Patents by Inventor Chikao Ikenaga

Chikao Ikenaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11148397
    Abstract: A deposition mask package according to the present embodiment includes a receiving portion, a lid portion that faces the receiving portion, a deposition mask that is arranged between the receiving portion and the lid portion and has an effective region in which a plurality of through-holes is formed. The receiving portion has a first opposing surface facing the lid portion and a concave portion provided on the first opposing surface. The concave portion is covered by a first flexible film. The effective region of the deposition mask is arranged on the concave portion with the first flexible film interposed therebetween.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: October 19, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Takumi Oike, Tsukasa Mukaida, Takeru Watanabe
  • Publication number: 20210317562
    Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.
    Type: Application
    Filed: June 25, 2021
    Publication date: October 14, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Daigo AOKI, Chikao IKENAGA, Isao INOUE
  • Patent number: 11136664
    Abstract: A deposition mask includes: a first surface and a second surface, in which a plurality of through-holes are formed; a pair of long side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a longitudinal direction of the deposition mask; and a pair of short side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a width direction of the deposition mask. The long side surface includes a first portion that is recessed inside and includes a first end portion positioned along the first surface, and a second end portion positioned along the second surface and positioned inside the first end portion. The through-hole includes a first recess formed on the first surface, and a second recess formed on the second surface and connected to the first recess through a hole connection portion.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: October 5, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Yasuhiro Uchida, Sachiyo Matsuura, Chikao Ikenaga
  • Patent number: 11118258
    Abstract: A deposition mask includes a mask body and a through-hole provided in the mask body and through which a deposition material passes when the deposition material is deposited on a deposition target substrate. The mask body satisfies y?950 and y?23x?1280 when an indentation elastic modulus is x (GPa) and a 0.2% yield strength is y (MPa).
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: September 14, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Yo Shimazaki, Kentarou Seki, Hiroki Furushou, Chiaki Hatsuta
  • Publication number: 20210242405
    Abstract: A method of quality determination of a deposition mask according to the present disclosure includes: a measuring step that measures a dimension X1 from a P1 point to a Q1 point, and a dimension X2 from a P2 point to a Q2 point; and a determining step that determines a quality of a deposition mask, based on the dimension X1 and the dimension X2 measured in the measuring step.
    Type: Application
    Filed: January 6, 2021
    Publication date: August 5, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventor: Chikao IKENAGA
  • Publication number: 20210214837
    Abstract: A deposition mask in which deformation of long sides is restrained is manufactured. A manufacturing method of a deposition mask includes a step of preparing a metal plate; a processing step of processing the metal plate into an intermediate product comprising: a plurality of deposition mask portions each including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and a support portion that surrounds the plurality of deposition mask portions, and is partially connected to the short sides of the plurality of deposition mask portions; and a separation step of separating the deposition mask portions from the support portion to obtain the deposition mask. In the intermediate product, the long sides of the deposition mask portions are not connected to the support portion.
    Type: Application
    Filed: March 31, 2021
    Publication date: July 15, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Takanori MARUOKA, Sachiyo MATSUURA
  • Publication number: 20210157232
    Abstract: A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 ?m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 ?m2 to 50 ?m2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.
    Type: Application
    Filed: February 5, 2021
    Publication date: May 27, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Chiaki HATSUTA, Hiroki OKA, Sachiyo MATSUURA, Hideyuki OKAMOTO, Masato USHIKUSA
  • Patent number: 10991883
    Abstract: A deposition mask has a central axis extending in a first direction, arranged at a central position in a second direction orthogonal to the first direction. Spaced apart point P1 and Q1 are provided on one side of the central axis, and spaced apart points Q1 and Q2 are provided on another side of the central axis. When a dimension from point P1 to point Q1 is X1, a dimension from point P2 to a point Q2 is X2, and a design value is ?x, the deposition mask satisfies the following.
    Type: Grant
    Filed: December 26, 2017
    Date of Patent: April 27, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventor: Chikao Ikenaga
  • Publication number: 20210108312
    Abstract: A method for manufacturing a metal plate, the metal plate including a first surface and a second surface positioned on the opposite side of the first surface, may include a step of rolling a base metal having an iron alloy containing nickel to produce the metal plate. The metal plate may include particles containing as a main component an element other than iron and nickel. In a sample including the first surface and the second surface of the metal plate, the following conditions (1) and (2) regarding the particles may be satisfied: (1) The number of the particles having an equivalent circle diameter of 1 ?m or more is 50 or more and 3000 or less per 1 mm3 in the sample, and (2) The number of the particles having an equivalent circle diameter of 3 ?m or more is 50 or less per 1 mm3 in the sample.
    Type: Application
    Filed: October 14, 2020
    Publication date: April 15, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroki OKA, Chikao IKENAGA, Sachiyo MATSUURA, Shogo ENDO, Chiaki HATSUTA, Asako NARITA
  • Publication number: 20210102268
    Abstract: A method for manufacturing a metal plate, the metal plate including a first surface and a second surface positioned on the opposite side of the first surface, may include a step of rolling a base metal having an iron alloy containing nickel to produce the metal plate. The metal plate may include particles containing as a main component an element other than iron and nickel. In a sample including the first surface and the second surface of the metal plate, the following conditions (1) and (2) regarding the particles may be satisfied: (1) The number of the particles having an equivalent circle diameter of 1 ?m or more is 50 or more and 3000 or less per 1 mm3 in the sample, and (2) The number of the particles having an equivalent circle diameter of 3 ?m or more is 50 or less per 1 mm3 in the sample.
    Type: Application
    Filed: July 28, 2020
    Publication date: April 8, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroki OKA, Chikao IKENAGA, Sachiyo MATSUURA, Shogo ENDO, Chiaki HATSUTA, Asako NARITA
  • Publication number: 20200308688
    Abstract: A wall surface of an opening of a deposition mask includes a first wall surface that extends from a first end toward a second surface, a second wall surface that extends from a second end toward a first surface, and a connection at which the first wall surface is connected to the second wall surface. When the opening is viewed from the first surface side along a normal direction of the first surface, the first end of the opening includes a first portion that extends in a first direction and has a first dimension and a second portion that extends in a second direction intersecting the first direction and a second dimension shorter than the first dimension. The first wall surface includes a first wall surface section that extends from the first portion toward the connection and a second wall surface section that extends from the second portion toward the connection. A height of the first wall surface section is lower than a height of the second wall surface section.
    Type: Application
    Filed: March 24, 2020
    Publication date: October 1, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Daigo AOKI
  • Publication number: 20200273735
    Abstract: A vapor deposition mask includes a mask main body and a support joined to the mask main body. The mask main body has a first alignment mark whereas the support has a second alignment mark. The first alignment mark and the second alignment are provided at such positions as to overlap with each other in plan view, and either one of the alignment marks is larger than the other of the alignment marks.
    Type: Application
    Filed: January 23, 2020
    Publication date: August 27, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventor: Chikao IKENAGA
  • Publication number: 20200248297
    Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.
    Type: Application
    Filed: February 6, 2020
    Publication date: August 6, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Daigo Aoki, Chikao Ikenaga, Isao Inoue
  • Patent number: 10731261
    Abstract: The object of the present invention is to provide a metal plate having an excellent transportability. A maximum value of a steepness degree at a central area in a width direction of the metal plate is not more than 0.4%. In addition, the maximum value of the steepness degree at the central area is not more than a steepness degree at one end side area, and is not more than a steepness degree at the other end side area. Further, a difference between the maximum value of the steepness degree at the one end side area and the maximum value of the steepness degree at the other end side area is not more than 0.4%.
    Type: Grant
    Filed: March 6, 2018
    Date of Patent: August 4, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Isao Miyatani
  • Publication number: 20200185607
    Abstract: A metal plate for manufacturing a deposition mask with reduced variation in dimension of through-holes; wherein an average value of plate thicknesses of the metal plate in a longitudinal direction is within a ±3% range around a predetermined value. When an average value of the plate thicknesses of the metal plate in the longitudinal direction is represented as A, and a value obtained by multiplying a standard deviation of the plate thicknesses of the metal plate in the longitudinal direction by 3 is represented as B, (B/A)×100(%) is ?5%. When a value obtained by multiplying a standard deviation of the plate thicknesses of the metal plate in the width direction by 3 is represented as C, and a value of a plate thickness of the metal plate at a central portion in the width direction is represented as X, (C/X)×100(%) is ?3%.
    Type: Application
    Filed: February 13, 2020
    Publication date: June 11, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventor: Chikao IKENAGA
  • Publication number: 20200149139
    Abstract: A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 ?m. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 ?m2 to 50 ?m2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.
    Type: Application
    Filed: November 12, 2019
    Publication date: May 14, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroki Oka, Sachiyo Matsuura, Chiaki Hatsuta, Chikao Ikenaga, Hideyuki Okamoto, Masato Ushikusa
  • Patent number: 10612124
    Abstract: The present invention provides a metal sheet, on a first surface of which a resist pattern having a narrow width can be stably provided. This manufacturing method for a metal sheet includes a preparation step of preparing a sheet material comprising an iron alloy that contains nickel. When a composition analysis of the first surface of the metal sheet obtained from the sheet material is performed using X-ray photoelectron spectroscopy, the ratio A1/A2 obtained by the result of the X-ray photoelectron spectroscopy does not exceed 0.4, where A1 is the sum of the peak area value of nickel oxide and the peak area value of nickel hydroxide, and A2 is the sum of the peak area value of iron oxide and the peak area value of iron hydroxide.
    Type: Grant
    Filed: January 17, 2019
    Date of Patent: April 7, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Hiroaki Nakayama, Kazunari Ikeda, Chiaki Hatsuta, Utako Oouchi
  • Patent number: 10600963
    Abstract: A metal plate for manufacturing a deposition mask with reduced variation in dimension of through-holes wherein an average value of plate thicknesses of the metal plate in a longitudinal direction is within a ±3% range around a predetermined value. When an average value of the plate thicknesses of the metal plate in the longitudinal direction is represented as A, and a value obtained by multiplying a standard deviation of the plate thicknesses of the metal plate in the longitudinal direction by 3 is represented as B, (B/A)×100 (%) is ?5%. When a value obtained by multiplying a standard deviation of the plate thicknesses of the metal plate in the width direction by 3 is represented as C, and a value of a plate thickness of the metal plate at a central portion in the width direction is represented as X, (C/X)×100(%) is ?3%.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: March 24, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventor: Chikao Ikenaga
  • Patent number: 10570498
    Abstract: The present invention provides a metal sheet, on a first surface of which a resist pattern having a narrow width can be stably provided. This manufacturing method for a metal sheet includes a preparation step of preparing a sheet material comprising an iron alloy that contains nickel. When a composition analysis of the first surface of the metal sheet obtained from the sheet material is performed using X-ray photoelectron spectroscopy, the ratio A1/A2 obtained by the result of the X-ray photoelectron spectroscopy does not exceed 0.4, where A1 is the sum of the peak area value of nickel oxide and the peak area value of nickel hydroxide, and A2 is the sum of the peak area value of iron oxide and the peak area value of iron hydroxide.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: February 25, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Hiroaki Nakayama, Kazunari Ikeda, Chiaki Hatsuta, Utako Oouchi
  • Publication number: 20200056279
    Abstract: A deposition mask in which deformation of long sides is restrained is manufactured. A manufacturing method of a deposition mask includes a step of preparing a metal plate; a processing step of processing the metal plate into an intermediate product comprising: a plurality of deposition mask portions each including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and a support portion that surrounds the plurality of deposition mask portions, and is partially connected to the short sides of the plurality of deposition mask portions; and a separation step of separating the deposition mask portions from the support portion to obtain the deposition mask. In the intermediate product, the long sides of the deposition mask portions are not connected to the support portion.
    Type: Application
    Filed: October 24, 2019
    Publication date: February 20, 2020
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Takanori MARUOKA, Sachiyo MATSUURA