Patents by Inventor Chikao Ikenaga

Chikao Ikenaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220325397
    Abstract: A deposition mask according to an embodiment of the present disclosure includes a first surface, a second surface that is located opposite the first surface, and two or more through-holes. Each of the through-holes includes a first recess that is located at the first surface and a second recess that is located at the second surface. The deposition mask has a first mask region having a first surface remaining ratio that represents a remaining area ratio of the second surface and a second mask region having a second surface remaining ratio that represents a remaining area ratio of the second surface and that is higher than the first surface remaining ratio.
    Type: Application
    Filed: April 6, 2022
    Publication date: October 13, 2022
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Isao MIYATANI, Chikao IKENAGA, Yoko NAKAMURA, Isao INOUE
  • Patent number: 11434559
    Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.
    Type: Grant
    Filed: June 25, 2021
    Date of Patent: September 6, 2022
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Daigo Aoki, Chikao Ikenaga, Isao Inoue
  • Publication number: 20220205077
    Abstract: A deposition mask in which deformation of long sides is restrained is manufactured. A manufacturing method of a deposition mask includes a step of preparing a metal plate; a processing step of processing the metal plate into an intermediate product comprising: a plurality of deposition mask portions each including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and a support portion that surrounds the plurality of deposition mask portions, and is partially connected to the short sides of the plurality of deposition mask portions; and a separation step of separating the deposition mask portions from the support portion to obtain the deposition mask. In the intermediate product, the long sides of the deposition mask portions are not connected to the support portion.
    Type: Application
    Filed: March 18, 2022
    Publication date: June 30, 2022
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Takanori MARUOKA, Sachiyo MATSUURA
  • Publication number: 20220162738
    Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.
    Type: Application
    Filed: February 2, 2022
    Publication date: May 26, 2022
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Daigo AOKI, Chikao IKENAGA, Isao INOUE
  • Patent number: 11313026
    Abstract: A deposition mask in which deformation of long sides is restrained is manufactured. A manufacturing method of a deposition mask includes a step of preparing a metal plate; a processing step of processing the metal plate into an intermediate product comprising: a plurality of deposition mask portions each including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and a support portion that surrounds the plurality of deposition mask portions, and is partially connected to the short sides of the plurality of deposition mask portions; and a separation step of separating the deposition mask portions from the support portion to obtain the deposition mask. In the intermediate product, the long sides of the deposition mask portions are not connected to the support portion.
    Type: Grant
    Filed: October 24, 2019
    Date of Patent: April 26, 2022
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Takanori Maruoka, Sachiyo Matsuura
  • Publication number: 20220121115
    Abstract: The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.
    Type: Application
    Filed: December 29, 2021
    Publication date: April 21, 2022
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroki OKA, Sachiyo MATSUURA, Chiaki HATSUTA, Chikao IKENAGA, Hideyuki OKAMOTO, Masato USHIKUSA
  • Patent number: 11279999
    Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.
    Type: Grant
    Filed: February 6, 2020
    Date of Patent: March 22, 2022
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Daigo Aoki, Chikao Ikenaga, Isao Inoue
  • Patent number: 11237481
    Abstract: The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.
    Type: Grant
    Filed: September 21, 2019
    Date of Patent: February 1, 2022
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroki Oka, Sachiyo Matsuura, Chiaki Hatsuta, Chikao Ikenaga, Hideyuki Okamoto, Masato Ushikusa
  • Publication number: 20220020952
    Abstract: A manufacturing method for an electronic device includes a preparation step of preparing a layered body including a substrate, two or more first electrodes, and organic layers, the substrate having a first surface and a second surface that is positioned opposite to the first surface, the two or more first electrodes positioned above the first surface of the substrate, the organic layers positioned above the first electrodes; a second electrode formation step of forming a second electrode above the organic layers so that the second electrode overlaps the two or more first electrodes when viewed in a normal direction to the first surface of the substrate; and a removal step of partly removing regions of the second electrode that is positioned between the first electrodes in plan view.
    Type: Application
    Filed: June 2, 2021
    Publication date: January 20, 2022
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Isao INOUE, Yoko NAKAMURA
  • Patent number: 11220736
    Abstract: A deposition mask includes a first surface facing to the deposition target substrate, and a second surface opposite to the first surface. The deposition mask includes: an effective area in which a plurality of through holes are formed and a longitudinal direction in which one or more of the effective areas are arranged along the longitudinal direction. At least in a central area of the longitudinal direction, the deposition mask is warped to be convex on the first surface in a cross section orthogonal to the longitudinal direction.
    Type: Grant
    Filed: October 24, 2017
    Date of Patent: January 11, 2022
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventor: Chikao Ikenaga
  • Patent number: 11217750
    Abstract: A method of inspecting an elongated metal plate is provided, including measuring longitudinal direction metal plate thicknesses, measuring width direction metal plate thicknesses, and selecting the metal plate that satisfies condition (1), (B/A)×100 (%) is 5% or less, A being an average value of the longitudinal direction metal plate thicknesses, and B being obtained by multiplying a standard deviation of the longitudinal direction metal plate thicknesses by 3, and that satisfies condition (2), (C/X)×100 (%) is 3% or less, C being a value obtained by multiplying a standard deviation of the width direction metal plate thicknesses by 3, and X being a central portion width direction metal plate thickness obtained when the width direction metal plate thicknesses are measured to calculate the standard deviation of the metal plate thicknesses in the width direction.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: January 4, 2022
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventor: Chikao Ikenaga
  • Publication number: 20210362474
    Abstract: A deposition mask package according to the present embodiment includes a receiving portion, a lid portion that faces the receiving portion, a deposition mask that is arranged between the receiving portion and the lid portion and has an effective region in which a plurality of through-holes is formed. The receiving portion has a first opposing surface facing the lid portion and a concave portion provided on the first opposing surface. The concave portion is covered by a first flexible film. The effective region of the deposition mask is arranged on the concave portion with the first flexible film interposed therebetween.
    Type: Application
    Filed: August 4, 2021
    Publication date: November 25, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Takumi Oike, Tsukasa Mukaida, Takeru Watanabe
  • Publication number: 20210348265
    Abstract: A standard mask apparatus includes at least one standard mask including at least one through-hole. The standard mask apparatus may include standard regions each including the at least one through-hole. The standard regions may be arranged in a first direction and in a second direction that intersects with the first direction. A ratio of a dimension of each standard region in the first direction to a dimension of an interval between two of the standard regions in the first direction may be higher than or equal to 0.1. A ratio of a dimension of each standard region in the second direction to a dimension of an interval between the two standard regions in the second direction may be higher than or equal to 0.1.
    Type: Application
    Filed: March 8, 2021
    Publication date: November 11, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Hideyuki OKAMOTO, Chikao IKENAGA, Yoshihiro BABA, Daigo AOKI
  • Publication number: 20210340665
    Abstract: A deposition mask includes: a first surface and a second surface, in which a plurality of through-holes are formed; a pair of long side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a longitudinal direction of the deposition mask; and a pair of short side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a width direction of the deposition mask. The long side surface includes a first portion that is recessed inside and includes a first end portion positioned along the first surface, and a second end portion positioned along the second surface and positioned inside the first end portion. The through-hole includes a first recess formed on the first surface, and a second recess formed on the second surface and connected to the first recess through a hole connection portion.
    Type: Application
    Filed: July 14, 2021
    Publication date: November 4, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Yasuhiro UCHIDA, Sachiyo MATSUURA, Chikao IKENAGA
  • Publication number: 20210340666
    Abstract: The object of the present invention is to provide a metal plate capable of manufacturing a deposition mask in which dispersion of positions of through-holes is restrained. A thermal recovery rate is defined as parts per million of a difference a distance between to measurement points on a sample before a heat treatment and a distance therebetween after the heat treatment, relative to the distance therebetween before the heat treatment. In this case, an average value of the thermal recovery rates of the respective samples is not less than ?10 ppm and not more than +10 ppm, and (2) a dispersion of the thermal recovery rates of the respective samples is not more than 20 ppm.
    Type: Application
    Filed: July 16, 2021
    Publication date: November 4, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao IKENAGA, Isao MIYATANI
  • Patent number: 11148397
    Abstract: A deposition mask package according to the present embodiment includes a receiving portion, a lid portion that faces the receiving portion, a deposition mask that is arranged between the receiving portion and the lid portion and has an effective region in which a plurality of through-holes is formed. The receiving portion has a first opposing surface facing the lid portion and a concave portion provided on the first opposing surface. The concave portion is covered by a first flexible film. The effective region of the deposition mask is arranged on the concave portion with the first flexible film interposed therebetween.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: October 19, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Takumi Oike, Tsukasa Mukaida, Takeru Watanabe
  • Publication number: 20210317562
    Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.
    Type: Application
    Filed: June 25, 2021
    Publication date: October 14, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Daigo AOKI, Chikao IKENAGA, Isao INOUE
  • Patent number: 11136664
    Abstract: A deposition mask includes: a first surface and a second surface, in which a plurality of through-holes are formed; a pair of long side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a longitudinal direction of the deposition mask; and a pair of short side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a width direction of the deposition mask. The long side surface includes a first portion that is recessed inside and includes a first end portion positioned along the first surface, and a second end portion positioned along the second surface and positioned inside the first end portion. The through-hole includes a first recess formed on the first surface, and a second recess formed on the second surface and connected to the first recess through a hole connection portion.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: October 5, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Yasuhiro Uchida, Sachiyo Matsuura, Chikao Ikenaga
  • Patent number: 11118258
    Abstract: A deposition mask includes a mask body and a through-hole provided in the mask body and through which a deposition material passes when the deposition material is deposited on a deposition target substrate. The mask body satisfies y?950 and y?23x?1280 when an indentation elastic modulus is x (GPa) and a 0.2% yield strength is y (MPa).
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: September 14, 2021
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Chikao Ikenaga, Yo Shimazaki, Kentarou Seki, Hiroki Furushou, Chiaki Hatsuta
  • Publication number: 20210242405
    Abstract: A method of quality determination of a deposition mask according to the present disclosure includes: a measuring step that measures a dimension X1 from a P1 point to a Q1 point, and a dimension X2 from a P2 point to a Q2 point; and a determining step that determines a quality of a deposition mask, based on the dimension X1 and the dimension X2 measured in the measuring step.
    Type: Application
    Filed: January 6, 2021
    Publication date: August 5, 2021
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventor: Chikao IKENAGA