Abstract: An image sensor includes a sensing layer, a filter unit, and a conductive layer. The filter unit is disposed on the sensing layer. The conductive layer surrounds the filter unit, and is disposed on the sensing layer. Therefore, light passing through the filter unit and falling on an adjacent sensing unit is minimized, and the image quality of the image sensor is improved.

Abstract: A color filter array having a lower density of the color blue is provided. The color filter array includes: a plurality of color filter units arranged in a 3×3 array. The color filter units include a blue filter and a plurality of other filters, and the blue filter is disposed in the center of each 3×3 array, wherein a number of the blue filter is fewer than that of each kind of the other filters in each 3×3 array.

Abstract: An image-sensor structure is provided. The image-sensor structure includes a substrate with a plurality of photoelectric conversion units formed therein, a plurality of color filters formed above the substrate, wherein the color filters are divided into red color filters, green color filters and blue color filters, a plurality of microlenses correspondingly formed above the color filters, a transparent material layer formed above the microlenses, a first filter blocking infrared (IR) light formed above the transparent material layer, a second filter allowing transmission of visible light formed above the first filter, and a lens module formed above the second filter.

Abstract: An image-sensor structure is provided. The image-sensor structure includes a substrate, a plurality of photoelectric conversion units formed in the substrate, a plurality of separated color filters formed above the substrate and the photoelectric conversion units, a first light shielding layer surrounding the separated color filters, and a first conductive polymer element blended with a low-refractive-index component filled between the individual separated color filters and between the all separated color filters and the first light shielding layer, wherein the first conductive polymer element is electrically connected to a grounding pad.

Abstract: An image sensor includes a sensing layer for sensing a light beam and a number of pixel groups. Each of the pixel groups includes a yellow filter unit allowing a green light component and a red light component of the light beam to pass through, a green filter unit allowing the green light component of the light beam to pass through, and a blue filter unit allowing a blue light component of the light beam to pass through.

Abstract: A detection device for specimens includes an image sensor, a light-guiding structure, and a carrier. The image sensor includes a sensing area and a non-sensing area around the sensing area. The light-guiding structure is disposed on the image sensor. The light-guiding structure includes a central guiding portion, a reflection layer, and first guiding portions. The central guiding portion is located over the sensing area. The reflection layer is disposed on the image sensor and includes channels located over the non-sensing area. The first guiding portions are located in the channels, and connected to the central guiding portion and a side surface of the light-guiding structure. The carrier is disposed on the light-guiding structure, and has wells located over the sensing area. Each of the wells is configured to receive a specimen.

Abstract: A detection device for specimens includes an image sensor, a light-guiding structure, a carrier, and a light source. The light-guiding structure is disposed on the image sensor, and includes a light-guiding layer and a top layer. The light-guiding layer is disposed on the image sensor. The top layer is disposed on the light-guiding layer. The carrier is disposed on the light-guiding structure. The carrier has a number of wells arranged in an array located over the guiding portions. Each of the wells is configured to receive a specimen.

Abstract: An image sensor includes a sensing layer, a filter unit, and a conductive layer. The filter unit is disposed on the sensing layer. The conductive layer surrounds the filter unit, and is disposed on the sensing layer. Therefore, light passing through the filter unit and falling on an adjacent sensing unit is minimized, and the image quality of the image sensor is improved.

Abstract: An image-sensor structure is provided. The image-sensor structure includes a substrate, a plurality of photoelectric conversion units formed in the substrate, a plurality of separated color filters formed above the substrate and the photoelectric conversion units, a first light shielding layer surrounding the separated color filters, and a first conductive polymer element blended with a low-refractive-index component filled between the individual separated color filters and between the all separated color filters and the first light shielding layer, wherein the first conductive polymer element is electrically connected to a grounding pad.

Abstract: An image sensing device is provided. The image sensing device includes a substrate having a pixel array with a plurality of pixels. A light guide structure is disposed over the substrate, forming a plurality of light pipes and a plurality of reflecting portions surrounding the light pipes. The light pipes are aligned with the pixels of the pixel array. The invention also provides a method for fabricating the image sensing device.

Abstract: A method for correcting pixel information of color pixels on a color filter array of an image sensor includes: establishing an M×M distance factor table, selecting M×M pixels of the color filter array, calculating a red/green/blue-color contribution from the red/green/blue pixels to a target pixel in the selected M×M pixels, calculating a red/blue/green-color pixel performance of the target pixel, calculating a red/blue/green-color correcting factor, obtaining a corrected pixel information of each of the red/green/blue pixels, by applying the red/green/blue-color correcting factor to the measured pixel information of each of the red/green/blue pixels.

Abstract: A method for correcting pixel information of color pixels on a color filter array of an image sensor includes: establishing an M×M distance factor table, selecting M×M pixels of the color filter array, calculating a red/green/blue-color contribution from the red/green/blue pixels to a target pixel in the selected M×M pixels, calculating a red/blue/green-color pixel performance of the target pixel, calculating a red/blue/green-color correcting factor, obtaining a corrected pixel information of each of the red/green/blue pixels, by applying the red/green/blue-color correcting factor to the measured pixel information of each of the red/green/blue pixels.

Abstract: A method for correcting pixel information of color pixels on a color filter array of an image sensor includes: establishing an M×M distance factor table, selecting M×M pixels of the color filter array, calculating a red/green/blue-color contribution from the red/green/blue pixels to a target pixel in the selected M×M pixels, calculating a red/blue/green-color pixel performance of the target pixel, calculating a red/blue/green-color correcting factor, obtaining a corrected pixel information of each of the red/green/blue pixels, by applying the red/green/blue-color correcting factor to the measured pixel information of each of the red/green/blue pixels.

Abstract: A method for correcting pixel information of color pixels on a color filter array of an image sensor includes: establishing an M×M distance factor table, selecting M×M pixels of the color filter array, calculating a red/green/blue-color contribution from the red/green/blue pixels to a target pixel in the selected M×M pixels, calculating a red/blue/green-color pixel performance of the target pixel, calculating a red/blue/green-color correcting factor, obtaining a corrected pixel information of each of the red/green/blue pixels, by applying the red/green/blue-color correcting factor to the measured pixel information of each of the red/green/blue pixels.

Abstract: A new method is provided for the creation of a dummy pattern. A typical wafer exposure mask contains a Clear Out Window (CLWD) pattern, this CLWD pattern is of no value during the process of shielding the area on the surface of the wafer where the alignment mark must be placed. This CLWD can therefore be used to create a dummy overlay pattern, resulting in a reduction in the wafer scaling error that typically occurs as a result of metal deposition. For the same reasons, a dummy overlay pattern can also be created in the scribe lines of the wafer surface.

Abstract: A verification photomask disclosed. The mask may be for process window verification purposes when switching between fabrication equipment, and/or for optical proximity correction (OPC) verification purposes. The mask includes device areas that are separated by scribe lines. One or more verification patterns are integrated into the scribe lines for verification purposes. These patterns can include: proximity patterns, photoresist-spacing patterns, polysilicon end cap patterns, as well as other patterns. A method for making the mask, and a semiconductor device created at least in part by a method including use of the mask, are also disclosed.

Abstract: A variable transmission focal mask to compensate lens heating is disclosed. A semiconductor fabrication alignment and exposure equipment includes an exposure and alignment unit, a variable transmission mask, and a stage. The unit has a light source and a lens. The mask is under the lens, and at least indirectly measures focus. The mask further can adjust the focus in real time in response to determining that the focus is out of specification. A wafer is placed on the stage for exposure to the light source through a mask or a reticle. The variable transmission mask normally has a substantially high transmission of light rating that can be adjusted downward to adjust the focus. For example, the mask can be a liquid crystal display (LCD) that can be darkened to so reduce its transmission of light rating.

Abstract: An optical proximity correction (OPC) verification mask is disclosed. The mask includes device areas that are separated by scribe lines. One or more OPC test patterns are integrated into the scribe lines for verification purposes. These patterns can include: line-end shortening (LES) patterns, such as serifs and hammerheads added to the ends of lines; corner rounding patterns, such as positive and negative serifs; and, scattering bars (SB's) and anti-scattering bars (ASB's) to compensate for isolated-dense proximity effects and isolated-feature depth of focus reduction. Other OPC patterns may also be included. A method for making the mask, and a semiconductor device created at least in part by a method including use of the mask, are also disclosed.

Abstract: A variable transmission focal mask to compensate lens heating is disclosed. A semiconductor fabrication alignment and exposure equipment includes an exposure and alignment unit, a variable transmission mask, and a stage. The unit has a light source and a lens. The mask is under the lens, and at least indirectly measures focus. The mask further can adjust the focus in real time in response to determining that the focus is out of specification. A wafer is placed on the stage for exposure to the light source through a mask or a reticle. The variable transmission mask normally has a substantially high transmission of light rating that can be adjusted downward to adjust the focus. For example, the mask can be a liquid crystal display (LCD) that can be darkened to so reduce its transmission of light rating.

Abstract: A verification photomask disclosed. The mask may be for process window verification purposes when switching between fabrication equipment, and/or for optical proximity correction (OPC) verification purposes. The mask includes device areas that are separated by scribe lines. One or more verification patterns are integrated into the scribe lines for verification purposes. These patterns can include: proximity patterns, photoresist-spacing patterns, polysilicon end cap patterns, as well as other patterns. A method for making the mask, and a semiconductor device created at least in part by a method including use of the mask, are also disclosed.