at a movable segment, a restraint segment configured to restrain movement of the movable segment is provided before an external force is applied to the processing portion. After processing of the processing portion is completed, the restraint segment is removed.
    Type: Grant
    Filed: June 18, 2009
    Date of Patent: June 14, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshitaka Zaitsu, Chienliu Chang, Masao Majima, Hironobu Maeda
  • Patent number: 7960289
    Abstract: An etching method is provided in which selective etching can be carried out for an amorphous oxide semiconductor film including at least one of gallium and zinc, and indium. In the etching method, the selective etching is performed using an alkaline etching solution. The alkaline etching solution contains especially ammonia in a specific concentration range.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: June 14, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventor: Chienliu Chang
  • Publication number: 20110095645
    Abstract: In an electromechanical transducer which includes a vibration membrane provided with an upper electrode, a substrate provided with a lower electrode, and a support member adapted to support the vibration membrane in such a manner that a gap is formed between the vibration membrane and the substrate with these electrodes being arranged in opposition to each other, it is constructed such that a part of the vibration membrane and a region of the substrate are in contact with each other, and a remaining region of the vibration membrane other than the contact region is able to vibrate. There is an overlap region of the first electrode and second electrode in the contact region, and at least one of these electrodes has a through portion formed therethrough in at least a part of the overlap region.
    Type: Application
    Filed: September 19, 2008
    Publication date: April 28, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Chienliu Chang
  • Publication number: 20110073968
    Abstract: An element array comprises a plurality of elements having a first electrode and a second electrode with a gap therebetween; the first electrode being separated for each of the elements by grooves, an insulating connection substrate being bonded to the first electrode, and a wiring being made from each of the respective first electrodes separated for each of the elements through the connection substrate to the side opposite to the first electrodes.
    Type: Application
    Filed: June 29, 2009
    Publication date: March 31, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Takahiro Ezaki, Chienliu Chang, Yasuhiro Soeda, Kenji Tamamori
  • Publication number: 20110062439
    Abstract: In the present invention, a thin film transistor is formed on a plastic film substrate (1) having anisotropy of thermal shrinkage rate or coefficient of thermal expansion in in-plane directions of the substrate. A channel is formed such that the direction (7) in which the thermal shrinkage rate or the coefficient of thermal expansion of the substrate is largest is nonparallel to the direction (8) of a current flowing through the channel of the thin film transistor. Then, a thin film transistor having stable and uniform electrical characteristics, which is formed on the plastic film substrate, is provided.
    Type: Application
    Filed: November 17, 2010
    Publication date: March 17, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Chienliu Chang
  • Publication number: 20110031568
    Abstract: A structure having a plurality of conductive regions insulated electrically from each other comprises a movable piece supported movably above the upper face of the conductive region, the movable piece having an electrode in opposition to the conductive region, the structure being constructed to be capable of emitting and receiving electric signals through the lower face of the conductive region, the plural conductive regions being insulated by sequentially connected oxidized regions formed from an oxide of a material having through-holes or grooves.
    Type: Application
    Filed: May 29, 2009
    Publication date: February 10, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Atsushi Kandori, Chienliu Chang, Makoto Takagi
  • Publication number: 20100327380
    Abstract: In a method of manufacturing a capacitive electromechanical transducer, a first electrode (8) is formed on a substrate (4), an insulating layer (9) which has an opening (6) leading to the first electrode is formed on the first electrode (8), and a sacrificial layer is formed on the insulating layer. A membrane (3) having a second electrode (1) is formed on the sacrificial layer, and an aperture is provided as an etchant inlet in the membrane. The sacrificial layer is etched to form a cavity (10), and then the aperture serving as an etchant inlet is sealed. The etching is executed by electrolytic etching in which a current is caused to flow between the first electrode (8) and an externally placed counter electrode through the opening (6) and the aperture of the membrane.
    Type: Application
    Filed: April 28, 2009
    Publication date: December 30, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Chienliu Chang
  • Publication number: 20100213791
    Abstract: An oscillator device that includes a movable body oscillatably supported about a rotation axis, wherein the movable body is separated into plural electrically separated conductive regions in the thickness direction, and at least one of the plural electrically separated conductive regions in the thickness direction further has plural electrically separated conductive regions.
    Type: Application
    Filed: June 30, 2008
    Publication date: August 26, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Atsushi Kandori, Chienliu Chang, Makoto Takagi
  • Publication number: 20100207484
    Abstract: In an electromechanical transducer which includes a vibration membrane provided with an upper electrode, a substrate provided with a lower electrode, and a support member adapted to support the vibration membrane in such a manner that a gap is formed between the vibration membrane and the substrate with these electrodes being arranged in opposition to each other, it is constructed such that a part of the vibration membrane and a region of the substrate are kept in contact with each other without application of an external force, and a remaining region of the vibration membrane other than its region in which the contact state is kept is able to vibrate.
    Type: Application
    Filed: September 19, 2008
    Publication date: August 19, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Chienliu Chang
  • Patent number: 7767106
    Abstract: Provided is a dry etching method for an oxide semiconductor film containing at least In, Ga, and Zn, which includes etching an oxide semiconductor film in a gas atmosphere containing a halogen-based gas.
    Type: Grant
    Filed: July 10, 2007
    Date of Patent: August 3, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventor: Chienliu Chang
  • Publication number: 20100123366
    Abstract: An electromechanical transducer of the present invention includes a first electrode, a vibrating membrane formed above the first electrode through a gap, a second electrode formed on the vibrating membrane, and an insulating protective layer formed on a surface of the second electrode side. A region where the protective layer is not formed is present on at least part of a surface of the vibrating membrane.
    Type: Application
    Filed: November 9, 2009
    Publication date: May 20, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Chienliu Chang
  • Publication number: 20100107758
    Abstract: A structural member having a plurality of conductive regions electrically insulated from each other, in which the plurality of conductive regions are electrically insulated from each other by continuous oxidized regions, and the oxidized regions are each formed of an oxide made of a material having a plurality of through holes or trenches formed therein.
    Type: Application
    Filed: January 10, 2008
    Publication date: May 6, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Atsushi Kandori, Chienliu Chang
  • Publication number: 20100035378
    Abstract: An etching method is provided in which selective etching can be carried out for an amorphous oxide semiconductor film including at least one of gallium and zinc, and indium. In the etching method, the selective etching is performed using an alkaline etching solution. The alkaline etching solution contains especially ammonia in a specific concentration range.
    Type: Application
    Filed: November 20, 2007
    Publication date: February 11, 2010
    Applicant: Canon Kabushiki Kaisha
    Inventor: Chienliu Chang
  • Publication number: 20090320274
    Abstract: A groove is formed on a handling member, on a face to be fixed to an element, the groove making up a portion of a channel that externally communicates in the state of being fixed to the element. The handling member is fixed so that the cleavage direction of the vibrating membrane and the edge direction of the groove of the handling member intersect. Thus, the probability that a membrane will break during handling or processing of the substrate is reduced, and the handling member can be quickly removed from the substrate.
    Type: Application
    Filed: June 22, 2009
    Publication date: December 31, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Ayako Kato, Chienliu Chang
  • Publication number: 20090315217
    Abstract: In a method of fabricating a structure by plastically deforming a processing portion provided at a movable segment, a restraint segment configured to restrain movement of the movable segment is provided before an external force is applied to the processing portion. After processing of the processing portion is completed, the restraint segment is removed.
    Type: Application
    Filed: June 18, 2009
    Publication date: December 24, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Yoshitaka Zaitsu, Chienliu Chang, Masao Majima, Hironobu Maeda
  • Publication number: 20090313809
    Abstract: A handling member is prepared that provides a channel that can withstand subsequent back face processing as to a substrate having elements made up of a substrate and a membrane, and the handling member is fixed to the substrate so that at least a portion within the elements are supported by the handling member. This provides a manufacturing method wherein the physical strength of an element at the time of manufacturing an electromechanical transducing apparatus is strengthened, and the handling member is easily detached in a short time after processing of the element.
    Type: Application
    Filed: June 22, 2009
    Publication date: December 24, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Ayako Kato, Chienliu Chang
  • Publication number: 20090313808
    Abstract: A groove is formed on a handling member, on a face to be fixed to an element, the groove making up a portion of a channel that externally communicates in the state of being fixed to the element. In the fixing process of the substrate and then handling member, the handling member is fixed so that the edge direction of the vibrating membrane supporting portion and the edge direction of the groove of the handling member intersect. Thus, the probability that a membrane will break during handling or processing of the substrate is reduced, and the handling member can be quickly removed from the substrate.
    Type: Application
    Filed: June 22, 2009
    Publication date: December 24, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Ayako Kato, Chienliu Chang
  • Publication number: 20090296515
    Abstract: A fluid mixing apparatus is constituted by a plurality of flow passageways for conveying fluids, respectively, and jet outlets, corresponding to and communicating with the flow passageways, respectively, for jetting the fluids therefrom so that movement directions of the fluids intersect each other to mix the fluids. The jet outlets are provided at a surface of a substrate in which the flow passageways are provided. At least one of the flow passageways communicating with at least one of the jet outlets has a center axis partially shifted from a center axis of at least one of the jet outlets so as to incline a movement direction of a fluid jetted from at least one of the jet outlets with respect to the surface of the substrate.
    Type: Application
    Filed: December 27, 2006
    Publication date: December 3, 2009
    Inventors: Takahiro Ezaki, Susumu Yasuda, Mamoru Tsukada, Takayuki Teshima, Kazumichi Nakahama, Chienliu Chang
  • Publication number: 20090149030
    Abstract: There is provided an etching method of an amorphous oxide layer containing In and at least one of Ga and Zn, which includes etching the amorphous oxide layer using an etchant containing any one of acetic acid, citric acid, hydrochloric acid, and perchloric acid.
    Type: Application
    Filed: August 1, 2006
    Publication date: June 11, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Chienliu Chang