Abstract: A crosstalk-suppressing image sensor includes a semiconductor substrate, an opaque layer, and a spectral filter. The semiconductor substrate includes a photodiode therein and is located beneath a light-exposure region of a back surface of the semiconductor substrate. The opaque layer is on the back surface, partially covers the light-exposure region, and has an opaque-layer thickness perpendicular to an image-plane direction parallel to the back surface. The spectral filter is adjacent to the opaque layer in the image-plane direction, and partially covers the light-exposure region.

Abstract: An image sensor device is disclosed. The image sensor device includes a substrate having a plurality of pixel regions. Two adjacent pixel regions are optically isolated by an isolation structure. In an embodiment, a method of forming the isolation structure includes receiving a workpiece having a first substrate, etching a frontside of the first substrate to form a first trench, depositing a fill layer in the first trench, removing a portion of the fill layer from the backside of the first substrate to form a second trench surrounded by the fill layer, and depositing a metal layer in the second trench to form the isolation structure.

Abstract: Half Quad Photodiode (QPD) for improving QPD channel imbalance. In one embodiment, an image sensor includes a plurality of pixels arranged in rows and columns of a pixel array that is disposed in a semiconductor material. Each pixel includes a plurality of subpixels. Each subpixel comprises a plurality of first photodiodes, a plurality of second photodiodes and a plurality of third photodiodes. The plurality of pixels are configured to receive incoming light through an illuminated surface of the semiconductor material. A plurality of small microlenses are individually distributed over individual first photodiodes and individual second photodiodes of each subpixel. A plurality of large microlenses are each distributed over a plurality of third photodiodes of each subpixel. A diameter of the small microlenses is smaller than a diameter of the large microlenses.

Abstract: Image sensors for Phase-Detection Auto Focus (PDAF) are provided. An image sensor includes a pixel including a plurality of photodiodes disposed in a semiconductor material according to an arrangement. The arrangement defines a first image subpixel comprising a plurality of first photodiodes, a second image subpixel comprising a plurality of second photodiodes, and a third image subpixel including a plurality of third photodiodes, and a phase detection subpixel comprising a first photodiode, a second photodiode, or a third photodiodes. The pixel can include a plurality of first micro-lenses disposed individually overlying at least a subset of the plurality of photodiodes of the first, second and third image subpixels. The pixel can also include a second micro-lens disposed overlying the phase detection subpixel, a first micro-lens of the first micro-lenses having a first radius less than a second radius of the second micro-lens.

Abstract: Image sensors and devices for phase-detection auto focus processes are provided. A symmetric polarization filter includes a first polarizer defining a first plurality of apertures and a second polarizer adjacent with the first polarizer defining a second plurality of apertures. The first plurality of apertures can be mirror symmetrical with the second plurality of apertures about a lateral axis of the symmetric polarization filter between the first polarizer and the second polarizer. The lateral axis can be defined as an axis of symmetry of the symmetric polarization filter in plane with the first polarizer and the second polarizer.

Abstract: An image sensor device is disclosed. The image sensor device includes a substrate having a plurality of pixel regions. Two adjacent pixel regions are optically isolated by an isolation structure. In an embodiment, a method of forming the isolation structure includes receiving a workpiece having a first substrate, etching a frontside of the first substrate to form a first trench, depositing a fill layer in the first trench, removing a portion of the fill layer from the backside of the first substrate to form a second trench surrounded by the fill layer, and depositing a metal layer in the second trench to form the isolation structure.

Abstract: A crosstalk-suppressing image sensor includes a semiconductor substrate, an opaque layer, and a spectral filter. The semiconductor substrate includes a photodiode therein and is located beneath a light-exposure region of a back surface of the semiconductor substrate. The opaque layer is on the back surface, partially covers the light-exposure region, and has an opaque-layer thickness perpendicular to an image-plane direction parallel to the back surface. The spectral filter is adjacent to the opaque layer in the image-plane direction, and partially covers the light-exposure region.

Abstract: An image sensor pixel includes a plurality of photodiodes, a shared microlens, and a plurality of microlenses. The plurality of photodiodes are arranged as a photodiode array with each of the plurality of photodiodes disposed within a semiconductor material. The shared microlens is optically aligned with a group of neighboring photodiodes included in the plurality of photodiodes. Each of the plurality of microlenses are optically aligned with an individual one of the plurality of photodiodes other than the group of neighboring photodiodes. The plurality of microlenses laterally surrounds the shared microlens.

Abstract: An image sensor pixel comprises a subpixel and a polarization pixel. The subpixel includes a group of photodiodes disposed in semiconductor material, a shared microlens optically aligned over the group of photodiodes, and a subpixel color filter disposed between the group of photodiodes and the shared microlens. The polarization pixel includes a first photodiode disposed in the semiconductor material, an unshared microlens optically aligned over the first photodiode, and a polarization filter disposed between the first photodiode and the unshared microlens. The shared microlens has a first lateral area. The unshared microlens has a second lateral area less than the first lateral area of the shared microlens.

Abstract: An imaging device includes a photodiode array. The photodiodes include a first set of photodiodes configured as image sensing photodiodes and a second set of photodiodes configured as phase detection auto focus (PDAF) photodiodes. The PDAF photodiodes are arranged in at least pairs in neighboring columns and are interspersed among the image sensing photodiodes. Transfer transistors are coupled to corresponding photodiodes. The transfer transistors coupled to the image sensing photodiodes included in an active row of are controlled in response to a first transfer control signal or a second transfer control signal that control all of the image sensing photodiodes of the active row. A transfer transistor is coupled to one of a pair of the PDAF photodiodes of the active row. The first transfer transistor is controlled in response to a first PDAF control signal that is independent of the first or second transfer control signals.

Abstract: An imaging device includes a first pixel circuit having a first plurality of photodiodes that includes a phase detection autofocus photodiode with image sensing photodiodes. A first buffer transistor having a first threshold voltage is coupled to the first plurality of photodiodes to generate a first output signal. A second pixel circuit is included having a second plurality of photodiodes that are all image sensing photodiodes. A second buffer transistor having a second threshold voltage is coupled to the second plurality of photodiodes to generate a second output signal. The first threshold voltage is less than the second threshold voltage. A driver is coupled to receive a combination of the first and second output signals to generate a total output signal. An influence of the first output signal dominates the second output signal in the total output signal because the first threshold voltage is less than the second threshold voltage.

Abstract: An image sensor pixel array comprises a plurality of image pixel units to gather image information and a plurality of phase detection auto-focus (PDAF) pixel units to gather phase information. Each of the PDAF pixel units includes two of first image sensor pixels covered by two micro-lenses, respectively. Each of the image pixel units includes four of second image sensor pixels adjacent to each other, wherein each of the second image sensor pixels is covered by an individual micro-lens. A coating layer is disposed on the micro-lenses and forms a flattened surface across the whole image sensor pixel array. A PDAF micro-lens is formed on the coating layer to cover the first image sensor pixels.

Abstract: An image sensor includes a plurality of photodiodes, a plurality of color filters, and a plurality of microlenses. The plurality of photodiodes are arranged as a photodiode array, each of the plurality of photodiodes disposed within respective portions of a semiconductor material with a first lateral area. The plurality of color filters are arranged as a color filter array optically aligned with the photodiode array. Each of the plurality of color filters having a second lateral area greater than the first lateral area. The plurality of microlenses are arranged as a microlens array optically aligned with the color filter array and the photodiode array. Each of the plurality of microlenses have a third later area greater than the first lateral area and less than the second lateral area.

Abstract: In some embodiments, an image sensor is provided. The image sensor comprises a plurality of photodiodes arranged as a photodiode array. The plurality of photodiodes includes a first set of photodiodes configured as phase detection photodiodes, and a second set of photodiodes configured as polarization detection photodiodes. In some embodiments, a controller is provided. The controller comprises circuitry configured to process signals from a first set of photodiodes of a photodiode array to obtain depth information; process signals from a second set of photodiodes of the photodiode array to obtain polarization information; process the polarization information to obtain an ambiguous set of surface normals; and process the ambiguous set of surface normals using the depth information to obtain a three-dimensional shape image.

Abstract: An imaging device includes a first pixel circuit having a first plurality of photodiodes that includes a phase detection autofocus photodiode with image sensing photodiodes. A first buffer transistor having a first threshold voltage is coupled to the first plurality of photodiodes to generate a first output signal. A second pixel circuit is included having a second plurality of photodiodes that are all image sensing photodiodes. A second buffer transistor having a second threshold voltage is coupled to the second plurality of photodiodes to generate a second output signal. The first threshold voltage is less than the second threshold voltage. A driver is coupled to receive a combination of the first and second output signals to generate a total output signal. An influence of the first output signal dominates the second output signal in the total output signal because the first threshold voltage is less than the second threshold voltage.

Abstract: An imaging device includes a photodiode array. The photodiodes include a first set of photodiodes configured as image sensing photodiodes and a second set of photodiodes configured as phase detection auto focus (PDAF) photodiodes. The PDAF photodiodes are arranged in at least pairs in neighboring columns and are interspersed among the image sensing photodiodes. Transfer transistors are coupled to corresponding photodiodes. The transfer transistors coupled to the image sensing photodiodes included in an active row of are controlled in response to a first transfer control signal or a second transfer control signal that control all of the image sensing photodiodes of the active row. A transfer transistor is coupled to one of a pair of the PDAF photodiodes of the active row. The first transfer transistor is controlled in response to a first PDAF control signal that is independent of the first or second transfer control signals.

Abstract: In some embodiments, an image sensor is provided. The image sensor comprises a plurality of photodiodes arranged as a photodiode array. The plurality of photodiodes includes a first set of photodiodes configured as phase detection photodiodes, and a second set of photodiodes configured as polarization detection photodiodes. In some embodiments, a controller is provided. The controller comprises circuitry configured to process signals from a first set of photodiodes of a photodiode array to obtain depth information; process signals from a second set of photodiodes of the photodiode array to obtain polarization information; process the polarization information to obtain an ambiguous set of surface normals; and process the ambiguous set of surface normals using the depth information to obtain a three-dimensional shape image.

Abstract: An image sensor includes a plurality of photodiodes, a plurality of color filters, and a plurality of microlenses. The plurality of photodiodes are arranged as a photodiode array, each of the plurality of photodiodes disposed within respective portions of a semiconductor material with a first lateral area. The plurality of color filters are arranged as a color filter array optically aligned with the photodiode array. Each of the plurality of color filters having a second lateral area greater than the first lateral area. The plurality of microlenses are arranged as a microlens array optically aligned with the color filter array and the photodiode array. Each of the plurality of microlenses have a third later area greater than the first lateral area and less than the second lateral area.

Abstract: An image sensor pixel comprises a subpixel and a polarization pixel. The subpixel includes a group of photodiodes disposed in semiconductor material, a shared microlens optically aligned over the group of photodiodes, and a subpixel color filter disposed between the group of photodiodes and the shared microlens. The polarization pixel includes a first photodiode disposed in the semiconductor material, an unshared microlens optically aligned over the first photodiode, and a polarization filter disposed between the first photodiode and the unshared microlens. The shared microlens has a first lateral area. The unshared microlens has a second lateral area less than the first lateral area of the shared microlens.

Abstract: An image sensor pixel includes a plurality of photodiodes, a shared microlens, and a plurality of microlenses. The plurality of photodiodes are arranged as a photodiode array with each of the plurality of photodiodes disposed within a semiconductor material. The shared microlens is optically aligned with a group of neighboring photodiodes included in the plurality of photodiodes. Each of the plurality of microlenses are optically aligned with an individual one of the plurality of photodiodes other than the group of neighboring photodiodes. The plurality of microlenses laterally surrounds the shared microlens.